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| Number | Title | Issue Date |
| 8092657 | Module for coating both sides of a substrate in a single pass A module to carry targets in a sputter deposition installation for coating two-sided substrates is described. The module is mountable to the installation through an interface flange that carries at least two targets with their associated magnet systems. When the mod... | 01/10/2012 |
| 8088259 | Display device and sputtering target for producing the same A display device in which an Al alloy film and a conductive oxide film are directly connected without interposition of refractory metal and some or all of Al alloy components deposit or are concentrated at the interface of contact between the Al alloy film and the c... | 01/03/2012 |
| 8016982 | Sputtering apparatus and sputtering method The present invention is to provide a sputtering apparatus and a sputtering method, specifically, a magnetron sputtering apparatus having a magnetron electrode capable of generating plasma in a wide region near the surface of a target, and a sputtering method using ... | 09/13/2011 |
| 7998318 | Crosslinkable fill compositions for uniformly protecting via and contact holes A via and contact hole fill composition and method for using the composition in the dual damascene production of circuits is provided. Broadly, the fill compositions include a quantity of solid components including a polymer binder and a solvent system for the solid... | 08/16/2011 |
| 7988832 | Work piece with a hard film of AlCr-containing material, and process for its production A work piece or structural component is coated with a system of film layers at least one of which is composed of (AlyCr1-y)X, where X=N, C, B, CN, BN, CBN, NO, CO, BO, CNO, BNO or CBNO and 0.2≦y | 08/02/2011 |
| 7875154 | Preparation method of palladium alloy composite membrane for hydrogen separation Disclosed herein is a method of preparing a palladium alloy composite membrane for hydrogen separation, including (a) providing a first metal coating layer on a porous support using a dry sputtering deposition process; (b) providing a palladium coating layer on the ... | 01/25/2011 |
| 7850827 | Double-layer shutter control method of multi-sputtering system A double-layer shutter control method of a multi-sputtering system provided with three targets in a single chamber and a double-layer rotating shutter mechanism having shutter plates which independently rotate and have holes formed therein, comprising selecting a ta... | 12/14/2010 |
| 7695596 | Device for fixing substrate for thin film sputter and method of fixing substrate using the same A device to fix a substrate for a thin film sputter, includes a mask, a mask pressing plate, a magnetic body, and a driving unit. The mask having patterns is positioned under the substrate so as to form the patterns on the substrate. The mask pressing plate is posit... | 04/13/2010 |
| 7691240 | Target assemblies, targets, backing plates, and methods of target cooling The invention includes backing plates having coolant deflectors with at least a portion of each of the deflectors being nonlinear. Projections projecting from the backing plate are configured to insert into openings within a sputtering target. The invention includes... | 04/06/2010 |
| 7641773 | Process for producing layers and layer systems, and coated substrate A method of producing substrates with functional layers which have high optical properties and/or a high surface smoothness, in particular a low turbidity and significantly lower roughness, is provided. The method includes a sputtering process for coating a substrat... | 01/05/2010 |
| 7544273 | Deposition methods and stacked film formed thereby A method of making a film having a uniform thickness and having a crystal axis parallel to a main surface of a substrate is described. In a deposition method, a film is formed by scattering a deposition material from a target (12) surface and growing the scat... | 06/09/2009 |
| 7531068 | Method for manufacturing silicon nanodot film for light emission in nano-size photonic devices A method for manufacturing a silicon nanodot thin film having uniform doping concentration without damage by placing a substrate on a stage within a chamber. The method further including depositing a matrix thin film based on the silicon by PECVD, while doping a lig... | 05/12/2009 |
| 7438948 | Method for coating a substrate with an undercoating and a functional coating A method for forming a coated substrate is disclosed. The method comprises depositing an undercoating layer and depositing a functional coating comprising a material which can be present in more than one crystal structure over the undercoating layer, wherein there i... | 10/21/2008 |
