Quotables
"The idea that cavalry will be replaced by these iron coaches is absurd. It is little short of treasonous."
Aide-de-camp to Field Marshal Haig ; At a tank demonstration, 1916
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7363110 | Gasket with curved configuration at peripheral edge A gasket having the form of a frame is provided with a curved portion at an inner or outer periphery thereof. When used in combination with a similarly configured gasket, the two gaskets may together, upon compression, form a pinch seal. The curved portion may be pr... | 04/22/2008 |
| 7297239 | Method and apparatus for the electrochemical deposition and planarization of a material on a workpiece surface An electrochemical apparatus is provided which deposits material onto or removes material from the surface of a workpiece. The apparatus comprises a polishing pad and a platen which is in turn comprised of a first conductive layer in contact with the polishing pad a... | 11/20/2007 |
| 7294243 | Contact assemblies for electrochemical processing of microelectronic workpieces and method of making thereof Contact assemblies for electrochemical processing of microelectronic workpieces. The contact assembly (400) can comprise a support member (410) that includes an inner wall (412) which defines an opening (414) configured to receive the wor... | 11/13/2007 |
| 7232507 | High volumetric efficiency electrochemical cell design for treatment of low concentrations of contaminants in low conductivity water An electrochemical cell design is disclosed for the particular application of the electrochemical treatment of contaminants in water. The cell is designed to allow the treatment of low concentrations of contaminants in low conductivity water efficiently, and to be s... | 06/19/2007 |
| 7223324 | Capping board with separating walls Disclosed in a capping board for use to support hanging legs of anodes and cathodes within adjacent electrolytic cells. This capping board has a main body having a bottom surface shaped to fit onto upper edges of the adjacent cells, and a top surface. A first set of... | 05/29/2007 |
| 7204919 | Capping board with at least one sheet of electrically conductive material embedded therein Disclosed is a capping board for use to support anodes and cathodes within adjacent electrolytic cells, which has a plurality of individual seats positioned in spaced apart relationship all along its length to receive and support hanging legs projecting from these a... | 04/17/2007 |
| 7048838 | Ion exchange membrane electrolyzer The invention provides an ion exchange membrane electrolyzer ensuring a satisfactory circulation of electrolyte, high electrolytic efficiency and great ridigity. An anode chamber partition in a flat sheet form is joined to a cathode chamber partition in a flat sheet... | 05/23/2006 |
| 7033479 | Electrolytic cells with renewable electrodes structures and method for substituting the same The invention is relative to an electrolytic cell comprising electrodes spaced apart from the back-wall by means of ribs, wherein a portion of the contact surface between the electrodes and the ribs is free from constraints in order to permit the complete removal of... | 04/25/2006 |
| 7018516 | Bipolar multi-purpose electrolytic cell for high current loads A bipolar multi-purpose electrolytic cell for high current loads has a frame, two electrode edge plates with metal electrode sheet, and power supply and of bipolar plates. Each includes a plastic electrode base body with electrode rear spaces and/or with coolings sp... | 03/28/2006 |
| 7003868 | Coated stainless-steel/copper weld for electroplating cathode A copper welding rod is used in an arc-welding operation to form a bead that joins a copper starter sheet and a stainless steel hanger bar. The amperage level of the arc-welding equipment is set to generate heat at the weld site which is above the melting point of c... | 02/28/2006 |
| 7001493 | Apparatus for preparing sterilizing water and process for sterilizing water The present invention provides an apparatus for preparing sterilizing water, which comprises an electrolyzer wherein an anode chamber (10) and a cathode chamber (20) partitioned by an ion exchange membrane (40) form a unit cell (A), being altern... | 02/21/2006 |
| 6962649 | Contact assemblies, methods for making contact assemblies, and machines with contact assemblies for electrochemical processing of microelectronic workpieces Contact assemblies for electrochemical processing of microelectronic workpieces. The contact assemblies can comprise a support member that includes an inner wall which defines an opening configured to receive the workpiece and a plurality of contacts. The individual... | 11/08/2005 |
