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Class 205/656 - Eroding workpiece of nonuniform internal electrical characteristics


Subclass of Class 205 - Electrolysis: processes, compositions used therein, and methods of preparing the compositions
Definition: Process in which the workpiece has electrical characteristics
No. of patents: 166
Last issue date: 12/08/2009


1          
NumberTitleIssue Date
7628906Method of manufacturing a spectral filter for green and longer wavelengths
A method of manufacture for optical spectral filters with omnidirectional properties in the visible, near IR, mid IR and/or far IR (infrared) spectral ranges is based on the formation of large arrays of coherently modulated waveguides by electrochemical etching of a...
12/08/2009
7334452Method for characterizing materials by using a mechanical resonator
Methods for monitoring a fluid composition include placing a mechanical resonator in the fluid composition and oscillating the resonator. The resonator can be a tuning fork resonator having tines oscillated in opposite directions and in opposite phases. A variable f...
02/26/2008
7332068Selective removal of dielectric materials and plating process using same
A metal is provided on a polymeric component and the component is subjected to a removal process such as plasma or liquid etching in the presence of an electric field. The etchant selectively attacks the polymer at the boundary between the metal and the polymer, the...
02/19/2008
7302982Label applicator and system
A label applicator including a support surface having a central area and curving downwardly from the central area. A post assembly extends up from the central area such that a label having a label through-hole can be positioned in a support position generally on the...
12/04/2007
7294248Fabrication and activation processes for nanostructure composite field emission cathodes
A method of forming an electron emitter includes the steps of: (i) forming a nanostructure-containing material; (ii) forming a mixture of nanostructure-containing material and a matrix material; (iii) depositing a layer of the mixture onto at least a portion of at l...
11/13/2007
7270011Combined absolute-pressure and relative-pressure sensor
A micromechanical sensor for measuring at least a first pressure of a first medium, as well as a method for manufacturing such a micromechanical sensor. The micromechanical sensor has at least one substrate having at least two sensor elements, which are preferably m...
09/18/2007
7261812Multi-column separation devices and methods
Chromatographic separation devices include multiple batch-processed columns joined by a body structure and adapted to perform parallel analyses. Both slurry-packed and monolithic column embodiments are provided. One or more liquid-permeable frits of various types ma...
08/28/2007
7255784Polishing method and electropolishing apparatus
A polishing method for electropolishing a metal film formed on a wafer surface so as to fill concave portions formed on the wafer surface comprises a step of determining an electropolishing end point of the metal film on the basis of a change of a current waveform r...
08/14/2007
7242012Lithography device for semiconductor circuit pattern generator
General purpose methods for the fabrication of integrated circuits from flexible membranes formed of very thin low stress dielectric materials, such as silicon dioxide or silicon nitride, and semiconductor layers. Semiconductor devices are formed in a semiconductor ...
07/10/2007
7223696Methods for maskless lithography
General purpose methods for the fabrication of integrated circuits from flexible membranes formed of very thin low stress dielectric materials, such as silicon dioxide or silicon nitride, and semiconductor layers. Semiconductor devices are formed in a semiconductor ...
05/29/2007
7211178Fixture for electro-chemical machining
On a fixture for electro-chemical machining for the production of long, curved cavities (11) in a component (12), the working electrode (3) of the electro-chemical machining tool (1) is connected to a guide body (1a) which m...
05/01/2007
7193239Three dimensional structure integrated circuit
A Three-Dimensional Structure (3DS) Memory allows for physical separation of the memory circuits and the control logic circuit onto different layers such that each layer may be separately optimized. One control logic circuit suffices for several memory circuits, red...
03/20/2007
7176545Apparatus and methods for maskless pattern generation
General purpose methods for the fabrication of integrated circuits from flexible membranes formed of very thin low stress dielectric materials, such as silicon dioxide or silicon nitride, and semiconductor layers. Semiconductor devices are formed in a semiconductor ...
