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| Number | Title | Issue Date |
| 8101055 | Sputtering apparatus and method for forming coating film by sputtering A sputtering apparatus for forming a coating film made of a metallic film on a coating surface of a substrate by sputtering to have such a film thickness that gradually increases or gradually decreases from its one end side to the other end side. The apparatus compr... | 01/24/2012 |
| 7981263 | Sputtering apparatus, method of driving the same, and method of manufacturing substrate using the same A sputtering apparatus includes a susceptor having a substrate and a plurality of target devices facing the substrate and substantially parallel to each other, each target device being rotatable. ... | 07/19/2011 |
| 7563349 | Sputtering device A sputtering device includes at least: a vacuum container defining a vacuum space; a substrate holder installed rotatably in the vacuum space; a substrate installed on the substrate holder; a target for forming thin film on the substrate; and a rotatable sputtering ... | 07/21/2009 |
| 7402228 | Manufacturing method and apparatus of phase shift mask blank There is disclosed a manufacturing method of a phase shift mask blank in which dispersions of phase angle and transmittance among blanks can be reduced as much as possible and yield is satisfactory. In the manufacturing method of the phase shift mask blank, a proces... | 07/22/2008 |
| 7294404 | Graded photocatalytic coatings The invention provides graded photocatalytic coatings. In one aspect, the invention provides a substrate carrying a photocatalytic coating that includes a first graded film region and a second graded film region. The first graded film region has a substantially cont... | 11/13/2007 |
| 7229532 | Sputtering apparatus A sputtering apparatus for forming a film by a physical gas-phase growth on a substrate having a irregular or flat shape is provided including three or more axes for independently varying a relative positional relationship between a substrate and a cathode in the co... | 06/12/2007 |
| 7169232 | Producing repetitive coatings on a flexible substrate Apparatus for use in making a device by forming repetitive sequences of coatings on a flexible substrate including defining a path for the flexible substrate; the flexible substrate being disposed about at least a portion of the path; a first deposition source for d... | 01/30/2007 |
| 7156961 | Sputtering apparatus and film forming method The present invention is to provide a sputtering apparatus and a thin film formation method which make it possible to form respective layers of a multilayer film having a clean interface at a optimum temperature, or which make it possible to continuously carry out t... | 01/02/2007 |
| 7153410 | Methods and apparatus for electrochemical-mechanical processing of microelectronic workpieces Methods and apparatuses for electrochemical-mechanical processing of microelectronic workpieces. One embodiment of an electrochemical processing apparatus in accordance with the invention comprises a workpiece holder configured to receive a microelectronic workpiece... | 12/26/2006 |
| 7153367 | Drive mechanism for a vacuum treatment apparatus The invention relates to a drive mechanism for a vacuum treatment apparatus by which substrate holders can be transported around an axis (A—A) from an entrance airlock to an exit airlock. A stationary supporting column (1) is disposed in the center and on i... | 12/26/2006 |
| 7150792 | Film deposition system and film deposition method using the same The present invention provides a film deposition system capable of effectively cooling a work having a large volume, and a film deposition method using this system. The film deposition system has, within a vacuum chamber 1, an evaporation source 3 for ... | 12/19/2006 |
| 7097744 | Method and apparatus for controlling darkspace gap in a chamber In one embodiment, a target alignment surface disposed on a target support mechanically engages a darkspace shield alignment surface disposed on a darkspace shield as the target is lodged into a chamber body. The respective alignment surfaces are shaped and position... | 08/29/2006 |
| 7090754 | Sputtering device An object of the invention is to provide a method of sputtering and a device for sputtering which can improve distribution of a film's thickness and coverage distribution improve. The device for sputtering includes at least a substrate, a substrate holder which hold... | 08/15/2006 |
| 7039637 | System and method for evaluating characters in an inputted search string against a character table bank comprising a predetermined number of columns that correspond to a plurality of pre-determined candidate character sets in order to provide enhanced full text search An evaluator system accepts input textual messages in unknown languages and assesses which character sets, corresponding to languages, matches that message. Textual messages whose individual characters are encoded in 16 bit Unicode or other universal format are pars... | 05/02/2006 |
| 7033471 | Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers A Vacuum transport chamber for disk-shaped substrates, has a base plate structure has an interior surface which borders an interior of the chamber on one side thereof. A covering structure is situated parallel and opposite an interior surface of the base plate struc... | 04/25/2006 |
| 7008520 | Sputtering device An object of the invention is to provide a sputtering device which can provide increased distribution of film formation and coverage distribution better than prior sputtering devices. Thus, this invention is that, in the sputtering device constituted of a substrate ... | 03/07/2006 |
| 7001675 | Method of forming a nanocomposite coating There is disclosed a method of depositing a nanocomposite coating of stainless steel and a metallic carbide or metallic nitride, e.g. chromium carbide or chromium nitride, onto a stainless steel substrate 10, including the steps of (a) providing the stainless... | 02/21/2006 |
| 7001482 | Method and apparatus for improved focus ring A focus ring assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a focus ring having one or more wear indicators for determining the lifetime of the focus ring, wherein the coupling of the focus ring to the substrate hol... | 02/21/2006 |
| 6964731 | Soil-resistant coating for glass surfaces A glass article which has a water-sheeting coating and a method of applying coatings to opposed sides of a substrate are described. In one embodiment, a glass sheet is provided bearing a sputtered water-sheeting coating comprising silica on an exterior surface and b... | 11/15/2005 |
| 6949170 | Deposition methods and apparatus A method and apparatus for processing a thin film on a substrate. The method involves locating the substrate in a first rotational position a location opposed to a process station. The process station has a first axis and is arranged for processing the substrate abo... | 09/27/2005 |
