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| Number | Title | Issue Date |
| 8375964 | Template cleaning method, system, and apparatus A template cleaning method for cleaning a template for nanoimprint, according to an embodiment of the present invention includes placing a wafer on a stage provided in a chamber, cleaning the wafer placed on the stage, inspecting the wafer for particles after the cl... | 02/19/2013 |
| 8251077 | Liquid processing apparatus, liquid processing method and storage medium A liquid processing apparatus and method capable of separately collecting first and second processing liquids from each other, and preventing a formation of a defect (such as watermarks and particles) on a target substrate are disclosed. In one embodiment, the liqui... | 08/28/2012 |
| 8020570 | Substrate processing apparatus and substrate processing method A part of the opening of the nozzle insertion hole located in the liquid discharging direction relative to the nozzle inserted in the nozzle insertion hole is enlarged in the liquid discharging direction. Therefore, the droplets which have migrated to the nozzle ins... | 09/20/2011 |
| 7861732 | Immersion cleaner for print rollers What is contemplated is a printing cylinder washer having a removable or portable drive assembly, or a series of portable drive assemblies of different lengths to accommodate different sizes of print rollers. The drive assemblies have a drive mechanism enabled by a ... | 01/04/2011 |
| 7740021 | Methods and apparatus for cleaning screens used in solid/liquid separations in oilfield operations Methods, apparatus, and kits are described, one method embodiment comprising loading a solids-laden screen into a carriage of a washing enclosure, the solids-laden screen comprising a screen mesh partially obstructed with solids from a well drilling or work-over ope... | 06/22/2010 |
| 7686022 | Nozzle device, and cleaning apparatus equipped with the nozzle device The present invention provides a nozzle device comprising a substantially cylindrical nozzle body and a cup member which is arranged within the cylinder of the nozzle body and jets out fluid droplets from the tip thereof while being driven to turn, wherein two or mo... | 03/30/2010 |
| 7513263 | Substrate holding device and substrate processing apparatus A substrate holding device according to the present invention comprises: a motor; a rotating shaft rotated by the driving force of the motor; a spin base coupled to the rotating shaft and rotated integrally with the rotating shaft; a cover member surrounding the mot... | 04/07/2009 |
| 7428907 | Substrate processing apparatus The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, interm... | 09/30/2008 |
| 7412980 | Machine for cleaning glasses or similar articles A washing machine for glass lenses (11) or other similar items of the type including a conveyor (1) has a bearing surface (10) for moving the lenses through a washing chamber (12) made of a succession of washing means (21). The tra... | 08/19/2008 |
| 7404407 | Substrate processing apparatus The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chem... | 07/29/2008 |
| 7396416 | Substrate cleaning device A substrate cleaning device comprises a chamber for cleaning a substrate; a substrate support installed in the chamber providing a surface for supporting the substrate during cleaning thereof; at least one cleaning solution supply outlet for spraying a cleaning solu... | 07/08/2008 |
| 7389783 | Proximity meniscus manifold An apparatus for processing a substrate is provided which includes a first manifold module to generate a fluid meniscus on a substrate surface. The apparatus also includes a second manifold module to connect with the first manifold module and also to move the first ... | 06/24/2008 |
| 7383847 | Paint implements cleaning system A paint implement cleaning system consists of a basic container having at least three water pressure nozzles located therein. There is at least one at the bottom of the container and others are located midway within the container and diametrically opposite from each... | 06/10/2008 |
| 7368016 | Substrate processing unit and substrate processing apparatus A substrate processing unit includes: a vertically-movable substrate holder for holding a substrate; a pan surrounding a periphery of the substrate holder; a cell, located below the substrate holder and within the pan, having in its interior a chemical processing se... | 05/06/2008 |
| 7347214 | Rotary shaft sealing mechanism and liquid processing apparatus The present invention provides a rotary shaft sealing mechanism having the seal between the rotary shaft and the seal ring improved, and a liquid processing apparatus including the rotary shaft sealing mechanism. The cleaning processing apparatus 1 com... | 03/25/2008 |
| 7337792 | Liquid processing apparatus and liquid processing method A cleaning apparatus 1 includes a foup loading/unloading part 2 for mounting foups F each accommodating a plurality of wafers W at intervals of a constant pitch (normal pitch), a rotor 34 capable of holding the wafers W at half the normal pitch ... | 03/04/2008 |
| 7338565 | Housingless washer An industrial parts washer includes a stand adapted to support a part, a chamber selectively moveable from a first position clear of the part to a second position engaging the stand where the chamber forms a closed volume encapsulating the part. A nozzle is position... | 03/04/2008 |
| 7334588 | Method and apparatus for wafer cleaning An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer. ... | 02/26/2008 |
