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Pillow with retractable umbrella
A pillow assembly having a supporting assembly and a retractable umbrella assembly that is easily transportable and allows a user to support his/her head while covering their face from sunlight.
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| Number | Title | Issue Date |
| 8123900 | Substrate supporting unit and apparatus for treating substrate using the substrate supporting unit Provided are a substrate supporting unit and a substrate treating apparatus using the substrate supporting unit. The substrate supporting unit comprises a base plate and a supporting portion formed on the base plate. The supporting portion comprises two supporting r... | 02/28/2012 |
| 8029641 | Device and method for liquid treatment of wafer-shaped articles Method and device for wet treating a defined peripheral edge-region of a wafer-shaped article having a first surface plane W1, a second surface plane W2 and an edge surface. The device includes a support for holding the wafer-shaped article; liquid dis... | 10/04/2011 |
| 7807018 | Etching apparatus for use in manufacture of flat panel display device and manufacturing method using the same Disclosed herein are an apparatus and method for manufacturing a flat panel display device. The apparatus and method for manufacturing a flat panel display device contribute to a compact apparatus for etching a substrate and damage or breakage prevention of the subs... | 10/05/2010 |
| 7758717 | Wafer treating apparatus On a hot plate, jigs and wafers are joined by bonding wax. A first transport mechanism, a posture change mechanism, a pusher and a second transport mechanism transport the jigs joined with the wafers from the hot plate to a treating transport mechanism. The treating... | 07/20/2010 |
| 7736461 | Cassette for preventing breakage of glass substrate A cassette capable of preventing breakage in glass substrates includes lower and upper frames; side frames between the lower and upper frames for connecting the lower and upper frames to each other, the side frames having a plurality of insertion recesses for receiv... | 06/15/2010 |
| 7566378 | Arrangement of electronic semiconductor components on a carrier system for treating said semiconductor components with a liquid medium The invention relates to an arrangement of electronic semiconductor components on a carrier system for treating the semiconductor components with a liquid medium. A semiconductor component is detachably mounted on the carrier system with the active side thereof in s... | 07/28/2009 |
| 7370659 | Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines Stepper and/or scanner machines including cleaning devices and methods for cleaning stepper and/or scanner machines are disclosed herein. In one embodiment, a stepper and/or scanner machine includes a housing, an illuminator, a lens, a workpiece support, a cleaning ... | 05/13/2008 |
| 7364626 | Substrate processing apparatus and substrate processing method Substrate cleaning apparatus and method capable of preventing adhesion of particles to a substrate irrespective of being hydrophilic or hydrophobic are provided. Although a cleaning liquid ejected from a two-fluid nozzle 36 rebounds from a cup CP and scatters... | 04/29/2008 |
| 7337792 | Liquid processing apparatus and liquid processing method A cleaning apparatus 1 includes a foup loading/unloading part 2 for mounting foups F each accommodating a plurality of wafers W at intervals of a constant pitch (normal pitch), a rotor 34 capable of holding the wafers W at half the normal pitch ... | 03/04/2008 |
| 7332056 | Thin film removing device and thin film removing method A thin film removing device and a thin film removing method are capable of removing straight parts of a thin film formed on a square substrate from corners of the substrate, and of suppressing the formation of mists. An approach stage 20 having flat stage pla... | 02/19/2008 |
| 7329616 | Substrate processing apparatus and substrate processing method A substrate processing apparatus and a substrate processing method are provided wherein an oxide film which is thinner than the conventional films can be formed with uniform thickness when forming an oxide film on the front-side surface of a substrate. A subs... | 02/12/2008 |
| 7326437 | Method and system for coating polymer solution on a substrate in a solvent saturated chamber A method and apparatus of coating a polymer solution on a substrate such as a semiconductor wafer. The apparatus includes a coating chamber having a rotatable chuck to support a substrate to be coated with a polymer solution. A dispenser to dispense the polymer solu... | 02/05/2008 |
