Bizarre Patents
Process For Propelling Foodstuffs or the Like into a Crowd
A method of launching foodstuffs into a crowd for promotional and entertainment purposes.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7363796 | Cold form nozzle for laser processing A method for cold-forming a nozzle for a laser includes placing a slug or tube of oxygen-free copper into a die. A mandrel is forced into the copper slug or tube. The resultant compressive force causes the copper to cold flow around the mandrel and the die to define... | 04/29/2008 |
| 7331663 | Replaceable pagewidth printhead cartridge A cartridge unit for an inkjet printer is provided. The cartridge unit has a body portion having one or more ink storage compartments, and a pagewidth printhead assembly which is mountable to the body. The printhead assembly is configured to receive ink from the com... | 02/19/2008 |
| 7304320 | Charged beam exposure apparatus, charged beam control method and manufacturing method of semiconductor device A charged beam exposure apparatus includes: a first shaping aperture provided with a plurality of rectangular openings which are different from each other in at least one of area and shape thereof; a second shaping aperture provided with a pattern having a shape cor... | 12/04/2007 |
| 7232631 | Mask for charged particle beam exposure, and method of forming the same The present invention relates to an SOI substrate as a mask substrate for the charged particle beam exposure of which a silicon oxidized film has a suitable thickness for the fabrication of a mask, a silicon membrane layer has a suitable thickness as a mask membrane... | 06/19/2007 |
| 7209055 | Electrostatic particle beam deflector An electrostatic deflector for a particle beam apparatus comprises opposing deflector plates that face one another across a particle beam gap and are electrostatically chargeable. Each deflector plate comprises its own voltage driver, which has a DAC and amplifier. ... | 04/24/2007 |
| 7189981 | Electromagnetic focusing method for electron-beam lithography system A method for projecting a predetermined pattern of an electron beam from an emitter to a wafer in a vacuum chamber of an electron-beam lithography system is provided. An initial condition for performing an electromagnetic focusing is first set and outspread phenomen... | 03/13/2007 |
| 7160475 | Fabrication of three dimensional structures The present disclosure relates to a method for generating a three-dimensional microstructure in an object. In one embodiment, a method for fabricating a microscopic three-dimensional structure is provided. A work piece is provided that includes a target area at whic... | 01/09/2007 |
| 7109501 | Charged particle beam lithography system, pattern drawing method, and method of manufacturing semiconductor device A charged particle beam lithography system includes: a charged particle beam source which generates a charged particle beam and irradiates a substrate therewith; an aperture in which has been formed a pattern of a shape corresponding to an arbitrary pattern to be dr... | 09/19/2006 |
| 7049611 | Charged-particle beam lithographic system When the focal point of the objective lens of a charged-particle beam lithographic system is shifted according to the deflection position within a writing field, the image magnification of the objective lens will vary. In the present invention, the focal point of th... | 05/23/2006 |
| 7034297 | Method and system for use in the monitoring of samples with a charged particle beam A method and apparatus for use in monitoring a sample with a charged particle beam are presented. A mechanical displacement between a plane defined by the sample's surface and an optical axis defined by a beam directing arrangement is provided so as to orient the sa... | 04/25/2006 |
| 6965114 | Apparatus and methods for mask/substrate alignment in charged-particle-beam pattern-transfer Methods and apparatus for alignment of masks and wafers in charged-particle-beam (CPB) pattern-transfer use optical position sensors to determine the positions of a mask or a mask stage with respect to an axis of a CPB optical system. The optical position sensor use... | 11/15/2005 |
| 6949756 | Shaped and low density focused ion beams A method and apparatus for providing a shaped ion beam having low current density and sharp edges. The low current density and sharp edges eliminate the problem of overmilling, while permitting rapid ion beam processing. One method of producing the shaped beam is by... | 09/27/2005 |
| 6936831 | Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same Reticles and apparatus for performing charged-particle-beam microlithography, and associated methods, are disclosed, in which the pattern to be transferred to a sensitive substrate is divided according to any of various schemes serving to improve throughput and patt... | 08/30/2005 |
