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| Number | Title | Issue Date |
| 8013269 | Induction plasma synthesis of nanopowders A process and apparatus for synthesizing a nanopowder is presented. In particular, a process for the synthesis of nanopowders of various materials such as metals, alloys, ceramics and composites by induction plasma technology, using organometallic compounds, chlorid... | 09/06/2011 |
| 7964818 | Method and apparatus for photomask etching A method of fabricating yttria parts is provided herein. In one embodiment, the method includes sintering a yttria sample, machining the sintered sample to form a part, and annealing the part in a three-stage process that includes heating the part at a predetermined... | 06/21/2011 |
| 7754997 | Apparatus and method to confine plasma and reduce flow resistance in a plasma An apparatus configured to confine a plasma within a processing region in a plasma processing chamber. In one embodiment, the apparatus includes a ring that has a baffle having a plurality of slots and a plurality of fingers. Each slot is configured to have a width ... | 07/13/2010 |
| 7629553 | Metal oxide nanoparticles and process for producing the same There is disclosed a process for producing metal oxide nanoparticles. The process includes the steps of: a) providing at least two precursor metal salt materials, b) passing the at least two precursor metal salt materials through a plasma torch forming a vaporized m... | 12/08/2009 |
| 7608798 | Plasma catalyst Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. In one embodiment, a plasma is ignited by subjecting a gas in a multi-mode processing cavity to electromagnetic radiation having a frequ... | 10/27/2009 |
| 7435926 | Methods and array for creating a mathematical model of a plasma processing system A method of creating a simplified equivalent circuit model of a plasma processing system, including an electrical measuring device, a lower electrode, an upper electrode, and a signal generator device is described. The method includes creating a simplified equivalen... | 10/14/2008 |
| 7432470 | Surface cleaning and sterilization Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. Such treatments include cleaning and sterilizing parts. In some embodiments, a plasma is ignited by subjecting a gas in a multi-mode pro... | 10/07/2008 |
| 7423235 | Electrode and electrode holder with threaded connection A threaded connection for an electrode holder and an electrode in a plasma arc torch is provided. The threaded connection has relatively low height, and the engaged portion of a male threaded portion of the electrode and a female threaded portion of the electrode ho... | 09/09/2008 |
| 7423234 | Process for the surface treatment of an article containing silicone crosslinked by polyaddition A process for increasing the surface tension (“wettability”) of a silicone element crosslinked by polyaddition from a liquid composition containing one or more α,ω-dimethylvinylpolydimethylsiloxanes (PDMS), one or more poly(dimethyl)(methylhydrogenosiloxy)-α,... | 09/09/2008 |
| 7375302 | Plasma arc torch having an electrode with internal passages An electrode for a plasma arc cutting torch which minimizes the deposition of high emissivity material on the nozzle, reduces electrode wear, and improves cut quality. The electrode has a body having a first end, a second end in a spaced relationship relative to the... | 05/20/2008 |
| 7375303 | Plasma arc torch having an electrode with internal passages An electrode for a plasma arc cutting torch which minimizes the deposition of high emissivity material on the nozzle, reduces electrode wear, and improves cut quality. The electrode has a body having a first end, a second end in a spaced relationship relative to the... | 05/20/2008 |
| 7371992 | Method for non-contact cleaning of a surface A flame torch can be used to clean the surface of a contact-sensitive object, such as a glass optic, extremely thin workpiece, or semiconductor wafer by providing a reactive precursor gas to the feed gases of the torch. Reactive atom plasma processing can be used to... | 05/13/2008 |
| 7357802 | Electrosurgical system with uniformly enhanced electric field and minimal collateral damage The present invention is directed towards an electrosurgical cutting system. The system comprises an electrically conductive blade, having first and second blade surfaces. First and second insulators are affixed to the first and second blade surfaces, respectively. ... | 04/15/2008 |
| 7355143 | Circuit board production method and its apparatus Making it possible to execute the detection of the particles floating inside a processing chamber with the use of an optical system including one observing window and one unit (An object of the present invention is, by using an optical system including one observing... | 04/08/2008 |
