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| Number | Title | Issue Date |
| 7435302 | Surface treatment apparatus and method for manufacturing liquid crystal display device A cleaning apparatus according to the present invention is provided with a brush drive mechanism which brings a brush being rotating closer to a substrate, measures electrical potentials generated on a plurality of conductor patterns formed on the substrate, by a co... | 10/14/2008 |
| 7337635 | Washing agent dispenser for a domestic washing machine, namely a dishwasher Washing agent dispenser for a household washing machine, namely a dishwasher, which dispenser has a body (2) delimiting at least a recess (3) for containing a certain amount of washing agent, comprising occlusion means (4,5) for said recess (... | 03/04/2008 |
| 7337860 | Apparatus and process for removing liquids from drill cuttings Drill cuttings associated with drilling fluid are thermally cleaned. The wet cuttings are fed into a vessel chamber having mechanical mixers, such as ribbon blenders, extending lengthwise of the chamber. Direct heating is applied to the chamber contents by introduci... | 03/04/2008 |
| 7326348 | Method for removal and destruction of ammonia from an aqueous medium Methods and apparatuses are provided for the removal and destruction of ammonia from an aqueous medium. The methods and apparatuses include the removal of ammonia from an aqueous medium by contact with either natural or synthetic zeolite. The spent zeolite is regene... | 02/05/2008 |
| 7128169 | Method for the removal and recovery of the oily component from drill cuttings with liquid CO Method for the removal and recovery of the oily component from cuttings coming from the drilling of oil wells by treatment of the cuttings with a solvent, which can be compressed to the liquid state, at a pressure value ranging from 45 to 80 bar and a temperature co... | 10/31/2006 |
| 7117876 | Method of cleaning a side of a thin flat substrate by applying sonic energy to the opposite side of the substrate A method of processing thin flat articles, particularly semiconductor wafers, utilizing sonic energy. In one aspect, the invention is a method comprising: supporting a substrate in a generally horizontal orientation and transmitting sonic energy to the substrate whi... | 10/10/2006 |
| 7118631 | Method for separating substances from particulate solids A method for separating a substance such as a hydrocarbon from a particulate material such as soil is provided. An aqueous slurry is formed and a shear force is applied to the slurry, such as in a reversible helical screw conveyor, while the slurry is vibrated. The ... | 10/10/2006 |
| 7108784 | Apparatus for removal and destruction of ammonia from an aqueous medium Methods and apparatuses are provided for the removal and destruction of ammonia from an aqueous medium. The methods and apparatuses include the removal of ammonia from an aqueous medium by contact with either natural or synthetic zeolite. The spent zeolite is re-gen... | 09/19/2006 |
| 7081170 | Method of cleaning ballast A method of cleaning encrusted ballast comprises the steps of screening the encrusted ballast to separate detritus from the ballast, washing the screened ballast with water while removing the separated detritus on a conveyor belt unit, clarifying the washing water t... | 07/25/2006 |
| 7066187 | Modular treatment plant having horizontal drum machines A machine for treating bulk material of industrial volume parts, having a treatment drum which is arranged with a horizontal axis and can be driven in both directions of rotation around the axis, the treatment drum comprises a permanently open co-axial inlet apertur... | 06/27/2006 |
| 7033068 | Substrate processing apparatus for processing substrates using dense phase gas and sonic waves Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing chamber, a substrate holder inside of the processing chamber for holding a ... | 04/25/2006 |
| 6939408 | Method for surface preparation of workpieces utilizing fluid separation techniques A method for preparing a workpiece surface utilizing two more fluids of differing density and miscibility which create one or more fluid interfaces wherein the fluids are chosen such that the solubility or affinity of one of the fluids is high for a material to be r... | 09/06/2005 |
