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Class 204/298.41 - Vacuum arc discharge coating


Subclass of Class 204 - Chemistry: electrical and wave energy
Definition: Apparatus for coating a workpiece within a vacuum environment
No. of patents: 224
Last issue date: 05/15/2012


1            
NumberTitleIssue Date
8177948Device for carbon deposition
A method for carbon deposition using a pulsed, plasma-supported vacuum arc discharge, having an anode, a target cathode made of carbon, a pulsed energy source and at least two ignition units. The at least two ignition units are positioned in the edge area of target ...
05/15/2012
8157976Apparatus for cathodic vacuum-arc coating deposition
Apparatus for cathodic vacuum-arc coating deposition. The apparatus includes a mixing chamber, at least one input duct projecting from a first end wall of the mixing chamber, and an output duct projecting from a second end wall of the mixing chamber. Coupled with ea...
04/17/2012
7871506Continuous ARC deposition apparatus and method with multiple available targets
An arc deposition apparatus comprises an evacuatable chamber and means for positioning at least two targets in the chamber, wherein a first one of the at least two targets is positionable in an operative position and another of the at least two targets is positionab...
01/18/2011
7828946Arc evaporator with a powerful magnetic guide for targets having a large surface area
A magnetic guide is presented that controls an electric arc between an anode and a cathode, which may be a target, over the whole cathode surface. The magnetic guide may be included in an arc evaporator and may include a first magnetic system having a group of perma...
11/09/2010
7695599Discharging power source, sputtering power source, and sputtering device
A discharging power supply including a direct current power supply unit, a control unit for controlling an output of the direct current power supply unit, and a vibrating current generation unit having a capacitance connected in parallel with a pair of outputs from ...
04/13/2010
7381311Filtered cathodic-arc plasma source
A filtered cathodic-arc plasma source of lower plasma losses and higher output plasma current to input current efficiency is disclosed. Plasma filtering is accomplished in a right angle bend magnetic filter arranged to include the effects of at least three added mag...
06/03/2008
7358658Amorphous diamond materials and associated methods for the use and manufacture thereof
An electroluminescence device having improved luminescence per volt input is provided. The device can include a first electrode, a second electrode, a diamond-like carbon layer electrically coupled to at least one of the first electrode or the second electrode, and ...
04/15/2008
7342236Fluid-cooled ion source
An ion source is cooled using a cooling plate that is separate and independent of the anode. The cooling plate forms a coolant cavity through which a fluid coolant (e.g., liquid or gas) can flow to cool the anode. In such configurations, the magnet may be thermally ...
03/11/2008
7300559Filtered cathodic arc deposition method and apparatus
An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma s...
11/27/2007
7300684Method and system for coating internal surfaces of prefabricated process piping in the field
The coating of internal surfaces of a workpiece is achieved by connecting a bias voltage such that the workpiece functions as a cathode and by connecting an anode at each opening of the workpiece. A source gas is introduced at an entrance opening, while a vacuum sou...
11/27/2007
7288293Process for plasma surface treatment and device for realizing the process
A process for plasma treatment of an object's surface to be treated comprising the creation of a plasma, the application of the plasma to the surface to be treated, and the excitation of the surface to be treated, such that it vibrates and undulates. The energy for ...
10/30/2007
7252745Filtered cathodic arc deposition method and apparatus
An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma s...
08/07/2007
7250196System and method for plasma plating
An exemplary system and method for plasma plating are provided to generate a deposition layer on a substrate. The method for plasma plating includes positioning a substrate within a vacuum chamber, positioning a depositant in a filament within the vacuum chamber, re...
07/31/2007
7189437Mobile plating system and method
An exemplary method for using a mobile plating system is provided that includes locating the mobile plating system at a desired location for plating, positioning an external vacuum pump from an interior position of a mobile storage volume of the mobile plasma platin...
03/13/2007
7166170Cylinder-based plasma processing system
A method and system for reducing the cost of a vacuum processing system by utilizing separately fabricated parts for the walls and the tops and bottoms of chambers. Walls are formed from cylinders (e.g., aluminum tubing or rolled ring forgings), and plates are then ...
01/23/2007
7160616DLC layer system and method for producing said layer system
The invention describes a device and a process that render possible the production of a layer system for wear protection, corrosion protection and improvement of the slipping properties and the like with an adhesion layer to be arranged on a substrate, a transition ...
01/09/2007
7150792Film deposition system and film deposition method using the same
The present invention provides a film deposition system capable of effectively cooling a work having a large volume, and a film deposition method using this system. The film deposition system has, within a vacuum chamber 1, an evaporation source 3 for ...
12/19/2006
7144547Target for cathode discharging arc ion plating and method of manufacturing the same
In a target for cathode discharging arc ion plating containing Al and Cr as an essential ingredient according to the invention, the thickness of the Al and Cr compound layer formed between Cr particles and Al contained in a target is 30 μm or less. Alternatively, t...
12/05/2006
7131392Vacuum evaporator
A vacuum evaporator according to the present invention comprises a vacuum chamber, a rod-like evaporation source provided to be liftable into and out of the vacuum chamber, and a work support means for supporting, relative to the evaporation source lowered into the ...
11/07/2006
7084573Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
A capacitive plasma source for iPVD is immersed in a strong local magnetic field, and may be a drop-in replacement for an inductively coupled plasma (ICP) source for iPVD. The source includes an annular electrode having a magnet pack behind it that includes a surfac...
