Bizarre Patents
Pillow with retractable umbrella
A pillow assembly having a supporting assembly and a retractable umbrella assembly that is easily transportable and allows a user to support his/her head while covering their face from sunlight.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7799166 | Wafer edge expose alignment method Incorporation of a sensor, such as an optical or laser based sensor, into a wafer edge processing unit, such as a WEE unit or mechanism. This sensor enables the WEE unit to be referenced to the wafer edge. Specifically, the sensor can be used to place a WEE unit in ... | 09/21/2010 |
| 7427333 | Resist removing method and resist removing apparatus In an inventive resist removing method, sulfuric acid and hydrogen peroxide water are supplied to a surface of a substrate to remove a resist from the substrate surface. Thereafter, hydrogen peroxide water is supplied to the substrate surface to remove the sulfuric ... | 09/23/2008 |
| 7341502 | Methods and systems for planarizing workpieces, e.g., microelectronic workpieces Planarizing workpieces, e.g., microelectronic workpieces, can employ a process indicator which is adapted to change an optical property in response to a planarizing condition. This process indicator may, for example, change color in response to reaching a particular... | 03/11/2008 |
| 7323413 | Method for stripping silicon nitride An apparatus and a method for stripping silicon nitride are disclosed that facilitate automatic, real-time, and exact measurement of etch rate and an ending time of the etching process when silicon nitride is stripped with phosphoric acid solution. The method for st... | 01/29/2008 |
| 7318870 | Method of cleaning semiconductor substrate A cleaning method for a semiconductor substrate including placing the semiconductor substrate into a cleaning chamber and injecting ozone gas (O3) into the cleaning chamber. This process operates to cleanse the semiconductor substrate without corrosion or... | 01/15/2008 |
| 7313454 | Method and apparatus for classifying manufacturing outputs A method for process monitoring involves acquiring data samples associated with a plurality of manufacturing related variables for a plurality of outputs of a manufacturing process. The distance of each data sample relative to every other data sample is then calcula... | 12/25/2007 |
| 7279662 | Temperature control device adapted to prevent overheating A temperature control device comprising a heater, a plurality of heater temperature sensors, a heater temperature controller, and a power supply unit, and adapted to prevent overheating and fires caused by the overheating of a heater, is disclosed. The heater adapte... | 10/09/2007 |
| 7267742 | Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device An etching apparatus includes a chamber containing an etching solution including first and second components and water, a concentration of the water in the etching solution is at a specified level or lower; a circulation path circulating the etching solution; a conc... | 09/11/2007 |
| 7238295 | Regeneration process of etching solution, etching process, and etching system A regeneration process is disclosed for an etching solution composed of a phosphoric acid solution and used in etching silicon nitride films in an etch bath. As a result of the etching, the etching solution contains a silicon compound. According to the regeneration ... | 07/03/2007 |
| 7185516 | Washwater neutralization system for glass forming line A neutralization system for controlling the pH of the washwater used to clean and maintain polyacrylic bound glass forming equipment. The neutralization system introduces a base solution to a washwater solution when the pH of the washwater solution contained in a cl... | 03/06/2007 |
| 7181306 | Enhanced plasma etch process A method of operating a plasma etcher wherein gas is introduced into the etcher at a substantially higher rate than a previous standard rate for a desired etch selectivity, and the throttle valve's open value is set to a substantially greater open value than a previ... | 02/20/2007 |
| 7169253 | Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing A method and system for cleaning and/or stripping photoresist from photomasks used in integrated circuit manufacturing comprising a process and means of introducing a mixture of sulfuric acid and ozone (or a mixture of sulfuric acid and hydrogen peroxide) to the sur... | 01/30/2007 |
| 7153690 | Real-time component monitoring and replenishment system for multicomponent fluids A multicomponent fluid composition monitoring and compositional control system, in which a component analysis is effected by titration or other analytical procedure, for one or more components of interest, and a computational means then is employed to determine and ... | 12/26/2006 |
