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| Number | Title | Issue Date |
| 8043488 | Rotatable sputter target The invention relates to a rotatable sputter target and to a method to manufacture such a sputter target. The sputter target comprises a target material and a magnet array located at the interior of the target material. The magnet array defines a central zone extend... | 10/25/2011 |
| 7897025 | Method and apparatus for forming thin film A rotor having a cylindrical peripheral surface is disposed in a treatment vessel into which a carrier gas is introduced, and the rotor peripheral surface is opposed to the surface of a substrate with a predetermine gap therebetween. Film-forming particulates includ... | 03/01/2011 |
| 7824528 | End-block for a rotatable target sputtering apparatus An end-block for electrically energising a rotatable tubular target in a vacuum coating installation is disclosed. The end-block has a rotary electrical contact that reduces the joule heating effects when operating in alternating current mode. When compared to known... | 11/02/2010 |
| 7399385 | Alternating current rotatable sputter cathode The present invention is an alternating current rotary sputter cathode in a vacuum chamber. The apparatus includes a housing containing a vacuum and a cathode disposed therein. A drive shaft is rotatably mounted in the bearing housing. A rotary vacuum seal is locate... | 07/15/2008 |
| 7320331 | In-situ plasma cleaning device for cylindrical surfaces An in-situ plasma cleaning device (PCD) performs an atomic surface cleaning process to remove contaminants and/or to modify the cylindrical surfaces of both the target and substrate. The atomic cleaning process utilizes a plasma generated locally within the in-situ ... | 01/22/2008 |
| 7198699 | Sputter coating apparatus including ion beam source(s), and corresponding method A coating apparatus deposits a first coating (single or multi-layered) onto a first side of a substrate (e.g., glass substrate) passing through the apparatus, and a second coating (single or multi-layered) onto the other or second side of the substrate. In certain e... | 04/03/2007 |
| 7166199 | Magnetron sputtering systems including anodic gas distribution systems The present invention provides a magnetron sputtering system using a gas distribution system which also serves as a source of anodic charge to generate plasma field. The sputtering system is comprised of a vacuum chamber, a cathode target of sputterable material, a ... | 01/23/2007 |
| 7156960 | Method and device for continuous cold plasma deposition of metal coatings A method for the deposition of a metal layer on a substrate (1) uses a cold plasma inside an enclosure (7) heated to avoid the formation of a metal deposit at its surface. The enclosure has an inlet (21) and an outlet (22) for the substra... | 01/02/2007 |
| 7075030 | Shielded beam delivery apparatus and method An apparatus includes a plasma generator aligned with a beam generator for producing a plasma to shield an energized beam. An electrode is coaxially aligned with the plasma generator and followed in turn by a vortex generator coaxially aligned with the electrode. A ... | 07/11/2006 |
| 7052583 | Magnetron cathode and magnetron sputtering apparatus comprising the same A magnetron cathode and a sputtering apparatus including the same are provided. The magnetron cathode includes three or more magnet units, each of which comprises a single magnet or a plurality of magnets having the same poles facing toward the same direction, where... | 05/30/2006 |
| 7038389 | Magnetron plasma source A point projection type flood plasma source implements a magnetron sputter cold cathode electron source in a discharge cavity separated from a process chamber by a narrow conduit and a solenoid magnetic field. The solenoid magnetic field impedes radial electron flow... | 05/02/2006 |
| 7030335 | Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression A plasma reactor for processing a semiconductor workpiece, includes a reactor chamber having a chamber wall and containing a workpiece support for holding the semiconductor workpiece, an overhead electrode overlying said workpiece support, the electrode comprising a... | 04/18/2006 |
| 7014741 | Cylindrical magnetron with self cleaning target A cylindrical magnetron capable of running at high current and voltage levels with a target tube that is self cleaning not only in the center portion, but also at the ends. Sputtering the ends of the target tube virtually eliminates accumulation of condensate at the... | 03/21/2006 |
