Bizarre Patents
Decorative Jeweled Wheel Cover
An improved wheel is provided wherein decorative items such as gem stones are embedded in either the wheel surface, a special mounting section attached to the wheel surface, or to a spoke strap that wraps around each spoke and positions embedded gem stones on the outside surface of the spoke.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8021512 | Method of preventing premature drying An apparatus, system and method for preventing premature drying of a surface of a substrate between fabrication operations includes receiving a substrate for cleaning, performing wet cleaning operations to the surface of the substrate to remove contaminants and fabr... | 09/20/2011 |
| 7857939 | Apparatus for treating wafers using supercritical fluid Provided are an apparatus and method for treating wafers using a supercritical fluid. The wafer treatment apparatus includes a plurality of chambers; a first supply supplying a first fluid in a supercritical state; a second supply supplying a mixture of the first fl... | 12/28/2010 |
| 7674350 | Feature dimension control in a manufacturing process A method for manufacturing a semiconductor device is disclosed including determining a dimension or other physical characteristic of a pattern in a layer of material that is disposed on a workpiece, and etching the layer of material using information that is related... | 03/09/2010 |
| 7427333 | Resist removing method and resist removing apparatus In an inventive resist removing method, sulfuric acid and hydrogen peroxide water are supplied to a surface of a substrate to remove a resist from the substrate surface. Thereafter, hydrogen peroxide water is supplied to the substrate surface to remove the sulfuric ... | 09/23/2008 |
| 7371306 | Integrated tool with interchangeable wet processing components for processing microfeature workpieces An integrated tool that enables wet chemical processing chambers, lift-rotate units and other hardware to be quickly interchanged without having to recalibrate the transport system or other components to the replacement items. These tools are expected to reduce the ... | 05/13/2008 |
| 7329115 | Patterning nanoline arrays with spatially varying pitch A nanoimprint mold is described, comprising a plurality of alternating layers of distinct materials differentially etched along an edge thereof, said layers having spatially varying thicknesses along said edge such that nanolines patterned with said nanoimprint mold... | 02/12/2008 |
| 7301190 | Structures and methods to enhance copper metallization Disclosed structures and methods inhibit atomic migration and related capacitive-resistive effects between a metallization layer and an insulator layer in a semiconductor structure. One exemplary structure includes an inhibiting layer between an insulator and a meta... | 11/27/2007 |
| 7285196 | Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals In recent years, copper wiring has emerged as a promising substitute for the aluminum wiring in integrated circuits, because copper offers lower electrical resistance and better reliability at smaller dimensions than aluminum. However, use of copper typically requir... | 10/23/2007 |
| 7262505 | Selective electroless-plated copper metallization Structures and methods are provided which include a selective electroless copper metallization. The present invention includes a novel methodology for forming copper vias on a substrate, including depositing a thin film seed layer of Palladium (Pd) or Copper (Cu) on... | 08/28/2007 |
| 7253521 | Methods for making integrated-circuit wiring from copper, silver, gold, and other metals Integrated circuits include networks of electrical components that are typically wired, or interconnected, together with aluminum wires. In recent years, researchers have begun using copper in combination with diffusion barriers, rather than aluminum, to form the wi... | 08/07/2007 |
| 7220665 | H plasma treatment Electronic devices are constructed by a method that includes forming a first conductive layer in an opening in a multilayer dielectric structure supported by a substrate, forming a core conductive layer on the first conductive layer, subjecting the core conductive l... | 05/22/2007 |
| 7198694 | Integrated tool with interchangeable wet processing components for processing microfeature workpieces and automated calibration systems An integrated tool and automatic calibration systems that enable wet chemical processing chambers, lift-rotate units and other hardware to be quickly interchanged without having to recalibrate the transport system or other components to the replacement items. These ... | 04/03/2007 |
| 7186301 | Device and method for cleaning photomask Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curi... | 03/06/2007 |
