Celebrity Inventors
Glam girl Heddy Lamar may have used her good looks to good effect on the silver screen, but she put her smarts to better use as an inventor. During World War II, she co-patented a frequency-switching system for torpedo guidance that was considered years ahead of its time.
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| Number | Title | Issue Date |
| 8123901 | Etching apparatus The wafer processing apparatus 100 included in an etching apparatus selectively etches the peripheral portion of a wafer 200. The wafer processing apparatus 100 includes a lower electrode 112 as a stage on which the wafer 200 is pl... | 02/28/2012 |
| 8092637 | Manufacturing method in plasma processing apparatus A manufacturing method includes steps of: placing a film composed of dielectric, on the top surface of a sample stage, forming a film-like heater on the film made of the dielectric, supplying power to the heater to detect a temperature distribution, adjusting a resi... | 01/10/2012 |
| 8088247 | Plasma processing apparatus A plasma processing apparatus is provided using a method of measuring the thickness of a processed material, by which the actual remaining thickness or etching depth of a processed layer can be correctly measured online. The plasma processing apparatus includes a de... | 01/03/2012 |
| 8083888 | Plasma processing apparatus The invention provides a plasma processing apparatus for measuring the etching quantity of the material being processed and detecting the end point of etching using optical interference on the surface of a sample being processed, so as to simultaneously realize long... | 12/27/2011 |
| 8021513 | Substrate carrying apparatus and substrate carrying method A substrate processing apparatus, adapted to provide a process, such as etching, to a substrate, includes a processing vessel, an ambient atmospheric carrying chamber, a carrying member for carrying the substrate, and a functional module located on a carrying route ... | 09/20/2011 |
| 8012303 | Container cleanliness measurement apparatus and method, and substrate processing system A container cleanliness measurement apparatus capable of preventing particles from being adhered to substrates, while improving the operation efficiency of a container for housing substrates. An FOUP inspection apparatus includes a particle-separation promoting nozz... | 09/06/2011 |
| 7972468 | Semiconductor device fabricating system A semiconductor device fabricating system 1 includes a casing 10, processing units 12, 13 and 14, for carrying out semiconductor device fabricating processes, disposed inside the casing, and platforms 15, 16 and 17 se... | 07/05/2011 |
| 7931776 | Plasma processing apparatus A plasma processing apparatus including a chamber having an inner wall with a protective film thereon and a sample stage disposed in the chamber in which plasma is generated by supplying high-frequency wave energy to processing gas to conduct plasma processing for a... | 04/26/2011 |
| 7794563 | Etching depth measuring device, etching apparatus, and etching depth measuring method An etching depth measuring device for measuring the etching depth of an object to be processed, when etching the object to be processed by using active species present in a plasma, the etching depth measuring device comprising: a chamber in which is formed an introd... | 09/14/2010 |
| 7771561 | Apparatus and method for surface treatment to substrate An apparatus and a method for surface treatment of substrates whereby the quality of substrates can be maintained by preventing excessive plasma treatment of substrates. In carrying out the plasma treatment on a surface of the substrate in a reaction chamber, there ... | 08/10/2010 |
| 7691226 | Electron temperature measurement method, electron temperature measurement program for implementing the method, and storage medium storing the electron temperature measurement program An electron temperature measurement method that enables an electron temperature as a plasma parameter to be measured precisely. A plasma is produced in a chamber 11 such that a wafer W is subjected to reactive ion etching therein. An ion energy distrib... | 04/06/2010 |
| 7686917 | Plasma processing system and apparatus and a sample processing method A plasma processing apparatus includes a vacuum vessel with a sample stage having a mounting surface disposed in a process chamber, and a plate having substantially uniform thickness and electric power applied thereto constituting a ceiling of the chamber. The plate... | 03/30/2010 |
| 7658815 | Plasma processing apparatus capable of controlling plasma emission intensity An antenna electrode having a substantially circular shape, is arranged on a plane of a processing vessel, which is located opposite to a stage for mounting a sample within the processing vessel, and positioned parallel to the stage. An emission monitor monitors emi... | 02/09/2010 |
| 7655110 | Plasma processing apparatus In the present invention, a probe which detects a time varying magnetic flux density in a direction around a center axis of a processing space is provided in a process vessel of a plasma processing apparatus. The probe detects an induced electromotive force generate... | 02/02/2010 |
| 7632377 | Dry etching apparatus capable of monitoring motion of WAP ring thereof An optical monitoring system includes a ring-shaped object suspended by and engaged with a plurality of vertical plunger shafts. Normally, the vertical plunger shafts move upward and downward reciprocally and coherently, but independently, such that the ring-shaped ... | 12/15/2009 |
| 7601240 | Disturbance-free, recipe-controlled plasma processing system and method A plasma processing system includes a first unit for plasma-processing a sample based on a recipe for plasma processing, and a second unit for modifying the recipe in accordance with a monitored value obtained during the plasma processing of the sample in the first ... | 10/13/2009 |
| 7591923 | Apparatus and method for use of optical system with a plasma processing system A plasma processing system and method for operating an optical system in conjunction with a plasma processing system are provided. The plasma processing system includes an optical system in communication with a plasma processing chamber of the plasma processing syst... | 09/22/2009 |
| 7582182 | Method and apparatus for measuring electron density of plasma and plasma processing apparatus An apparatus for measuring plasma electron density precisely measures electron density in plasma even under a low electron density condition or high pressure condition. This plasma electron density measuring apparatus includes a vector network analyzer in a measurin... | 09/01/2009 |
| 7544269 | Method and apparatus for electron density measurement A plasma processing system including a plasma chamber (120) having a substrate holder (128) and a monitoring system (130). The monitoring system (130) includes a microwave mirror (140) having a concave surface (142) located ... | 06/09/2009 |
