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| Number | Title | Issue Date |
| 7409960 | Cleaning fluid container The invention aims at improving a cleaning fluid container (3) for a cleaning device (RV) for personal needs, in particular for cleaning a shaving head (SK) of a dry shaving apparatus (R), with a housing (20), with an inlet port (15) provided on... | 08/12/2008 |
| 7360546 | Cleaning apparatus for semiconductor wafer A cleaning apparatus for a semiconductor wafer comprising: a double container including an inner container with an upper opening for accommodating a substrate to be cleaned and an outer container having an airtight space accommodating the inner container therein, th... | 04/22/2008 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7278434 | Cleaning device with toggle for increasing ozone dissolution in water for cleaning vegetables and fruits A cleaning device with a toggle serves for increasing ozone dissolution in water for cleaning vegetables and fruits. The cleaning device is placed in a washing barrel. The cleaning device comprises a toggle being a circular body which is installed with at least one ... | 10/09/2007 |
| 7255114 | Ion sampling system for wafer An ion sampling method for wafer provides a wafer in a sampling chamber, wherein the wafer surface that is going to be sampled faces upward; spraying an extraction liquid continuously on the wafer surface to form a liquid film thereon; keeping the thickness of the f... | 08/14/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7217325 | System for processing a workpiece A system for processing a workpiece includes a process head assembly and a base assembly. The process head assembly has a process head and an upper rotor. The base assembly has a base and a lower rotor. The base and lower rotor have magnets wherein the upper rotor i... | 05/15/2007 |
| 7207499 | Apparatus and method for producing porous polymer particles An apparatus and method for producing porous polymer particles is disclosed. The apparatus includes a rotating atomizer wheel (39) onto which a uniform thin layer of a polymer may be applied via a distributor (40), followed by the movement of the polym... | 04/24/2007 |
| 7205153 | Analytical reagent for acid copper sulfate solutions Embodiments of the invention provide an analytical method and analytical reagent solutions for determining the concentration of electrolyte components, such as copper, acid and chloride constituents in an acid or basic metal plating bath using a chemical analyzer. C... | 04/17/2007 |
| 7192494 | Method and apparatus for annealing copper films A method and apparatus for annealing copper. The method comprises forming a copper layer by electroplating on a substrate in an integrated processing system and annealing the copper layer in a chamber inside the integrated processing system. ... | 03/20/2007 |
| 7189313 | Substrate support with fluid retention band An apparatus and method for supporting a substrate is provided. In one embodiment, an apparatus for supporting a substrate includes a body having a band extending therefrom. The band is adapted to retain a fluid on the body thereby forming a shallow processing bath ... | 03/13/2007 |
| 7160511 | Liquid pipetting apparatus and micro array manufacturing apparatus A liquid pipetting apparatus for dispensing liquid of minute volume for use in a survey instruments of a hemanalysis machine, a genetic screening, and a pharmaceutical screening, etc., is disclosed. The liquid pipetting apparatus comprises a liquid holding member fo... | 01/09/2007 |
| 7140393 | Non-contact shuttle valve for flow diversion in high pressure systems A valve for redirecting flow in a supercritical fluid or other high pressure processing system is disclosed. In high pressure supercritical carbon dioxide (SCCO2) equipment for semiconductor wafer processing, a major hurtle in providing clean equipment and clean waf... | 11/28/2006 |
| 7140512 | Interlocking lid for wet bench An interlocking lid which is suitable for a wet bench tank used in the processing of semiconductor wafer substrates. The interlocking lid includes a pair of lid panels typically provided with a clasp having elements for engaging and interlocking with each other when... | 11/28/2006 |
| 7138039 | Liquid isolation of contact rings Embodiments of the invention may further provide a contact ring for an electrochemical plating system. The contact generally includes a substrate receiving member having a substrate support surface formed thereon, a plurality of electrical contact pins extending fro... | 11/21/2006 |
| 7111632 | Ultrasonic cleaning device for removing undesirable particles from an object A cleaning device for cleaning an object includes an inner vessel configured to contain a first liquid and the object. The cleaning device also includes an external vessel configured to contain a second liquid and the inner vessel. The second liquid is acoustically ... | 09/26/2006 |
| 7087144 | Contact ring with embedded flexible contacts A contact assembly for supporting a substrate in an electrochemical plating system, wherein that contact assembly includes a contact ring and a thrust plate assembly. The contact ring includes an annular ring member having an upper surface and a lower surface, an an... | 08/08/2006 |
| 7025861 | Contact plating apparatus Embodiments of the invention generally provide a substrate processing system and method. The substrate processing system generally includes a fluid basin configured to contain a plating solution therein, an anode assembly positioned in a lower portion of the fluid b... | 04/11/2006 |
| 6994776 | Method and apparatus for low temperature annealing of metallization micro-structure in the production of a microelectronic device A method for filling recessed microstructures at a surface of a microelectronic workpiece, such as a semiconductor wafer, with metallization is set forth. In accordance with the method, a metal layer is deposited into the microstructures with a process, such as an e... | 02/07/2006 |
| 6969682 | Single workpiece processing system A system for processing wafers includes a robot moveable within an enclosure to load and unload workpieces into and out of workpiece processors. A processor includes an upper rotor having alignment pins, and a lower rotor having one or more openings for receiving th... | 11/29/2005 |
