Bizarre Patents
Crispy Chip Sandwich and Process of Producing a Sandwich Product
A food product comprising a multilayer cookie or snack having outer layers formed from a crispy type edible food product such as a potato chip or corn chip, etc. with an intermediate marshmallow layer being in contact with the inner surface of each crispy chip and one or more filler substances.
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| Number | Title | Issue Date |
| 8043484 | Methods and apparatus for resputtering process that improves barrier coverage Conductive or barrier material is deposited on a semiconductor substrate having recessed features by a method that has at least two operations. The first operation involves depositing a layer of the material on at least a portion of the field regions of the wafer. T... | 10/25/2011 |
| 7476302 | Apparatus and method to deposit magnesium oxide film on a large area An apparatus and method to deposit a MgO film on a large substrate area. The method includes applying a voltage to one or more magnesium targets; applying an electric current to the one or more magnesium targets when the voltage stops increasing so that a power with... | 01/13/2009 |
| 7378003 | Thin-film magnetic recording head manufacture using selective imaging A focused particle beam system, according to one embodiment of the invention, precisely shapes a pole-tip assembly formed by a multi-layer device having a first layer with a first structural element, a second layer with a second structural element, and a shielding l... | 05/27/2008 |
| 7320895 | Thyristor-based device having dual control ports Switching operations, such as those used in memory devices, are enhanced using a thyristor-based semiconductor device adapted to switch between a blocking state and a conducting state. According to an example embodiment of the present invention, a thyristor-based se... | 01/22/2008 |
| 7316764 | System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signal A system and method for performing sputter etching includes an ion source that generates an ion current that is directed at a substrate and an electron source that generates an electron current directed at the substrate. Biasing circuitry biases the substrate with a... | 01/08/2008 |
| 7316199 | Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber A magnetic field generator for producing a magnetic field that accelerates plasma formation is placed proximate a reaction chamber of semiconductor substrate processing system. The magnetic field generator has four main magnetic coil sections for producing a magneti... | 01/08/2008 |
| 7313854 | Method of manufacturing a tactile sensor A method of manufacturing a tactile sensor, which is capable of implementing a wide range of senses, including sensing contact pressure (vertical force and horizontal force) with an external object and heat caused by the contact pressure, comprises forming a side bl... | 01/01/2008 |
| 7306696 | Interferometric endpoint determination in a substrate etching process In determining an endpoint of etching a substrate, light that is directed toward the substrate is reflected from the substrate. A wavelength of the light is selected to locally maximize the intensity of the reflected light at an initial time point of the etching pro... | 12/11/2007 |
| 7288173 | Ion beam processing system and ion beam processing method An ion beam processing system emitting an ion beam at a workpiece to process the workpiece, provided with an electrode for applying an electric field to the workpiece, the potential of the electrode being made 0V or a negative potential, and a cover insulated from t... | 10/30/2007 |
| 7255784 | Polishing method and electropolishing apparatus A polishing method for electropolishing a metal film formed on a wafer surface so as to fill concave portions formed on the wafer surface comprises a step of determining an electropolishing end point of the metal film on the basis of a change of a current waveform r... | 08/14/2007 |
| 7241397 | Honeycomb optical window deposition shield and method for a plasma processing system An optical window deposition shield including a backing plate having a through hole, and a honeycomb structure having a plurality of adjacent cells configured to allow optical viewing through the honeycomb structure. Each cell of the honeycomb structure has an aspec... | 07/10/2007 |
| 7232526 | Method and apparatus for controlling material removal from semiconductor substrate using induced current endpointing A method and apparatus for controlling the removal of material from a semiconductor substrate in an integrated circuit fabrication process is disclosed. The method and apparatus utilize a light source or charged particle beam (electron or ion beam) to induce a curre... | 06/19/2007 |
