Bizarre Patents
Mountable Printable Placard With Headband
A resilient headband in a shape for being mounted on the head of the user. The headband is equipped with a longitudinal slotted member for holding a placard.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8052833 | Chemical treatment apparatus A chemical treatment apparatus includes an outer bath; an inner bath, located inside the outer bath; a circulation system, connecting the outer bath to the inner bath; and a draining system, having a first draining pipe and a connecting pipe, wherein the connecting ... | 11/08/2011 |
| 8043468 | Apparatus for and method of processing substrate A substrate processing apparatus discharges a hydrofluoric acid solution from discharge nozzles toward grooves formed in side walls of an inner bath. The hydrofluoric acid solution discharged from the discharge nozzles impinges upon the grooves to diffuse, thereby m... | 10/25/2011 |
| 7591922 | Substrate processing apparatus and substrate processing method A substrate processing apparatus for supplying a treatment liquid onto the surface of a substrate to treat the same. This apparatus is provided with: a spin chuck for holding and rotating a substrate; a nozzle for supplying a treatment liquid to the substrate held b... | 09/22/2009 |
| 7582181 | Method and system for controlling a velocity field of a supercritical fluid in a processing system A method and system for controlling a velocity field in a processing system is described. In an exemplary embodiment described, the system includes a multi-outlet exhaust manifold having three or more outlets coupled to the processing system adjacent a surface of a ... | 09/01/2009 |
| 7479205 | Substrate processing apparatus The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, interm... | 01/20/2009 |
| 7387701 | Etchant fume exhaust apparatus An etchant fume exhaust apparatus is installed in a system performing an etching process during fabrication of LCDs. The etchant fume exhaust apparatus prevents the contamination and corrosion of the etching system by allowing both gaseous and liquid etchant to be d... | 06/17/2008 |
| 7377991 | Ultrasonic assisted etch using corrosive liquids An ultrasonic etching apparatus for chemically-etching a workpiece is disclosed. The apparatus includes an outer tank at least partially filled with an aqueous solution, an inner tank at least partially disposed within the outer tank and in contact with aqueous solu... | 05/27/2008 |
| 7332054 | Etch apparatus In a process using a hot phosphoric acid etchant (12) to etch silicon nitride on a semiconductor wafer (15) submerged in a tank (11) of the etchant (12), a recirculating path is established for the etchant (12). A porous filter ( | 02/19/2008 |
| 7267742 | Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device An etching apparatus includes a chamber containing an etching solution including first and second components and water, a concentration of the water in the etching solution is at a specified level or lower; a circulation path circulating the etching solution; a conc... | 09/11/2007 |
| 7169253 | Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing A method and system for cleaning and/or stripping photoresist from photomasks used in integrated circuit manufacturing comprising a process and means of introducing a mixture of sulfuric acid and ozone (or a mixture of sulfuric acid and hydrogen peroxide) to the sur... | 01/30/2007 |
| 7156948 | Wet etching apparatus A wet etching apparatus is disclosed. The apparatus comprises a first tank, containing a first wet etching solution; a filter, having a filter cartridge, connected to the first tank to filter out the impurities in the first solution; a second etching tank, connected... | 01/02/2007 |
| 7138014 | Electroless deposition apparatus An apparatus and a method of depositing a catalytic layer comprising at least one metal selected from the group consisting of noble metals, semi-noble metals, alloys thereof, and combinations thereof in sub-micron features formed on a substrate. Examples of noble me... | 11/21/2006 |
| 7001086 | Developing method, substrate treating method, and substrate treating apparatus A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissol... | 02/21/2006 |
| 6899111 | Configurable single substrate wet-dry integrated cluster cleaner The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes a chamber body having a processing cavity ... | 05/31/2005 |
| 6878303 | Substrate processing apparatus and substrate processing method A substrate processing apparatus for supplying a treatment liquid onto the surface of a substrate to treat the same. This apparatus is provided with: a spin chuck for holding and rotating a substrate; a nozzle for supplying a treatment liquid to the substrate held b... | 04/12/2005 |
| 6878232 | Method and apparatus for improving a temperature controlled solution delivery process A method and apparatus for improving an operating efficiency for a process including temperature dependent fluid delivery including determining a projected time period to start a process during a non-operating time period; delivering a process fluid for performing t... | 04/12/2005 |
| 6851435 | Method and apparatus for localized liquid treatment of the surface of a substrate A method and apparatus for dispensing a liquid on the surface of a localized zone of a substrate, for example for cleaning of etching purposes. Along with the liquid, a gaseous tensio-active substance is supplied, which is miscible with said liquid and when mixed wi... | 02/08/2005 |
| 6848457 | Liquid treatment equipment, liquid treatment method, semiconductor device manufacturing method, and semiconductor device manufacturing equipment Providing liquid treatment equipment capable of largely reducing a frequency of discarding a treatment solution as a whole and capable of implementing smooth and high quality liquid treatment with less manufacturing burden. Equipment comprises a treatment solution b... | 02/01/2005 |
| 6837943 | Method and apparatus for cleaning a semiconductor substrate A stripping solution is supplied onto the surface of a substrate and an alternating magnetic flux is applied to the substrate. The alternating magnetic flux induces a current in a conductive pattern of the substrate which heats the conductive pattern while the strip... | 01/04/2005 |
| 6814835 | Apparatus and method for supplying chemicals in chemical mechanical polishing systems An apparatus for supplying chemicals in a chemical mechanical polishing (CMP) process includes a plurality of chemical solution supply sources for supplying different chemical solutions in a pump-less manner by using a pressure applied at the chemical solution suppl... | 11/09/2004 |