| 7270136 | Apparatus for cleaning the edges of wafers The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning, thus resulting in increase of the yield rate of wafers. The apparatus... | 09/18/2007 |
| 7267132 | Methods for removing silicon and silicon-nitride contamination layers from deposition tubes Described are methods, systems, and chemistries for removing layers of stubborn silicon and silicon-nitride contamination layers from the inside surfaces of such articles as deposition tubes. In such embodiments, a tube to be cleaned is gently rolled on it side whil... | 09/11/2007 |
| 7255114 | Ion sampling system for wafer An ion sampling method for wafer provides a wafer in a sampling chamber, wherein the wafer surface that is going to be sampled faces upward; spraying an extraction liquid continuously on the wafer surface to form a liquid film thereon; keeping the thickness of the f... | 08/14/2007 |
| 7254900 | Wafer edge wheel with drying function An edge wheel for supporting and rotating a disk-shaped substrate includes a wheel body having a peripheral groove configured to support an edge of a substrate and at least one radial channel extending into said wheel body from said peripheral groove. An edge wheel ... | 08/14/2007 |
| 7253117 | Methods for use of pulsed voltage in a plasma reactor A method and apparatus for providing a positive voltage spike to a semiconductor substrate pedestal during a portion of a high voltage power bias oscillation cycle to reduce or eliminate the detrimental effects of feature charging during the operation of a plasma re... | 08/07/2007 |
| 7252719 | High pressure processing method A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; ... | 08/07/2007 |
| 7250084 | Downward mechanism for support pins A downward mechanism for support pins is applicable to a reactor of removable type. Support pins are located on the base of the reactor, and each support pin has a base thereunder. The downward mechanism has an elevator mechanism and a board fixed thereto. The board... | 07/31/2007 |
| 7223308 | Apparatus to improve wafer temperature uniformity for face-up wet processing A method and apparatus for controlling a substrate temperature during an electroless deposition process. The apparatus includes a deposition cell configured to support a substrate at a position above a fluid distribution member. A heated fluid is dispensed from the ... | 05/29/2007 |
| 7208069 | Device for etching semiconductors with a large surface area The device etches semiconductors with a large surface area in a trough-shaped receptacle containing a liquid electrolyte. A sample head is mounted inside the etching trough, and is provided with a device for holding at least one semiconductor wafer. The device is ti... | 04/24/2007 |
| 7198677 | Low temperature wafer backside cleaning A ring is provided that, together with a wafer, separates a processing chamber into an upper portion and a lower portion so that one side of the wafer, such as the backside, can be cleaned or otherwise processed with little or no interaction to the frontside of the ... | 04/03/2007 |
| 7192488 | Methods and systems for processing a bevel edge of a substrate using a dynamic liquid meniscus A system and method for processing an edge of a substrate includes an edge roller and a first proximity head. The first proximity head being mounted on the edge roller. The first proximity head capable of forming a meniscus and including a concave portion and multip... | 03/20/2007 |
| 7189305 | Gas-assist systems for applying and moving ozonated resist stripper to resist-bearing surfaces of substrates A method for moving resist stripper across the surface of a semiconductor substrate that includes applying a wet chemical resist stripper, such as an organic or oxidizing wet chemical resist stripper, to at least a portion of a photomask positioned over the semicond... | 03/13/2007 |
| 7176403 | Method and apparatus for the compensation of edge ring wear in a plasma processing chamber A method for processing a plurality of substrates in a plasma processing chamber of a plasma processing system, each of the substrate being disposed on a chuck and surrounded by an edge ring during the processing. The method includes processing a first substrate of ... | 02/13/2007 |
| 7172674 | Device for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, in which a mask is kept at a defined short distance to the wafer-shaped article such that liquid can be retained between the mask and the defined area of the wafer-shap... | 02/06/2007 |