| 7345255 | Composite overlay compound A method of forming a composite overlay compound on a substrate includes forming a mixture including at least one component from a first group of component materials including titanium, chrome, tungsten, vanadium, niobium, and molybdenum. The mixture also includes a... | 03/18/2008 |
| 7342195 | Customizable ion fusion formation system and process A customizable ion fusion formation system and method is used to repair a targeted repair region of a workpiece with successive layers of feedstock material. The system includes a moveable positioning platform and a control platform positioned separate and apart fro... | 03/11/2008 |
| 7342196 | Plasma spraying apparatus and also a method for monitoring the condition of a plasma apparatus The invention relates to a plasma spraying apparatus (1) including a plasma torch (2) for heating up a spray powder (3) in a heating zone (4) and a metering unit (5) for metering the spray powder (3), the metering unit (5... | 03/11/2008 |
| 7342197 | Plasma torch with corrosive protected collimator To protect the collimator of a transferred plasma arc torch from premature failure due to corrosion, an anti-corrosive covering is applied on the exposed face surface and a portion of the inner exit bore of the collimator. The specification describes several methods... | 03/11/2008 |
| 7342198 | Method and apparatus for generating an electrical arc A method of generating an electrical arc includes steps of providing a first electrode and a second electrode, determining a dielectric strength of a gap region between the electrodes, determining a desired dielectric strength change based on the determined dielectr... | 03/11/2008 |
| 7334477 | Apparatus and methods for the detection of an arc in a plasma processing system In a plasma processing system, a method for detecting an arc event on a substrate in a plasma chamber having a chuck is disclosed. The method includes positioning a substrate on the chuck. The method also includes providing a vibration-sensing arrangement in the pla... | 02/26/2008 |
| 7335611 | Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer A method of forming a conductor in a thin film structure on a semiconductor substrate includes forming high aspect ratio openings in a base layer having vertical side walls, depositing a dielectric barrier layer comprising a dielectric compound of a barrier metal on... | 02/26/2008 |
| 7329828 | Method for inert gas welding or inert gas soldering of workpieces comprising identical or different metals or metal alloys by means of an additional Zn/Al metal The invention relates to a method for inert gas welding or inert gas soldering of workpieces (A) made of steel, aluminum, magnesium, copper, or the alloys thereof with workpieces (B) made of steel, aluminum, magnesium, copper, or the alloys thereof by using an addit... | 02/12/2008 |
| 7326875 | Method for supplying a plasma torch with a gas, mixed gas, or gas mixture, comprising volumetric flow regulation in combination with pressure regulation; and arrangement for carrying out said method A method of supplying a plasma torch with a gas, mixed gas or gas mixture, in which the volume flow of the gas, mixed gas or gas mixture is controlled, characterised in that the volume flow control is effected in combination with a pressure control of the gas, mixed... | 02/05/2008 |
| 7326874 | Vented shield system for a plasma arc torch Vented shield systems for plasma arc torches are provided that comprise a shield cup body defining a distal end portion, a vented retainer secured to the distal end portion of the shield cup body, and a shield cap secured to the vented retainer. The vented retainer ... | 02/05/2008 |
| 7323401 | Semiconductor substrate process using a low temperature deposited carbon-containing hard mask A method of processing a thin film structure on a semiconductor substrate using an optically writable mask includes placing the substrate in a reactor chamber, the substrate having on its surface a target layer to be etched in accordance with a predetermined pattern... | 01/29/2008 |
| 7320734 | Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage A system for processing a workpiece includes a plasma immersion ion implantation reactor with an enclosure having a side wall and a ceiling and defining a chamber, and a workpiece support pedestal within the chamber having a workpiece support surface facing the ceil... | 01/22/2008 |
| 7317186 | Short torch design for direct liquid sample introduction using conventional and micro-nebulizers for plasma spectrometry An apparatus and method for providing direct liquid sample introduction using a nebulizer are provided. The apparatus and method include a short torch having an inner tube and an outer tube, and an elongated adapter having a cavity for receiving the nebulizer and po... | 01/08/2008 |
