Bizarre Patents
Dining Table Having Integral Dishwasher
A space-saving dishwasher, which may be installed within a counter top or table, having a dish-carrying rack that is vertically shiftable through the open top of the dishwasher for facilitating loading and unloading of the dishes.
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| Number | Title | Issue Date |
| 8087419 | Substrate holding rotating mechanism, and substrate processing apparatus A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holdin... | 01/03/2012 |
| 7958899 | Substrate cleaning apparatus and substrate cleaning method At a vibration applying position, ultrasonic vibration is applied upon a liquid film which is on a surface of a substrate. Concurrently with this, at a drop arrival position which is different from the vibration applying position, drops of a cleaning liquid are supp... | 06/14/2011 |
| 7938130 | Substrate holding rotating mechanism, and substrate processing apparatus A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holdin... | 05/10/2011 |
| 7766021 | Substrate treatment apparatus A substrate treatment apparatus, which treats a substrate with a treatment liquid that is ultrasonically vibrated, includes an oscillator body which is rectangular-parallelepiped and has a treatment liquid supply path having an opening on a lower surface thereof in ... | 08/03/2010 |
| 7422023 | Tissue valve cleansing apparatus The apparatus includes a housing having a centrally disposed longitudinal axis situated along a horizontal plane during operating conditions. The housing further has a monolithically formed flange portion extending orthogonally therefrom. The flange portion has a pl... | 09/09/2008 |
| 7422024 | Ultrasonic shower cleaning apparatus of double-side cleaning type An ultrasonic shower cleaning apparatus is disclosed which is capable of efficiently cleaning both surfaces of an article and configured to have a reduced size enabling an installation space thereof to be decreased. A pair of ultrasonic shower cleaning mechanisms ea... | 09/09/2008 |
| 7387132 | Apparatus for treating wafer An apparatus for treating a wafer preferably includes a rotating chuck for rotating the wafer and a treating fluid supplying part for supplying the wafer with one or more treating fluids. The treating fluid(s) can be used to clean and/or dry the wafer. The treating ... | 06/17/2008 |
| 7354481 | Substrate holding and rotating apparatus A substrate holding and rotating apparatus includes: a spin base connected to a rotary shaft and rotatable therearound; holding members attached to the spin base and displaceable between holding positions at which the holding members come in contact with the periphe... | 04/08/2008 |
| 7326300 | Coating apparatus and method using the same A coating apparatus (2) includes a work table (20) having a plurality of blowing holes (201) for suspending a substrate (200) thereabove, a coating unit (22) having a photoresist coating nozzle (222) and a supplying device (... | 02/05/2008 |
| 7306002 | System and method for wet cleaning a semiconductor wafer A system and method for cleaning a substrate, such as a semiconductor wafer, utilizes a rotatable wafer supporting assembly with a cylindrical body to provide stability for the substrate being cleaned, even at high rotational speeds. The rotatable wafer supporting a... | 12/11/2007 |
| 7284760 | Holding device for disk-shaped objects Semiconductor technology requires the use of object holders, which are capable of holding wafers securely, also during rotation. In order to save time and expense, such holders should be suitable for integration directly into a processing facility, wherever possible... | 10/23/2007 |
| 7270136 | Apparatus for cleaning the edges of wafers The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning, thus resulting in increase of the yield rate of wafers. The apparatus... | 09/18/2007 |
| 7267129 | Device and process for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the outside to the peripheral-side edge of the wafer-shaped article and ... | 09/11/2007 |
| 7267132 | Methods for removing silicon and silicon-nitride contamination layers from deposition tubes Described are methods, systems, and chemistries for removing layers of stubborn silicon and silicon-nitride contamination layers from the inside surfaces of such articles as deposition tubes. In such embodiments, a tube to be cleaned is gently rolled on it side whil... | 09/11/2007 |
| 7258124 | Apparatus and method for treating surfaces of semiconductor wafers using ozone An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of processing fluid formed o... | 08/21/2007 |
| 7252102 | Ultrasonic slat washer An ultrasonic cleaner apparatus is disclosed which includes a support housing, a tub supported by the housing and an ultrasound and sensor transducer contacting the bottom of the cleaning tank. A fixture assembly for holding items to be cleaned is configured for ins... | 08/07/2007 |
| 7201176 | Wafer chucking apparatus for spin processor A wafer chuck is configured to hold a wafer efficiently for spin process cleaning of wafer edges and back sides. A first group of retractable tips extend to hold the wafer during a first portion of the cleaning period. A second group of retractable tips extend to ho... | 04/10/2007 |
| 7172674 | Device for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, in which a mask is kept at a defined short distance to the wafer-shaped article such that liquid can be retained between the mask and the defined area of the wafer-shap... | 02/06/2007 |
| 7140066 | Apparatus and method for inspecting and cleaning semiconductor devices A semiconductor device is inspected and cleaned by applying a vacuum to the area in which the semiconductor device is positioned. Micro-sized particulates that are brushed off the semiconductor device during cleaning are drawn off by the vacuum. ... | 11/28/2006 |
| 7108001 | Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating speed and direction sensors and a home position locator facilitate motor... | 09/19/2006 |
| 7087122 | Wafer backside plate for use in a spin, rinse, and dry module and methods for making and implementing the same A method for spinning a wafer to enable rinsing and drying is provided. The method includes engaging the wafer at a wafer processing plane and spinning the wafer. The method further includes moving a wafer backside plate from a first position to a second position as... | 08/08/2006 |