| 6949146 | Ultrasonic cleaning module for singulated electronic packages The invention provides an ultrasonic cleaning module and a method for cleaning singulated electronic packages. The module comprises a cutting chuck having a surface with a plurality of cutting recesses defined in it for enabling a cutting device to separate individu... | 09/27/2005 |
| 6926017 | Wafer container washing apparatus The present invention is directed to a semi-conductor handling equipment cleaning apparatus configured for use with wafer carriers. The base of the cleaning apparatus is configured to support the wafer carrier in sealing contact about a first aperture. A first fluid... | 08/09/2005 |
| 6904920 | Method and apparatus for cleaning containers A machine for cleaning containers such as flat media carriers has inside and outside arrays of nozzles arranged to spray a cleaning solution onto containers supported on a spinning rotor in a chamber. The cleaning solution, a mixture of water and a detergent or surf... | 06/14/2005 |
| 6866049 | Device addressing gas contamination in a wet process A device for wet processing of a semiconductor-containing substrate that addresses contamination in the wet process by removing undesired sources of gas contamination, the method involving pumping a processing liquid through a degasifier, exposing the semiconductor ... | 03/15/2005 |
| 6863079 | Semiconductor wafer washing system and method of supplying chemicals to the washing tanks of the system A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer washing system includes a washing solution supply section in which a plura... | 03/08/2005 |
| 6776175 | Liquid waste disposal and canister flushing system A liquid waste disposal and canister flushing system for a medical canister including a press-fit canister lid, features a cabinet with an opening and a sink with a drain positioned therein. A mounting bracket is affixed to the cabinet and includes a shaft connected... | 08/17/2004 |
| 6712081 | Pressure processing device A pressure processing device including a vessel having a body and an opening/closing member. A seal member is provided on a joining surface between the body and the opening/closing member, and a non-sliding joining surface is provided which is not slidably moved whe... | 03/30/2004 |
| 6691720 | Multi-process system with pivoting process chamber A system for processing a workpiece includes an inner chamber pivotably supported within an outer chamber. The inner chamber has an opening to allow liquid to drain out. A motor pivots the inner chamber to bring the opening at or below the level of liquid... | 02/17/2004 |
| 6680253 | Apparatus for processing a workpiece A system for processing a workpiece includes a base having a bowl or recess for holding a liquid. A process reactor or head holds a workpiece between an upper rotor and a lower rotor. A head lifter lowers the head holding the workpiece into contact with t... | 01/20/2004 |
| 6672319 | Pressurized liquid diffuser The invention relates to a diffuser for wet processing systems involved in the manufacturing of semiconductor wafers. The diffuser includes a plenum section and a slitted section. Pressurized fluid from the plenum section is forced through the slitted sec... | 01/06/2004 |
| 6668844 | Systems and methods for processing workpieces Workpieces requiring low levels of contamination, such as semiconductor wafers, are loaded into a rotor within a process chamber. The process chamber has a horizontal drain opening in its cylindrical wall. The chamber is closed via a door. A process or ri... | 12/30/2003 |
| 6626194 | Electric shaver cleaning apparatus A cleaning apparatus for electric shaver components has a removable basket that fits inside a compartment. Cleaning is carried out by pumping cleaning fluid and air into a bottom of the compartment via a sieve plate. Debris removed from the components is ... | 09/30/2003 |
| 6622738 | Apparatus and system for removing photoresist through the use of hot deionized water bath, water vapor and ozone gas An apparatus and system for removing photoresist or other organic material from a substrate such as a semiconductor wafer is provided. The apparatus and system includes a chamber for partially immersing the substrate in a solvent (e.g., deionized water), ... | 09/23/2003 |
| 6532976 | Semiconductor wafer cleaning apparatus A semiconductor wafer cleaning apparatus comprises an outer tank, a cleaning tank provided within the outer tank, a wafer carrier provided within the cleaning tank, a plurality of jet nozzles directed toward the wafer carrier, a main pipe connected to the... | 03/18/2003 |
| 6505634 | Semiconductor wafer cleaning apparatus The object of this invention is to provide a semiconductor wafer cleaning apparatus designed to clean several wafers at the same time while rotating the wafers held in a horizontal, laid-down position. In an operation of this apparatus, a wafer feeding ro... | 01/14/2003 |
| 6502591 | Surface tension effect dryer with porous vessel walls A processor for rinsing and drying of semiconductor substrates includes a process vessel contained within an outer containment vessel. A diluted organic vapor creates a Marangoni effect flow along the surface of processing liquid contained within the proc... | 01/07/2003 |
| 6474350 | Cleaning device for probe needle of probe card and washing liquid used therefor A cleaning device for a probe needle of a probe card rarely causing abrasion and deformation of the tip of a probe needle and capable of improving a probe needle life as well as a washing liquid used therefor are obtained. The tip of a probe needle of a p... | 11/05/2002 |
| 6374835 | Parts washing system Provided is a parts washer that includes a multi-tiered basin, a cleaning fluid and a biological component, living within the fluid, that breaks down organic waste. The multi-tiered basin includes a sink member with a false bottom, and a support grid and ... | 04/23/2002 |
| 6363953 | Device for cleaning contact lens and similar utility items A device for cleaning contact lenses, which device comprises a first chamber (1) provided with draining means (3,8), a second chamber (2) adapted to be fluidly communicable with the first chamber (1), a lens holder (20) adapted to be inserted in the first... | 04/02/2002 |