| 7139459 | Spectral filter for green and longer wavelengths Visible and infra-red spectral filters based on arrays of uncoupled identical waveguides having coherently modulated cross sections offer many unique advantages, such as independence of the spectral position of the Bragg-resonance based transmission or reflection fe... | 11/21/2006 |
| 7128803 | Integration of sensor based metrology into semiconductor processing tools A system for processing a wafer is provided. The system includes a chemical mechanical planarization (CMP) tool. The CMP tool includes a wafer carrier defined within a housing. A carrier film is affixed to the bottom surface and supports a wafer. A sensor embedded i... | 10/31/2006 |
| 7102763 | Methods and apparatus for processing microelectronic workpieces using metrology A method and apparatus for processing a microelectronic workpiece using metrology. The apparatus can include one or more processing or transport units, a metrology unit, and a control unit coupled to the metrology unit and at least one of the processing or transport... | 09/05/2006 |
| 7097784 | Etching method and apparatus for semiconductor wafers A method for etching semiconductor wafers in an etching apparatus including an etching bath filled with an etchant and capable of setting liquid temperature and process sequence, comprises selecting a predetermined etching program suitable for etching of the semicon... | 08/29/2006 |
| 7081182 | Method and apparatus for automatically measuring the concentration of TOC in a fluid used in a semiconductor manufacturing process The present invention relates to a method and apparatus for automatically measuring the concentration of total organic carbon (TOC) in chemicals and ultra-pure water that are used in a wet etch process. The apparatus includes a sampling line extending from a process... | 07/25/2006 |
| 7052575 | System and method for active control of etch process A system for regulating an etch process is provided. The system includes one or more light sources, each light source directing light to one or more features and/or gratings on a wafer. Light reflected from the features and/or gratings is collected by a measuring sy... | 05/30/2006 |
| 7037842 | Method and apparatus for dissolving a gas into a liquid for single wet wafer processing A method and apparatus for processing a wafer is described. According to the present invention a wafer is placed on a substrate support. A liquid is then fed through a conduit having an output opening over the wafer. A gas is dissolved in the liquid prior to the liq... | 05/02/2006 |
| 7014732 | Etching apparatus Disclosed is an etching apparatus enabling to increase productivity of etching glass substrates. The present invention includes an etching bath having an etchant, a plurality of sensors inside the etching bath detecting a level of the etchant, and a deionized water ... | 03/21/2006 |
| 7000454 | Particle measurement configuration and semiconductor wafer processing device with such a configuration A particle measurement configuration measures the particle concentration in a liquid or gaseous medium by way of a particle measuring instrument. In order to avoid erroneous measurements or damage to the particle measuring instrument, a measuring cell is provided wh... | 02/21/2006 |
| 6968619 | Method for manufacturing endodontic instruments A method of manufacturing endodontic files involves a chemical milling process to yield endodontic files having a desired taper. The process involves the steps of (a) providing a metallic rod having a cutting portion with a polygonal cross section; (b) torsioning th... | 11/29/2005 |
| 6955764 | Method and apparatus for preparing slurry for CMP apparatus The method and apparatus are provided for preparing a slurry for a CMP apparatus with which mixing accuracy for a slurry is improved and accurate measurement is automatically accomplished for H2O2 as a small amount of additive. A slurry prepara... | 10/18/2005 |
| 6953044 | Drained water recovery system and method for operating the same A drained water recovery system of a process device and recovering method thereof is provided. The recovering method includes using a conductivity meter to measure the conductivity of the drained water so that the drained water with different degrees of conductivity... | 10/11/2005 |
| 6932884 | Substrate processing apparatus A substrate processing apparatus comprises roll chucks for holding and rotating a substrate, a closable chamber housing the roll chucks therein, and a gas introduction pipe for introducing a gas into the chamber. The substrate processing apparatus further comprises ... | 08/23/2005 |