| 6929720 | Sputtering source for ionized physical vapor deposition of metals A plasma processing system is provided with a cylindrical target, open at both ends, and with a magnet array that forms a hollow cathode magnetron (HCM). At one of the open ends is placed an inductively coupled RF energy source. A dielectric window at one end of the... | 08/16/2005 |
| 6905579 | Cylindrical magnetron target and spindle apparatus A cylindrical magnetron target and spindle attachment apparatus for affixing a cylindrical magnetron target to a rotatable support spindle. The attachment apparatus includes a target and a spindle. The target defines a receiving portion. The spindle has a spindle pl... | 06/14/2005 |
| 6841051 | High-power ion sputtering magnetron A high-power ion sputtering magnetron having a rotary cathode comprising a conducting member disposed within the rotary cathode being made of an electrically conductive material for conducting electrical current from the power supply to the rotary cathode. The ion s... | 01/11/2005 |
| 6837975 | Asymmetric rotating sidewall magnet ring for magnetron sputtering A magnetron system for a sputtering target having an annular vault facing the wafer to be coated and having inner and outer sidewalls and a roof. A small magnetron is positioned over the roof. A first magnet assembly having a first magnet polarity along the target a... | 01/04/2005 |
| 6835290 | System and method for controlling thin film defects A system and method for reducing and controlling the number of defects due to carbon inclusions on magnetic media is disclosed. A diamond like carbon protective layer is deposited on magnetic media using a rotary cathode target assembly. The target and cathode are c... | 12/28/2004 |
| 6793784 | Tube target A tube target for cathode sputtering installations, and a process for producing a cylindrical hollow body for such a tube target and its use. The problem of providing a simple and low-cost process for producing a cylindrical hollow body for a tube target and of prov... | 09/21/2004 |
| 6790326 | Magnetron for a vault shaped sputtering target having two opposed sidewall magnets A plasma sputter reactor including a target with an annular vault formed in its surface facing the wafer to be sputter coated and having inner and outer sidewalls and a roof thereover. A well is formed at the back of the target between the tubular inner sidewall. A ... | 09/14/2004 |
| 6787011 | Cylindrical target and its production method A cylindrical target having a cylindrical backing tube and hollow cylindrical target material disposed on an outer circumference of the cylindrical backing tube. The backing tube and the target material are joined via an electroconductive felt present beteween the b... | 09/07/2004 |
| 6767436 | Method and apparatus of plasma-enhanced coaxial magnetron for sputter-coating interior surfaces A plasma-enhanced coaxial magnetron sputter-cleaning and coating assembly for sputter-cleaning and coating the interior surfaces of a cylindrical workpiece is provided. The apparatus sputter-coats the workpiece using a cylindrical sputtering material, the material h... | 07/27/2004 |
| 6768079 | Susceptor with built-in plasma generation electrode and manufacturing method therefor The invention provides a susceptor with a built-in plasma generation electrode that can make the throughput by a range of plasma processing of a plate specimen uniform, and that has excellent plasma resistance, thermal conductivity and durability, and a manufacturin... | 07/27/2004 |
| 6761804 | Inverted magnetron A source of sputtered deposition material has, in one embodiment, a torus-shaped plasma generation area in which a plasma operates to sputter the interior surface of a toroidal cathode. In one embodiment, the sputtered deposition material passes to the exterior of t... | 07/13/2004 |
| 6743342 | Sputtering target with a partially enclosed vault A sputtering target having an annular vault with a throat between two sidewalls and facing a substrate to be sputter coated. The vault is partially closed by a plate placed in the annular throat between the sidewalls. Thereby, the plasma density is increased within ... | 06/01/2004 |
| 6736948 | Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation An AC/DC cylindrical magnetron with a drive system that absorbs large variations in the rotation of the target tube, an efficient high capacity electrical transfer system, and improved electrical isolation. ... | 05/18/2004 |