| 7317171 | Method and apparatus for generating an electric arc A method and apparatus for reducing the gap resistance between two electrodes, such as the electrodes used fusion splicing one optical fiber to another, by injecting negative ions into the gas or gasses that are located between the electrodes. As a result, the volta... | 01/08/2008 |
| 7311851 | Apparatus and method for reactive atom plasma processing for material deposition Reactive atom plasma processing can be used to shape, polish, planarize, and clean surfaces of difficult materials with minimal subsurface damage. The apparatus and methods use a plasma torch, such as a conventional ICP torch. The workpiece and plasma torch are move... | 12/25/2007 |
| 7312148 | Copper barrier reflow process employing high speed optical annealing A method of forming a barrier layer for a thin film structure on a semiconductor substrate includes forming high aspect ratio openings in a base layer having vertical side walls, depositing a dielectric barrier layer comprising a dielectric compound of a barrier met... | 12/25/2007 |
| 7312162 | Low temperature plasma deposition process for carbon layer deposition A method of depositing a carbon layer on a workpiece includes placing the workpiece in a reactor chamber, introducing a carbon-containing process gas into the chamber, generating a reentrant toroidal RF plasma current in a reentrant path that includes a process zone... | 12/25/2007 |
| 7309843 | Plasma-assisted joining Methods and apparatus for plasma-assisted joining of one or more parts together are provided. The joining process may include, for example, placing at least first and second joining areas in proximity to one another in a cavity, forming a plasma in the cavity by sub... | 12/18/2007 |
| 7309842 | Shielded monolithic microplasma source for prevention of continuous thin film formation A monolithic microplasma source includes a dielectric substrate having an outer surface that is exposed to a time varying electric field. A gap layer is positioned on an inner surface of the dielectric substrate. A shield including a slit is positioned on the gap la... | 12/18/2007 |
| 7305852 | Method for manufacturing quartz glass ingot The invention provides a method for manufacturing a large scale quartz glass slab ingot in a flame hydrolysis reaction in a furnace, including the steps of rotating the furnace, depositing a fused silica on a furnace bed, and extending the deposit outwardly by heati... | 12/11/2007 |
| 7305311 | Arc detection and handling in radio frequency power applications A radio frequency power delivery system comprises an RF power generator, arc detection circuitry, and control logic responsive to the arc detection circuitry. A dynamic boundary is computed about the measured value of a parameter representative of or related to the ... | 12/04/2007 |
| 7304263 | Systems and methods utilizing an aperture with a reactive atom plasma torch The footprint of a reactive atom plasma processing tool can be modified using an aperture device. A flow of reactive gas can be injected into the center of an annular plasma. An aperture can be positioned relative to the plasma such that the effective footprint of t... | 12/04/2007 |
| 7303982 | Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage A method for implanting ions in a surface layer of a workpiece includes placing the workpiece on a workpiece support in a chamber with the surface layer being in facing relationship with a ceiling of the chamber, thereby defining a processing zone between the workpi... | 12/04/2007 |
| 7294563 | Semiconductor on insulator vertical transistor fabrication and doping process A process for conformally doping through the vertical and horizontal surfaces of a 3-dimensional vertical transistor in a semiconductor-on-insulator structure employs an RF oscillating torroidal plasma current to perform either conformal ion implantation, or conform... | 11/13/2007 |
| 7291545 | Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage A method of ion implanting a species in a workpiece to a selected ion implantation profile depth includes placing a workpiece having a semiconductor material on an electrostatic chuck in or near a processing region of a plasma reactor chamber and applying a chucking... | 11/06/2007 |
| 7291360 | Chemical vapor deposition plasma process using plural ion shower grids A chemical vapor deposition process is carried out in a reactor chamber having a set of plural parallel ion shower grids that divide the chamber into an upper ion generation region and a lower process region, each of the ion shower grids having plural orifices in mu... | 11/06/2007 |
