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| Number | Title | Issue Date |
| 8172960 | Tantalum sputtering target and method of manufacturing same Provided is a tantalum sputtering target manufactured by working a molten and cast tantalum ingot or billet through forging, annealing and rolling, wherein the structure of the tantalum target comprises a non-recrystallized structure. The tantalum sputtering target ... | 05/08/2012 |
| 7998287 | Tantalum sputtering target and method of fabrication A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described. ... | 08/16/2011 |
| 7892367 | Tantalum sputtering target A tantalum sputtering target, wherein when the sum of the overall crystalline orientation is 1 on a tantalum target surface, the area ratio of crystals having any orientation among (100), (111), (110) does not exceed 0.5. Thus, obtained is a tantalum sputtering targ... | 02/22/2011 |
| 7740717 | Tantalum sputtering target and method for preparation thereof Provided is a tantalum sputtering target having a crystal structure in which the (222) orientation is preferential from a position 10% of the target thickness toward the center face of the target, and a manufacturing method of a tantalum sputtering target, including... | 06/22/2010 |
| 7704335 | Refractory metal intermetallic composites based on niobium-silicides, and related articles A refractory composition is described, containing niobium, silicon, titanium, and at least one of rhenium and ruthenium. The amount of silicon in the composition is at least about 9 atom %, and the amount of titanium present is less than about 26 atom %, based on to... | 04/27/2010 |
| 7585380 | High purity tantalum, products containing the same, and methods of making the same High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99.995% and more preferably at least 99.999%. In addition, tantalum metal and alloys thereof are described, which either have a grain siz... | 09/08/2009 |
| 7553381 | Crystalline metal film A metal film according to the present invention has a cubic crystal structure having a periodic pattern of crystal orientation in a plane. The crystal orientation is gradually rotated about a particular crystal-axis direction such that a {100} plane, a {110} plane, ... | 06/30/2009 |
| 7485198 | Tantalum and niobium billets and methods of producing the same Extruded tantalum billets and niobium billets are described having a substantially uniform grain size and preferably an average grain size of about 150 microns or less and more preferably an average grain size of about 100 microns or less. The extruded billet can th... | 02/03/2009 |
| 7341703 | Mixed hydrogen generation material In one aspect, the invention provides a novel quaternary hydrogen storage composition having a hydrogenated state and a dehydrogenated state. Further, the present invention provides methods of storing hydrogen in a hydrogen storage composition, and methods of releas... | 03/11/2008 |
| 7332123 | Method for manufacturing composite articles and the articles obtained therefrom A method of molding an article comprises inserting a mandrel into the cavity of the mold; placing a niobium based refractory metal intermetallic composite powder into a cavity of a mold; consolidating the niobium based refractory metal intermetallic composite around... | 02/19/2008 |
| 7325293 | Zirconia-stabilized multi-filamentary niobium-tin superconducting wire A multi-filament superconducting wire in which the filaments comprise zirconia-stabilized ultra-fine grain Nb3Sn. The superconducting wire is formed by wire-drawing a preform comprising a metallic matrix and at least one niobium alloy rod having zirconium... | 02/05/2008 |
| 7314579 | Hydrogen generation material The dispersion of metal-element containing additives with hydrogen storage particles of the family of hydrogen-rich materials, M′xM″yNzHd as specified herein, markedly lowers the temperature at which hydrogen is remove... | 01/01/2008 |
| 7228722 | Method of forming sputtering articles by multidirectional deformation A method of producing a valve metal mill form having dimensions sufficient to be divided to form a plurality of sputter targets is described. The method includes multidirectional deformation of an ingot to form a mill form having a preferred average grain size of ab... | 06/12/2007 |
| 7220397 | Modified oxygen reduced valve metal oxides Pressed material such as anodes are described and formed from oxygen reduced oxide powders using additives, such as binders and/or lubricants. Methods to form the pressed material are also described, such as with the use of atomizing, spray drying, fluid bed process... | 05/22/2007 |
