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| Number | Title | Issue Date |
| 8113221 | Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium After a rinse process on a wafer W is performed by feeding pure water to the surface of the wafer W at a predetermined flow rate while rotating the wafer W in an approximately horizontal state, a feed amount of the pure water to the wafer W is reduced, and a pure-wa... | 02/14/2012 |
| 7412982 | Cleaning probe and megasonic cleaning apparatus having the same A cleaning probe capable of providing uniform cleaning to an entire wafer while not damaging the edge portion of the wafer, and a megasonic cleaning apparatus having the cleaning probe are provided. The cleaning probe comprises a front portion located near the cente... | 08/19/2008 |
| 7413628 | Substrate treatment method and substrate treatment apparatus A substrate treatment method for treating a substrate by supplying a treatment liquid to the substrate while rotating the substrate. The method comprises the steps of: performing a first substrate rotation process for rotating the substrate while clamping the substr... | 08/19/2008 |
| 7387131 | Processing apparatus and substrate processing method A substrate processing apparatus for processing a substrate With a processing fluid is provided. The apparatus includes holding members 60 for holding the substrate W, a chuck member 61 for supporting the holding members 60 and a top-face member... | 06/17/2008 |
| 7323066 | Paint accessory cleaning device and method A device and method for cleaning paint accessories and particularly roller covers and/or other paint accessories simultaneously or individually. A spray head has a fluid inlet engageable to a source of fluid and a fluid collection chamber in communication with the f... | 01/29/2008 |
| 7284760 | Holding device for disk-shaped objects Semiconductor technology requires the use of object holders, which are capable of holding wafers securely, also during rotation. In order to save time and expense, such holders should be suitable for integration directly into a processing facility, wherever possible... | 10/23/2007 |
| 7267132 | Methods for removing silicon and silicon-nitride contamination layers from deposition tubes Described are methods, systems, and chemistries for removing layers of stubborn silicon and silicon-nitride contamination layers from the inside surfaces of such articles as deposition tubes. In such embodiments, a tube to be cleaned is gently rolled on it side whil... | 09/11/2007 |
| 7267129 | Device and process for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the outside to the peripheral-side edge of the wafer-shaped article and ... | 09/11/2007 |
| 7258124 | Apparatus and method for treating surfaces of semiconductor wafers using ozone An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of processing fluid formed o... | 08/21/2007 |
| 7258479 | Power-operated salt pellet decrystalizing device A power-operated salt pellet mixing device includes a hand-operable power tool provided with a first elongated shank. A second elongated shank is spaced from the first shank. The device further includes a coupling threadably attachable to the first shank and the sec... | 08/21/2007 |
| 7256132 | Substrate centering apparatus and method A semiconductor substrate centering mechanism includes a plurality of substrate support pins, each pin having a top surface. The top surfaces of the pins define a plane in which the substrate is supported. Each pin has a tab mounted eccentrically at the top surface ... | 08/14/2007 |
| 7246984 | Method and apparatus for transferring an article to be processed and processing apparatus A transferring apparatus transfers an article to be processed, which is carried by a carrier device, to a holder provided in a processing chamber defined by a processing vessel and adapted to hold the article at a specified processing position. The transferring appa... | 07/24/2007 |
| 7240680 | Substrate processing apparatus A substrate processing apparatus includes a rotor 45 for rotating a plurality of wafers W paralleled each other at appropriate intervals. While rotating the wafers W by the rotor 45, a chemical liquid is supplied to the wafers W for their processing. T... | 07/10/2007 |
| 7241362 | Substrate treatment method and substrate treatment apparatus A substrate treatment method for treating a substrate by supplying a treatment liquid to the substrate while rotating the substrate. The method comprises the steps of: performing a first substrate rotation process for rotating the substrate while clamping the substr... | 07/10/2007 |
| 7229206 | Geometric and perforated paint mixer and paint roller cleaner The present invention sets forth an implement which enables the user to mix paint, clean the can and can lip, and to clean conventional paint rollers utilizing a hand drill. The implement is selectively adjustable to be configured to mix paint in large and small con... | 06/12/2007 |
| 7226055 | Substrate holding and spinning assembly and methods for making the same A substrate holding apparatus is provided. The substrate holding apparatus includes a chuck yoke, a plurality of arm assemblies, and a plurality of gripper assemblies. A first end of each of the arm assemblies is connected to the chuck yoke and each of the arm assem... | 06/05/2007 |
| 7172674 | Device for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, in which a mask is kept at a defined short distance to the wafer-shaped article such that liquid can be retained between the mask and the defined area of the wafer-shap... | 02/06/2007 |
| 7140066 | Apparatus and method for inspecting and cleaning semiconductor devices A semiconductor device is inspected and cleaned by applying a vacuum to the area in which the semiconductor device is positioned. Micro-sized particulates that are brushed off the semiconductor device during cleaning are drawn off by the vacuum. ... | 11/28/2006 |
| 7134129 | Data storage disc carrier with self centering and locking structures A disc holder for holding at least one media storage disc during rotation includes a central hub arranged for rotation about a central axis. The hub includes resilient centering arms which are arranged to provide an outwardly directed centering force on an internal ... | 11/07/2006 |
| 7108001 | Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating speed and direction sensors and a home position locator facilitate motor... | 09/19/2006 |
| 7059944 | Integrated system for processing semiconductor wafers An integrated process tool for chemical mechanical processing, cleaning and drying a semiconductor workpiece is provided. The integrated process tool includes a CMP module and a cleaning and drying module. After being processed, the workpiece is transported from the... | 06/13/2006 |