| 6780277 | Etching method and etching apparatus An etching method and an etching apparatus are provided. Silicon (Si) from surfaces semiconductor wafers W dissolves into an etching liquid E stored in a process bath 10. On detection of the concentration of silicon by a concentration sensor 50, the et... | 08/24/2004 |
| 6758938 | Delivery of dissolved ozone An apparatus and method for delivering ozone to a workpiece. In one embodiment, fluid is sprayed onto a workpiece placed in an ozone-rich environment. Alternatively, ozone is mixed with the fluid prior to spraying the fluid onto the workpiece. When spraying the flui... | 07/06/2004 |
| 6744212 | Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power density conditions The present invention includes a system and method for confining plasma within a plasma processing chamber. The plasma processing apparatus comprises a first electrode, a power generator, a second electrode, at least one confinement ring, and a ground extension surr... | 06/01/2004 |
| 6733615 | Method and apparatus for fixed abrasive substrate preparation and use in a cluster CMP tool An apparatus enabling preparation and use of a fixed abrasive polishing member is described. The apparatus includes a patterned three-dimensional substrate, an abrasive coating a surface of the patterned substrate and a vacuum deposition chamber in which the abrasiv... | 05/11/2004 |
| 6712926 | Recycling apparatus The present invention describes a chemical solution recycling apparatus in a spin etching and cleaning process chamber for manufacturing semiconductor devices. Modification of the exterior dimension and the main structure of the process chamber is not necessary. The... | 03/30/2004 |
| 6683009 | Method for local etching A method is described for local etching of surfaces. The method includes the steps of providing a surface, providing an etchant, and providing a device for supplying and extracting the etchant. The device contains two cylindrical lines of different cross-... | 01/27/2004 |
| 6660098 | System for processing a workpiece An apparatus for processing a workpiece in a micro-environment includes a workpiece housing connected to a motor for rotation. The workpiece housing defines a substantially closed processing chamber therein in which one or more processing fluids are distr... | 12/09/2003 |
| 6649018 | System for removal of photoresist using sparger A process and system for removing photoresist from semiconductor wafers comprises applying pressure in excess of one atmosphere to ozone, mixing the ozone with ambient temperature or higher deionized water via a sparger plate, and exposing the semiconduct... | 11/18/2003 |
| 6630052 | Apparatus for etching glass substrate An apparatus for etching a glass substrate includes a first bath containing an etchant, at least one porous panel having a plurality of jet holes in the first bath, the porous panel containing the etchant to jet the etchant against the glass substrate, a ... | 10/07/2003 |
| 6592708 | Filter apparatus and method therefor An ultrasonic driver (105) is used to vibrate a filter disk (103) at ultrasonic frequencies. Vibrations are used to break up agglomerates into smaller pieces that pass through filter disk (103). The energy is controlled to minimize the translational energ... | 07/15/2003 |
| 6503363 | System for reducing wafer contamination using freshly, conditioned alkaline etching solution A system for conditioning an alkaline etching solution for reducing contamination in a silicon wafer etching process. The system includes a conditioning tank for mixing a conditioned alkaline etching solution, the conditioned alkaline etching solution inc... | 01/07/2003 |
| 6497238 | Method of manufacturing electronic devices and apparatus for carrying out such a method A method of manufacturing electronic devices, in particular, but not exclusively, semiconductor devices, and apparatus for carrying out such a method, in which method substrates 1, which are provided at a surface 2 with a silicon oxide-containing material... | 12/24/2002 |
| 6472331 | Method and apparatus for measuring and dispensing a wafer etchant A tank is set up to hold a precise volume of acid by first adjusting an overflow pipe to establish a volume that is larger than the desired volume and then adjusting the vertical position of a volume occupying element that extends above and below the surf... | 10/29/2002 |
| 6398904 | Wet etching system for manufacturing semiconductor devices A wet etching system includes a tank for containing a chemical and having an open top portion, and a heater disposed in the tank for heating the chemical contained therein. A cover is arranged on the open top portion of the tank, and the cover includes a ... | 06/04/2002 |
| 6333275 | Etchant mixing system for edge bevel removal of copper from silicon wafers A chemical etching system provides a mixture of sulfuric acid and hydrogen peroxide and serves as the etchant for removing residual copper from an edge bevel region of a semiconductor wafer. The etching system includes a dilution module where concentrated... | 12/25/2001 |
| 6299723 | Anti-airlock apparatus for filters An anti-airlock apparatus for filters comprises a process bath for processing wafers, a filtration unit incorporating a filter for preliminarily filtering a process solution before said processing and connected to a first deaeration line, and a tank body ... | 10/09/2001 |
| 6235641 | Method and system to control the concentration of dissolved gas in a liquid This invention relates to a method and system for establishing and maintaining a precise concentration of dissolved gas in a liquid. More particularly, the invention relates to a method and system of establishing and maintaining a precise concentration of... | 05/22/2001 |
| 6207068 | Silicon nitride etch bath system An improved silicon nitride etch bath system is provided. The improved etch bath system includes a silicon dioxide condensing system formed of a heat exchanger and a secondary filter. The heat exchanger is provided for removing a small portion of phosphor... | 03/27/2001 |
| 6200414 | Circulation system for supplying chemical for manufacturing semiconductor devices and circulating method thereof A circulation system for supplying one or more chemicals, or mixtures thereof, includes a chemical tank containing the chemical. A chemical supply line is connected at one end to the chemical tank, through which the chemical from the chemical tank is supp... | 03/13/2001 |
| 6086778 | Muffle etch injector assembly A novel modular muffle etch injector assembly for use in a gas blanketed down-flow chemical vapor deposition apparatus of the type having a muffle and a modular gas injector assembly for introducing chemical vapors into a deposition chamber, the muffle be... | 07/11/2000 |
