Celebrity Inventors
Comic actor Danny Kaye received patent D166,807 for the co-design of "Blowout Toy or the Like". It's similar to one of those toys that unravels when you blow into at a birthday party except Kaye's has three blowouts going in different directions, not just one.
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| Number | Title | Issue Date |
| 7935217 | Substrate processing apparatus for treating substrate with predetermined processing by supplying processing liquid to rim portion of rotating substrate A bevel unit comprises CCDs and processing liquid nozzles, and the CCDs take an image of a circumferential edge surface of a substrate. An image processing part detects the distances between the circumferential edge surface of the substrate and the processing liquid... | 05/03/2011 |
| 7722736 | Apparatus for and method of processing a substrate with processing liquid On the top surface of a substrate, an atmosphere blocker plate, of which plan size is equal or larger than the substrate size, is disposed opposing to the top surface of the substrate. In the rim portion of the atmosphere blocker plate, a vertical through hole is fo... | 05/25/2010 |
| 7524396 | Object processing apparatus and processing method A processing apparatus includes a processing bath having a liquid injection port in the bottom thereof, a rectifier plate located between the bottom of the processing bath and a position at which an object to be processed is positioned, and a distribution portion ex... | 04/28/2009 |
| 7427333 | Resist removing method and resist removing apparatus In an inventive resist removing method, sulfuric acid and hydrogen peroxide water are supplied to a surface of a substrate to remove a resist from the substrate surface. Thereafter, hydrogen peroxide water is supplied to the substrate surface to remove the sulfuric ... | 09/23/2008 |
| 7410908 | Manufacturing method for a semiconductor device A manufacturing method for a semiconductor device, includes: preparing a semiconductor wafer having an active surface, a side surface, a rear surface on the side opposite the active surface, and a plurality of semiconductor elements formed on the active surface; for... | 08/12/2008 |
| 7332055 | Substrate processing apparatus A substrate processing apparatus is provided. The apparatus includes a plurality of fluid suppliers 61, 61, 63 for supplying different processing fluids. In processing a wafer W, the substrate processing apparatus moves the fluid suppliers 61, 62, 63 a... | 02/19/2008 |
| 7332056 | Thin film removing device and thin film removing method A thin film removing device and a thin film removing method are capable of removing straight parts of a thin film formed on a square substrate from corners of the substrate, and of suppressing the formation of mists. An approach stage 20 having flat stage pla... | 02/19/2008 |
| 7270136 | Apparatus for cleaning the edges of wafers The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning, thus resulting in increase of the yield rate of wafers. The apparatus... | 09/18/2007 |
| 7267742 | Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device An etching apparatus includes a chamber containing an etching solution including first and second components and water, a concentration of the water in the etching solution is at a specified level or lower; a circulation path circulating the etching solution; a conc... | 09/11/2007 |
| 7252778 | Etching method and etching device An etching method and etching device are provided, enabling uniform rendering of the thickness of a film for processing on a wafer regardless of the film thickness profile thereof, and thereby enabling global planarizing of the wafer surface. In an etching method, t... | 08/07/2007 |
| 7169253 | Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing A method and system for cleaning and/or stripping photoresist from photomasks used in integrated circuit manufacturing comprising a process and means of introducing a mixture of sulfuric acid and ozone (or a mixture of sulfuric acid and hydrogen peroxide) to the sur... | 01/30/2007 |
| 7108749 | Technological machinery for production of polarizers The invention pertains to technological apparatus' for production of polarizers, obtained from lyotropic liquid crystals (LLC) based on organic compounds, in particular, dyes. The technological production line for polarizer formation comprises at least one system of... | 09/19/2006 |
| 7104476 | Multi-sectored flat board type showerhead used in CVD apparatus Disclosed is a showerhead of a CVD apparatus comprising a plate having an empty inside and provided with a plurality of injection holes at one surface thereof; and gas supplying pipes installed at the plate so as to supply gas, wherein introduced gas thereto is inje... | 09/12/2006 |