| 6933508 | Method of surface texturizing A method and system for providing a texture to a surface of a workpiece is provided. The method comprises providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features... | 08/23/2005 |
| 6914252 | Charged beam exposure apparatus having blanking aperture and basic figure aperture Two or more-staged masks are prepared for a charged beam generating source. One mask has first aperture sections having rectangular apertures arranged into a lattice form, and electrodes which deflects a beam at respective first aperture sections. The other mask has... | 07/05/2005 |
| 6909065 | Altering method of circuit pattern of printed-circuit board, cutting method of circuit pattern of printed-circuit board and printed-circuit board having altered circuit pattern A method for altering a circuit pattern of a printed-circuit board includes the steps of removing a portion of the printed-circuit board so that the circuit pattern inside the printed-circuit board is exposed, and connecting an exposed portion of the circuit pattern... | 06/21/2005 |
| 6888090 | Electron beam welding method A method of forming a welded component by electron beam welding, and the resulting welded assembly. The method is particularly directed to the welding of a component whose subcomponents are formed of dissimilar metals, with the result that an electron beam used to w... | 05/03/2005 |
| 6627842 | Micro-protrusion arrays fabricated by e-beam exposure The method of the invention produces protruding features on a glass layer. Initially, a conductive layer is applied to the glass layer and is coupled to a source of reference potential. This conductive layer prevents a build-up of electrons in the glass l... | 09/30/2003 |
| 5674413 | Scattering reticle for electron beam systems A reticle for an electron beam system for direct writing applications has a base layer that contains a reticle pattern; a set of reinforcing struts connected to the base layer separating the base layer into a set of non-contiguous subfields; in which the ... | 10/07/1997 |
| 5532446 | Magnetic deflection system for a high-power electron beam A magnetic deflection system for a high-power electron beam with an expanding cross-section area is used for melting or vaporizing metallic materials. Saddle coils are provided which open in a direction of expansion of the electron beam. With the aid of t... | 07/02/1996 |
| 5466904 | Electron beam lithography system An electron beam system for direct writing applications combining the parallel throughput of a projection system and the stitching capability of a probe-forming system employs an electron gun to illuminate an initial aperture uniformly, a first set of con... | 11/14/1995 |
| 5459297 | Method and apparatus for manufacturing a texture drum In the implementation of the method for after-treatment of a texture drum wherein a surface structure is generated in the region of a surface with an electron beam, the texture drum, following a charging occurring within a working interval with an electro... | 10/17/1995 |
| 5432314 | Transparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plate A transparent mask plate used in a charged particle beam exposure apparatus includes a base plate, an exposure pattern area, and a calibration area. The exposure pattern area is formed in the base plate and has a plurality of transparent patterns for shap... | 07/11/1995 |
| 5428203 | Electron beam exposing apparatus with a stencil mask kept at a constant temperature An electron beam exposing apparatus permitting the temperature of mask to be constant without affecting an electron beam. Keeping the temperature of a stencil mask 81 constant permits the position and form of an opening 69 to be constant. The temperature ... | 06/27/1995 |
| 5217653 | Method and apparatus for producing a stepless 3-dimensional object by stereolithography A method and apparatus for producing a stepless 3-dimensional object by stereolithography, wherein a mathematical representation of the object is stored and dissected so as to generate a mathematical representation of a first laminate thereof, and a repre... | 06/08/1993 |
| 5173582 | Charged particle beam lithography system and method A charged particle beam lithography system includes a beam source of a charged particle beam, a beam shaping aperture for providing a predetermined cross section to the charged particle beam, a first focusing system for focusing the charged particle beam ... | 12/22/1992 |