| 7166184 | Multi-stage type processing apparatus A multi-stage type processing apparatus which can be positioned in a limited space without having a complicated driving mechanism, includes processing units which are stacked in a multi-stage state in the vertical direction. Each processing unit has a cup surroundin... | 01/23/2007 |
| 7105100 | System and method for gas distribution in a dry etch process A system and method for distributing gas to a substrate in a dry etch chamber make use of different flow channels to distribute the gas to different portions of a substrate. A first flow channel can be oriented to distribute gas to an inner portion of the substrate.... | 09/12/2006 |
| 7067018 | Automated system for handling and processing wafers within a carrier A workpiece handling and processing system has a interface section for loading wafers from cassettes into carriers. The wafers are lifted out of cassettes by a buffer elevator and moved into a position over an open carrier by a buffer robot. A comb elevator lifts co... | 06/27/2006 |
| 7052575 | System and method for active control of etch process A system for regulating an etch process is provided. The system includes one or more light sources, each light source directing light to one or more features and/or gratings on a wafer. Light reflected from the features and/or gratings is collected by a measuring sy... | 05/30/2006 |
| 7037842 | Method and apparatus for dissolving a gas into a liquid for single wet wafer processing A method and apparatus for processing a wafer is described. According to the present invention a wafer is placed on a substrate support. A liquid is then fed through a conduit having an output opening over the wafer. A gas is dissolved in the liquid prior to the liq... | 05/02/2006 |
| 7018504 | Loadlock with integrated pre-clean chamber A wafer carrier adapted to hold a plurality of wafers and is positioned on an elevator plate in a load lock. The elevator plate is adapted to move between a first position with the carrier in a first chamber of the load lock and a second position with the carrier in... | 03/28/2006 |
| 6955764 | Method and apparatus for preparing slurry for CMP apparatus The method and apparatus are provided for preparing a slurry for a CMP apparatus with which mixing accuracy for a slurry is improved and accurate measurement is automatically accomplished for H2O2 as a small amount of additive. A slurry prepara... | 10/18/2005 |
| 6945259 | Substrate cleaning method and substrate cleaning apparatus A substrate cleaning apparatus is provided that includes a cleaning cup for receiving a to-be-cleaned substrate, a table in the cleaning cup, a first, second, and third nozzles, a pure water heating mechanism configured to supply hot pure water, a branch line, a con... | 09/20/2005 |
| 6921466 | Revolution member supporting apparatus and semiconductor substrate processing apparatus A revolution member supporting apparatus holds and rotates a disc-shaped object (object to be rotated) such as a semiconductor wafer. The revolution member supporting apparatus includes a rotatable member which rotates about an axis of roation, and a plurality of ho... | 07/26/2005 |
| 6841031 | Substrate processing apparatus equipping with high-pressure processing unit With respect to any one of processing units, a main transportation path, a developing unit, a dedicated transportation robot and a high-pressure processing unit are disposed linearly in this order in a direction. Hence, even if a processing fluid adhering to a subst... | 01/11/2005 |
| 6689691 | Method of simultaneously polishing a plurality of objects of a similar type, in particular silicon wafers, on a polishing installation The method allows simultaneous polishing of a plurality of objects of a similar type, preferably silicon wafers. The polishing process is interrupted briefly at least once. During the polishing pause, the carriers on which the objects to be polished have ... | 02/10/2004 |
| 6666948 | Silicon wafer polisher An method and apparatus for forming wafers of varying thickness'. The apparatus includes a template. The template is formed of a main disk including a plurality of cavities extending into a first side thereof and a backing plate positioned on a side of th... | 12/23/2003 |
| 6578588 | Unified strip/cleaning apparatus A unified strip/cleaning apparatus wherein a strip device is integrated with a cleaning device. In the apparatus, a strip line removes resin on a substrate and a cleaning line is provided under the strip line to clean and dry the substrate. A loader suppl... | 06/17/2003 |
| 6572730 | System and method for chemical mechanical planarization A semiconductor wafer processing system for polishing a substrate that generally includes a base having a first side and a second side, and at least one drive system that is disposed on the first side of the base. One or more polishing heads are coupled t... | 06/03/2003 |