| 7213322 | Method for manufacturing surface acoustic wave device A piezoelectric substrate is provided with interdigital transducer electrodes including a first electrode layer, a second electrode layer, and a third electrode layer that is principally made of aluminum. The piezoelectric substrate has a stepped structure on the su... | 05/08/2007 |
| 7208422 | Plasma processing method A plasma processing method utilizing a plasma processing apparatus having a plasma generating unit, a process chamber including an outer cylinder for withstanding a reduced pressure, and an inner cylinder made of non-magnetic material and being replaceable arranged ... | 04/24/2007 |
| 7205237 | Apparatus and method for selected site backside unlayering of si, GaAs, GaAlAsof SOI technologies for scanning probe microscopy and atomic force probing characterization Apparatus for exposure and probing of features in a semiconductor workpiece includes a hollow concentrator for covering a portion of the workpiece connected by a gas conduit to a supply of etchant gas. A stage supports and positions the semiconductor workpiece. Cont... | 04/17/2007 |
| 7172675 | Observation window of plasma processing apparatus and plasma processing apparatus using the same An observation window airtightly installed at a wall of a processing room of a plasma processing apparatus includes a body having a through hole with an opening facing the processing room, a transparent member installed at a side of the body opposite to the processi... | 02/06/2007 |
| 7160475 | Fabrication of three dimensional structures The present disclosure relates to a method for generating a three-dimensional microstructure in an object. In one embodiment, a method for fabricating a microscopic three-dimensional structure is provided. A work piece is provided that includes a target area at whic... | 01/09/2007 |
| 7159302 | Method for manufacturing a perpendicular write head A method for manufacturing a write head having a small write pole tip that emits magnetic flux sufficient for effective perpendicular recording. The method creates a leading edge taper (LET) between the write pole tip and a magnetic flux guide to create a sufficient... | 01/09/2007 |
| 7156975 | Polishing method and electropolishing apparatus A polishing method for electropolishing a metal film formed on a wafer surface so as to fill concave portions formed on the wafer surface comprises a step of determining an electropolishing end point of the metal film on the basis of a change of a current waveform r... | 01/02/2007 |
| 7152305 | Method for fabricating a magnetoresistive (MR) read head A magnetoresistive (MR) read head is disclosed including a shield layer with a recessed portion and a protruding portion defined by the recessed portion. Also included is an MR sensor located in vertical alignment with the protruding portion of the shield layer. Fur... | 12/26/2006 |
| 7147747 | Plasma processing apparatus and plasma processing method A plasma processing apparatus having a process chamber in which an object to be processed is subjected to plasma processing includes a light-receiving part for a spectrometer unit, an arithmetic unit, a database, a determination unit and an apparatus controller. The... | 12/12/2006 |
| 7147748 | Plasma processing method A plasma processing method using a plasma processing apparatus having a process chamber in which a substrate is subjected to a plasma processing, a light-receiving part, a spectrometer unit, an arithmetic unit, a database, a determination unit for determining that a... | 12/12/2006 |
| 7135123 | Method and system for integrated circuit backside navigation The backside navigation method of the present invention includes milling a fiducial opening through the substrate of an integrated circuit. The milling process is stopped when the fiducial opening reaches the bottom of a trench isolation structure. The trench isolat... | 11/14/2006 |
| 7118657 | Pulsed ion beam control of solid state features For controlling a physical dimension of a solid state structural feature, a solid state structure is provided, having a surface and having a structural feature. The structure is exposed to a first periodic flux of ions having a first exposure duty cycle characterize... | 10/10/2006 |
| 7108584 | Method and apparatus for manufacturing liquid drop ejecting head The method and apparatus manufacture a liquid drop ejecting head. The method and apparatus blast particles on a substrate having on an upper layer a patterned mask layer made of an organic material and on a lower layer a driver circuit for ejecting a liquid drop to ... | 09/19/2006 |
| 7101458 | Plasma processing method and apparatus In a plasma processing method and apparatus for monitoring an operating status of a plasma processing apparatus and/or a processing status of an object being processed, emission spectra emitted from a plasma is obtained as optical data when the plasma process is per... | 09/05/2006 |