| 7166183 | Apparatus and method for treating edge of substrate An apparatus for treating an edge of a semiconductor substrate includes an etchant supply nozzle for supplying a first etchant to the edge of the semiconductor substrate. The apparatus further includes a shielding cover for preventing an etchant from flowing to a sh... | 01/23/2007 |
| 7160392 | Method for dechucking a substrate A substrate support assembly and method for dechucking a substrate is provided. In one embodiment, a support assembly includes a substrate support having a support surface, a first set of lift pins and one or more other lift pins movably disposed through the substra... | 01/09/2007 |
| 7160416 | Substrate treating apparatus A substrate treating apparatus for treating substrates as immersed in a treating solution includes a treating tank for storing the treating solution and accommodating the substrates, a holding mechanism for holding a plurality of substrates in upstanding posture in ... | 01/09/2007 |
| 7153388 | Chamber for high-pressure wafer processing and method for making the same Broadly speaking, a wafer processing chamber for performing a high pressure wafer process is provided. More specifically, the wafer processing chamber incorporates a wafer processing volume and an outer chamber volume. The wafer processing volume is configured to co... | 12/26/2006 |
| 7138014 | Electroless deposition apparatus An apparatus and a method of depositing a catalytic layer comprising at least one metal selected from the group consisting of noble metals, semi-noble metals, alloys thereof, and combinations thereof in sub-micron features formed on a substrate. Examples of noble me... | 11/21/2006 |
| 7138067 | Methods and apparatus for tuning a set of plasma processing steps In a plasma processing system, a method of tuning of a set of plasma processing steps is disclosed. The method includes striking a first plasma comprising neutrals and ions in a plasma reactor of the plasma processing system. The method also includes etching in a fi... | 11/21/2006 |
| 7128279 | Method and apparatus for fluid delivery to a backside of a substrate A fluid delivery device for delivering fluid to the backside of a substrate while minimizing waste is provided. The device includes an inner cylindrical tube having a top opening and a bottom opening. An upper cap overlying a top portion of the inner cylindrical tub... | 10/31/2006 |
| 7122084 | Device for liquid treatment of disk-shaped objects A device is suggested which includes a carrier (1) for receiving the disk-shaped object (10), a liquid supply device (17) for applying liquid onto a disk-shaped object (10) located on the carrier (1), and a liquid catch ring (2 | 10/17/2006 |
| 7105074 | Substrate treating method and apparatus A substrate treating apparatus is provided for eliminating wasteful consumption of a treating solution in a treating mode in which the treating solution is delivered in a strip form to a substrate from a treating solution delivery nozzle sweeping over the substrate.... | 09/12/2006 |
| 7105100 | System and method for gas distribution in a dry etch process A system and method for distributing gas to a substrate in a dry etch chamber make use of different flow channels to distribute the gas to different portions of a substrate. A first flow channel can be oriented to distribute gas to an inner portion of the substrate.... | 09/12/2006 |
| 7089687 | Wafer edge wheel with drying function An edge wheel for supporting and rotating a disk-shaped substrate includes a wheel body having a peripheral groove configured to support an edge of a substrate and at least one radial channel extending into said wheel body from said peripheral groove. An edge wheel ... | 08/15/2006 |
| 7087122 | Wafer backside plate for use in a spin, rinse, and dry module and methods for making and implementing the same A method for spinning a wafer to enable rinsing and drying is provided. The method includes engaging the wafer at a wafer processing plane and spinning the wafer. The method further includes moving a wafer backside plate from a first position to a second position as... | 08/08/2006 |
| 7067033 | Chemical liquid processing apparatus for processing a substrate In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further, a negative pressure is generated in a space between a processing obje... | 06/27/2006 |
| 7052577 | Annular receptacle for a rotating carrier An annular receptacle is described, particularly for a rotating carrier for receiving a disk-shaped object such as a semiconductor. ... | 05/30/2006 |