| 6689253 | Facing target assembly and sputter deposition apparatus A facing target sputtering apparatus, comprising: inner and outer spaced-apart, concentric, and coextensive tubular cathodes open at each end, with the inwardly facing surface of the outer cathode and the outwardly facing surface of the inner cathode; a first ... | 02/10/2004 |
| 6673221 | Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly An improved interconnection system for attaching an improved cylindrical magnetron target to a rotatable flanged spindle incorporates an annular extension on the target, which fits over the edge of the spindle flange, facilitates centering the target on t... | 01/06/2004 |
| 6645358 | Hollow cylindrical cathode sputtering target and process for producing it A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder is disclosed. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the targe... | 11/11/2003 |
| 6613199 | Apparatus and method for physical vapor deposition using an open top hollow cathode magnetron A hollow cathode magnetron comprises an open top target within a hollow cathode. The open top target can be biased to a negative potential so as to form an electric field within the cathode to generate a plasma. The magnetron uses at least one electromagn... | 09/02/2003 |
| 6551477 | Interlocking cylindrical magnetron cathodes and targets A cylindrical magnetron having a cylindrical cathode surrounding a cylindrical target. The cathode is without features extending inwards thereof at either end such that the target may be axially removed from or installed into the cathode from either end. ... | 04/22/2003 |
| 6497803 | Unbalanced plasma generating apparatus having cylindrical symmetry Apparatus for creating subatmospheric high plasma densities in the vicinity of a substrate in a work space for use in magnetron sputter deposition aided by ion bombardment of the substrate. Unbalanced flux lines emanating from cylindrical or frusto-conica... | 12/24/2002 |
| 6497796 | Apparatus and method for controlling plasma uniformity across a substrate A magnetron source comprises a hollow cathode with a non-planar target. By using a magnet between the cathode and a substrate, plasma can be controlled to achieve high ionization levels, good step coverage, and good process uniformity. Step coverage unifo... | 12/24/2002 |
| 6471831 | Apparatus and method for improving film uniformity in a physical vapor deposition system A PVD system comprises a hollow cathode magnetron with a downstream plasma control mechanism. The magnetron has a hollow cathode with a non-planar target and at least one electromagnetic coil to generate and maintain a plasma within the cathode. The magne... | 10/29/2002 |
| 6454920 | Magnetron sputtering source A sputter source has at least two electrically mutually isolated stationar bar-shaped target arrangements mounted one alongside the other and separated by respective slits. Each of the target arrangements includes a respective electric pad so that each ta... | 09/24/2002 |
| 6444105 | Physical vapor deposition reactor including magnet to control flow of ions A novel hollow cathode magnetron source is disclosed. The source comprises a hollow cathode with a non-planar target. By using a magnet between the cathode and a substrate, plasma can be controlled to achieve high ionization levels, good step coverage, an... | 09/03/2002 |
| 6436252 | Method and apparatus for magnetron sputtering A cathode assembly for magnetron sputtering of a workpiece, and sputtering apparatus and methods of sputtering using same are provided. The cathode assembly includes a tubular cathode, which may be cylindrical in cross section along its length, or which m... | 08/20/2002 |
| 6406599 | Magnetron with a rotating center magnet for a vault shaped sputtering target A plasma sputter reactor including a target with an annular vault formed in a surface facing the wafer to be sputter coated and having inner and outer sidewalls and a roof thereover. A well is formed at the back of the target between the tubular inner sid... | 06/18/2002 |
| 6383565 | Vapor deposition coating apparatus The invention relates to a vapor deposition coating apparatus. More particularly it relates to an apparatus in which the ion current density is carefully controlled to improve coating. This control enhances the versatility and enlarges the range of deposi... | 05/07/2002 |
| 6375815 | Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly An improved interconnection system for attaching an improved cylindrical magnetron target to a rotatable flanged spindle incorporates an annular extension on the target, which fits over the edge of the spindle flange, facilitates centering the target on t... | 04/23/2002 |
