Bizarre Patents
Mouthguard made at least partially from an edible candy
A mouthguard includes a U-shaped upper bite plate which removably fits over upper teeth of a person, with the entire upper bite plate being made from a soft, deformable and edible gummi candy.
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| Number | Title | Issue Date |
| 7435301 | Cleaning solution of silicon germanium layer and cleaning method using the same Disclosed are a cleaning solution for preventing damage of a silicon germanium layer when cleaning a semiconductor device including the silicon germanium layer and a cleaning method using the same. The cleaning solution of a silicon germanium layer includes from abo... | 10/14/2008 |
| 7435302 | Surface treatment apparatus and method for manufacturing liquid crystal display device A cleaning apparatus according to the present invention is provided with a brush drive mechanism which brings a brush being rotating closer to a substrate, measures electrical potentials generated on a plurality of conductor patterns formed on the substrate, by a co... | 10/14/2008 |
| 7417018 | Method of cleaning a solid surface by removing organic and/or mineral soils using a microemulsion The invention relates to a method of cleaning a solid surface comprising the following stages: a) the solid surface is cleaned using a microemulsion-type cleaning composition; e) the cleaned surface is drained; f) the drained surface is rinsed with an organic solven... | 08/26/2008 |
| 7416611 | Process and apparatus for treating a workpiece with gases In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk transport achieved by entraining the gas in a liquid stream, spray or ... | 08/26/2008 |
| 7410545 | Substrate processing method of and substrate processing apparatus for freezing and cleaning substrate A substrate immersed in pure water held inside a processing bath disposed to a cleaning unit 1 and accordingly washed, as it bears an aqueous film on its surface, is transported by a substrate transportation mechanism 3 to a spin-processing unit 2 | 08/12/2008 |
| 7410543 | Substrate processing method Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing gas, such as ozone gas, into a processing vessel to pressurize an atm... | 08/12/2008 |
| 7404863 | Methods of thinning a silicon wafer using HF and ozone A method of thinning a silicon wafer in a controllable cost-effective manner with minimal chemical consumption. The wafer is placed into a process chamber, after which ozone gas and HF vapor are delivered into the process chamber to react with a silicon surface of t... | 07/29/2008 |
| 7360546 | Cleaning apparatus for semiconductor wafer A cleaning apparatus for a semiconductor wafer comprising: a double container including an inner container with an upper opening for accommodating a substrate to be cleaned and an outer container having an airtight space accommodating the inner container therein, th... | 04/22/2008 |
| 7353832 | Housingless washer An industrial parts washer includes a stand adapted to support a part, a chamber selectively movable from a first position clear of the part to a second position engaging the stand where the chamber forms a closed volume encapsulating the part. A nozzle is positione... | 04/08/2008 |
| 7347320 | Top dresser A top dresser (10) includes sheeting (70) in the form of an endless belt passing around first and second drums (148, 160) and a bed (166) including a plurality of rollers (106). Continuous V-shaped guides (122) are received ... | 03/25/2008 |
| 7349067 | Lithographic apparatus and device manufacturing method A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provi... | 03/25/2008 |
| 7337792 | Liquid processing apparatus and liquid processing method A cleaning apparatus 1 includes a foup loading/unloading part 2 for mounting foups F each accommodating a plurality of wafers W at intervals of a constant pitch (normal pitch), a rotor 34 capable of holding the wafers W at half the normal pitch ... | 03/04/2008 |
| 7338565 | Housingless washer An industrial parts washer includes a stand adapted to support a part, a chamber selectively moveable from a first position clear of the part to a second position engaging the stand where the chamber forms a closed volume encapsulating the part. A nozzle is position... | 03/04/2008 |
| 7329482 | Dampening water composition for lithographic printing A dampening water composition for a lithographic printing comprising an adduct compound of ethylene oxide and propylene oxide to ethylenediamine, which compound has a weight-average molecular weight of from 500 to 1500. The dampening water composition can be used in... | 02/12/2008 |
| 7328503 | Recycling system for engine oil filter A recycling system is used for processing an engine oil filter and comprises a frame, a filter net, a cutting device, a dividing device, and a compressing device. Thus, all of the parts of the used engine oil filter can be divided, processed and reused respectively,... | 02/12/2008 |
| 7326305 | System and method for decapsulating an encapsulated object A system and method for the selective etching or removal of encapsulating material from an encapsulated object, such as a semiconductor, includes depositing an encapsulant-removal agent, such as a solvent or acid, onto the surface of the object. A flow of heated gas... | 02/05/2008 |
| 7306680 | Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface. ... | 12/11/2007 |
| 7294576 | Tunable selectivity slurries in CMP applications The invention provides a method of preparing a chemical-mechanical polishing composition for polishing a substrate with at least a first layer and a second layer. The method comprises providing both a first chemical-mechanical polishing composition comprising an abr... | 11/13/2007 |
