Bizarre Patents
Crispy Chip Sandwich and Process of Producing a Sandwich Product
A food product comprising a multilayer cookie or snack having outer layers formed from a crispy type edible food product such as a potato chip or corn chip, etc. with an intermediate marshmallow layer being in contact with the inner surface of each crispy chip and one or more filler substances.
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| Number | Title | Issue Date |
| 8163101 | Method of cleaning contaminated surfaces A method for cleaning contaminated surfaces of surgical waste management equipment. The method includes rinsing surfaces of the equipment with water to remove water soluble contaminants and waste material. A rinse solution is applied to the surfaces of the equipment... | 04/24/2012 |
| 8133327 | Substrate processing method, storage medium and substrate processing apparatus Provided is a substrate processing method that prevents generation of watermarks on a substrate and can be performed at a low cost. The method controls the ambient humidity around the substrate depending on the kind of the chemical liquid, when the substrate is proc... | 03/13/2012 |
| 8118945 | Substrate processing method and substrate processing apparatus A substrate processing method includes a cleaning processing step, a mixed organic solvent supplying step, and a fluorine organic solvent supplying step. The cleaning processing step is a step of cleaning a main surface of a substrate by supplying deionized water to... | 02/21/2012 |
| 8080113 | Method and apparatus for collecting chemicals from semiconductor wafer An apparatus and a method are provided for accurately analyzing and evaluating a degree of contamination on a chamfered part without mixing impurities from parts other than the chamfered part into chemicals. At a position in which, on a front plane flat part of a se... | 12/20/2011 |
| 8075702 | Resist removing method and resist removing apparatus In an inventive resist removing method, sulfuric acid and hydrogen peroxide water are supplied to a surface of a substrate to remove a resist from the substrate surface. Thereafter, hydrogen peroxide water is supplied to the substrate surface to remove the sulfuric ... | 12/13/2011 |
| 8075701 | Processes for reconditioning multi-component electrodes A process for reconditioning a multi-component electrode comprising a silicon electrode bonded to an electrically conductive backing plate is provided. The process comprises: (i) removing metal ions from the multi-component electrode by soaking the multi-component e... | 12/13/2011 |
| 8070884 | Methods for rinsing microelectronic substrates utilizing cool rinse fluid within a gas enviroment including a drying enhancement substance Rinsing and drying a surface of a microelectronic device and the enhanced removal of rinse fluid from the surface of the microelectronic device while the microelectronic device is rotated is provided as part of a spray processing operation. Rinse fluid is generally ... | 12/06/2011 |
| 8043440 | Cleaning apparatus and method and computer readable medium A control mechanism of a cleaning apparatus is preset to control the apparatus for a cleaning process or a rinsing process to include delivering a process liquid, which is corresponding one of a cleaning liquid and a rinsing liquid, from a back surface liquid supply... | 10/25/2011 |
| 8038803 | Method of descaling metallic devices Methods are provided for descaling metallic components devices such as stents. The devices or components are cleaned under ultrasound in a cleaning solution of ammonium hydrogen fluoride at a temperature within a range of about 60° to 80° C., then rinsed at that t... | 10/18/2011 |
| 8034188 | Method for cleaning surface of resin layer A method for cleaning a surface of a resin layer capable of sufficiently improving peel strength of a metal film formed by plating on a surface which is roughened by performing a desmear treatment on a resin layer containing a resin added with a large amount of fill... | 10/11/2011 |
| 8034190 | Substrate processing apparatus and substrate processing method A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interfa... | 10/11/2011 |
| 8034189 | Processes for surface cleaning Described and claimed are apparatuses and systems for surface cleaning comprising a pump and an applicator connected to the pump through which one or more cleaning agents can be applied to the surface at an operating pressure that is about 600 PSI or less and an ope... | 10/11/2011 |