| 7073521 | Substrate processing apparatus comprising ring-shaped motor In a substrate processing apparatus for performing a substrate processing with a substrate being rotated, a ring-shaped motor is provided and a water pipe, a drainpipe and gas supply pipes are connected to a stationary part of the motor covered with a rotating part ... | 07/11/2006 |
| 7055535 | Holding unit, processing apparatus and holding method of substrates A holding unit holds a substrate to enable a surface of the substrate to be processed. The unit has a vacuum suction member that comes into contact with a peripheral portion of the surface of the substrate and sucks the substrate. A processing apparatus holds the wa... | 06/06/2006 |
| 7056392 | Wafer chucking apparatus and method for spin processor A wafer chuck is configured to hold a wafer efficiently for spin process cleaning of wafer edges and back sides. A first group of retractable tips extend to hold the wafer during a first portion of the cleaning period. A second group of retractable tips extend to ho... | 06/06/2006 |
| 7051743 | Apparatus and method for cleaning surfaces of semiconductor wafers using ozone An apparatus and method for cleaning surfaces of semiconductor wafers utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of cleaning fluid formed on a semiconductor wafer surface to inc... | 05/30/2006 |
| 7040330 | Method and apparatus for megasonic cleaning of patterned substrates A system for cleaning a semiconductor substrate is provided. The system includes transducers for generating acoustic energy oriented in a substantially perpendicular direction to a surface of a semiconductor substrate and an acoustic energy oriented in a substantial... | 05/09/2006 |
| 7007702 | Device and process for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the outside to the peripheral-side edge of the wafer-shaped article and ... | 03/07/2006 |
| 7000623 | Apparatus and method for substrate preparation implementing a surface tension reducing process Methods and systems for preparing a substrate implementing a surface tension reducing process are provided. In one example, a substrate preparation system includes a chuck which fingers for edge gripping the substrate. The chuck is hollow to provide simultaneous acc... | 02/21/2006 |
| 6997195 | Ergonomic dishwashing machine The dishwashing machine has at least two washing vessels (10–12) that are separated from each other and are part of a structural assembly (3) that is capable of being pulled out as a whole from a casing (1) in which it is housed. Each such was... | 02/14/2006 |
| 6983755 | Cleaning method and cleaning apparatus for performing the same A cleaning apparatus includes upper and lower nozzle assemblies supplying a cleaning liquid to edge and bottom sections of a semiconductor substrate. The upper nozzle assembly has a first nozzle supplying the cleaning liquid onto the edge section, and second and thi... | 01/10/2006 |
| 6969682 | Single workpiece processing system A system for processing wafers includes a robot moveable within an enclosure to load and unload workpieces into and out of workpiece processors. A processor includes an upper rotor having alignment pins, and a lower rotor having one or more openings for receiving th... | 11/29/2005 |
| 6964724 | Etching and cleaning methods and etching and cleaning apparatuses used therefor An etching/cleaning apparatus is provided, which makes it possible to effectively remove an unnecessary material or materials existing on a semiconductor wafer without damaging the device area with good controllability. The apparatus comprises (a) a rotating means f... | 11/15/2005 |
| 6960265 | Apparatus and method for collecting metallic impurity on a semiconductor wafer An apparatus and method for automatically collecting metallic impurities of a semiconductor wafer. In one aspect, an apparatus includes an air tight process chamber including a loading unit for loading the semiconductor wafer and unloading unit for unloading the sem... | 11/01/2005 |
| 6949172 | Arrangement enabling a liquid to flow evenly around a surface of a sample and use of said arrangement The invention relates to an arrangement enabling a liquid (2) to flow evenly around a surface of a sample (3); said arrangement has a flow chamber (1) through which a liquid (2) flows via inflow and outflow pipes (7, 8). The sample... | 09/27/2005 |
| 6945260 | Machine for treating objects A machine for treating objects having a series of stations (12) whereof each includes a system for gripping (16) a container (11) in a loading point of the path, wherein, between the loading and unloading points, the container (11) is dis... | 09/20/2005 |
| 6916126 | Developing method for semiconductor substrate Embodiments of the present invention provide a developing method, which can efficiently prevent the developing solution from remaining on the backside surface of the wafer, so as to avoid the influence of the contamination on the subsequent processes. In one embodim... | 07/12/2005 |
| 6913651 | Apparatus and method for electroless deposition of materials on semiconductor substrates An apparatus of the invention has a closable chamber that can be sealed and is capable of withstanding an increased pressure and high temperature. The chamber contains a substrate holder that can be rotated around a vertical axis, and an edge-grip mechanism inside t... | 07/05/2005 |
| 6900132 | Single workpiece processing system A system for processing semiconductor wafers has process units on a deck of a frame. The process units and the deck have precision locating features, such as tapered pins, for precisely positioning the process units on the deck. Process units can be removed and repl... | 05/31/2005 |
| 6895981 | Cross flow processor A centrifugal processor includes an elongated inlet and outlet in fluid communication with a rotor housing having an eccentric bowl. A rotor having fan blades and adapted to hold flat media is rotatably disposed within the rotor housing. An intake gate is pivotably ... | 05/24/2005 |
| 6895979 | Processing apparatus and processing method A processing apparatus essentially includes a rotatable rotor 21 for carrying semiconductor wafers W, a motor 22 for driving to rotate the rotor 21, a plurality of processing chambers for surrounding the wafers W carried by the rotor 21, ... | 05/24/2005 |