| 7435300 | Dynamic film thickness control system/method and its utilization A dynamic film thickness control system/method and its utilization consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is utilized for real-time control over deposited film thickness and graduall... | 10/14/2008 |
| 7431807 | Evaporation method using infrared guiding heater A method for evaporating a solid organic material by sublimation using an infrared guiding heater which minimizes temperature gradients in the bulk of the organic target. The bulk is heated to a temperature below the sublimation temperature of the target. A localize... | 10/07/2008 |
| 7431811 | Ruthenium oxide electrodes and fabrication method thereof A ruthenium oxide electrode. The ruthenium oxide electrode includes a substrate, a ruthenium oxide film formed thereon, and a conductive wire connecting to the ruthenium oxide film. The invention also provides a method of fabricating the ruthenium oxide electrode. | 10/07/2008 |
| 7429543 | Method for the production of a substrate Method for producing a substrate includes establishing a plasma discharge with a locally inhomogeneous density distribution and exposing the substrate to the inhomogeneously density-distributed plasma discharge. The distribution is established by establishing a spec... | 09/30/2008 |
| 7422655 | Apparatus for performing semiconductor processing on target substrate An apparatus for performing a semiconductor process on a target substrate (W) includes a lifting mechanism (48) disposed in a worktable (38) to assist transfer of the target substrate. The lifting mechanism includes a lifter pin (51) configured ... | 09/09/2008 |
| 7416702 | Hydrogen sensor and process for production thereof According to the present invention there is disclosed a hydrogen sensor comprising a substrate, a rare earth metal film formed on the substrate, and a protective film formed on the rare earth metal... | 08/26/2008 |
| 7404879 | Ionized physical vapor deposition apparatus using helical self-resonant coil Provided is an ionized physical vapor deposition (IPVD) apparatus having a helical self-resonant coil. The IPVD apparatus comprises a process chamber having a substrate holder that supports a substrate to be processed, a deposition material source that supplies a ma... | 07/29/2008 |
| 7398592 | Manufacturable CMP assisted liftoff process to fabricate write pole for perpendicular recording heads This invention describes a manufacturable method, including a CMP liftoff process, for removing masking materials after ion milling for fabricating the write pole of a magnetic head. Significant parameters for the CMP assisted liftoff process include the thickness o... | 07/15/2008 |
| 7387816 | Scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s), and method of making article using combustion CVD A method of making a scratch resistant coated article is provided, the coated article also being resistant to attacks by at least some fluoride-based etchant(s) for at least a period of time. In certain example embodiments, the method includes using flame pyrolysis ... | 06/17/2008 |
| 7381397 | Using condensed chemicals to precondition lithium niobate and lithium tantalate crystals Methods and apparatus for preconditioning a lithium niobate or lithium tantalate crystal. At least a portion of a surface of the crystal is covered with a condensed material including one or more active chemicals. The crystal is heated in a non-oxidizing environment... | 06/03/2008 |
| 7374648 | Single piece coil support assemblies, coil constructions and methods of assembling coil constructions The invention includes a coil support assembly having an insulator interfacing a surface of a shield disposed within a processing chamber. The insulator has an extension which extends through the shield. A second insulator is disposed between the shield and a coil a... | 05/20/2008 |
| 7370416 | Method of manufacturing an injector plate A method of manufacturing an injector plate is provided where a wafer is provided and a release layer is disposed on the wafer. Then a photo resist is formed over the release layer. After photolithography processing, a plurality of plugs are formed from the photo re... | 05/13/2008 |
| 7361404 | Coated article with removable protective coating and related methods A coated article is disclosed. The coated article of the invention includes a substrate having a surface and a removable protective coating comprising up to 100 weight percent of a carbon-containing material deposited over at least a portion of the substrate, where ... | 04/22/2008 |