| 7067432 | Methodology for in-situ and real-time chamber condition monitoring and process recovery during plasma processing A new methodology of monitoring process drift and chamber seasoning is presented based on the discovery of the strong correlation between chamber surface condition and free radical density in a plasma. Lower free radical density indicates either there is a significa... | 06/27/2006 |
| 7060977 | Nanolithographic calibration methods A system and method for calibration of nanolithography includes fabricating a nanoscale test pattern, measuring a parameter of the test pattern, and calculating a calibration coefficient from the measured parameter. The calculated calibration coefficient is then use... | 06/13/2006 |
| 7048837 | End point detection for sputtering and resputtering Plasma etching or resputtering of a layer of sputtered materials including opaque metal conductor materials may be controlled in a sputter reactor system. In one embodiment, resputtering of a sputter deposited layer is performed after material has been sputtered dep... | 05/23/2006 |
| 7048869 | Plasma processing apparatus and a plasma processing method In an oxide film etching process, a plasma having a suitable ratio of CF3, CF2, CF, F is necessary, and there is a problem in that the etching characteristic fluctuates with a temperature fluctuation of the etching chamber. Using a UHF type ECR... | 05/23/2006 |
| 7025895 | Plasma processing apparatus and method A plasma processing apparatus and method are capable of performing etching with high precision without damaging the semiconductor wafer. The plasma processing apparatus has a plasma generation power supply for generating a plasma within a processing chamber; a high-... | 04/11/2006 |
| 7007374 | Method of making a magnetic head A narrow track width read sensor having a high magnetoresistive sensitivity is made using a self-aligned process which requires the use of only a single resist mask. A plurality of sensor layers is deposited over a substrate. After forming a resist mask in the centr... | 03/07/2006 |
| 6979389 | Micro-actuation apparatus for head ABS planarity (PTR) control during slider machining An apparatus and method of machining sliders to obtain the optimum PTR for each slider. An array of MEMS devices configured for angular actuation are provided, and a slider is placed in each MEMS device of the array. The ion milling of the sliders is controlled indi... | 12/27/2005 |
| 6969619 | Full spectrum endpoint detection A method of endpoint detection during plasma processing of a semiconductor wafer comprises processing a semiconductor wafer using a plasma, detecting radiation emission from the plasma during the semiconductor processing, and tracking data points representing change... | 11/29/2005 |
| 6958248 | Method and apparatus for the improvement of material/voltage contrast A method and system for registering a CAD layout to a Focused Ion Beam image for through-the substrate probing, without using an optical image and without requiring biasing, includes an improved method of trench endpointing during the FIB milling operation with a lo... | 10/25/2005 |
| 6952014 | End-point detection for FIB circuit modification A Focused Ion Beam (FIB) milling end-point detection system uses a constant current power supply to energize an Integrated Circuit (IC) that is to be modified. The FIB is cycled over a conductive trace that is to be accessed during the milling process. The input pow... | 10/04/2005 |
| 6933460 | Method and device for plasma treatment of moving metal substrates The invention relates to a method of treatment, in particular cleaning and/or heating, for a metal substrate (1) fed in a substantially continuous manner through a vacuum chamber (3), having a treatment zone in which an electric discharge (10), ... | 08/23/2005 |
| 6933081 | Method for quartz bump defect repair with less substrate damage A method for minimizing damage to a substrate while repairing a defect in a phase shifting mask for an integrated circuit comprising locating a bump defect in a phase shifting mask, depositing a first layer of protective coating to an upper surface of the bump defec... | 08/23/2005 |
| 6919168 | Masking methods and etching sequences for patterning electrodes of high density RAM capacitors A method of etching a noble metal electrode layer disposed on a substrate to produce a semiconductor device including a plurality of electrodes separated by a distance equal to or less than about 0.35 μm and having a noble metal profile equal to or greater than abo... | 07/19/2005 |
| 6907841 | Apparatus and method for synthesizing spherical diamond powder by using chemical vapor deposition method Disclosed are an apparatus and a method to synthesize powders typed diamond with the size between several tens nm to several μm in diameter using conventional CVD processes for deposition of diamond films. Gas phase nucleation has been induced on the boundary of pl... | 06/21/2005 |
