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A method of swing on a swing is disclosed, in which a user positioned on a standard swing suspended by two chains from a substantially horizontal tree branch induces side to side motion by pulling alternately on one chain and then the other.
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| Number | Title | Issue Date |
| 8152933 | Substrate processing apparatus, substrate processing method, and drain cup cleaning method A substrate processing apparatus includes a substrate holding member configured to rotate along with a wafer (W) held thereon and a drain cup (51) configured to surround the wafer (W). A cleaning process is performed by rotating the wafer (W) while supplying ... | 04/10/2012 |
| 8152932 | Method for removing scum in a drum washing machine, and drum washing machine suitable for this purpose A method for removing scum in a tub of an electronically controlled drum washing machine. The method includes alternately rotating a drum following a main washing cycle and pumping liquid out of the drum, pumping a liquid out of the drum for between 30 seconds to 15... | 04/10/2012 |
| 7955441 | Device and method for cleaning mould paddles A device is disclosed for cleaning dental trays at least partly filled with a molding material. The device has a container, a pump for placing a cleaning liquid under pressure, and a spray nozzle for spraying the pressurized cleaning liquid into the container. A met... | 06/07/2011 |
| 7927429 | Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium After a rinse process on a wafer W is performed by feeding pure water to the surface of the wafer W at a predetermined flow rate while rotating the wafer W in an approximately horizontal state, a feed amount of the pure water to the wafer W is reduced, and a pure-wa... | 04/19/2011 |
| 7922830 | Immersion cleaner for print rollers What is contemplated is a printing cylinder washer having a removable or portable drive assembly, or a series of portable drive assemblies of different lengths to accommodate different sizes of print rollers. The drive assemblies have a drive mechanism enabled by a ... | 04/12/2011 |
| 7837804 | Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started, and ... | 11/23/2010 |
| 7819985 | Method and apparatus for wafer cleaning An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer. ... | 10/26/2010 |
| 7789972 | Substrate processing apparatus and substrate processing method A substrate processing apparatus according to the present invention comprises a substrate holding mechanism for holding a substrate and rotating the held substrate; a process liquid supply mechanism for supplying a process liquid to the substrate; a process liquid a... | 09/07/2010 |
| 7754022 | Wash chamber for appendage-washing method A wash cylinder or chamber for an automated cleaning station to clean an object or a person's body part includes nozzles on the interior of the cylinder, the nozzles of one embodiment comprising an increasing roll angle providing a novel spray pattern. Additionally,... | 07/13/2010 |
| 7699939 | Substrate cleaning method A substrate cleaning method including rotating a substrate at least for a period, supplying a liquid to the front surface of the substrate and cleaning the substrate, and drying the substrate is provided. Said drying of the substrate includes: reducing a rotational ... | 04/20/2010 |
| 7611589 | Methods of spin-on wafer cleaning A method for spin-on wafer cleaning. The method comprises controlling spin speed and vertical water jet pressure. The vertical jet pressure and the spin speed are substantially maintained in inverse proportion. Wafer spin speed is between 50 to 1200 rpm. Vertical wa... | 11/03/2009 |
| 7608152 | Substrate processing apparatus and method In the vicinity of a rim portion of a spin base 5, a plurality of supports 7 which abut on a bottom rim portion of a substrate W and support the substrate W are formed projecting toward above from the spin base 5. The substrate W is supported ho... | 10/27/2009 |
| 7479192 | Flat surface washing apparatus An engine and high pressure pump are mounted onto a wheeled chassis. High pressure water is distributed to a rotating wand and nozzle assembly on the wheeled chassis so that as the chassis is moved along a linear path, high pressure water is sprayed onto an underlyi... | 01/20/2009 |
| 7435302 | Surface treatment apparatus and method for manufacturing liquid crystal display device A cleaning apparatus according to the present invention is provided with a brush drive mechanism which brings a brush being rotating closer to a substrate, measures electrical potentials generated on a plurality of conductor patterns formed on the substrate, by a co... | 10/14/2008 |
| 7428906 | Method for cleaning a stationary gas turbine unit during operation A method for cleaning a stationary gas turbine unit during operation, wherein the unit comprises a turbine, a compressor driven by the turbine, the compressor having an inlet, an air inlet duct arranged upstream of the air inlet of the compressor, the inlet duct hav... | 09/30/2008 |
| 7422641 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 09/09/2008 |
| 7416611 | Process and apparatus for treating a workpiece with gases In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk transport achieved by entraining the gas in a liquid stream, spray or ... | 08/26/2008 |
| 7410545 | Substrate processing method of and substrate processing apparatus for freezing and cleaning substrate A substrate immersed in pure water held inside a processing bath disposed to a cleaning unit 1 and accordingly washed, as it bears an aqueous film on its surface, is transported by a substrate transportation mechanism 3 to a spin-processing unit 2 | 08/12/2008 |
| 7405164 | Apparatus and method for removing a photoresist structure from a substrate In an apparatus and method for removing a photoresist structure from a substrate, a chamber for receiving the substrate includes a showerhead for uniformly distributing a mixture of water vapor and ozone gas onto the substrate. The showerhead includes a first space ... | 07/29/2008 |
| 7404863 | Methods of thinning a silicon wafer using HF and ozone A method of thinning a silicon wafer in a controllable cost-effective manner with minimal chemical consumption. The wafer is placed into a process chamber, after which ozone gas and HF vapor are delivered into the process chamber to react with a silicon surface of t... | 07/29/2008 |