| 7156963 | Tantalum sputtering target and method for preparation thereof Provided is a tantalum sputtering target having a crystal structure in which the (222) orientation is preferential from a position of 10% of the target thickness toward the center face of the target, and a manufacturing method of a tantalum sputtering target, includ... | 01/02/2007 |
| 7149076 | Capacitor anode formed of metallic columns on a substrate Capacitor anodes that include metallic columns formed on a substrate so as to form a porous microstructure and methods of making the anodes are described. The metallic columns can be distinct from one another and project outward from the substrate. Also described is... | 12/12/2006 |
| 7108757 | Hydrogen storage alloys providing for the reversible storage of hydrogen at low temperatures A reversible hydrogen storage alloy capable of storing large amounts of hydrogen and delivering reversibly large amounts of hydrogen at temperatures ranging from 0° C. up to 40° C. The hydrogen storage alloy is generally composed of titanium, vanadium, and chromiu... | 09/19/2006 |
| 7081148 | Textured-grain-powder metallurgy tantalum sputter target The sputter target includes a tantalum body having tantalum grains formed from consolidating tantalum powder and a sputter face. The sputter face has an atom transport direction for transporting tantalum atoms away from the sputter face for coating a substrate. The ... | 07/25/2006 |
| 7073559 | Method for producing metal fibers A method of producing metal fibers including melting a mixture of at least a fiber metal and a matrix metal, cooling the mixture to form a bulk matrix comprising at least a fiber phase and a matrix phase and removing at least a substantial portion of the matrix phas... | 07/11/2006 |
| 7066975 | Nitrogen-containing metal powder, production process thereof, and porous sintered body and solid electrolytic capacitor using the metal powder An object of the present invention is to provide nitrogen-containing metallic powder at high productivity, which powder contains a metal such as niobium or tantalum containing nitrogen uniformly, and enables production of an anode electrode that has high specific ca... | 06/27/2006 |
| 7011692 | Powder composition for capacitor, sintered body using the composition and capacitor using the sintered body A powder composition for a capacitor comprising a tantalum or niobium and a compound having a silicon-oxygen bond, at least a part of which may be nitrided and which has an average particle size of from 0.1 to 5 μm; a sintered body using the composition; and a capa... | 03/14/2006 |
| 6929726 | Sputtering target, Al interconnection film, and electronic component A sputtering target consists essentially of 0.1 to 50% by weight of at least one kind of element that forms an intermetallic compound with Al, and the balance of Al. The element that forms an intermetallic compound with Al is uniformly dispersed in the target textur... | 08/16/2005 |
| 6923934 | Titanium aluminide, cast made therefrom and method of making the same TiAl alloy includes 46 to 50 at % of Al, 5 at % or less of combination of Mo, V and Si, provided that Si content is 0.7 at % or less, and Mo content satisfies an equation of −0.3x +17.5 at % or less where x represents Al (at %), and the remainder being Ti and inev... | 08/02/2005 |
| 6913655 | Niobium-silicide based composities resistant to high temperature oxidation A niobium-silicide refractory metal intermetallic composite adapted for use in a turbine component. The niobium-silicide refractory metal intermetallic composite comprises: between about 19 atomic percent and about 24 atomic percent titanium; between about 1 atomic ... | 07/05/2005 |
| 6893513 | High purity tantalum, products containing the same, and methods of making the same High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99.995% and more preferably at least 99.999%. In addition, tantalum metal and alloys thereof are described, which either have a grain siz... | 05/17/2005 |
| 6863750 | High purity niobium and products containing the same, and methods of making the same High purity niobium metals and alloys containing the same are described. The niobium metal preferably has a purity of at least 99.99% and more preferably at least 99.999%. In addition, niobium metal and alloys thereof are described, which either have a grain size of... | 03/08/2005 |
