Class 134/151 - With spray or jet applying conduits or nozzles

Subclass of Class 134 - Cleaning and liquid contact with solids
Definition: Apparatus having fluid nozzles or jet forming means for
No. of patents: 88
Last issue date: 03/23/2010

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Number	Title	Issue Date
7681581	Compact duct system incorporating moveable and nestable baffles for use in tools used to process microelectronic workpieces with one or more treatment fluids Apparatuses, and related methods, for processing a workpiece that include particular baffle members or duct structures having an inlet proximal to an outer periphery of a workpiece and/or workpiece support. ...	03/23/2010
7416647	Plating processing device A plating processing device comprises: a plating bath, on which an object to be plated is mounted; and a sparger provided with plating nozzle and washing nozzle for jetting plating solution and washing solution, respectively, toward the object in such a manner that ...	08/26/2008
7412982	Cleaning probe and megasonic cleaning apparatus having the same A cleaning probe capable of providing uniform cleaning to an entire wafer while not damaging the edge portion of the wafer, and a megasonic cleaning apparatus having the cleaning probe are provided. The cleaning probe comprises a front portion located near the cente...	08/19/2008
7396416	Substrate cleaning device A substrate cleaning device comprises a chamber for cleaning a substrate; a substrate support installed in the chamber providing a surface for supporting the substrate during cleaning thereof; at least one cleaning solution supply outlet for spraying a cleaning solu...	07/08/2008
7306002	System and method for wet cleaning a semiconductor wafer A system and method for cleaning a substrate, such as a semiconductor wafer, utilizes a rotatable wafer supporting assembly with a cylindrical body to provide stability for the substrate being cleaned, even at high rotational speeds. The rotatable wafer supporting a...	12/11/2007
7287535	Work washing apparatus A work washing apparatus including a transfer unit for controlling forward and rearward movements of a work, a table moved by the transfer unit, carrying out the washing of the work from upper and lower surfaces thereof and provided with water/air pipes, an upper su...	10/30/2007
7264008	Apparatus for cleaning a wafer An apparatus for cleaning a wafer includes a plurality of holders for contacting and securing peripheral portions of a wafer, and for rotating the wafer, a first plate disposed to face a first surface of the wafer, the first plate having a plurality of first nozzles...	09/04/2007
7243911	Substrate treating apparatus A substrate treating apparatus for performing a predetermined treatment of substrates includes a treating tank for storing a treating solution, a holder for holding a plurality of substrates arranged in one direction inside the treating tank, and a bubble generating...	07/17/2007
7223323	Multi-chemistry plating system Embodiments of the invention generally provide an electrochemical plating system. The plating system includes a substrate loading station positioned in communication with a mainframe processing platform, at least one substrate plating cell positioned on the mainfram...	05/29/2007
7192494	Method and apparatus for annealing copper films A method and apparatus for annealing copper. The method comprises forming a copper layer by electroplating on a substrate in an integrated processing system and annealing the copper layer in a chamber inside the integrated processing system. ...	03/20/2007
7189313	Substrate support with fluid retention band An apparatus and method for supporting a substrate is provided. In one embodiment, an apparatus for supporting a substrate includes a body having a band extending therefrom. The band is adapted to retain a fluid on the body thereby forming a shallow processing bath ...	03/13/2007
7087144	Contact ring with embedded flexible contacts A contact assembly for supporting a substrate in an electrochemical plating system, wherein that contact assembly includes a contact ring and a thrust plate assembly. The contact ring includes an annular ring member having an upper surface and a lower surface, an an...	08/08/2006
7051743	Apparatus and method for cleaning surfaces of semiconductor wafers using ozone An apparatus and method for cleaning surfaces of semiconductor wafers utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of cleaning fluid formed on a semiconductor wafer surface to inc...	05/30/2006
7047984	Device and method for cleaning articles used in the production of semiconductor components A cleaning device for use in the production of semiconductor components comprises two feed devices with which a fluid medium is guided across a respective surface of an object to be cleaned so that different faces of the object are simultaneously cleaned. At least t...	05/23/2006
7047989	Sonic-energy cleaner system with gasified fluid In accordance with one embodiment there is provided a method of improving the performance of a substrate cleaner of the type having a megasonic probe with a probe shaft extending generally parallel to a surface of a rotating substrate, and at least one dispenser for...	05/23/2006
7044435	System for influencing the rheological properties of a transportable material A system for influencing the rheological properties of a transportable material, especially a free-flowing, pasty or bulk product is associated, or can be associated, with a machine for processing or treating the transportable material in which the transportable mat...	05/16/2006
7032604	Three rack dishwasher An improved dishwasher is provided with a lower rack, a middle rack, and an upper rack. Each rack has a spray arm associated therewith. A fourth spray arm may also be provided for enhanced cleaning of objects in the racks. The lower rack is a low profile tineless ra...	04/25/2006
7025861	Contact plating apparatus Embodiments of the invention generally provide a substrate processing system and method. The substrate processing system generally includes a fluid basin configured to contain a plating solution therein, an anode assembly positioned in a lower portion of the fluid b...	04/11/2006
6994776	Method and apparatus for low temperature annealing of metallization micro-structure in the production of a microelectronic device A method for filling recessed microstructures at a surface of a microelectronic workpiece, such as a semiconductor wafer, with metallization is set forth. In accordance with the method, a metal layer is deposited into the microstructures with a process, such as an e...	02/07/2006