| 7040330 | Method and apparatus for megasonic cleaning of patterned substrates A system for cleaning a semiconductor substrate is provided. The system includes transducers for generating acoustic energy oriented in a substantially perpendicular direction to a surface of a semiconductor substrate and an acoustic energy oriented in a substantial... | 05/09/2006 |
| 7007702 | Device and process for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the outside to the peripheral-side edge of the wafer-shaped article and ... | 03/07/2006 |
| 6983755 | Cleaning method and cleaning apparatus for performing the same A cleaning apparatus includes upper and lower nozzle assemblies supplying a cleaning liquid to edge and bottom sections of a semiconductor substrate. The upper nozzle assembly has a first nozzle supplying the cleaning liquid onto the edge section, and second and thi... | 01/10/2006 |
| 6979034 | Workpiece handling end-effector and a method for processing workpieces using a workpiece handling end-effector A two sided wafer handling end-effector provides for the efficient loading and unloading of wafers into and out of a wafer processing apparatus. Each side of the end-effector includes spaced apart rotatable catch mechanisms between which a wafer is firmly grasped. W... | 12/27/2005 |
| 6964419 | Chuck rollers and pins for substrate cleaning and drying system A design for chuck rollers and a design for chuck pins for a wafer cleaning and drying system is disclosed. Each of the chuck rollers includes a roller head which ensures proper engagement of a wafer with the chuck rollers for rotation of the wafer during a wafer sc... | 11/15/2005 |
| 6960772 | Mask carrier A carrier for the masks used in Electron Projection Lithography, or other workpieces used in nanotechnology fields, comprises a rectangular frame having a set of four electrostatic chucks in the top surface for holding the mask above a central aperture that has an e... | 11/01/2005 |
| 6946774 | Segmented uniform energy megasonic transducer A transducer comprising an acoustic energy generating means and a resonator. The acoustic energy generating means generates acoustic energy and is adapted for delivering an approximately uniform amount of acoustic energy to each unit of surface area on a substrate i... | 09/20/2005 |
| 6902315 | Devices, methods and systems for mixing and stirring paints and the like Devices, systems and methods for mixing and stirring paints and the like having an axial shaft with a means for moving the liquid mounted on the axial shaft and a cage-like frame surrounding the means for moving the liquid and surrounding at least a portion of the a... | 06/07/2005 |
| 6880563 | Apparatus and method of cleaning a substrate A cleaning apparatus is provided with a processing bath to be filled with a cleaning chemical, an ultrasonic oscillator, and a retainer for holding a substrate to be immersed into a cleaning chemical. The front surface of the substrate is cleaned while ultrasonic wa... | 04/19/2005 |
| 6877518 | Chemical solution treatment apparatus for semiconductor substrate A chemical solution treatment apparatus for dissolving and removing ruthenium-based metal adhering to a substrate by a chemical solution, includes: a chemical solution treatment unit; a reservoir unit; and a chemical solution circulation system. The chemical solutio... | 04/12/2005 |
| 6848455 | Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species Contaminants are removed from a semiconductor wafer by the in-situ generation of oxidizing species. These active species are generated by the simultaneous application of ultra-violet radiation and chemicals containing oxidants such as hydrogen peroxide and dissolved... | 02/01/2005 |
| 6827092 | Wafer backside plate for use in a spin, rinse, and dry module and methods for making and implementing the same An apparatus for preparing a wafer is provided. The apparatus includes a wafer backside plate and a central shaft. The wafer backside plate has a top surface that includes a cylindrical edge lip, which defines a central aperture. The central shaft is designed to fit... | 12/07/2004 |
| 6823876 | Methodology of rotational etching tool maintenance A method of cleaning and maintenance used for a rotational etching tool, combining the physical characteristics of water (splashed off after striking the surface of a spinning wafer) and a PM (preventive maintenance) computer program, can automatically and quickly c... | 11/30/2004 |
| 6821488 | Sample holding chuck for use in reactor and reactor using same A chuck assembly for holding a sample includes a shaft; a generally circular chuck member, the shaft extending from a first surface of the chuck member; and a sample holder associated with a second surface of the chuck member. The second surface is opposite the firs... | 11/23/2004 |
| 6818071 | Method and apparatus for cleaning a roller cover An apparatus and method for cleaning a roller cover of the type used to apply a coating material is disclosed. In one embodiment the apparatus includes a body, at least one roller cover engaging element for positioning at least partially within the interior area of ... | 11/16/2004 |
| 6810888 | Wafer rotary holding apparatus and wafer surface treatment apparatus with waste liquid recovery mechanism Provided is a wafer rotary holding apparatus by which a reduced pressure is created on an upper surface of a rotary disk by a simple and easy-to-make mechanism with no need of any of a vacuum source apparatus, a compressed air supply apparatus, a compressed gas supp... | 11/02/2004 |
| 6789554 | Removing toner from printed material Toner xerographically adhered to a material, such as a sheet of paper, may be removed using a solvent-based or solventless approach. The application of ultrasonic tamping, scraping and brushing may aid in removing toner particles. In a solvent-based approach, a solv... | 09/14/2004 |
| 6761362 | Wafer holding device A wafer holding device, comprising a rotating baseplate, a wafer seat which is provided on the rotating baseplate coaxially with the rotating baseplate and which receives a peripheral edge of a wafer by a circumference, a predetermined number of chuck levers rotatab... | 07/13/2004 |
| 6742279 | Apparatus and method for rinsing substrates Embodiments of the invention provide a spin rinse dry (SRD) chamber for a semiconductor processing system. The SRD chamber includes a selectively rotatable substrate support member having an upper substrate receiving surface formed thereon, and a selectively rotatab... | 06/01/2004 |
