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| Number | Title | Issue Date |
| 7785456 | Magnetic latch for a vapour deposition system The invention relates to a magnetic latch for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical vapor deposition (CVD) system or a physical vapor deposition (PVD) s... | 08/31/2010 |
| 7625472 | Plasma-assisted sputter deposition system A plasma-assisted sputter deposition system includes a reactor 1 into which a process gas is introduced; a doughnut-shaped electrode to be sputtered by plasma, in which a lower surface thereof is angled to a surface of a wafer; a spinning plate that spin on i... | 12/01/2009 |
| 7244474 | Chemical vapor deposition plasma process using an ion shower grid A chemical vapor deposition process is carried out in a reactor chamber with an ion shower grid that divides the chamber into an upper ion generation region and a lower process region, the ion shower grid having plural orifices oriented in a non-parallel direction r... | 07/17/2007 |
| 7229532 | Sputtering apparatus A sputtering apparatus for forming a film by a physical gas-phase growth on a substrate having a irregular or flat shape is provided including three or more axes for independently varying a relative positional relationship between a substrate and a cathode in the co... | 06/12/2007 |
| 7198699 | Sputter coating apparatus including ion beam source(s), and corresponding method A coating apparatus deposits a first coating (single or multi-layered) onto a first side of a substrate (e.g., glass substrate) passing through the apparatus, and a second coating (single or multi-layered) onto the other or second side of the substrate. In certain e... | 04/03/2007 |
| 7198678 | Apparatus for performing at least one process on a substrate Apparatus for performing at least one processing operation on a substrate, the apparatus being provided with at least one process chamber and a vacuum lock for the purposes of placing the substrate from the surroundings into a process chamber without the reduced pre... | 04/03/2007 |
| 7164126 | Method of forming a sample image and charged particle beam apparatus An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of t... | 01/16/2007 |
| 7153367 | Drive mechanism for a vacuum treatment apparatus The invention relates to a drive mechanism for a vacuum treatment apparatus by which substrate holders can be transported around an axis (A—A) from an entrance airlock to an exit airlock. A stationary supporting column (1) is disposed in the center and on i... | 12/26/2006 |
| 7153399 | Method and apparatus for producing uniform isotropic stresses in a sputtered film The invention provides a method and apparatus for producing uniform, isotropic stresses in a sputtered film. In the presently preferred embodiment, a new sputtering geometry and a new domain of transport speed are presented, which together allow the achievement of t... | 12/26/2006 |
| 6905582 | Configurable vacuum system and method An exemplary configurable vacuum system is provided for use in coating or plating that provides the capability and versatility to handle substrates of significantly different shapes and sizes. The configurable vacuum system includes a vacuum table assembly, a mechan... | 06/14/2005 |
| 6905578 | Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure An apparatus and method for depositing plural layers of materials on a substrate within a single vacuum chamber allows high-throughput deposition of structures such as these for GMR and MRAM application. An indexing mechanism aligns a substrate with each of plural t... | 06/14/2005 |
| 6858085 | Two-compartment chamber for sequential processing An apparatus for sequential and isolated processing of a workpiece comprises a two compartment chamber and a mechanism to transfer the workpiece from one compartment to the other compartment. The transfer mechanism comprises two doors that seal the pathway between t... | 02/22/2005 |
| 6858119 | Mobile plating system and method An exemplary mobile plating system is provided for performing a plating process using virtually any known or available deposition technology for coating or plating as substrate. The mobile plating system may include a vacuum chamber positioned in a mobile storage vo... | 02/22/2005 |
| 6843883 | Vacuum processing apparatus and method for producing an object to be processed A vacuum processing apparatus 50 is provided with a bypass line 52 for causing a vacuum transfer chamber 4 and a load-lock chamber 12 to communicate with each other, and a bypass opening and shutting valve 54 for opening and shutti... | 01/18/2005 |
| 6841048 | Coating apparatus for disk-shaped workpieces Coating apparatus for disk-shaped workpieces has a transport chamber with a workpiece transport configuration having two linearly driven transport rams connected to a rotational axis. The rams are within shell lines of a rotation body about the axis and are extended... | 01/11/2005 |
| 6837940 | Film-forming device with a substrate rotating mechanism A film-forming device with a substrate rotating mechanism includes a susceptor 30 in the form of a circular disk; a base plate 6 positioned below the susceptor 30 and rotatably retaining the susceptor 30; a revolution generating section | 01/04/2005 |
| 6827789 | Isolation chamber arrangement for serial processing of semiconductor wafers for the electronic industry An apparatus for the treatment of semiconductor wafers, comprising a supportive frame and a process table arranged on the supportive frame. The process table comprises a stationary upper platen and a stationary lower plate. An intermediate indexing plate is rotative... | 12/07/2004 |
| 6818108 | Chamber for the transport of workpieces in a vacuum atmosphere, a chamber combination and a method for transporting a workpiece A vacuum chamber for transporting at least one workpiece has two or more openings defining respective opening areas for treating or handling the at least one workpiece. A transport device is arranged relative to the openings and includes a drive shaft rotatable arou... | 11/16/2004 |
| 6797069 | Gas driven planetary rotation apparatus and methods for forming silicon carbide layers A gas driven rotation apparatus for use with a flow of drive gas includes a base member having an upper surface, a main platter overlying the upper surface of the base member, and a satellite platter overlying the main platter. The apparatus is adapted to direct the... | 09/28/2004 |
| 6761772 | Workpiece support In order to ensure uniform coating of workpieces, workpiece holders carrying said workpieces are rotatably mounted at the edge of a turntable, a plurality of which are fastened in succession at adjustable distances to a drivable shaft. In order to trigger intermitte... | 07/13/2004 |