| 6827828 | Mixed metal materials The invention includes a method of forming a material which comprises at least two elements. More specifically, the method comprises providing an electrolytic cell comprising a cathode, an anode, and an electrolytic solution extending between the cathode and anode. ... | 12/07/2004 |
| 6770154 | Textured-grain-powder metallurgy tantalum sputter target The sputter target includes a tantalum body having tantalum grains formed from consolidating tantalum powder and a sputter face. The sputter face has an atom transport direction for transporting tantalum atoms away from the sputter face for coating a substrate. The ... | 08/03/2004 |
| 6767653 | Coatings, method of manufacture, and the articles derived therefrom A turbine component comprises a substrate; and a crystalline coating disposed on a surface of the substrate, wherein the crystalline coating comprises tin and yttrium in an amount greater than or equal to about 0.05 atomic percent based upon the total coating. A met... | 07/27/2004 |
| 6736947 | Sputtering target, A1 interconnection film, and electronic component A sputtering target consists essentially of 0.1 to 50% by weight of at least one kind of element that forms an intermetallic compound with Al, and the balance of Al. The element that forms an intermetallic compound with Al is uniformly dispersed in the target textur... | 05/18/2004 |
| 6690759 | Zirconium-base alloy and nuclear reactor component comprising the same Disclosed herein are zirconium-base alloys excellent in both corrosion resistance and hydrogen absorption property, useful as materials for nuclear reactors. Such a zirconium-base alloy for nuclear reactors comprises 0.5-2 wt. % Sn, 0.07-0.6 wt. % Fe, 0.0... | 02/10/2004 |
| 6610421 | Spin electronic material and fabrication method thereof A spin electronic material exhibiting a spin-dependent electronic effect includes zincblende TE-VE, where TE stands for V, Cr or Mn and VE stands for As or Sb.... | 08/26/2003 |
| 6596100 | Metal-made seamless pipe and process for production thereof A metal-made seamless pipe is provided, containing at least one metal selected from the group consisting of metals each having a melting point of 1,600° C. or more, and has a porosity of 0.3 to 25%. The porosity is defined as a ratio of the open pores pr... | 07/22/2003 |
| 6576069 | Tantalum-silicon alloys and products containing the same and processes of making the same An alloy comprising tantalum and silicon is described. The tantalum is the predominant metal present. The alloy also has a uniformity of tensile strength when formed into a wire, such that the maximum population standard deviation of tensile strength for ... | 06/10/2003 |
| 6540851 | Tantalum-silicon alloys and products containing the same and processes of making the same An alloy comprising tantalum and silicon is described. The tantalum is the predominant metal present. The alloy also has a uniformity of tensile strength when formed into a wire, such that the maximum population standard deviation of tensile strength for ... | 04/01/2003 |
| 6517645 | Valve metal compositions and method Valve metal articles such as wire, sheet or powder having a second metal, preferably in a peripheral margin, prepared by coating the valve metal with a salt solution of the metal additive and heat treating in the presence of an oxygen getter to remove the... | 02/11/2003 |
| 6454994 | Solids comprising tantalum, strontium and silicon The invention includes a method of forming a solid from at least two different powdered materials. A first and second of the different powder materials is compressed into a pellet. A melt pool is formed at a temperature which will melt both the first and ... | 09/24/2002 |
| 6447623 | Creep resistant Nb-silicide based two-phase composites A two-phase niobium-based silicide composite exhibits creep resistance at temperatures equal to or greater than 1150° C. The niobium-based silicide composite comprises at least silicon (Si) hafnium (Hf), titanium (Ti), and niobium (Nb). The concentration... | 09/10/2002 |
| 6440278 | Target and process for its production, and method for forming a film having a high refractive index A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is de... | 08/27/2002 |
| 6428910 | Nb-based silicide composite compositions A refractory metal intermetallic composition comprising titanium (Ti), hafnium (Hf), silicon (Si), aluminum (Al), chromium (Cr), germanium (Ge), tin (Sn), iron (Fe), and a balance of niobium (Nb) for use in composite structures having applications in turb... | 08/06/2002 |
