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Class 204/192.36 - Organic


Subclass of Class 204 - Chemistry: electrical and wave energy
Definition: Processes wherein the material being etched is organic material.
No. of patents: 80
Last issue date: 10/31/2006


1    
NumberTitleIssue Date
7129606Vacuuming motor and vacuuming apparatus
In a vacuuming motor used by being attached to a peripheral edge of a motor attaching hole provided at a vacuum chamber, an end portion on a load side of a motor main body is attached with a reduction gear main body having an attaching flange fixed to the motor atta...
10/31/2006
7005239Method of forming metal line
A method of forming a metal line includes the steps of forming a metal layer on a substrate in a chamber while maintaining a chamber pressure for a plasma to be equal to or smaller than 0.8 Pa, and coating a photoresist on the metal layer. ...
02/28/2006
6949324Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same
A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 μm thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-lin...
09/27/2005
6868856Enhanced remote plasma cleaning
Methods and apparatus for cleaning semiconductor processing equipment. The apparatus include both local and remote gas dissociators coupled to a semiconductor processing chamber to be cleaned. The methods include introducing a precursor gas into the remote dissociat...
03/22/2005
6746960Electronic techniques for analyte detection
Techniques are used to detect and identify analytes. Techniques are used to fabricate and manufacture sensors to detect analytes. An analyte (1810) is sensed by sensors (1820) that output electrical signals in response to the analyte. The electrical si...
06/08/2004
6451373Method of forming a therapeutic coating onto a surface of an implantable prosthesis
A method of coating an implantable prosthesis by applying a composition including a therapeutic substance and a fluid to the prosthesis and removing the fluid is disclosed. The fluid is not capable of significantly dissolving the therapeutic substance. A ...
09/17/2002
6409891Low energy plasma cleaning method for cryofilms
Cryofilm/organic contaminants are removed from cryogenically cooled surfaces such as spacecraft cryo-telescope mirrors by sputtering and chemical reaction with a low energy plasma having an average ion energy of not more than about 30 eV, and preferably i...
06/25/2002
6338776Dielectric processing with included stabilization periods
The present invention is directed to allowing a work piece to stabilize in regard to temperature and humidity/water content prior to precision operations so as to minimize any problems resulting from dimensional changes....
01/15/2002
6137660Method for reducing ESD and imaging damage during focused ion beam definition of magnetoresistive head write track width
A magnetoresistive read/recording head for use in a fixed disk drive data storage device is formed by the steps of first, photolithographically depositing the head on one surface of a slider block, second, applying, a conductive film preferably of carbon ...
10/24/2000
6030901Photoresist stripping without degrading low dielectric constant materials
Photoresist masks are stripped using a H2 -N2 plasma to prevent increasing the dielectric constant of an exposed carbon-containing dielectric material. Embodiments of the present invention include forming a low dielectric constant, c...
02/29/2000
5998104Method of stripping a resist mask
A method for removing a used organic resist in a downstream ashing apparatus on a silicon semiconductor wafer in which water vapor is added to an oxygen plasma gas generated by microwaves. The addition of the water vapor lowers an activation energy of the...
12/07/1999
5965629Process for modifying surfaces of materials, and materials having surfaces modified thereby
A process for modifying the surfaces of a polymer, ceramic, ITO or glass by irradiating energized ion particles onto the surfaces of the polymer, ceramic, ITO or glass, while blowing a reactive gas directly over the surface of the polymer, ceramic, ITO or...
10/12/1999
5895271Metal film forming method
A metal film forming method by which a metal film having a desired pattern can be formed with good reproducibility and satisfactory precision. In a metal film forming method for forming a metal film into the desired pattern on a surface of an object by th...
04/20/1999
5811358Low temperature dry process for stripping photoresist after high dose ion implantation
A dry process for stripping photoresist from a semiconductor device during the manufacturing process and after high dose ion implantation is describe. The implant-hardened surface of the photoresist is first stripped by oxygen and nitrogen/hydrogen plasma...
09/22/1998
5773201Method of stripping a resist mask
A method for removing a used organic resist in a downstream ashing apparatus on a silicon semiconductor wafer in which water vapor is added to an oxygen plasma gas generated by microwaves. The addition of the water vapor lowers an activation energy of the...
06/30/1998
5688383Method for improving the performance of high temperature superconducting thin film wafers
A method for decreasing the microwave surface impedance of high-temperature superconducting thin films comprises (a) applying, preferably by spin-coating, a protective coating (preferably poly(methyl methacrylate) or polyimide) to the surface of a high-te...
11/18/1997
5658440Surface image transfer etching
A process called surface image transfer etching (SITE) is used to etch patterned photoresist so as to more completely transfer a well-defined pattern formed in the top surface (10a) of a material to the bulk of the material (12). The process uses no mask,...
08/19/1997
5652040Magnetic recording medium
A magnetic recording medium is provided and includes a support having a surface and a magnetic layer formed on the surface of the support and containing a magnetic powder and a binder resin. The surface of the support is treated by a treatment selected fr...
07/29/1997
5643423Method for producing an abrasion resistant coated substrate product
The coated substrate product finds particular application in eyeglass and sunglass lenses, architectural glass, analytical instrument windows, automotive windshields and laser bar code scanners for use in retail stores and supermarkets. The product has gr...
07/01/1997
5487810Process for pretreating surfaces of plastic items
In order to improve the adhesion of coatings, especially metal coatings, to the surfaces of plastic components, the latter are pretreated in low-pressure plasma with a process gas containing sulphur hexafluoride (SF6) which is substantially fre...