| 6932210 | Self-cleaning oscillating conveyor for deburring, dedusting and the onward transport of small parts A self-cleaning oscillating conveyor includes a vertical tube and a conveyor channel that is helically wound upwardly around the vertical tube with a corresponding electromagnetic oscillating unit and a casing tube, which surrounds the exterior of the conveyor chann... | 08/23/2005 |
| 6907890 | Capillary drying of substrates An apparatus and method for drying substrates. The inventive apparatus comprises: an object support member for supporting at least one substrate in a process tank having one or more support sections comprising capillary material. The inventive method is a method of ... | 06/21/2005 |
| 6904919 | Apparatus and method for separating substances from particulate solids A method for separating a substance such as a hydrocarbon from a particulate material such as soil is provided. An aqueous slurry is formed and a shear force is applied to the slurry, such as in a reversible helical screw conveyor, while the slurry is vibrated. The ... | 06/14/2005 |
| 6905551 | Method and apparatus for cleaning the front surface of a mounted lens In a method and apparatus for cleaning the front surface of a mounted lens a web is moved to a lowered position against the lens. A first segment of the web is then slackened. The first segment of web is then rubbed against the lens. Following the rubbing the web is... | 06/14/2005 |
| 6880560 | Substrate processing apparatus for processing substrates using dense phase gas and sonic waves Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing chamber, a substrate holder inside of the processing chamber for holding a ... | 04/19/2005 |
| 6797073 | Plant for washing plastic material A plant for the continuous washing of plastic material in scales. The plant having a washing apparatus, at least one filtering unit connected to the apparatus for purifying the washing fluid and means for varying the time the scales remain in the washing apparatus a... | 09/28/2004 |
| 6782898 | Ring-shaped part washing method and washing jig used in the method In a ring shaped part washing method an ultrasonic vibration plate 33 is disposed in a washing tank 23 filled with a washing fluid 31, and ultrasonic waves generated by the ultrasonic vibration plate 33 are applied to ring-shaped parts | 08/31/2004 |
| 6676766 | Method for cleaning a substrate using a sherbet-like composition A method for cleaning a substrate with sherbet-like composition, comprising mixing the liquid organic agent and pure water in a mixing vessel to form a mixture, supercooling the mixture uniformly at a predetermined temperature while stirring the mixture, ... | 01/13/2004 |
| 6652665 | Method of removing silicone polymer deposits from electronic components A method of removing cured silicone polymer deposits from electronic components. The components are immersed in a preheated solution of a quaternary ammonium fluoride in a hydrophobic non-hydroxylic aprotic solvent with agitation. The components are then ... | 11/25/2003 |
| 6645306 | Hydrogen peroxide pickling scheme for stainless steel grades The present invention relates to a process for pickling hot rolled, hot rolled & annealed, and cold rolled & annealed stainless steel strip in a continuous fashion. The process comprises a series of pre-pickling tanks and pickling tanks, and optionally in... | 11/11/2003 |
| 6638363 | Method of cleaning solder paste A cleaning apparatus for cleaning solder paste off the bottom side of a printed circuit board stencil includes a container of cleaning solution therein and a blade holder that is movable between a wiping position and the container of cleaning solution. A ... | 10/28/2003 |
| 6632751 | Method and apparatus for liquid-treating and drying a substrate The present invention is related to a method and apparatus for liquid treating and drying a substrate, such as a semiconductor wafer, the method comprising the step of immersing a substrate or a batch of substrates in a tank filled with a liquid, and remo... | 10/14/2003 |
| 6609528 | Method for producing saponified ethylene-vinyl acetate copolymer A method for producing a saponified ethylene-vinyl acetate copolymer, which comprises washing chips of a saponified ethylene-vinyl acetate copolymer. In this method, the chips containing impurities and methanol are introduced into a washing column through... | 08/26/2003 |
| 6601592 | Method of semiconductor substrate batch demounting This is a method of cassette-to-cassette batch demounting process that includes providing an apparatus having two cassettes for holding and separating semiconductor substrates. A first cassette is placed on top of a second cassette, using the first casset... | 08/05/2003 |