08/01/2006
7060167Vacuum arc vapor deposition apparatus
A vacuum arc vapor deposition apparatus can form a film of good quality without uselessly increasing a time from start of film deposition to completion thereof even when a trigger electrode induces vacuum arc discharge in response to turn-off of the vacuum arc disch...
06/13/2006
7041203Apparatus and method for generating and using multi-direction DC and AC electrical currents
Multi-directional currents are generated in a medium by cyclically reversing the direction of a conventional current applied to at least one of at least two electrodes so that an electromotive force (EMF) pulse travels from side of the electrode to the other, changi...
05/09/2006
7033462Vacuum arc vapor deposition process and apparatus
To prevent the film forming characteristic deterioration by a magnetic field of a magnetic filter to thereby make vacuum arc vapor deposition uniform, in the invention, plurality of magnets includes a terminal magnet closest to a plasma injection hole located at the...
04/25/2006
7029560Rod target for arc evaporation source, manufacturing method therefor, and arc deposition device
In the rod target for an arc evaporation source, of which the outer peripheral surface is used as an evaporation surface, the opposite ends thereof in the longitudinal direction thereof are each formed thicker than the central part thereof. The length of the thicker...
04/18/2006
7025863Vacuum system with separable work piece support
A vacuum system for the treatment of work pieces has an evacuatable treatment chamber having a centrally disposed low voltage arc discharge arrangement and laterally disposed loading opening. A coupling device between the work piece support and a receiving device on...
04/11/2006
7014738Enhanced macroparticle filter and cathode arc source
A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of ...
03/21/2006
7014889Process and apparatus for plasma activated depositions in a vacuum
Plasma deposition apparatus (1) and method that allows metal or nonmetal vapor (6) to be generated by electron-beam evaporation, guides that vapor using a noble gas stream (containing reactive gases in cases of reactive evaporation), ionizes the dense ...
03/21/2006
7005047Film deposition apparatus and film deposition method
A particle film deposition apparatus and method are provided, with which ultra fine particles are generated by arc heating. The generated ultra fine particles can be efficiently sucked up into a transfer tube regardless of an arc voltage, and the resulting film can ...
02/28/2006
6998034Vacuum arc deposition apparatus
An arc evaporation source constituting this vacuum arc deposition apparatus has a plurality of cathodes, a trigger electrode, a trigger drive unit, a shutter, and a shutter drive unit. The trigger drive unit changes over the position of the trigger electrode to ther...
02/14/2006
6993919Processing apparatus and processing apparatus maintenance method
The electrode temperature control device in a processing apparatus 100 includes a freezing circuit 110 comprising a compressor 148, a condenser 142, an expansion valve 150 and an evaporator 108 with the evaporator disposed i...
02/07/2006
6936145Coating method and apparatus
A method and apparatus used for the application of plating/coating in a cathodic arc process to improve coating uniformity, deposition rates, quality, cost, packaging, arc triggering, target wear and other improvements is described in the patent. The process improve...
08/30/2005
6929727Rectangular cathodic arc source and method of steering an arc spot
The invention provides an arc coating apparatus having a steering magnetic field source comprising steering conductors disposed along the short sides of a rectangular target behind the target, and a magnetic focusing system disposed along the long sides of the targe...
08/16/2005
6926811Arc-coating process with rotating cathodes
A method is provided for coating objects in a vacuum chamber in which a physical vapor deposition (PVD) can be carried out. The chamber has at least one anode means, at least one cathode and at least one magnetic field source. An arc can be ignited between the at le...
08/09/2005
6923891Copper interconnects
A method for forming a conductive region on a first portion of a substrate, the method being constituted by exposing the first portion to a filtered beam of substantially fully ionised metallic ions under a pulsed, modulated electrical bias. The method uses FCVA (Fi...
08/02/2005
6905582Configurable vacuum system and method
An exemplary configurable vacuum system is provided for use in coating or plating that provides the capability and versatility to handle substrates of significantly different shapes and sizes. The configurable vacuum system includes a vacuum table assembly, a mechan...
06/14/2005
6878248Method of manufacturing an object in a vacuum recipient
A method of manufacturing an object in a vacuum treatment apparatus having a vacuum recipient for containing an atmosphere, includes the steps of supporting a substrate on a work piece carrier arrangement in the recipient and treating the substrate to manufacture th...
04/12/2005
6875326Plasma processing apparatus with real-time particle filter
A plasma processing device include a plasma generation unit for generating plasma by using a cathodic arc discharge, first and second magnetic field ducts arranged in a row for transporting the plasma with one end of the row being connected to the plasma generation ...
04/05/2005
6869509Source for vacuum treatment process
The invention relates to an arc source or a source for vaporizing or sputtering of materials and a method for operating a source. The source comprises an insulated counter-electrode and/or an AC magnet system. Thereby, dependent on the requirement, any desired poten...
03/22/2005
6866752Method of forming ultra thin film devices by vacuum arc vapor deposition
A method for providing an ultra thin electrical circuit integral with a portion of a surface of an object, including using a focal Vacuum Arc Vapor Deposition device having a chamber, a nozzle and a nozzle seal, depressing the nozzle seal against the portion of the ...
03/15/2005
6866753Vacuum arc vapor deposition apparatus and vacuum arc vapor deposition method
A vacuum arc vapor deposition apparatus includes a plurality of magnetic coils for guiding a plasma produced by a vacuum arc evaporating source to the vicinity of a substrate in a film forming chamber by use of a deflection magnetic field. The vacuum arc vapor depos...
03/15/2005
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