| 7105074 | Substrate treating method and apparatus A substrate treating apparatus is provided for eliminating wasteful consumption of a treating solution in a treating mode in which the treating solution is delivered in a strip form to a substrate from a treating solution delivery nozzle sweeping over the substrate.... | 09/12/2006 |
| 7083700 | Methods and apparatuses for planarizing microelectronic substrate assemblies Methods and apparatuses for planarizing microelectronic substrate assemblies on fixed-abrasive polishing pads with non-abrasive lubricating planarizing solutions. One aspect of the invention is to deposit a lubricating planarizing solution without abrasive particles... | 08/01/2006 |
| 6932884 | Substrate processing apparatus A substrate processing apparatus comprises roll chucks for holding and rotating a substrate, a closable chamber housing the roll chucks therein, and a gas introduction pipe for introducing a gas into the chamber. The substrate processing apparatus further comprises ... | 08/23/2005 |
| 6851435 | Method and apparatus for localized liquid treatment of the surface of a substrate A method and apparatus for dispensing a liquid on the surface of a localized zone of a substrate, for example for cleaning of etching purposes. Along with the liquid, a gaseous tensio-active substance is supplied, which is miscible with said liquid and when mixed wi... | 02/08/2005 |
| 6817369 | Device and method for cleaning substrates The inventive device for cleaning substrates, especially semiconductor wafers, comprises a treatment basin for receiving at least one substrate, a cover for sealing said treatment basin, a first feeding device for controllably feeding in a reactive gas, a second fee... | 11/16/2004 |
| 6805754 | Device and method for processing substrates A device and method for processing substrates, whereby medium consumption and processing time are reduced. According to the inventive method, liquid is conducted to a surface of the substrate that is to be treated via at least one nozzle that is arranged in a substa... | 10/19/2004 |
| 6793764 | Chemical dispensing system for semiconductor wafer processing A method for dispensing a chemical, such as an edge bead removal solvent, onto a semiconductor wafer comprising the steps of dispensing the chemical selectively onto the wafer and applying a suction to the area immediately surrounding the location at which the chemi... | 09/21/2004 |
| 6706139 | Method and apparatus for cleaning a web-based chemical mechanical planarization system A method and apparatus for cleaning a web-based chemical-mechanical planarization (CMP) system. Specifically, a fluid spray bar is coupled to a frame assembly which may be mounted on a CMP system. The fluid spray bar will move along the frame assembly. As the fluid ... | 03/16/2004 |
| 6592708 | Filter apparatus and method therefor An ultrasonic driver (105) is used to vibrate a filter disk (103) at ultrasonic frequencies. Vibrations are used to break up agglomerates into smaller pieces that pass through filter disk (103). The energy is controlled to minimize the translational energ... | 07/15/2003 |
| 6586342 | Edge bevel removal of copper from silicon wafers Chemical etching methods and associated modules for performing the removal of metal from the edge bevel region of a semiconductor wafer are described. The methods and systems apply liquid etchant in a precise manner at the edge bevel region of the wafer u... | 07/01/2003 |
| 6537416 | Wafer chuck for use in edge bevel removal of copper from silicon wafers A wafer chuck includes alignment members that allows a semiconductor wafer to be properly aligned on the chuck without using a separate alignment stage. The alignment members may be cams, for example, attached to arms of the wafer chuck. These members may... | 03/25/2003 |
| 6503362 | Atomizing nozzle an filter and spray generating device A nozzle assembly for use in atomizing and generating sprays from a fluid. The nozzle assembly includes two members, each with generally planar surfaces, that are joined together. A first set of channels is formed in the generally planar surface of a firs... | 01/07/2003 |
| 6322626 | Apparatus for controlling a temperature of a microelectronics substrate A method and apparatus for controlling a temperature of a microelectronic substrate. In one embodiment, the apparatus can include a substrate support configured to engage and support the microelectronic substrate. The apparatus can further include a tempe... | 11/27/2001 |
