Class 216/45 - Mask is reusable (i.e., stencil)

Subclass of Class 216 - Etching a substrate: processes
Definition: Process using a prefabricated stencil or mask which may
No. of patents: 38
Last issue date: 07/07/2009

Number	Title	Issue Date
7556741	Method for producing a solar cell A dry etching apparatus including a plate 15 provided in parallel or nearly parallel with an RF electrode 9 to cover a substrate 1 placed on the RF electrode 9 directly or through a tray 24. The plate 15 is provided with pla...	07/07/2009
7556740	Method for producing a solar cell A substrate processing apparatus that roughens the surface of a substrate through a dry etching method by covering the surface of the substrate to be processed with a plate provided with a number of opening portions. The plate is provided with the opening portions i...	07/07/2009
7387741	Power module member manufactured by wet treatment, and wet treatment method and wet treatment equipment thereof The present invention provides a method of forming a circuit pattern on an integrally bonded member, the method not requiring a correction step of a laminate film or a resist film which has been necessary at the time of wet treatment of the integrally bonded member....	06/17/2008
7327013	Stencil mask with charge-up prevention and method of manufacturing the same A drive unit is described for switching circuit breakers on and off, in particular disconnecting switches and/or grounding switches of medium-voltage switchgear. The drive unit includes a reversible d.c. motor and a switching device containing two separately drivabl...	02/05/2008
7170666	Nanostructure antireflection surfaces An antireflection surface formed using a plurality of nanostructures of a first material on a surface of a second material. The first material is different from the second material. The distribution of spatial periods of the nanostructures is set by a self-assembly ...	01/30/2007
7160475	Fabrication of three dimensional structures The present disclosure relates to a method for generating a three-dimensional microstructure in an object. In one embodiment, a method for fabricating a microscopic three-dimensional structure is provided. A work piece is provided that includes a target area at whic...	01/09/2007
7122224	Methods and apparatus for turbine engine component coating A method for processing a substrate article is provided. The method includes masking a first portion of the substrate article with a maskant that includes a formed graphite piece that overlays and contacts the first portion of the substrate such that a second portio...	10/17/2006
7087119	Atomic layer deposition with point of use generated reactive gas species An apparatus for atomic layer deposition preventing mixing of a precursor gas and an input gas. From the apparatus a flow of the input gas is provided over a surface of the workpiece wherein a beam of the electromagnetic radiation is directed into the input gas in c...	08/08/2006
7041231	Method of refurbishing a transition duct for a gas turbine system A method of refurbishing a transition duct (100) for a gas turbine system includes providing the transition duct. The transition duct has a first wall (221) defining a first passageway (110) and having holes (223) through a metal layer (	05/09/2006
6976424	Stamp device for printing a pattern on a surface of a substrate A stamp device for printing a pattern on a surface of a substrate having a two-sided rigid carrier layer providing on its first side a patterned layer made of a first material and being combined on its second side with a soft layer made of a softer material than tha...	12/20/2005
6969681	Method for fabricating a semiconductor component using contact printing A method for fabricating semiconductor components includes the steps of providing semiconductor dice on a substrate and forming a polymer layer on the substrate. In addition, the method includes the steps of providing a stencil having patterns thereon, and pressing ...	11/29/2005
6955726	Mask and mask frame assembly for evaporation A mask frame assembly includes a frame having an opening and a mask having at least two unit mask elements. Both ends of each unit mask element are fixed to the frame in a state of tension. The unit mask elements include a unit masking pattern, and overlap each othe...	10/18/2005
6913442	Apparatus for retaining an internal coating during article repair An internal coating on an internal passage wall exposed at a passage opening through an article external surface is protected from removal during repair of the article, including removal of at least a portion of an external coating, by a masking assembly disposed ab...	07/05/2005
6602430	Methods for finishing microelectronic device packages Methods for finishing or refurbishing surfaces on protective covers encapsulating microelectronic dies. In one embodiment, a method for fishing a surface of a protective package on a microelectronic device includes abrading the surface of the package by e...	08/05/2003
6558733	Method for etching a micropatterned microdepot prosthesis An implantable prosthesis, for example a stent, is provided having one or more micropatterned microdepots formed in the stent. Depots are formed in the prosthesis via chemical etching and laser fabrication methods, including combinations thereof. They are...	05/06/2003
6551162	Method for manufacturing a photocathode A method for manufacturing a photocathode includes positioning the photocathode on a support such that an etch surface of the photocathode faces away from the support. The method includes inserting an end of the support containing the photocathode into a ...	04/22/2003
6485655	Method and apparatus for retaining an internal coating during article repair An internal coating on an internal passage wall exposed at a passage opening through an article external surface is protected from removal during repair of the article, including removal of at least a portion of an external coating, by a masking assembly ...	11/26/2002
6475399	Method for fabricating a stencil mask Disclosed is a method for fabricating a stencil mask for use in electron beam lithography which improves resolution by effectively reducing beam blur resulting from coulomb repulsion effects in the electron beam. The disclosed method includes fabricating ...	11/05/2002