| 6939448 | Contact assemblies, methods for making contact assemblies, and plating machines with contact assemblies for plating microelectronic workpieces Contact assemblies, electroplating machines with contact assemblies, and methods for making contact assemblies that are used in the fabrication of microelectronic workpieces. The contact assemblies can be wet-contact assemblies or dry-contact assemblies. A contact a... | 09/06/2005 |
| 6911127 | Contact assemblies, methods for making contact assemblies, and plating machines with contact assemblies for plating microelectronic workpieces Contact assemblies, electroplating machines with contact assemblies, and methods for making contact assemblies that are used in the fabrication of microelectronic workpieces. The contact assemblies can be wet-contact assemblies or dry-contact assemblies. A contact a... | 06/28/2005 |
| 6884330 | Counter plate electrode with self adjusting z-axis The present invention relates to a method and apparatus for properly and consistently spacing an electrode from a workpiece while electrochemically etching (ECM) grooves to a precise depth in a surface of the workpiece to form a fluid dynamic bearing. The electrode ... | 04/26/2005 |
| 6805778 | Contact assembly for supplying power to workpieces during electrochemical processing Methods used in semiconductor electroplating systems, such as for plating copper, onto a semiconductor wafer or other semiconductor workpiece. The methods apply to patterned metal layers plated onto a seed layer which is partially protected by an overlying photoresi... | 10/19/2004 |
| 6761808 | Electrode structure An electrode structure for use, for example, in a bipolar electrolyser comprising (i) a pan with a dished recess and a flange around the periphery thereof for supporting gasket means for sealing a separator between the flanges in adjacent electrode structures, which... | 07/13/2004 |
| 6663762 | Plating system workpiece support having workpiece engaging electrode A semiconductor workpiece holder used in electroplating systems for plating metal layers onto a semiconductor workpieces, and is of particular advantage in connection with plating copper onto semiconductor materials. The workpiece holder includes electrod... | 12/16/2003 |
| 6576098 | Metal cathode sheet The present invention relates to a metal cathode sheet as component of cathode equipment for an electrolysis tank for the electrolytic recovery of pure metals, especially copper. The cathode sheet is provided, at its side edges which come into contact wit... | 06/10/2003 |
| 6478936 | Anode assembly for plating and planarizing a conductive layer A particular anode assembly can be used to supply a solution for any of a plating operation, a planarization operation, and a plating and planarization operation to be performed on a semiconductor wafer. The anode assembly includes a rotatable shaft dispo... | 11/12/2002 |
| 6409892 | Reactor vessel having improved cup, anode, and conductor assembly An improved anode, cup and conductor assembly for a reactor vessel includes an anode assembly supported within a cup which holds a supply of process fluid. The cup is supported around its perimeter within the reactor vessel. The anode assembly has an anod... | 06/25/2002 |
| 6395155 | Electrolysis plate An electrolysis plate is described which consists of an outer non-conductive frame, particularly a frame having a fiber-reinforced cresol resin, an electrically conductive, bipolar graphite plate which is mounted therein and is preferably slotted on both ... | 05/28/2002 |
| 6383352 | Spiral anode for metal plating baths A metal anode having at least a portion of which formed in a spiral configuration is disclosed. The spacing between the adjacent spirals of the anode is essentially uniform in order to provide uniform fluid flow and electrical characteristics. The anode m... | 05/07/2002 |
| 6358388 | Plating system workpiece support having workpiece-engaging electrodes with distal contact-part and dielectric cover A semiconductor workpiece holder used in electroplating systems for plating metal layers onto a semiconductor workpieces, and is of particular advantage in connection with plating copper onto semiconductor materials. The workpiece holder includes electrod... | 03/19/2002 |
| 6325903 | Parallel action holding clamp for electroplating articles A holding clamp device, for releasably holding a thick planar article over ground, comprising: an elongated main arm member, defining first and second opposite end portions; a pair of first and second tubular bar members, each defining an outer end portio... | 12/04/2001 |
| 6312572 | Electrolyzer The present invention provides an ion exchange membrane type electrolyzer, which comprises electrodes at opposed positions via an ion exchange membrane, spacers are mounted in dot-like arrangement on openings of electrode surface to maintain spacing betwe... | 11/06/2001 |
