Class 205/675 - Less than 50 weight percent water

Subclass of Class 205 - Electrolysis: processes, compositions used therein, and methods of preparing the compositions
Definition: Subject matter in which the major portion by weight of the
No. of patents: 26
Last issue date: 04/26/2005

Number	Title	Issue Date
6884338	Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor The present invention provides methods of polishing and/or cleaning copper interconnects using bis(perfluoroalkanesulfonyl) imide acids or copper tris(perfluoroalkanesulfonyl) methide acids compositions. ...	04/26/2005
6858126	High capacitance anode and system and method for making same A method of producing electrodes for electrolytic capacitors by etching metal foil in a low pH etching electrolyte is disclosed. The low pH electrolyte is an aqueous solution, which comprises hydrochloric acid, glycerol, sodium perchlorate or perchloric acid, sodium...	02/22/2005
6858124	Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor The present invention provides methods of polishing and/or cleaning copper interconnects using sulfonic acid compositions. ...	02/22/2005
6783657	Systems and methods for the electrolytic removal of metals from substrates The present invention provides methods and systems for the electrolytic removal of platinum and/or other of the Group 8-11 metals from substrates. ...	08/31/2004
6610194	Bath composition for electropolishing of titanium and method for using same A bath composition for the electropolishing of a metal surface made of nonalloyed titanium is disclosed. The bath composition may comprise sulfuric acid of 2 to 40% by volume, hydrofluoric acid of 10 to 18% by volume and acetic acid of 42 to 62% by volume...	08/26/2003
6579439	Electrolytic aluminum polishing processes This invention, in one aspect, relates to processes for electropolishing aluminum, in particular, aluminum alloy metal surfaces, by immersing the metal surface in a polishing solution and making the aluminum alloy material anodic. The polishing solution c...	06/17/2003
6527938	Method for microporous surface modification of implantable metallic medical articles A process for creating surface microporosity on a titanium (or other metal) medical device includes creating a surface oxide layer on the device; placing the device, which is connected to a negative terminal of an electrical power supply, into a calcium c...	03/04/2003
6238810	Process for using surface active agents to produce high etch gains for electrolytic capacitor manufacturing A surface active, viscosity modifying agent is used to promote additional tunnel initiation during the etching of high purity cubicity anode foil, preferably aluminum anode foil, to render it suitable for use in electrolytic capacitors. The anode foil is ...	05/29/2001
6168706	Process for producing high etch gains for electrolytic capacitor manufacturing Aluminum anode foil is etched using a process of treating the foil in an electrolyte bath composition comprising aluminum chloride hexahydrate, hydrochloric acid, sulfuric acid and perchloric acid or perchlorate. The anode foil is etched in the electrolyt...	01/02/2001
6074546	Method for photoelectrochemical polishing of silicon wafers A method is provided for photochemical polishing of a silicon wafer using electromagnetic waves within the spectrum of 150 to 2000 nanometers wavelength. A photochemical polishing apparatus is also disclosed in which the electromagnetic waves are provided...	06/13/2000
5997713	Silicon etching process for making microchannel plates An element with elongated, high aspect ratio channels such as microchannel plate is fabricated by electrochemical etching of a p-type silicon element in a electrolyte to form channels extending through the element. The electrolyte may be an aqueous electr...	12/07/1999
5458735	Process for the production of electroluminescent silicon structures A process for the production of electroluminescent silicon structures, including: placing a silicon wafer in an acid bath; anodizing the silicon wafer in the acid bath using the apparatus of FIG. 2; illuminating the anode side of the silicon wafer during ...	10/17/1995
5374338	Selective electroetch of copper and other metals The present invention relates to a method for selectively electroetching a metal from an electrical device having the steps of: immersing the electrical device in an etching solution; immersing a cathode in the etching solution; applying an etching potent...	12/20/1994