| 7358484 | Hyperthermal neutral beam source and method of operating Method and system for pumping a hyperthermal neutral beam source is described. The pumping system enables use of the hyperthermal neutral beam source for semiconductor processing applications, such as etching processes. An embodiment is described having a neutral be... | 04/15/2008 |
| 7358658 | Amorphous diamond materials and associated methods for the use and manufacture thereof An electroluminescence device having improved luminescence per volt input is provided. The device can include a first electrode, a second electrode, a diamond-like carbon layer electrically coupled to at least one of the first electrode or the second electrode, and ... | 04/15/2008 |
| 7357975 | Carbon-containing hard coating and a method for depositing a hard coating onto a substrate The carbon-containing hard coating (1) according to the invention comprises nano-crystalline grains being separated from each other by grain boundaries, wherein said hard coating comprises aluminum (Al), at least one additional metal (Me1, Me2), carbon (C) and at le... | 04/15/2008 |
| 7355192 | Adjustable suspension assembly for a collimating lattice According to one aspect of the invention a plasma-based substrate processing apparatus comprises a collimator holding device, which efficiently and accurately positions a collimator over a substrate to enable the plasma-based substrate processing apparatus to select... | 04/08/2008 |
| 7354555 | Gas flow control system with interlock A system for controlling the flow of gases into a reaction chamber used in processing semiconductor devices includes a safety interlock feature that prevents inadvertent mixing of incompatible, reactive gases. The interlock feature is implemented in an interlock con... | 04/08/2008 |
| 7354617 | Fixing belt and method for evaluating it A method for evaluating a fixing belt includes forming a fixing belt which includes a substrate, an elastic layer laminated on the substrate, and a mold releasing layer laminated on the elastic layer. A universal hardness test for the fixing belt is performed. The f... | 04/08/2008 |
| 7351596 | Method and system for operating a physical vapor deposition process A method for fabricating semiconductor wafers using physical vapor deposition. The method includes maintaining a substrate on a susceptor in a chamber. The substrate has a face positioned within a vicinity of a target material, which is within the chamber. The targe... | 04/01/2008 |
| 7351962 | Electrode for mass spectrometry An electrode for use in a reduced pressure region in a mass spectrometer whereby the electrode is subject to deposition of dielectric (non-conducting) substances thereon, which can cause unstable performance of the mass spectrometer. The surface portion of the elect... | 04/01/2008 |
| 7351986 | Method and apparatus for reducing cross contamination of species during ion implantation A wafer support for an ion implanter includes a wafer holder and a support arm for the holder in the implant chamber. A portion of the support arm adjacent the wafer holder is at least intermittently exposed to the ion beam during implantation, as a result of the re... | 04/01/2008 |
| 7344760 | Wear-resistant electrically conductive body A method for making a wear-resistant electrically conductive body having an electrically conductive diamond-like carbon coating, by ion-accelerating copper ions from a copper ion source onto a negatively charged electrically conductive body, and simultaneously ion-a... | 03/18/2008 |
| 7341644 | Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor There is not known a conventional method for predicting the consumed degree of consumable supplies and the thickness of deposited films without opening a processing chamber. A method for predicting the consumed degree of a consumable supply and the thickness ... | 03/11/2008 |
| 7338581 | Sputtering apparatus A sputtering apparatus includes paired targets 31 disposed in a vacuum chamber 30, substrate holder 33 disposed at a position nearly perpendicular to the paired target 31 and apart from a space formed by the paired targets 31, a pl... | 03/04/2008 |
| 7335421 | Heatable windshield A heatable transparency includes a first ply having a No. 1 surface and a No. 2 surface and a second ply having a No. 3 surface and a No. 4 surface. The No. 2 surface faces the No. 3 surface. An electrically conductive coati... | 02/26/2008 |
| 7335426 | High strength vacuum deposited nitinol alloy films and method of making same A vacuum deposition method for fabricating high-strength nitinol films by sputter depositing nickel and titanium from a heated sputtering target, and controlling the sputter deposition process parameters in order to create high-strength nitinol films that exhibit sh... | 02/26/2008 |