| 8016948 | Method of removing contaminants from a coating surface comprising an oxide or fluoride of a group IIIB metal Disclosed herein is a cleaning method useful in removing contaminants from a surface of a coating which comprises an oxide or fluoride of a Group III B metal. Typically the coating overlies an aluminum substrate which is present as part of a semiconductor processing... | 09/13/2011 |
| 7967916 | Method of preventing pattern collapse during rinsing and drying A system and method for preventing a pattern formed on a substrate from collapsing during a rinsing and drying phase of a fabrication operation includes determining a plurality of process parameters associated with a rinsing chemistry used during the rinsing operati... | 06/28/2011 |
| 7964042 | Substrate processing apparatus and substrate processing method After the rinsing processing is completed, the rotation speed of the substrate is reduced from 600 rpm to 10 rpm to form a puddle-like DIW liquid film. After the supply of DIW is stopped, the control unit waits for a predetermined time (0.5 seconds) so that the film... | 06/21/2011 |
| 7959743 | Lithium salts of fatty alcohol sulphates for cleaning boreholes, boring devices and borings The invention relates to a process of cleaning boreholes, boring equipment and borings with an aqueous cleaning of one more lithium salts of alkyl sulfates of formula (I): R—O—SO3−Li+ (I) in which R is ... | 06/14/2011 |
| 7951245 | Composition and method for road-film removal A concentrate and a ready-to-use or diluted formulation for an aqueous vehicle cleaner can remove a wide range of different types of traffic film using either low pressure application, hand pressure application, water jet spray apparatus, clean-in-place systems or o... | 05/31/2011 |
| 7942980 | Starch removal process Starch is removed from the surface of an article using a multi-step method that includes presoaking the article in an acidic solution to remove the starch from the surface of the article and washing the article in an alkaline solution to clean the article. ... | 05/17/2011 |
| RE42248 | Cleaning method, cleaning apparatus and electro optical device A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition ... | 03/29/2011 |
| 7901515 | Media path universal cleaning fluid composition Exemplary embodiments provide a cleaning composition that can include alkane components for cleaning printer members made of elastomeric materials. ... | 03/08/2011 |
| 7892361 | In-chamber member, a cleaning method therefor and a plasma processing apparatus An in-chamber member to use in the chamber of a plasma processing vessel has a coating film formed by a coating agent. The in-chamber member having deposits formed on the coating film is separated from the chamber and is immersed into a peeling solvent, e.g., aceton... | 02/22/2011 |
| 7846264 | Cleaning method used in removing contaminants from a solid yttrium oxide-containing substrate Disclosed herein is a gas distribution plate for use in a gas distribution assembly for a processing chamber, where the gas distribution plate is fabricated from a solid yttrium oxide-comprising substrate, which may also include aluminum oxide. The gas distribution ... | 12/07/2010 |
| 7846265 | Media path universal cleaning fluid composition Exemplary embodiments provide a cleaning composition that can include alkane components for cleaning printer members made of elastomeric materials. ... | 12/07/2010 |
| 7828907 | Detergent component for preventing precipitation of water hardness and providing soil removal properties A cleaning composition for removing soils includes an alkyl vinyl ether-maleic acid copolymer and at least one component selected from the group consisting of sodium carbonate and sodium hydroxide. The composition contains less than about 10% by weight of at least o... | 11/09/2010 |
| 7824504 | Electronic device cleaning equipment and electronic device cleaning method An electronic device cleaning method includes the steps of: placing, on a processing face, a semiconductor substrate having an obverse face portion in which an electronic device is formed so that the processing face faces a reverse face of the semiconductor substrat... | 11/02/2010 |
| 7806987 | Washing device and its work conveying method The present invention resides in a washing device constructed by a conveyer of a carrying-in side arranged in a frame, a reservoir lower portion having plural rails for holding the work and an ultrasonic generator arranged in this frame, each reservoir upper portion... | 10/05/2010 |
| 7789971 | Treatment of substrate using functionalizing agent in supercritical carbon dioxide During the processing of substrates, the substrate surface may be subjected to a cleaning process using supercritical CO2. Surface matter may remain, for example, because it is only minimally soluble in the supercritical CO2. For example, an ox... | 09/07/2010 |