5035780	Method of manufacturing a platinum tip In the production of a tunneling probe tip having a sharp point by utilizing electropolishing, the present invention has enabled the production of a platinum tunneling probe tip always produceable in an identical conical form having high point sharpness w...	07/30/1991
4686021	Lithographic support and process of preparing the same A process of preparing a lithographic support, the lithographic support produced by the process and a presensitized plate are disclosed. The process comprises chemically graining at least one surface of an aluminium plate with an aqueous solution containi...	08/11/1987
4686017	Electrolytic bath and methods of use An electrolytic bath, suitable for depositing a metal on or removing a metal from a substrate is provided which comprises an anode and cathode, an acid having a pKa of about 6 or less, and a chalcogen-containing compound soluble in said bath an...	08/11/1987
4668348	Method for forming adherent, bright, smooth and hard chromium electrodeposits on ferrous metal substrates from high energy efficient chromium baths An activation solution is provided for forming adherent chromium electrodeposits on metal substrates, preferably ferrous metals such as cast iron, from high energy efficient chromium baths. The solution suitably is a mixture of sulfuric acid, added sulfat...	05/26/1987
4642168	Metal layer patterning method A metal layer of aluminum, an aluminum-silicon alloy, aluminum-copper alloy to be patterned is formed on an insulating substrate and a mask layer of a predetermined pattern is formed on the metal layer and then the metal layer is subjected to electrolytic...	02/10/1987
4425204	Rapid method for the etching and cleaning of dental casting metals A process for rapidly etching and cleaning dental metal castings which result in a saving of time to the dentists of as much as 1000 percent as compared to prior art methods. A bath combining both etchant and cleaners is applied to the dental casting and ...	01/10/1984
4372831	Electrolyte solution for electropolishing An electrolyte solution for electropolishing metallic workpieces. The solution includes a base electrolyte, encompassing concentrated mineral acid such as phosphoric acid, sulfuric acid, nitric acid, perchloric acids, or mixtures thereof, and at least one...	02/08/1983
4220509	Electrolyte for electrochemical polishing of articles made of titanium and titanium alloys Electrolyte for electrochemical polishing of articles made of titanium and titanium alloys contains 45-70 wt.-% sulphuric acid, 4-20 wt.-% nitric acid, 20-35 wt.-% hydrofluoric acid, 0.4-1.9 wt.-% sodium salt of L-sulphocarboxylic acid containing 17 to 20...	09/02/1980
4194954	Electrolytic etch preparation of semiconductor surfaces The surface of a semiconductor is prepared by electrolytically removing the surface of the semiconductor. A two component electrolyte is used. A first component forms an oxide on the surface of the semiconductor and the second component dissolves the oxid...	03/25/1980
4169026	Etchant for electrolytic etching of a ferrite for a magnetic head and method of producing a magnetic head An etchant comprising an electrolytic liquid which comprises sulfuric acid as a main component and water in such amount that the weight ratio of sulfuric acid to water is between 9:1 and 2:1. The ferrite surface having been electrolytically etched by usin...	09/25/1979
4166015	Process for the manufacture of aluminum supports for planographic printing plates by electrochemical roughening of the plate surfaces This invention relates to an improvement in the process for the manufacture of aluminum supports for planographic printing plates by electrochemical roughening of the surfaces in agitated aqueous electrolyte solutions, the improvement comprising that the ...	08/28/1979
4078980	Electrolytic chromium etching of chromium-layered semiconductor A layer of chromium is removed from the metalization system on a silicon integrated circuit wafer that also includes copper and aluminum. By electrolytic etching in a sulfuric acid solution containing about 10% by volume water saturated with chromium sulf...	03/14/1978
4072588	Method for the anodic polishing of surfaces of intermetallic niobium compounds and niobium alloys The surface of an intermetallic niobium compound or niobium alloy to be polished is electrically shunted across a niobium part and immersed in electrolyte together with the latter permitting relatively thick surface layers of niobium compounds of high qua...	02/07/1978

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Class 205/675 - Less than 50 weight percent water