Famous Patents
3M employee and church chorister Art Fry needed something to temporarily mark pages in his hymnal. He was in luck because his colleague, Spencer Silver, accidentally developed a glue that was too weak for other purposes. After initially discouraging consumer response, Post-it Notes became a hit in 1979.
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| Number | Title | Issue Date |
| 7075030 | Shielded beam delivery apparatus and method An apparatus includes a plasma generator aligned with a beam generator for producing a plasma to shield an energized beam. An electrode is coaxially aligned with the plasma generator and followed in turn by a vortex generator coaxially aligned with the electrode. A ... | 07/11/2006 |
| 6949752 | Electron beam apparatus and high-voltage discharge prevention method Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage introduction insulator to thereby prevent creation of high-voltage discharge a... | 09/27/2005 |
| 6737660 | Electron beam irradiation apparatus and electron beam irradiating method An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pa... | 05/18/2004 |
| 6730370 | Method and apparatus for processing materials by applying a controlled succession of thermal spikes or shockwaves through a growth medium A method and apparatus for locally raising the temperature of a material in order to facilitate chemical reactions or processes related to growth or removal of the material utilizes an electrode to apply, in the presence of a growth or removal medium, a controlled s... | 05/04/2004 |
| 5951886 | Apparatus for electron beam welding at atmospheric pressure Electron beam is focussed in a focussing column in a high vacuum environment and emitted downward through upper, middle, and lower orifices. A second stage vacuum housing concentrically surrounds a lower portion of the beam focussing column and separates ... | 09/14/1999 |
| 5950904 | Gas containment box used with a welding head This invention concerns a containment box disposed around a welding head (1) and including a fixed frame carrying a fairing (16) modeled to the shape of the element (3) to be welded, a cover (9) sliding on the frame (10), and a bell with spherical boss (7... | 09/14/1999 |
| 5578831 | Method and apparatus for charged particle propagation A method and apparatus are provided for propagating charged particles from a vacuum to a higher pressure region. A generator 14,14b includes an evacuated chamber 16a,b having a gun 18,18b for discharging a beam of charged particles such as an electron bea... | 11/26/1996 |
| 5532446 | Magnetic deflection system for a high-power electron beam A magnetic deflection system for a high-power electron beam with an expanding cross-section area is used for melting or vaporizing metallic materials. Saddle coils are provided which open in a direction of expansion of the electron beam. With the aid of t... | 07/02/1996 |
| 4792688 | Differentially pumped seal apparatus A differentially pumped seal apparatus (14) comprising a rough port nozzle (R), a medium port nozzle (M) and a high port nozzle (H), each with a centrally located sleeve (34,36,40) defining concentric apertures (44,48,52). Each nozzle is configured as a s... | 12/20/1988 |
| 4659899 | Vacuum-compatible air-cooled plasma device A plasma generating device, and in particular a duoplasmatron ion gun, is disclosed that is air cooled, high vacuum compatible and hence very clean with a stable ion current output. The device is mounted to a standard type flange held at ground potential ... | 04/21/1987 |
| 4607167 | Charged particle beam lithography machine incorporating localized vacuum envelope A charged particle beam lithography machine includes a beam source and beam steering and forming elements within an evacuated column. A stage assembly for supporting a semiconductor wafer or mask is positioned in ambient and proximate the exit end of said... | 08/19/1986 |
| 4584479 | Envelope apparatus for localized vacuum processing An envelope apparatus is provided for facilitating the production of a vacuum at a localized region on the surface of an article such as a semiconductor wafer. The vacuum permits vacuum processing in the localized region. The envelope apparatus includes a... | 04/22/1986 |
| 4528451 | Gap control system for localized vacuum processing Apparatus for controlling the gap between localized vacuum processing envelope apparatus and a workpiece as the workpiece, typically a semiconductor wafer, is moved laterally with respect to the envelope apparatus. The envelope apparatus includes an envel... | 07/09/1985 |
| 4335297 | Electron beam processor An electron beam processor with an energy storage line and matched field emission diode that define a high energy electron beam generator. A transport system positions a specimen to be thermally processed in a processing station. Energy stored on the line... | 06/15/1982 |
| 4304979 | Method and apparatus for electron beam welding at elevated pressures Method and an apparatus whereby electron beam deep welding can be performed at pressures of more than 10 millibars, especially under atmospheric conditions, without the need for complex apparatus. This is achieved by guide surfaces disposed between a seam... | 12/08/1981 |
| 4163889 | Device for the simultaneous operation of a number of gas discharge electron guns A device for the simultaneous operation of a number of gas discharge electron guns in which electron beams produced by the guns have different intensities due to different diameters of discharge spaces and/or due to a different anode-cathode distance.... | 08/07/1979 |
| 4123663 | Gas-etching device A gas etching device comprises a vacuum vessel provided with a means for supplying into the vacuum vessel a gas containing therein oxygen atoms and a gas containing therein fluorine atoms, an etching gas-producing region provided within the vacuum vessel ... | 10/31/1978 |
| 4112137 | Process for coating insulating substrates by reactive ion plating An insulating substrate, such as a glass windscreen, is coated with a conductive coating of an oxide of at least one metal by a process in which the substrate is subjected, in a rarefied oxygen atmosphere, to metal ions and oxygen ions arising from bombar... | 09/05/1978 |
| 4019091 | Gas discharge electron gun for generating an electron beam by means of a glow discharge A gas discharge electron gun for generating an electron beam by means of a glow discharge. A rapid control (.apprxeq.1 msec) is possible by admitting the gas to the gun through at least one aperture in the inner wall of a tubular positive electrode.... | 04/19/1977 |