| 6537416 | Wafer chuck for use in edge bevel removal of copper from silicon wafers A wafer chuck includes alignment members that allows a semiconductor wafer to be properly aligned on the chuck without using a separate alignment stage. The alignment members may be cams, for example, attached to arms of the wafer chuck. These members may... | 03/25/2003 |
| 6497785 | Wet chemical process tank with improved fluid circulation A wet chemical process tank, or a wet etch tank, that has improved fluid circulation and improved uniformity in the fluid concentration in the tank is disclosed. In a preferred embodiment, a tank body is provided which has a liquid dispenser positioned th... | 12/24/2002 |
| 6461437 | Apparatus used for fabricating liquid crystal device and method of fabricating the same An apparatus for manufacturing a liquid crystal display device that can prevent chemical contamination attributed to contacting an external atmosphere, and a method of manufacturing the liquid crystal display device. The apparatus includes a cleaning cham... | 10/08/2002 |
| 6391113 | Semiconductor wafer processing apparatus and method of controlling the same Semiconductor wafer counters are respectively provided at a loader portion, at a plurality of processing baths and at an unloader portion in a semiconductor wafer processing apparatus in which semiconductor wafers are processed in sequence using a plurali... | 05/21/2002 |
| 6309981 | Edge bevel removal of copper from silicon wafers Chemical etching methods and associated modules for performing the removal of metal from the edge bevel region of a semiconductor wafer are described. The methods and systems apply liquid etchant in a precise manner at the edge bevel region of the wafer u... | 10/30/2001 |
| 6270619 | Treatment device, laser annealing device, manufacturing apparatus, and manufacturing apparatus for flat display device A film forming device in a substrate manufacturing apparatus a stage section on which a cassette storing a plurality of glass substrates is mounted. A treatment section for subjecting the substrate to a predetermined treatment is arranged to oppose the st... | 08/07/2001 |
| 6254721 | Method and apparatus for processing samples Disclosed is apparatus for treating samples, and a method of using the apparatus. The apparatus includes processing apparatus (a) for treating the samples (e.g., plasma etching apparatus), (b) for removing residual corrosive compounds formed by the sample... | 07/03/2001 |
| 6225235 | Method and device for cleaning and etching individual wafers using wet chemistry The invention concerns a method for wet-chemical cleaning and etching of disc-shaped substrates in a closed processing chamber, wherein the substrate to be processed is received by a substrate support, the substrate is rotated and both sides of the substr... | 05/01/2001 |
| 6221204 | Stackable chamber apparatus A stackable processing chamber apparatus includes a processing chamber unit and a driving device for driving said transmitting shaft to rotate. The processing chamber unit includes a body defining a chamber. The processing chamber unit is provided with an... | 04/24/2001 |
| 6143126 | Process and manufacturing tool architecture for use in the manufacture of one or more metallization levels on an integrated circuit A manufacturing tool configuration for applying one or more levels of interconnect metallization to a generally planar dielectric surface of a workpiece with a minimal number of workpiece transfer operations between the tool sets is disclosed. The tool co... | 11/07/2000 |
| 6120641 | Process architecture and manufacturing tool sets employing hard mask patterning for use in the manufacture of one or more metallization levels on a workpiece A manufacturing tool configuration for applying one or more levels of interconnect metallization to a generally planar dielectric surface of a workpiece with a minimal number of workpiece transfer operations between the tool sets is disclosed. The tool co... | 09/19/2000 |
| 6071376 | Method and apparatus for cleaning photomask To provide a photomask cleaning method which brings about a high effect of removing residual sulfuric acid or foreign objects and can remove foreign objects effectively without fluctuating the transmission or other properties of the light-shielding layer ... | 06/06/2000 |
| 6036816 | Apparatus for processing a sample having a metal laminate Disclosed is apparatus for treating samples, and a method of using the apparatus. The apparatus includes processing apparatus (a) for treating the samples (e.g., plasma etching apparatus), (b) for removing residual corrosive compounds formed by the sample... | 03/14/2000 |