| 5159170 | Grid structure for reducing current density in focussed ion beam A transmission grid is disposed in a conventional focussed ion beam system which includes an ion beam source emitter or ion gun, electrodes to turn the ion beam off and on, a beam defining aperture and electrostatic lenses to focus the ion beam onto a tar... | 10/27/1992 |
| 5130550 | Electron beam lithography apparatus having device for correcting beam shape An electron beam lithography apparatus comprising an upper aperture, a lower aperture, a deflector disposed between the upper aperture and the lower aperture, an optical lens for converging the electron beam passed through the lower aperture onto a specim... | 07/14/1992 |
| 5051556 | Charged particle beam lithography system and a method thereof A charged particle beam lithography system comprises a beam source of a charged particle beam, a beam shaping aperture for providing a predetermined cross section to the charged particle beam, a first focusing system for focusing the charged particle beam... | 09/24/1991 |
| 4973818 | Device and method for the control and monitoring of an electron beam for metal working A device and a method for the control and monitoring of a deflectable electron beam is provided for the working of metal wherein the electron beam is not permitted to go beyond an allowed working area. With this device with the aid of a Teach-In method th... | 11/27/1990 |
| 4940881 | Method and apparatus for effecting selective ablation of a coating from a substrate, and controlling the wall angle of coating edge portions The angles of the walls of vias being ablated by excimer lasers are controlled by interposing refractive elements between the masks and the workpieces, and rotating the refractive elements about axes parallel to the optical axis. In one embodiment, the re... | 07/10/1990 |
| 4914304 | Charged-beam exposure system In an electron beam exposure system, an electron beam emitted from an electron gun is shaped by first and second beam-shaping aperture masks and is projected on a target to draw a predetermined pattern. The predetermined pattern consists of rectangular se... | 04/03/1990 |
| 4825033 | Variable shaped spot electron beam pattern generator The electron beam 2 of the generator illuminates a first rectangular aperture 4 which is then imaged on a second rectangular aperture 10 by a magnetic lens 7 having reversible flux. The flux of the lens is chosen so that the focused image of the first ape... | 04/25/1989 |
| 4804395 | Electrode arrangement for lensing method A system is provided for positioning a pair of electrodes on either side of the end portion of an optical fiber extending through a contact, to establish an arc through a cross-aperture in the contact and across the fiber to melt the fiber into a lens, wh... | 02/14/1989 |
| 4760238 | Charged particle beam generation A charge particle beam generator is described which comprises an annular arrangement of filaments (6) which, when heated, emit electrons. A microprocessor controller (not shown) causes a voltage to be applied across each filament (6) in succession so as t... | 07/26/1988 |
| 4755203 | Optic fiber positioning for lensing method A system is described for forming a lens at the end of an optical fiber which extends through a hole in a contact, so the tip of the lens lies at a desired lens position located a predetermined distance rearward of the tip of the contact. The fiber is fix... | 07/05/1988 |
| 4731537 | Electron beam gun An electron beam gun generates an electron beam directed at a target. The gun comprises electrodes for creating an electric field along the direction of beam travel and focusing coils for creating a magnetic field along the direction of beam travel. The e... | 03/15/1988 |
| 4710640 | Electron beam lithography An electron beam lithograhy apparatus capable of uniformly exposing the surface of a sample by an electron beam including a generator for generating the electron beam, members for shaping the electron beam, members for focusing the shaped electron beam on... | 12/01/1987 |
| 4683366 | All electrostatic electron optical sub-system for variable electron beam spot shaping and method of operation An all-electrostatic variable spot charged particle (electron) beam shaping sub-system which is compact and of much smaller size than known similar systems designed for the same purpose and operating with magnetic lenses. The improved electrostatic variab... | 07/28/1987 |
| 4423305 | Method and apparatus for controlling alignment of an electron beam of a variable shape An electron beam, which is applied along an axis from a source to a target, is aligned along the axis by deflecting the beam off the axis to a reference location. At the reference location, the source image of the electron beam is centered on a sensing pl... | 12/27/1983 |