02/13/2007
7138295Method of information processing using three dimensional integrated circuits
A Three-Dimensional Structure (3DS) Memory allows for physical separation of the memory circuits and the control logic circuit onto different layers such that each layer may be separately optimized. One control logic circuit suffices for several memory circuits, red...
11/21/2006
7139459Spectral filter for green and longer wavelengths
Visible and infra-red spectral filters based on arrays of uncoupled identical waveguides having coherently modulated cross sections offer many unique advantages, such as independence of the spectral position of the Bragg-resonance based transmission or reflection fe...
11/21/2006
7135120Method of manufacturing a spectral filter for green and shorter wavelengths
The UV, deep UV and/or far UV (ultraviolet) filter transmission spectrum of an MPSi spectral filter is optimized by introducing at least one layer of substantially transparent dielectric material on the pore walls. Such a layer will modify strongly the spectral depe...
11/14/2006
7074327Sample preparation for parallel chromatography
Systems and methods are provided for preparing samples for chromatographic separations and then chromatographically separating the prepared samples, preferably in a high-throughput fashion utilizing multiple parallel first (fluid) processing regions in fluid communi...
07/11/2006
7074317Method for fabricating trench capacitors for large scale integrated semiconductor memories
An electrochemical method is provided for producing trenches for trench capacitors in p-doped silicon with a very high diameter/depth aspect ratio for large scale integrated semiconductor memories. Trenches (macropores) having a diameter of less than about 100 nm an...
07/11/2006
7045052Method of manufacturing a spectral filter for green and longer wavelengths
A method of manufacture for optical spectral filters with omnidirectional properties in the visible, near IR, mid IR and/or far IR (infrared) spectral ranges is based on the formation of large arrays of coherently modulated waveguides by electrochemical etching of a...
05/16/2006
7037438Method for production of a semiconductor component and a semiconductor component produced by said method
A method is for producing a semiconductor component, e.g., a multilayer semiconductor element, e.g., a micromechanical component, e.g., a pressure sensor, having a semiconductor substrate, e.g., made of silicon, and a semiconductor component produced according to th...
05/02/2006
7037854Method for chemical-mechanical jet etching of semiconductor structures
A chemical-mechanical jet etching method rapidly removes large amounts of material in wafer thinning, or produces large-scale features on a silicon wafer, gallium arsenide substrate, or similar flat semiconductor workpiece, at etch rates in the range of 10–100 mic...
05/02/2006
7037177Method and apparatus for conditioning a chemical-mechanical polishing pad
A conditioner including abrasive elements for conditioning a polishing pad to be used in abrasive semiconductor substrate treatment processes, such as chemical-mechanical polishing or chemical-mechanical planarization processes. The abrasive elements are formed from...
05/02/2006
7001501Method for etching at least one ion track to a pore in a membrane and electrolyte cell for preparing the membrane
In an electrolytic cell a membrane consisting of dielectric material such as an organic polymer, which separates two chambers of the electrolytic cell from each other is produced using an etching solution which is provided in one of the chambers, contains active etc...
02/21/2006
6923907Separation column devices and fabrication methods
Pressure-driven microfluidic separation devices, such as may be used for performing high performance liquid chromatography, are provided. Multiple separation columns may be defined in a single device and packed with stationary phase material retained by porous frits...
08/02/2005
6805972Method of forming nanoporous membranes
The present invention is directed to nanoporous metal membranes and methods of making nanoporous metal membranes from metal leaf. At least a portion of the metal leaf is freely supported by a de-alloying medium for a time effective to de-alloy the metal leaf. After ...
10/19/2004
6803637Micromechanical component with different doping types so that one type is anodized into porous silicon
A micromechanical component having a substrate made from a substrate material having a first doping type, a micromechanical functional structure provided in the substrate and a cover layer to at least partially cover the micromechanical functional structure. The mic...