01/30/1996
5462781Surface modified porous expanded polytetrafluoroethylene and process for making
An implantable porous expanded polytetrafluoroethylene material having a microstructure of nodes interconnected by fibrils wherein a surface of the material has been modified by the removal of fibrils from the surface so that under magnification the surfa...
10/31/1995
5437900Surface modified porous expanded polytetrafluoroethylene and process for making
Porous expanded polytetrafluoroethylene material having a microstructure of nodes interconnected by fibrils wherein a surface of the material has been modified to have increased hydrophobicity as indicated by having a water droplet roll-off angle of less ...
08/01/1995
5368710Method of treating an article with a plasma apparatus in which a uniform electric field is induced by a dielectric window
A method of plasma treating an article in a housing having a chamber in which the article such as a wafer can be treated with plasma. The housing includes at least one inlet port connected to an interior of the chamber through which process gas can be sup...
11/29/1994
5357005Reactive surface functionalization
Method for treating surface of dielectric polymer with water vapor plasma to form reactive sites and grafting a reactive polymer thereto to tailor the properties of the dielectric polymer surface....
10/18/1994
5328557Plasma treatment of O-rings
A method for treating an O-ring to substantially eliminate the adhesion of wafers to the O-ring in semiconductor equipment, which method comprises the steps of: placing an O-ring in a reactor, exposing the O-ring to an ionizing gas for approximately two m...
07/12/1994
5300189Plasma surface treatment method and apparatus
A surface treatment method and apparatus permitting the treatment of a film with plasma with a high treatment speed and a high efficiency without uselessly complicating the construction of a device for realizing it are disclosed. The area where the counte...
04/05/1994
5296091Method of etching substrates having a low thermal conductivity
Disclosed is a vacuum reactor for etching substrates having a low thermal conductivity to a high degree of etch rate uniformity, wherein the substrates to be etched are arranged in a holder at a predetermined spacing from the cathode to which RF energy is...
03/22/1994
5258264Process of forming a dual overhang collimated lift-off stencil with subsequent metal deposition
A process and structure for depositing metal lines in a lift-off process is disclosed. The process comprises the deposition of a four-layer structure or lift-off stencil, comprising a first layer of a lift-off polymer etchable in oxygen plasma, a first ba...
11/02/1993
5196103Method of making an electrical interconnection device
The present invention refers to an electrical interconnection device having conductive metal layers separated by a dielectric cyclobutarene polymer layer. The adhesion of the conductive metal layer to the dielectric cyclobutarene polymer layer is promoted...
03/23/1993
5153303Polyimides prepared from disubstituted aromatic tetracarboxylic acid dianhydrides
Fully cyclized polyimides based on aromatic tetracarboxylic acid dianhydrides with substitution in the positions ortho to the bridging moiety and aromatic diamines, exhibiting solubility in organic solvents, increased glass transition temperatures, low co...
10/06/1992
5114529Plasma processing method and apparatus
A plasma processing apparatus includes an oxygen source 14 which provides gas to a plasma generating means 16 for generating plasma in a plasma generating area 40. Gas flows from the plasma generating area 40 to a wafer 30 placed in a processing area 60. ...
05/19/1992
5057187Ashing method for removing an organic film on a substance of a semiconductor device under fabrication
Plasma ashing methods, for moving a resist material formed on a ground layer of a semiconductor device during fabrication of said semiconductor, are performed by using one of three kinds of reactant gases each composed of three different gases. Plasma ash...
10/15/1991
5030322Method of forming orientation film of liquid-crystal display device
A method of forming an orientation film of a liquid-crystal display device having two electrode plates and a liquid-crystal cell between the two electrode plates includes the steps of forming an organic film on a partial or overall surface of at least one...
07/09/1991
5019210Method for enhancing the adhesion of polymer surfaces by water vapor plasma treatment
Method for water vapor plasma treating the surface of a polymer body to enhance the adhesion of a first and second polymer surface. The method is particularly useful for polyimide surfaces....
05/28/1991
4983254Processing for stripping organic material
A process for stripping an organic material, which comprises forming gases including a gas containing oxygen and a gas containing a halogen into plasma in a plasma chamber, and supplying an active species of the halogen in the gas formed plasma to a react...
01/08/1991
4980022Method of removing a layer of organic matter
A method removes a first layer of an organic matter which is formed on a second layer, where the first layer is subjected to an ion implantation. The method includes the steps of generating a plasma by exciting a gas which includes H2 O using a...
12/25/1990
4968552Versatile reactive ion etch barriers from polyamic acid salts
The present invention provides a novel approach to forming a RIE etch barrier in processes where thermally stable polymeric materials containing free carboxyl groups, such as polyamic acid polymers, are present as masking layers in the electrical device t...
11/06/1990
4966648Process for producing thin film magnetic head
An improved process for producing a thin film magnetic head includes forming a nonmagnetic material layer over a lower magnetic core layer with an electrically conductive coil layer embedded in the nonmagnetic material layer. It further includes forming a...
10/30/1990
4957588Method for high temperature reaction process
A method for high temperature reaction process, including the steps of mounting a substrate on which a radiation-sensitive polymer film is formed on a lower heating plate in a reaction vessel, sealing the reaction vessel while positioning an upper heating...
09/18/1990
4946549Method for fabricating or modifying an article comprising the removal of a polymer coating
Disclosed is a method for removing poly-para-xylylene, its derivatives, and copolymers (collectively called "parylene") from bodies, including relatively large bodies such as printed circuit (PC) boards, that is capable of yielding relatively high removal...
08/07/1990
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