| 6884149 | Method and system for in-situ monitoring of mixing ratio of high selectivity slurry A method and system for monitoring the quality of a slurry utilized in a chemical mechanical polishing operation. A slurry is generally delivered through a tubular path during a chemical mechanical polishing operation. A laser light is generally transmitted from a l... | 04/26/2005 |
| 6878303 | Substrate processing apparatus and substrate processing method A substrate processing apparatus for supplying a treatment liquid onto the surface of a substrate to treat the same. This apparatus is provided with: a spin chuck for holding and rotating a substrate; a nozzle for supplying a treatment liquid to the substrate held b... | 04/12/2005 |
| 6878232 | Method and apparatus for improving a temperature controlled solution delivery process A method and apparatus for improving an operating efficiency for a process including temperature dependent fluid delivery including determining a projected time period to start a process during a non-operating time period; delivering a process fluid for performing t... | 04/12/2005 |
| 6875306 | Vacuum processing device A vacuum processing device includes at least one vacuum processing chamber for performing predetermined treatments to a wafer being transferred to a predetermined position within the chamber, an atmospheric transfer equipment for transferring a wafer in atmospheric ... | 04/05/2005 |
| 6869498 | Chemical mechanical polishing with shear force measurement A chemical mechanical polishing system uses a shear force measurement system. Polishing parameters, such as the polishing pressure, can be adjusted in response to the measured shear force. For example, the pressure can be increased to avoid hydroplaning or decreased... | 03/22/2005 |
| 6863772 | Dual-port end point window for plasma etcher A dual-port endpoint detection window for a process chamber for substrates. The dual-port endpoint detection window of the present invention comprises a primary port and a secondary port each of which may be individually removably fitted with a light sensor for the ... | 03/08/2005 |
| 6821792 | Method and apparatus for determining a sampling plan based on process and equipment state information A processing line includes a process tool, a metrology tool, a tool state monitor, and a sampling controller. The processing tool is configured to process workpieces. The metrology tool is configured to measure an output characteristic of selected workpieces in acco... | 11/23/2004 |
| 6817369 | Device and method for cleaning substrates The inventive device for cleaning substrates, especially semiconductor wafers, comprises a treatment basin for receiving at least one substrate, a cover for sealing said treatment basin, a first feeding device for controllably feeding in a reactive gas, a second fee... | 11/16/2004 |
| 6805754 | Device and method for processing substrates A device and method for processing substrates, whereby medium consumption and processing time are reduced. According to the inventive method, liquid is conducted to a surface of the substrate that is to be treated via at least one nozzle that is arranged in a substa... | 10/19/2004 |
| 6790287 | Substrate processing apparatus, substrate inspection method and substrate processing system An inspection unit is provided in a substrate processing apparatus performing resist coating processing and development processing on a substrate. In the inspection unit, a film thickness measuring device, a line width measuring device, an overlay measuring device a... | 09/14/2004 |
| 6780277 | Etching method and etching apparatus An etching method and an etching apparatus are provided. Silicon (Si) from surfaces semiconductor wafers W dissolves into an etching liquid E stored in a process bath 10. On detection of the concentration of silicon by a concentration sensor 50, the et... | 08/24/2004 |
| 6764573 | Wafer thinning techniques Apparatuses (10, 100), and methods of using same, for the simultaneous thinning of the backside surfaces of a plurality of semiconductor wafers (W) using a non-crystallographic and uniform etching process, are described. The apparatuses (10, 100) inclu... | 07/20/2004 |
| 6758940 | Apparatus and method for controlling boiling conditions of hot phosphoric acid solution with pressure adjustment Disclosed is an apparatus and method for controlling boiling condition of hot H3PO4 solution by adjusting the vapor extracting rate thereof, wherein an acid tank filled with hot H3PO4 solution to a level surface is located... | 07/06/2004 |
| 6749716 | Apparatus for assessing a silicon dioxide content An apparatus for assessing a silicon dioxide content of a phosphoric acid bath for etching silicon nitride and a system for etching silicon nitride bath utilize a sensor. In particular, the apparatus for assessing the silicon dioxide content of a phosphoric acid bat... | 06/15/2004 |