10/12/2004
6790340Method and apparatus for radiation assisted electrochemical etching and etched product
An electrochemical etching system has an etching bath for holding an n-type silicon substrate with a first surface of the substrate in contact with hydrofluoric acid, an electrode positioned in the hydrofluoric acid, a power source having a positive pole connected t...
09/14/2004
6743406Family of discretely sized silicon nanoparticles and method for producing the same
A family of discrete and uniformly sized silicon nanoparticles, including 1 (blue emitting), 1.67 (green emitting), 2.15 (yellow emitting), 2.9 (red emitting) and 3.7 nm (infrared emitting) nanoparticles, and a method that produces the family. The nanoparticles prod...
06/01/2004
6726815Electrochemical etching cell
An electrochemical etching cell (1) is proposed for etching an etching body (15) made at least superficially of an etching material. The etching cell (1) has at least one chamber filled with an electrolyte, and is provided with a first electrode...
04/27/2004
6706166Method for improving an electrodeposition process through use of a multi-electrode assembly
A method for improving an electrodeposited metal film uniformity and preventing metal deposition and peeling of deposited metal from an electrode during an electrodeposition and electropolishing process including providing a first anode electrode assembly and a semi...
03/16/2004
6602397Method for producing a filter
A method for the production of filters in which a blank of n- or p-doped etchable semiconductor material is connected as an anode or a cathode according to doping. The method includes contacting a first side of the blank with an etching solution in which ...
08/05/2003
6585947Method for producing silicon nanoparticles
A method for producing the silicon nanoparticle of the invention is a gradual advancing electrochemical etch of bulk silicon. Separation of nanoparticles from the surface of the silicon may also be conducted. Once separated, various methods may be employe...
07/01/2003
6521118Semiconductor etching process and apparatus
There is provided a process for etching a semiconductor material, comprising the steps of: providing an electrochemical cell containing an etching electrolyte, the etching electrolyte being selected from the group of acidic electrolyte solutions, alkaline...
02/18/2003
6440295Method for electropolishing metal on semiconductor devices
An electropolishing apparatus for polishing a metal layer formed on a wafer (31) includes an electrolyte (34), a polishing receptacle (100), a wafer chuck (29), a fluid inlet (5, 7, 9), and at least one cathode (1, 2, 3). The wafer chuck (29) holds and po...
08/27/2002
6413408Method for the production of a porous layer
An interference filter having a layer with an area consisting of a porous material extending from the surface of the layer to the interior, the dimensions of the porous layer area in a direction normal to the layer surface have different values to provide...
07/02/2002
6398940Method for fabricating nanoscale patterns on a surface
A novel method to fabricate nanoscale pits on Au(111) surfaces in contact with aqueous solution is claimed. The method uses in situ electrochemical scanning tunnelling microscopy with independent electrochemical substrate and tip potential control and ver...
06/04/2002
6376285Annealed porous silicon with epitaxial layer for SOI
An epitaxial layer of silicon is grown on a layer of partially-oxidized porous silicon, then covered by a capping layer which provides structural support and prevents oxidation of the epitaxial layer. A high-temperature anneal allows the partially oxidize...
04/23/2002
6340425Method of manufacturing cold cathode device having porous emitter
In the manufacturing of the cold cathode device which has a porous silicon portion as an emitter portion, the silicon layer is given an electric potential, while the gate electrode is given an electric potential lower than that of the silicon layer. And t...
01/22/2002
6328876Method for producting a filter
A method for producing a filter includes the steps of providing a blank of etchable semiconductor material having a first side and a second side and affixing a holding element to the blank. The holding element is chemically resistant to an etching solutio...
12/11/2001
6261963Reverse electroplating of barrier metal layer to improve electromigration performance in copper interconnect devices
A method is provided for forming a conductive interconnect, the method comprising forming a first dielectric layer above a structure layer, forming a first opening in the first dielectric layer, and forming a first conductive structure in the first openin...
07/17/2001
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