| 7293567 | Application of acoustic and vibrational energy for fabricating bumped IC die and assembly of PCA's A method and apparatus are disclosed for improving a screen printing process by applying vibrational energy to assist in the print release, cleaning, and drying processes. The vibrational energy or acoustic pressure waves may be created by a transducer where the wav... | 11/13/2007 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7287537 | Megasonic probe energy director A megasonic cleaning apparatus configured to provide effective cleaning of a substrate without causing damage to the substrate is provided. The apparatus includes a megasonic probe, a transducer configured to energize the probe, and a heat transfer element disposed ... | 10/30/2007 |
| 7284560 | Liquid processing apparatus A liquid processing apparatus has a substrate rotating device including a holder for holding a substrate and a motor, a chamber for applying the liquid processing to the substrate, a posture changing mechanism for changing the posture of the substrate rotating devic... | 10/23/2007 |
| 7282099 | Dense phase processing fluids for microelectronic component manufacture Method for processing an article by contacting the article with a dense fluid. The article is introduced into a sealable processing chamber and the processing chamber is sealed. A dense fluid is prepared by introducing a subcritical fluid into a pressurization vesse... | 10/16/2007 |
| 7279050 | One-piece bottom edge wipe sponge for cleaning a photoreceptor drum A one-piece sponge cleans and removes coating material from the bottom edge, inside and outside surface of a photoreceptor drum. The one-piece sponge has an inner sponge section and an outer sponge section, both with internal channels to remove solvent and dissolved... | 10/09/2007 |
| 7270136 | Apparatus for cleaning the edges of wafers The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning, thus resulting in increase of the yield rate of wafers. The apparatus... | 09/18/2007 |
| 7270941 | Method of passivating of low dielectric materials in wafer processing A method of passivating silicon-oxide based low-k materials using a supercritical carbon dioxide passivating solution comprising a silylating agent is disclosed. The silylating agent is preferably an organosilicon compound comprising organo-groups with five carbon a... | 09/18/2007 |
| 7264680 | Process and apparatus for treating a workpiece using ozone A method for cleaning a semiconductor workpiece having a metal layer in a processing chamber includes the steps of introducing a liquid solution including dissolved carbon dioxide onto the workpiece, and introducing ozone into the processing chamber. The ozone oxidi... | 09/04/2007 |
| 7261847 | Process for the functional regeneration of the porosity of moulds used for moulding ceramic objects A process for the functional regeneration of the porosity of the materials used to make molds (2) for moulding ceramic objects, when the pores have been damaged by use of the mold (2), comprises the sequential execution of at least two successive steps... | 08/28/2007 |
| 7258747 | Multi-motion stainbrush A method of using an electric stainbrush for cleaning inanimate surfaces is provided. The electric stainbrush includes a handle having a motor disposed therein, a head having a longitudinal axis, and a neck disposed between the handle and the head. First and second ... | 08/21/2007 |
| 7255114 | Ion sampling system for wafer An ion sampling method for wafer provides a wafer in a sampling chamber, wherein the wafer surface that is going to be sampled faces upward; spraying an extraction liquid continuously on the wafer surface to form a liquid film thereon; keeping the thickness of the f... | 08/14/2007 |
| 7255749 | Substrate cleaning method and substrate cleaning apparatus In a cleaning treatment of a substrate using an aqueous solution of ammonium fluoride or a mixture of an aqueous solution of ammonium fluoride and hydrofluoric acid as a cleaning liquid, the cleaning liquid is replenished by at least one liquid selected from the gro... | 08/14/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7250086 | Method of using a solid rinse additive dispenser for dispensing a use solution in a dishwashing machine A preferred embodiment method for dispensing a use solution from a solid product into a dishwashing machine includes placing a solid product in a dispenser. The product dispenser (10) for dispensing a use solution from a solid product includes a chamber (1... | 07/31/2007 |
| 7244315 | Microelectronic device drying devices and techniques Improved methods of rinsing and drying microelectronic devices by way of an immersion processing apparatus are provided for effectively cleaning microelectronic devices. Methods and arrangements control the separation of one or more microelectronic devices from a li... | 07/17/2007 |
| 7243911 | Substrate treating apparatus A substrate treating apparatus for performing a predetermined treatment of substrates includes a treating tank for storing a treating solution, a holder for holding a plurality of substrates arranged in one direction inside the treating tank, and a bubble generating... | 07/17/2007 |
| 7240680 | Substrate processing apparatus A substrate processing apparatus includes a rotor 45 for rotating a plurality of wafers W paralleled each other at appropriate intervals. While rotating the wafers W by the rotor 45, a chemical liquid is supplied to the wafers W for their processing. T... | 07/10/2007 |
| 7238090 | Polishing apparatus having a trough Methods and apparatus for chemical mechanical polishing are described. In one embodiment, an apparatus includes a table top and a transfer station and multiple polishing stations are mounted on the table top. The apparatus further includes multiple washing stations,... | 07/03/2007 |
| 7235141 | Lift-off method and chemical liquid tank A lift-off procedure is provided which enables prevention of damage to a wiring pattern caused by contact of a metal being peeled off from a wafer with a wiring pattern at a time of lift-off procedure. A wafer having a surface on which a pattern is formed which cont... | 06/26/2007 |
| 7226512 | Load lock system for supercritical fluid cleaning A substrate is transferred from an environment at about vacuum into a load lock through a first door. The substrate is then sealed within the load lock. The pressure within the load lock is raised to a high pressure above vacuum. A second door coupling the load lock... | 06/05/2007 |