| 6676989 | Method and system for improving the effectiveness of medical stents by the application of gas cluster ion beam technology Numerous studies suggest that the current popular designs of coronary stents are functionally equivalent and suffer a 16 to 22 percent rate of restenosis. Although the use of coronary stents is growing, the benefits of their use remain controversial in ce... | 01/13/2004 |
| 6669824 | Dual-scan thin film processing system A deposition system is described. The deposition system includes a deposition source that generates deposition flux comprising neutral atoms and molecules. A shield defining an aperture is positioned in the path of the deposition flux. The shield passes t... | 12/30/2003 |
| 6656330 | Coating installation for disk-form workpieces A method for manufacturing a coated substrate disk, comprises linearly bringing the substrate on a mounting, into an evacuated transport chamber and rotating the mounting in the chamber. The mounting is then extended into a coating position and coating of... | 12/02/2003 |
| 6649208 | Apparatus and method for thin film deposition onto substrates An apparatus for depositing thin films on a plurality of substrates has a vacuum chamber, a source of the material or materials to be deposited as the thin film, a source of energy for causing the material to be vaporized, and mechanical apparatus for imp... | 11/18/2003 |
| 6632282 | Planetary multi-substrate holder system for material deposition A planetary multi-substrate holder system for material deposition includes a substrate holder having circumferentially shaped openings in which disk-like substrates of a smaller diameter than the diameter of the openings are maintained. Upon rotation of t... | 10/14/2003 |
| 6616818 | Apparatus and method for coating substrates Apparatus (10) for treating a substrate, comprising: a vacuum chamber (12); a substrate carrier (14) adapted to carry a substrate (16) to be treated; a source material holder (22) for holding a source material (34) with which the substrate (16) is to be t... | 09/09/2003 |
| 6592675 | Rotating susceptor A semiconductor processing reactor includes a rotating susceptor having at least one substrate holder for supporting a substrate during processing. A susceptor motor is coupled to the rotating susceptor and a substrate holder motor is coupled to the subst... | 07/15/2003 |
| 6579420 | Apparatus and method for uniformly depositing thin films over substrates A thin film deposition apparatus and method are disclosed in this invention. The apparatus includes a depositing thin-film particle source, a beam-defining aperture between the particle source and the deposited substrate(s), and a substrate holder to rota... | 06/17/2003 |
| 6517692 | Apparatus for flow-line treatment of articles in an artificial medium An apparatus for flow-line treatment of articles has two chambers. The first chamber is a vacuum working chamber to treat articles in an artificial atmosphere. First transport means transport articles through the first chamber and at least one lock at the... | 02/11/2003 |
| 6503379 | Mobile plating system and method An exemplary mobile plating system and method are provided for performing a plating process using virtually any known or available deposition technology for coating or plating. The mobile plating system may include a vacuum chamber positioned in a mobile ... | 01/07/2003 |
| 6494997 | Radio frequency magnetron sputtering for lighting applications A magnetron sputtering device and method for applying an interference layer to a substrate includes a magnetron sputtering chamber (A) which houses a substrate carrying assembly (B). The substrate carrying assembly comprises a primary rotation table (10),... | 12/17/2002 |
| 6495010 | Differentially-pumped material processing system A differentially pumped deposition system is described that includes a deposition source, such as a magnetron sputtering source, that is positioned in a first chamber. The deposition source generates deposition flux comprising neutral atoms and molecules.... | 12/17/2002 |
| 6485616 | System and method for coating substrates with improved capacity and uniformity A system and method for coating substrates. The coating process includes an improved capacity and uniformity through the addition of a second motion component in which the substrates move in a closed path. A major portion of the path is linear and the con... | 11/26/2002 |
| 6461484 | Sputtering device A sputtering device is provided in which at least one target is sputtered by sputtering discharge to produce a film of target material on at least the first surface of a substrate. The sputtering device has a principal rotating mechanism that rotates the ... | 10/08/2002 |
| 6454908 | Vacuum treatment system A vacuum treatment system has a vacuum chamber in which there is at least one part which is driven in rotation and is connected by a gear train which comprises at least two rotating transmission bodies with a motor drive unit. The rotating transmission bo... | 09/24/2002 |
| 6425988 | Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy A method and system for producing a film (preferably a thin film with highly uniform or highly accurate custom graded thickness) on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source o... | 07/30/2002 |
| 6395156 | Sputtering chamber with moving table producing orbital motion of target for improved uniformity A sputtering chamber has a target that moves with an orbital motion relative to an ion beam. An X-Y assembly allows for target movement in both the horizontal and vertical directions. The X-Y assembly has a base plate, an intermediate plate, and a target ... | 05/28/2002 |
| 6361669 | Apparatus and method for plating wafers, substrates and other articles A plating apparatus and methodology is disclosed that is particularly useful in improving the plating rate, improving the plating of via holes, improving the uniformity of the plating deposition across the surface of the wafer, and minimizing damage to th... | 03/26/2002 |
| 6355146 | Sputtering process and apparatus for coating powders A process and apparatus for coating small particles and fibers. The process involves agitation by vibrating or tumbling the particles or fibers to promote coating uniformly, removing adsorbed gases and static charges from the particles or fibers by an ini... | 03/12/2002 |
| 6338775 | Apparatus and method for uniformly depositing thin films over substrates A thin film deposition apparatus and method are disclosed in this invention. The method includes a step of providing a vacuum chamber for containing a thin-film particle source for generating thin-film particles to deposit a thin-film on the substrates. T... | 01/15/2002 |