| 7396416 | Substrate cleaning device A substrate cleaning device comprises a chamber for cleaning a substrate; a substrate support installed in the chamber providing a surface for supporting the substrate during cleaning thereof; at least one cleaning solution supply outlet for spraying a cleaning solu... | 07/08/2008 |
| 7371694 | Semiconductor device fabrication method and fabrication apparatus The flatness of the surface of a Si substrate is requested as the present gate length is miniaturized. The present invention is a semiconductor device fabrication method for flattening a silicon surface by continuously supplying a high-temperature fluoride ammonium ... | 05/13/2008 |
| 7364626 | Substrate processing apparatus and substrate processing method Substrate cleaning apparatus and method capable of preventing adhesion of particles to a substrate irrespective of being hydrophilic or hydrophobic are provided. Although a cleaning liquid ejected from a two-fluid nozzle 36 rebounds from a cup CP and scatters... | 04/29/2008 |
| 7364625 | Rinsing processes and equipment Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates the use of a surface tension ... | 04/29/2008 |
| 7348188 | Method for analyzing metal element on surface of wafer Various kinds of metal elements existing on the surface of a wafer are analyzed with higher sensitivity. A high concentration HF solution is dropped onto a surface of a wafer. By providing the droplets of high concentration HF solution, the native oxide film on the ... | 03/25/2008 |
| 7338565 | Housingless washer An industrial parts washer includes a stand adapted to support a part, a chamber selectively moveable from a first position clear of the part to a second position engaging the stand where the chamber forms a closed volume encapsulating the part. A nozzle is position... | 03/04/2008 |
| 7338563 | Process for cleaning hydrocarbons from soils A combination of parallel processes is disclosed to provide optimal re-mediation operations for contaminated soil. Soils with high levels of heavy petroleum hydrocarbons are directed to a thermal process for destruction in a combustion process. Carbon dioxide genera... | 03/04/2008 |
| 7329321 | Enhanced wafer cleaning method A method for removing post-processing residues in a single wafer cleaning system is provided. The method initiates with providing a first heated fluid to a proximity head disposed over a substrate. Then, a meniscus of the first fluid is generated between a surface o... | 02/12/2008 |
| 7328713 | Nozzle apparatus for stripping edge bead of wafer There is provided a nozzle apparatus for stripping an edge bead from a wafer, which includes a rotatable support arm, and a side rinse nozzle coupled to a leading end of the support arm to remove the bead of photoresist remaining on the edge of a wafer. The side rin... | 02/12/2008 |
| 7320328 | Pulsed pressure cleaning apparatus and process An apparatus and process are described delivering alternating pulses of fluid and air within either a fully sealed or partially sealed tooling enclave in the direct presence of a constant or variable vacuum source for the purpose of removing loose as well as attache... | 01/22/2008 |
| 7314529 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 01/01/2008 |
| 7314054 | Liquid processing apparatus with nozzle having planar ejecting orifices A liquid processing apparatus includes containers 26, 27, 26a, 26b surrounding processing chambers 51, 52 for accommodating a plurality of wafers W and nozzles 54, 56 for supplying a processing liquid to the substrates W in ... | 01/01/2008 |
| 7300526 | Method and system for removal of contaminates from phaseshift photomasks A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photom... | 11/27/2007 |
| 7300598 | Substrate processing method and apparatus The invention relates to a process including a chemical liquid treatment and a rinse liquid treatment on a substrate, more particularly to a technique for reducing consumption of a chemical liquid while achieving uniform process and preventing particle generation. I... | 11/27/2007 |
| 7300524 | Substrate cleaning method A substrate cleaning apparatus includes an indexer, a front surface cleaning unit for cleaning the front surface of a substrate, a back surface cleaning unit for cleaning the back surface of the substrate, a particle inspecting unit for detecting a distribution of p... | 11/27/2007 |
| 7284560 | Liquid processing apparatus A liquid processing apparatus has a substrate rotating device including a holder for holding a substrate and a motor, a chamber for applying the liquid processing to the substrate, a posture changing mechanism for changing the posture of the substrate rotating devic... | 10/23/2007 |
| 7285287 | Carbon dioxide-assisted methods of providing biocompatible intraluminal prostheses Methods of producing biocompatible intraluminal prostheses are provided and include immersing polymeric material of an intraluminal prosthesis in a densified carbon dioxide composition under controlled conditions such that toxic materials are absorbed by the densifi... | 10/23/2007 |
| 7282086 | Fluid filter cleaning apparatus A filter cleaning apparatus for cleaning a filter using cleaning fluid comprises a housing, a filter holder for holding the filter, wherein the filter holder is mountable in the housing, a rotating means for rotating the filter holder, wherein the filter holder hold... | 10/16/2007 |
| 7275551 | Device for cleaning food with ozone water, and method of cleaning food using cleaning device A food washing apparatus of the invention includes an ozonized water generator (10), a cylindrical washing tank (1) in which the food materials are put and which can rotate to wash the food materials, a drainage part (4) formed at a part of the ... | 10/02/2007 |
| 7267132 | Methods for removing silicon and silicon-nitride contamination layers from deposition tubes Described are methods, systems, and chemistries for removing layers of stubborn silicon and silicon-nitride contamination layers from the inside surfaces of such articles as deposition tubes. In such embodiments, a tube to be cleaned is gently rolled on it side whil... | 09/11/2007 |