| 7785421 | Substrate treatment method and substrate treatment apparatus The substrate treatment method includes: a cleaning step of supplying deionized water to a major surface of a substrate to clean the substrate; a pre-drying treatment step of supplying a pre-drying treatment liquid containing an organic solvent more volatile than th... | 08/31/2010 |
| 7780795 | Adhesive removal indicator system and method of use An adhesive removal indicator system and method of use including a method for removing a residual bonding adhesive from a substrate, such as human skin, the method including applying an adhesive adsorbable colored dye on the residual bonding adhesive to form a color... | 08/24/2010 |
| 7749333 | Substrate processing apparatus and method In a substrate processing apparatus, a control section is preset to perform a chemical liquid process by use of a chemical liquid after a rinsing process by use of a rinsing liquid. The control section first executes a step of rotating a substrate at a rotational sp... | 07/06/2010 |
| 7718012 | Method of degasification in semiconductor cleaning A method of improving the effectiveness of semiconductor cleaning solvents is provided. Insoluble gas bubbles, typically air, hinder wet chemical cleaning methods. Preferred embodiments include purging a first, insoluble gas from the cleaning system and replacing it... | 05/18/2010 |
| 7695570 | Processing-subject cleaning method and apparatus, and device manufacturing method and device The invention reduces the amounts of cleaning liquids and rinse liquid used, as well as the energy consumption. A cleaning head has a plurality of cleaning units and a drying unit. An organic substance cleaning portion of each cleaning unit blows a first cleaning ag... | 04/13/2010 |
| 7678200 | Technique on ozone water for use in cleaning semiconductor substrate An ultra-pure ozone water comprising an increased amount of an organic carbon capable of suppressing the reduction of the half-life period of ozone; and a method for producing the ultra-pure ozone water which comprises adding an organic solvent containing the above ... | 03/16/2010 |
| 7638004 | Method for cleaning microwave applicator tube A method of cleaning a microwave plasma applicator tube as described herein includes preparing a microwave plasma applicator for cleaning. A general cleaning of the plasma applicator tube is performed using an organic solvent wash and an ultrapure water wash. Select... | 12/29/2009 |
| 7632359 | Cleaning liquid and nozzle plate cleaning method A weakly alkali cleaning liquid suitable for use in the case of cleaning and removing inks adhered to a nozzle plate, in an ink jet printer using inks in which inorganic pigments and metal oxides are mixed into polymers, is provided. In the cleaning liquid, carbonat... | 12/15/2009 |
| 7618495 | Method for pickling a work string using dispersed solvent-in-acid fluid design A method for cleaning a work string which may have been used to inject drilling muds, cement slurries, cement displacement materials and the like into a well where the work strong may contain drilling mud residues, cement slurry residues, cement slurry displacement ... | 11/17/2009 |
| 7611588 | Methods and compositions for removing metal oxides The invention relates to methods and compositions for removing metal oxide soils from surfaces. The compositions include an anionic surfactant and a pH adjuster at an acidic pH. In one embodiment, the invention relates to a method of removing a metal oxide soil from... | 11/03/2009 |
| 7604702 | Method, apparatus, and system for bi-solvent based cleaning of precision components A bi-solvent cleaning system for cleaning precision components without the use of VOC solvents. The bi-solvent cleaning system provides for is a two mode operation for cleaning and rinsing precision components using VOC exempt solvents that is as effective as prior ... | 10/20/2009 |
| 7594971 | Method of cleaning and sterilizing medical instruments A novel method of cleaning and disinfecting organically contaminated articles such as, for instance, medical instruments, wherein the cleaning cycle consists of two sections divided by removal and replenishing the cleaning liquid, in each section of which the temper... | 09/29/2009 |
| 7578890 | Method for removing contaminants from silicon wafer surface Taught is a method of removal surface contaminants, including organic contaminants, metal ions and solid particles, from silicon wafer surface comprising the following steps: (a) submerging the silicon wafer surface in an aqueous cleaning agent solution through whic... | 08/25/2009 |