6458285	Method and apparatus for frequency control of piezoelectric components A frequency control apparatus including a shielding board that is provided with a window for exposing some or all of a plurality of electrodes disposed on a piezoelectric substrate, and a shutter for opening and closing the window. An aperture pattern boa...	10/01/2002
6447688	Method for fabricating a stencil mask Disclosed is a novel method for fabricating a stencil mask comprising the formation of an absorber pattern, including an alignment key or target, on the topside of an SOI wafer having a transparent buried insulating layer. The formation of the absorber pa...	09/10/2002
6418941	Method of and apparatus for plasma cleaning of chip-mounted board There is disclosed a method of the plasma cleaning of a chip-mounted board, in which the destruction of a chip due to the charge build-up in a land during the plasma cleaning is prevented. There is provided a mask member for covering a board placed on a p...	07/16/2002
6387290	Tangential flow planar microfabricated fluid filter A microfilter utilizing the principles of tangential flow to prevent clogging, and sloped channel sides to overcome surface tension effects is provided which has feed inlet and exit connected by a feed flow channel; a barrier channel parallel to the feed ...	05/14/2002
6251542	Semiconductor wafer etching method A semiconductor wafer etching method is disclosed that allows etching without use of restricted ozone-destroying solvents such as trichloroethane or fluorocarbons. This method involves forming a protective film of silicon resin or alkali resistant resin o...	06/26/2001
6022752	Mandrel for forming a nozzle plate having orifices of precise size and location and method of making the mandrel A mandrel for forming a nozzle plate having orifices of precise size and location, and method of making the mandrel. The nozzle plate is formed by overcoating a substrate with a metal film. The film is covered with a photoresist material. Portions of the ...	02/08/2000
5972234	Debris-free wafer marking method The present invention discloses a method for marking an electronic substrate without the splatter or debris defect which can be carried out by first providing a tape, then creating a cavity or a mark through the tape by a high-intensity energy beam or any...	10/26/1999
5935453	MR sensor having end regions with planar sides A magnetoresistive (MR) sensor having passive end regions separated by a central active region in which an MR sensing element is formed over substantially only the central active region. The MR sensor is defined by forming a resist pattern over both the e...	08/10/1999
5868952	Fabrication method with energy beam Three-dimensional ultra-fine micro-fabricated structures of the order of μm and less are produced for use in advanced optical communication systems and quantum effect devices. The basic components are an energy beam source, a mask member and a specimen s...	02/09/1999
5766494	Etching method and apparatus According to the present invention, there is provided an etching method comprising the steps of forming a first thin film on a surface of a substrate to be processed, supporting the substrate to be processed, forming a second thin film serving to deactiva...	06/16/1998
5759423	Electron beam writing method and apparatus for carrying out the same An electron beam writing apparatus comprises: an electron beam source for projecting an electron beam; a first mask provided with a first rectangular aperture for passing the electron beam projected by the electron beam source to shape the electron beam i...	06/02/1998
5509553	Direct etch processes for the manufacture of high density multichip modules The process of the manufacture of both the conductive layers and dielectric layers of multichip modules of the deposited variety is set forth with direct etch techniques being substituted for photolithography. Simply stated, entire circuit layers of the m...	04/23/1996
5302547	Systems for patterning dielectrics by laser ablation A differentiable ablation approach to patterning dielectrics which are not of the same absorbance uses an absorbant dielectric at a specified laser wavelength over a non-absorbant dielectric at that wavelength. The absorbant dielectric may be laser-patter...	04/12/1994
4948461	Dry-etching method and plasma An etching plasma containing a reactive fluorine-containing gas and atoms or ions of a heavy metal is particularly useful in a method of removing material from a substrate by reactive ion etching....	08/14/1990
4780177	Excimer laser patterning of a novel resist A dual layer resist configuration is employed for photopatterning high resolution conductive patterns on underlying polymeric or ceramic substrates, particularly substrates exhibiting surface roughness and non-planar design features such as channels, boss...	10/25/1988
4734152	Dry etching patterning of electrical and optical materials A new anisotropic dry etching system using a hot jet tube to heat and dissociate non-reactive source gas to form a directed flux of reactive specie or radicals for etching materials through openings in a resist or a reusable stencil of SiNx whe...	03/29/1988
4652337	Vehicle identification system A kit for facilitating the reproduction of a selected array of alphanumeric characters on a variety of receiving surfaces. The kit contains a set of stencils, with a first stencil having a plurality of cutouts in a desired array and with registration mark...	03/24/1987
4482427	Process for forming via holes having sloped walls A dry process for forming via holes with sloped walls by oxygen reactive ion etching through a perforated mask....	11/13/1984
4370194	Orientation of ordered liquids and their use in devices Ordered liquids, or mesophases, are aligned by forming a structure on a substrate surface using a planar process of formation, the surface structure having a predetermined pattern, and applying a mesophase to the surface to substantially orient the molecu...	01/25/1983

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Class 216/45 - Mask is reusable (i.e., stencil)