| 5993681 | Method and apparatus for aiming a spray etcher nozzle A method and apparatus for achieving alignment between a spray etcher nozzle and a semiconductor (either microelectronic or optoelectronic, for example) wafer surface. A spray nozzle tip is temporarily removed from the spray nozzle and an illumination sou... | 11/30/1999 |
| 5591299 | System for providing integrated monitoring, control and diagnostics functions for semiconductor spray process tools Method and apparatus for providing integrated monitoring, control and diagnostics functions for semiconductor spray processors is disclosed. In a preferred embodiment, a spray processor host system of the present invention comprises a plurality of PC-clas... | 01/07/1997 |
| 5456788 | Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process A contactless method and apparatus for in-situ chemical etch monitoring of an etching process during etching of a workpiece with a wet chemical etchant are disclosed. The method comprises steps of providing a base member having a reference surface; releas... | 10/10/1995 |
| 5387313 | Etchant control system An etching system for etching openings in a metal web including multiple etching station for etching a metal web from opposite sides, with each of the etching stations including a set of first bank of oscillatable nozzles located in a first chamber in the... | 02/07/1995 |
| 5290384 | Apparatus for controlled spray etching An apparatus is provided for controlled spray etching, in which panels, such as printed circuit boards are delivered through an etching chamber, to have a spray etchant sprayed generally on upper and lower surfaces of the panel. The spray is controlled su... | 03/01/1994 |
| 5244527 | Manufacturing unit for semiconductor devices A sensor for detecting the end point of etching is secured to a wafer chuck and a light projector and light receiver of an infrared photosensor which is used as the sensor for detecting the end point for aluminum etching rotates in synchronization with th... | 09/14/1993 |
| 5032217 | System for treating a surface of a rotating wafer An apparatus and method for treating a surface of a wafer by using a treatment solution includes a wafer rotating device for rotating the wafer in a horizontal plane, and a treatment solution discharge nozzle for continuously discharging the treatment sol... | 07/16/1991 |
| 5002627 | Spray etching apparatus with automatic individually controllable etching jets The invention concerns a method of etching an etch material consisting at least partly of metal and an arrangement for implementing that method. According to the invention, the etchant is applied through jet assemblies arranged perpendicularly to each oth... | 03/26/1991 |
| 4741798 | Installation for etching material In an installation for etching material to be etched consisting at least partly of metal, preferably copper, oxidizing agent is added to the etching medium containing an acid, directly before the actual etching operation, in a quantity which is in a ratio... | 05/03/1988 |
| 4397708 | Etching and etchant removal apparatus Etching method and etching and etchant removal apparatus. A specific embodiment includes two sets of fan spray nozzles located adjacent to the etching chamber and positioned to direct a spray at the work piece as the work piece exits the etching chamber. ... | 08/09/1983 |
| 4344809 | Jet etch apparatus for decapsulation of molded devices A jet etch apparatus and method for decapsulation of molded devices having an etching block through which an etchant solution is drawn. The etchant solution which flows through the etching block forms a jet spray that impinges upon a device to be decapsul... | 08/17/1982 |
| 4126510 | Etching a succession of articles from a strip of sheet metal When precision etching a succession of articles from a strip of metal having random variations in thickness and moving along a prescribed path, the thickness of the metal strip is monitored, and the etching step is adjusted in response to the monitored th... | 11/21/1978 |
| 3953265 | Meniscus-contained method of handling fluids in the manufacture of semiconductor wafers The invention relates to a method for reducing the comsumption of etchants used in manufacturing semiconductor devices comprising the steps of supporting a semiconductor wafer, metering a predetermined volume of etchant onto the surface of said wafer to f... | 04/27/1976 |
| 3953276 | Etching apparatus with plural nozzle arrangements An apparatus for re-etching the apertures of different size shadow masks has a plurality of sets of etchant supply arms individually having an effective length related to a particular mask size, each set being connected to an assigned one of a correspondi... | 04/27/1976 |