| 7537671 | Self-calibrating optical emission spectroscopy for plasma monitoring A plasma processing system and plasma monitor therefor is provided in which a plasma monitor housing is coupled to a plasma processing chamber such that a line-of-sight monitoring path extends through the housing to an optical sensor outside of a window. A separate ... | 05/26/2009 |
| 7507313 | Film removal method and apparatus A film removal method and apparatus for removing a film from a substrate are disclosed. The method comprises the steps of disposing a plasma generator and a sucking apparatus over the substrate, projecting a plasma beam from the plasma generator onto the film obliqu... | 03/24/2009 |
| 7479207 | Adjustable height PIF probe A plasma probe assembly for use in a plasma processing chamber is provided. A semiconductor probe element with a probe surface at a first end of the semiconductor probe element is provided. An electrical connector is electrically connected to the semiconductor probe... | 01/20/2009 |
| 7473332 | Method for processing semiconductor A method of processing a semiconductor which includes providing a process gas supply unit for supplying a process gas to a sample stand to hold a sample in a process chamber and to the process chamber, successively supplying a plurality of samples of a lot to the pr... | 01/06/2009 |
| 7455747 | Substrate processing apparatus, control method for the apparatus, and program for implementing the method A substrate processing apparatus, according to which inspection of various devices in the substrate processing apparatus can be carried out with improved reliability, while reducing the burden on a user. A processing chamber processes semiconductor wafers therein. A... | 11/25/2008 |
| 7445689 | Substrate processing method and substrate processing system The substrate processing system has an ozone generator that generates and supplies an ozone-containing gas to plural or N (N is a natural number not less than 2) ozone process units. The ozone generator has capacity of supplying the first processing fluid to only Nā... | 11/04/2008 |
| 7440859 | Method for determining plasma characteristics Methods for determining characteristics of a plasma are provided. In one embodiment, a method for determining characteristics of a plasma includes obtaining metrics of a plasma at two different frequencies, and determining at least one characteristic of the plasma u... | 10/21/2008 |
| 7431795 | Cluster tool and method for process integration in manufacture of a gate structure of a field effect transistor A method and apparatus for process integration in manufacture of a gate structure of a field effect transistor are disclosed. The method includes assembling an integrated substrate processing system having a metrology module and a vacuumed processing platform to per... | 10/07/2008 |
| 7416633 | Plasma processing apparatus Described is a vacuum processing apparatus that includes a vacuum container which has a processing chamber inside thereof, wherein a plasma used for processing a sample is formed inside the processing chamber. The processing chamber has an upper side wall which surr... | 08/26/2008 |
| 7361600 | Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus According to the present invention, a chemical and mechanical polishing apparatus (100) for a sample such as a wafer includes a built-in inspection apparatus (25) incorporated therein. The polishing apparatus (100) further comprises a load unit ... | 04/22/2008 |
| 7354524 | Method and system for processing multi-layer films A method of processing multi-layer films, the method including: (1) processing a plurality of layers according to selected parameters, (2) determining a plurality of optical characteristics each associated with one of the plurality of layers and determined during th... | 04/08/2008 |
| 7351292 | Assembly for processing substrates An assembly for processing substrates, which processing comprises a vacuum deposition process, such as, for instance, sputtering, CVD or PECVD, which vacuum deposition process is carried out in at least one process chamber, the assembly being provided with a conveyi... | 04/01/2008 |
| 7350476 | Method and apparatus to determine consumable part condition A system for monitoring a condition of a consumable component in a substrate processing system that includes a tapered plug having a first axis, a second axis that intersects the first axis, a top portion with first width, a bottom portion with a second width, and s... | 04/01/2008 |
| 7347656 | Vacuum processing apparatus and semiconductor manufacturing line using the same A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plural... | 03/25/2008 |
| 7341644 | Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor There is not known a conventional method for predicting the consumed degree of consumable supplies and the thickness of deposited films without opening a processing chamber. A method for predicting the consumed degree of a consumable supply and the thickness ... | 03/11/2008 |
| 7338581 | Sputtering apparatus A sputtering apparatus includes paired targets 31 disposed in a vacuum chamber 30, substrate holder 33 disposed at a position nearly perpendicular to the paired target 31 and apart from a space formed by the paired targets 31, a pl... | 03/04/2008 |
| 7334477 | Apparatus and methods for the detection of an arc in a plasma processing system In a plasma processing system, a method for detecting an arc event on a substrate in a plasma chamber having a chuck is disclosed. The method includes positioning a substrate on the chuck. The method also includes providing a vibration-sensing arrangement in the pla... | 02/26/2008 |
| 7331751 | Vacuum processing method A vacuum processing method includes an atmospheric transfer step of transferring a wafer in atmospheric air to a vacuum transfer chamber using atmospheric transfer equipment disposed in atmospheric air, a vacuum transfer step of transferring the wafer received from ... | 02/19/2008 |
| 7329549 | Monitoring method of processing state and processing unit The present invention is a monitoring method of monitoring a change of a processing state of an object to be processed when a predetermined process is conducted to the object to be processed by using a processing unit. The method includes: a step of respectively set... | 02/12/2008 |
| 7328126 | Method and system of diagnosing a processing system using adaptive multivariate analysis A method and system of monitoring a processing system and for processing a substrate during the course of semiconductor manufacturing. As such, data is acquired from the processing system for a plurality of observations, the data including a plurality of data parame... | 02/05/2008 |
| 7319316 | Apparatus for measuring a set of electrical characteristics in a plasma A probe apparatus configured to measure a set of electrical characteristics in a plasma processing chamber, the plasma processing chamber including a set of plasma chamber surfaces configured to be exposed to a plasma is disclosed. The probe apparatus includes a col... | 01/15/2008 |