| 6913675 | Film forming apparatus, substrate for forming oxide thin film, and production method thereof The invention provides a film forming apparatus that is capable of forming films sequentially with two types of film forming mechanisms in the same chamber. The film forming apparatus according to the present invention includes a Pt target disposed at one sid... | 07/05/2005 |
| 6905578 | Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure An apparatus and method for depositing plural layers of materials on a substrate within a single vacuum chamber allows high-throughput deposition of structures such as these for GMR and MRAM application. An indexing mechanism aligns a substrate with each of plural t... | 06/14/2005 |
| 6905582 | Configurable vacuum system and method An exemplary configurable vacuum system is provided for use in coating or plating that provides the capability and versatility to handle substrates of significantly different shapes and sizes. The configurable vacuum system includes a vacuum table assembly, a mechan... | 06/14/2005 |
| 6905579 | Cylindrical magnetron target and spindle apparatus A cylindrical magnetron target and spindle attachment apparatus for affixing a cylindrical magnetron target to a rotatable support spindle. The attachment apparatus includes a target and a spindle. The target defines a receiving portion. The spindle has a spindle pl... | 06/14/2005 |
| 6878242 | Segmented sputtering target and method/apparatus for using same A rotating sputtering target(s) is segmented so as to include a plurality of different sputtering material portions or segments radially dispersed around the outer periphery of the target. This enables a plurality of different layers to be sputter-deposited, one aft... | 04/12/2005 |
| 6863785 | Sputtering apparatus and sputter film deposition method A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, p... | 03/08/2005 |
| 6858085 | Two-compartment chamber for sequential processing An apparatus for sequential and isolated processing of a workpiece comprises a two compartment chamber and a mechanism to transfer the workpiece from one compartment to the other compartment. The transfer mechanism comprises two doors that seal the pathway between t... | 02/22/2005 |
| 6858118 | Apparatus for enhancing the lifetime of stencil masks An apparatus for masked ion-beam lithography comprises a mask maintenance module for prolongation of the lifetime of the stencil mask. The module comprises a deposition means for depositing material to the side of the mask irradiated by the lithography beam, with at... | 02/22/2005 |
| 6858119 | Mobile plating system and method An exemplary mobile plating system is provided for performing a plating process using virtually any known or available deposition technology for coating or plating as substrate. The mobile plating system may include a vacuum chamber positioned in a mobile storage vo... | 02/22/2005 |
| 6841048 | Coating apparatus for disk-shaped workpieces Coating apparatus for disk-shaped workpieces has a transport chamber with a workpiece transport configuration having two linearly driven transport rams connected to a rotational axis. The rams are within shell lines of a rotation body about the axis and are extended... | 01/11/2005 |
| 6837974 | Single piece pod shield for vertical plenum wafer processing machine A replacement chamber shield is provided for a wafer processing machine that replaces many prior art shield components with a single piece shield. The shield is particularly suitable for use in a processing chamber of a vacuum processing machine of a type for proces... | 01/04/2005 |
| 6827789 | Isolation chamber arrangement for serial processing of semiconductor wafers for the electronic industry An apparatus for the treatment of semiconductor wafers, comprising a supportive frame and a process table arranged on the supportive frame. The process table comprises a stationary upper platen and a stationary lower plate. An intermediate indexing plate is rotative... | 12/07/2004 |
| 6818068 | Conveyor for treating hollow bodies comprising an advanced pressure distribution circuit Aconveyer for treating hollow bodies, comprising several identical treatment stations (12, 13) that process at least one hollow body, whereby the respective treatment station for a given treatment stage communicates with a pressure source via distribution mea... | 11/16/2004 |
| 6818108 | Chamber for the transport of workpieces in a vacuum atmosphere, a chamber combination and a method for transporting a workpiece A vacuum chamber for transporting at least one workpiece has two or more openings defining respective opening areas for treating or handling the at least one workpiece. A transport device is arranged relative to the openings and includes a drive shaft rotatable arou... | 11/16/2004 |
| 6802949 | Method for manufacturing half-metallic magnetic oxide and plasma sputtering apparatus used in the same Disclosed are a method for manufacturing a half-metallic magnetic oxide and a plasma sputtering apparatus used in the method. A conductor provided with at least one hole is disposed between a metal target and a substrate holder in the plasma sputtering apparatus, th... | 10/12/2004 |
| 6800183 | Sputtering device The invention is intended to provide a sputtering device in which a single sputtering chamber is equipped with a plurality of supports and a target-positioning mechanism for rotating the supports to position the targets into film-forming position. Each support is pr... | 10/05/2004 |
| 6780290 | Method and device for forming film The prevent invention improves the film thickness distribution in the direction of revolution of substrates by a simple manner in a method for forming coating films, wherein a evaporating source 3 is disposed at a predetermined distance from substrates 2, ... | 08/24/2004 |
| 6761772 | Workpiece support In order to ensure uniform coating of workpieces, workpiece holders carrying said workpieces are rotatably mounted at the edge of a turntable, a plurality of which are fastened in succession at adjustable distances to a drivable shaft. In order to trigger intermitte... | 07/13/2004 |
| 6755945 | Ionized PVD with sequential deposition and etching An iPVD apparatus (20) is programmed to deposit material (10) into high aspect ratio submicron features (11) on semiconductor substrates (21) by cycling between deposition and etch modes within a vacuum chamber (30). The modes oper... | 06/29/2004 |
| 6740209 | Multilayer film deposition apparatus, and method and apparatus for manufacturing perpendicular-magnetic-recording media This application discloses a multi-layer film deposition apparatus comprising; plural cathodes comprising targets respectively, a main rotation mechanism for rotating each cathode together, and a substrate holder to hold a substrate onto which a multi-layer film is ... | 05/25/2004 |