| 6599371 | Hydrogen peroxide pickling scheme for silicon-containing electrical steel grades The pickling process of the present invention is designed for pickling electrical steel strip in a continuous fashion and comprises at least one pickling tank equipped with at least one set of sprayers designed to spray the top and bottom surfaces of a st... | 07/29/2003 |
| 6585829 | Method for washing container A method of washing a container,including charging a material to be contained into a container body having a mouth-and-neck portion; mounting a container closure on the mouth-and-neck portion of the container body, the container closure having a top panel... | 07/01/2003 |
| 6539952 | Megasonic treatment apparatus The invention provides an apparatus and method for cleaning or etching wafers. The invention further provides a megasonic transducer designed to apply mechanical vibrations to a layer of fluid in contact with a wafer. The electromechanical transducer is h... | 04/01/2003 |
| 6527870 | Wafer cleaning module and method for cleaning the surface of a substrate In a method for cleaning a surface of a substrate an amount of a solution is applied on a surface of the substrate. After the solution is applied on the surface, crystallization of the solution is initiated to form a liquid-crystal mixture. Once the liqui... | 03/04/2003 |
| 6523551 | Apparatus and method for holding down bottles in a high pressure wash A machine for washing bottles has a conveyor which advances intermittently from station to station. The conveyor has a carriage extending transversely thereof formed to receive at least one inverted bottle. Full cone spray nozzles located above and below ... | 02/25/2003 |
| 6514353 | Label removal system and method thereof A label removal system for removing a label with a stock portion and an adhesive from a product includes a stripper, an applicator, a remover, and a transportation system. The stripper sprays a first liquid at the label to strip at least a portion of the ... | 02/04/2003 |
| 6491762 | Method for removal of cured films from cookware and bakeware products A method for removing non-stick coatings from cookware or bakeware products is disclosed. The method includes the step of determining the angles of the primary surfaces of a pan having a coating to be removed. The method further includes the step of confi... | 12/10/2002 |
| 6468357 | Remover for a ruthenium containing metal and use thereof A method for removing a ruthenium-containing metal includes the step of applying a remover to a semiconductor substrate. The remover includes a cerium (IV) nitrate salt and nitric acid.... | 10/22/2002 |
| 6468362 | Method and apparatus for cleaning/drying hydrophobic wafers A method and an apparatus that uses a surfactant to clean a hydrophobic wafer is provided. In a first aspect, the method may clean and dry a wafer without applying pure DI water to the wafer. In a second aspect, the method may clean a wafer by applying pu... | 10/22/2002 |
| 6463938 | Wafer cleaning method Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or s... | 10/15/2002 |
| 6461441 | Method of removing debris from cleaning pads in work piece cleaning equipment The cleaning pads (102, 104) that are used to clean work pieces (200), such as semiconductor wafers, are cyclically compressed against one another and rinsed with a rinsing fluid. By cyclically compressing the cleaning pads (102, 104) together and rinsing... | 10/08/2002 |
| 6457479 | Method of metal oxide thin film cleaning A method of cleaning a metal oxide thin film on a silicon wafer, includes dipping the wafer in an organic solvent; drying the wafer in a nitrogen atmosphere; and stripping any photoresist from the wafer in an oxygen atmosphere under partial vacuum at a te... | 10/01/2002 |
| 6454873 | System for processing fiberglass Process and apparatus for recovering clean fiberglass and urea formaldehyde from urea formaldehyde treated waste fiberglass, which involves the use of a continuous batch tunnel machine comprising end to end modules in each of which a perforated basket is ... | 09/24/2002 |
| 6432214 | Cleaning apparatus A machine for cleaning containers has inside and outside arrays of nozzles arranged to spray a cleaning solution onto containers supported on a spinning rotor. Used cleaning solution is diverted to a reclaim tank for reuse, thereby allowing low-cost clean... | 08/13/2002 |