6983756	Substrate treatment process and apparatus A substrate treatment apparatus comprises a treatment vessel, a substrate holder for rotating the substrate in a horizontal plane in the treatment vessel, a nozzle unit arranged in an upper part of the treatment vessel such that a liquid is downwardly fed, a feed li...	01/10/2006
6983755	Cleaning method and cleaning apparatus for performing the same A cleaning apparatus includes upper and lower nozzle assemblies supplying a cleaning liquid to edge and bottom sections of a semiconductor substrate. The upper nozzle assembly has a first nozzle supplying the cleaning liquid onto the edge section, and second and thi...	01/10/2006
6945259	Substrate cleaning method and substrate cleaning apparatus A substrate cleaning apparatus is provided that includes a cleaning cup for receiving a to-be-cleaned substrate, a table in the cleaning cup, a first, second, and third nozzles, a pure water heating mechanism configured to supply hot pure water, a branch line, a con...	09/20/2005
6942107	Glove holding member for supporting protective gloves for transportation and/or cleaning A method and a system for transporting and cleaning slaughter equipment especially knives (3), gloves and aprons at slaughterhouses, the system comprising knife holding members for receiving and releasable holding one or more knives (3), glove holding ...	09/13/2005
6926017	Wafer container washing apparatus The present invention is directed to a semi-conductor handling equipment cleaning apparatus configured for use with wafer carriers. The base of the cleaning apparatus is configured to support the wafer carrier in sealing contact about a first aperture. A first fluid...	08/09/2005
6899111	Configurable single substrate wet-dry integrated cluster cleaner The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes a chamber body having a processing cavity ...	05/31/2005
6892738	Apparatus and methods for reducing damage to substrates during megasonic cleaning processes The present invention provides a megasonic cleaning apparatus configured to provide effective cleaning of a substrate without causing damage to the substrate. The apparatus includes a probe having one of a variety of cross-sections configured to decrease the ratio o...	05/17/2005
6802323	Method and apparatus for storing guide wires A guide wire holding apparatus includes a tray, one or more raised corrugated areas, a fluid source, a syringe, a valve, a drainage system, and one or more coupling devices. Each of the one or more raised corrugated areas is located on the inner surface of the tray ...	10/12/2004
6684890	Megasonic cleaner probe system with gasified fluid In accordance with one embodiment there is provided a method of improving the performance of a substrate cleaner of the type having a megasonic probe with a probe shaft extending generally parallel to a surface of a rotating substrate, and at least one di...	02/03/2004
6681782	Wafer cleaning Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or s...	01/27/2004
6679272	Megasonic probe energy attenuator The present invention provides a megasonic cleaning apparatus configured to provide effective cleaning of a substrate without causing damage to the substrate. The apparatus includes a probe having one of a variety of cross-sections configured to decrease ...	01/20/2004
6592681	Floating oil boom cleaning apparatus A floating cleaning device that cleans marine growth from float and skirt type oil booms. The cleaning device is a floating platform with ramps at the front and rear with tracks that guide the movement of the oil boom past a series of spray washers suppli...	07/15/2003
6543462	Apparatus for cleaning surfaces substantially free of contaminants A cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants has a resiliently mounted nozzle for spraying a cryogenic cleaning medium on the surface. The nozzle is driven in an oscillatory manne...	04/08/2003
6454875	Golf club cleaning apparatus An apparatus for cleaning golf clubs having an enclosure with a lower reservoir for holding water and an upper spray chamber in communication with said lower reservoir. The spray chamber houses a cleaning path for cleaning golf clubs. The cleaning path is...	09/24/2002
6328639	System for abrasively cleaning small parts and a container for holding small parts undergoing abrasive cleaning A system for abrasively cleaning small parts, and a container for holding small parts undergoing abrasive cleaning. An abrasive cleaning cabinet has a bottom member and a cover hingedly connected to the bottom member. The cover is pivotable between a clos...	12/11/2001
6178610	Method of and apparatus for removing burrs from metal work-piece A method of and device for removing burrs from metal work-pieces processed by a metal processing machine is provided. The method and device both include the burrs being removed by a high pressure stream of liquid that exits a high pressure nozzle and is d...	01/30/2001
6131589	Accurate positioning of a wafer A load station is used in a planarizing machine to perform several useful functions related to handling of a wafer. By centering the wafer with respect to a spindle carrier the load station interrupts the accumulation of positional errors. The load statio...	10/17/2000
6110573	Highly clean plastic film or sheet and process for its production A plastic film or sheet, wherein upon immersing a test piece of the plastic film or sheet in ultrapure water, extracting pure water from near the surface of the test piece and evaluating the cleanliness of a resulting bag based on the concentration (numbe...	08/29/2000
6102054	Screen and mat cleaning apparatus An apparatus is provided to efficiently clean a mat or a screen. The screen or mat is placed on or within a frame and within an enclosure; large volumes of pressurized water and/or cleaning solvent are simultaneously directed towards one or more sides of ...	08/15/2000
6086269	Method and apparatus for applying a substance to a surface A method and an apparatus apply a substance, especially a developer, to a surface through jets. Each jet carries the substance to be applied to a predetermined portion of the surface, and each jet essentially applies a predetermined quantity of substance ...	07/11/2000
5964952	Method of cleaning surfaces with water and steam A method and device for cleaning contaminated surfaces with both water and steam. A water film is applied to the contaminated surface and steam sprayed into the water film while water is continued to be applied to the water film. In this way the steam is ...	10/12/1999

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Class 134/151 - With spray or jet applying conduits or nozzles