| 6290827 | Device for electrochemical measurement A measuring system with a measuring body (2) mounted on a rotatable shaft (1) and being provided with electrodes (16) for measuring electrical currents obtained through chemical reactions within an analyte solution. In the rotatable shaft is housed an ele... | 09/18/2001 |
| 6284109 | Spacer mechanism for anodes A spacer mechanism which is used to separate electrodes within an electrowinning process. The spacers have a central body portion which defines the distancing between the electrodes and at least four sloping arms extending from the central body. The arms ... | 09/04/2001 |
| 6280582 | Reactor vessel having improved cup, anode and conductor assembly An improved anode, cup and conductor assembly for a reactor vessel includes an anode assembly supported within a cup which holds a supply of process fluid. The anode assembly has an anode shield carrying an anode. The anode shield and the anode are suppor... | 08/28/2001 |
| 6270647 | Electroplating system having auxiliary electrode exterior to main reactor chamber for contact cleaning operations A system for electroplating a semiconductor wafer is set forth. The system comprises a first electrode in electrical contact with the semiconductor wafer and a second electrode. The first electrode and the semiconductor wafer form a cathode during electro... | 08/07/2001 |
| 6267856 | Parallel action holding clamp for electroplating articles A holding clamp device, for releasably holding a thick planar article over ground, comprising: an elongated main arm member, defining first and second opposite end portions; a pair of first and second tubular bar members, each defining an outer end portio... | 07/31/2001 |
| 6264810 | Electromechanical attachment of inert electrode to a current conductor A coupling for an inert electrode for refining a metal is provided. The coupling includes an electrode assembly and an electrically conductive support structure assembly. The support structure assembly includes a mechanical connection and an electrical co... | 07/24/2001 |
| 6251257 | Apparatus and method for electrochemically etching grooves in an outer surface of a shaft The present invention is directed to an apparatus 245 and method of etching grooves 235 in a shaft 175. In one embodiment, a cathode 250 is provided for electrochemically etching grooves 235 in an outer surface 215 of the shaft 175 to form a fluid dynamic... | 06/26/2001 |
| 6228231 | Electroplating workpiece fixture having liquid gap spacer A fixture for supporting a workpiece during electroplating of a metal upon the workpiece in a conductive electroplating bath includes a non-conductive frame member for receiving the workpiece therein. The fixture further includes a current distribution me... | 05/08/2001 |
| 6156167 | Clamshell apparatus for electrochemically treating semiconductor wafers An apparatus for electroplating a wafer surface includes a cup having a central aperture defined by an inner perimeter, a compliant seal adjacent the inner perimeter, contacts adjacent the compliant seal and a cone attached to a rotatable spindle. The com... | 12/05/2000 |
| 6120657 | Device for transmitting electric current to disc elements in surface-coating thereof A device for evenly distributed electrical current transmission to a disc element when electroplating the disc element includes a closed loop of an elongated, elastic, electrically conducting body contacting one side of the disc element at least at its ou... | 09/19/2000 |
| 6113759 | Anode design for semiconductor deposition having novel electrical contact assembly An anode assembly includes a perforated anode and an electrical contact assembly attached to the anode. A perforated anode holder holds the anode. The anode holder includes perforations at least in a bottom wall such that plating solution may flow through... | 09/05/2000 |
| 6103076 | Auxiliary anode element suitable for use in electroplating a bent tubular workpiece A flexible auxiliary anode element for electroplating a tubular workpiece while the workpiece and an anode element are immersed in a plating liquid contained in a plating both. The flexible auxiliary anode element can be inserted into a hollow interior of... | 08/15/2000 |
| 6099712 | Semiconductor plating bowl and method using anode shield A semiconductor plating bowl which includes a shield on a consumable anode. The shield is preferably made from a dielectric material, such as a plastic. The shield is placed in the area upon which flowing plating fluid would otherwise impinge upon the pro... | 08/08/2000 |
| 6080289 | Electroplating apparatus with self-cleaning contacts An electroplating apparatus comprising a plating tank containing electroplating solution, one or more substrates to be electroplated, and an electrical contact mechanism. The electrical contact mechanism comprises a first set of one or more conductive con... | 06/27/2000 |