| 7328713 | Nozzle apparatus for stripping edge bead of wafer There is provided a nozzle apparatus for stripping an edge bead from a wafer, which includes a rotatable support arm, and a side rinse nozzle coupled to a leading end of the support arm to remove the bead of photoresist remaining on the edge of a wafer. The side rin... | 02/12/2008 |
| 7323066 | Paint accessory cleaning device and method A device and method for cleaning paint accessories and particularly roller covers and/or other paint accessories simultaneously or individually. A spray head has a fluid inlet engageable to a source of fluid and a fluid collection chamber in communication with the f... | 01/29/2008 |
| 7306002 | System and method for wet cleaning a semiconductor wafer A system and method for cleaning a substrate, such as a semiconductor wafer, utilizes a rotatable wafer supporting assembly with a cylindrical body to provide stability for the substrate being cleaned, even at high rotational speeds. The rotatable wafer supporting a... | 12/11/2007 |
| 7303633 | Apparatus for producing optical information recording medium A method for producing an optical information recording medium includes the steps of: coating a solution for forming a dye recording layer onto a surface of a rotating disc-shaped resin substrate; and discharging a cleaning solution from a nozzle onto a peripheral e... | 12/04/2007 |
| 7287537 | Megasonic probe energy director A megasonic cleaning apparatus configured to provide effective cleaning of a substrate without causing damage to the substrate is provided. The apparatus includes a megasonic probe, a transducer configured to energize the probe, and a heat transfer element disposed ... | 10/30/2007 |
| 7275551 | Device for cleaning food with ozone water, and method of cleaning food using cleaning device A food washing apparatus of the invention includes an ozonized water generator (10), a cylindrical washing tank (1) in which the food materials are put and which can rotate to wash the food materials, a drainage part (4) formed at a part of the ... | 10/02/2007 |
| 7270136 | Apparatus for cleaning the edges of wafers The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning, thus resulting in increase of the yield rate of wafers. The apparatus... | 09/18/2007 |
| 7267130 | Substrate processing apparatus The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, interm... | 09/11/2007 |
| 7264007 | Method and apparatus for cleaning a substrate using megasonic power A method for processing a substrate is provided that includes generating a fluid meniscus on a surface of the substrate and applying acoustic energy to the fluid meniscus. The method also includes moving the fluid meniscus over the surface the substrate to process t... | 09/04/2007 |
| 7264008 | Apparatus for cleaning a wafer An apparatus for cleaning a wafer includes a plurality of holders for contacting and securing peripheral portions of a wafer, and for rotating the wafer, a first plate disposed to face a first surface of the wafer, the first plate having a plurality of first nozzles... | 09/04/2007 |
| 7252102 | Ultrasonic slat washer An ultrasonic cleaner apparatus is disclosed which includes a support housing, a tub supported by the housing and an ultrasound and sensor transducer contacting the bottom of the cleaning tank. A fixture assembly for holding items to be cleaned is configured for ins... | 08/07/2007 |
| 7252099 | Wafer cleaning apparatus with multiple wash-heads A wafer cleaning apparatus with multiple wash-heads is applied in chemical and mechanical polishing process after wafer cleaning. The wafer cleaning apparatus device includes a supporting base, which supporting base comprises a driving device and at least one fluid ... | 08/07/2007 |
| 7237561 | Apparatus for cleaning semiconductor wafer including heating using a light source and method for cleaning wafer using the same An apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same wherein, the apparatus includes a chamber on which a wafer is mounted, a revolving chuck mounted in the chamber for supporting and fixing the wafer, a nozzle for spraying ... | 07/03/2007 |
| 7234477 | Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces One of many embodiments of a substrate preparation system is provided which includes a head having a head surface where the head surface is proximate to a surface of the substrate. The system also includes a first conduit for delivering a first fluid to the surface ... | 06/26/2007 |
| 7231929 | Dishwasher and adjustable rack An automatic dishwasher comprises a tub comprising a peripheral wall defining a wash chamber, a rotating water spray assembly in the wash chamber for spraying liquid into the wash chamber, at least one side sprayer in the wash chamber for spraying liquid into the wa... | 06/19/2007 |
| 7223323 | Multi-chemistry plating system Embodiments of the invention generally provide an electrochemical plating system. The plating system includes a substrate loading station positioned in communication with a mainframe processing platform, at least one substrate plating cell positioned on the mainfram... | 05/29/2007 |
| 7211932 | Apparatus for megasonic processing of an article A transducer assembly used for the megasonic processing of an article. In one aspect, the transducer assembly comprises: a vibration transmitter having a rear portion adapted to be supported adjacent to an article to be processed and having an elongated forward port... | 05/01/2007 |
| 7211145 | Substrate processing apparatus and substrate processing method A substrate processing apparatus include a spin chuck capable of holding a semiconductor wafer in a horizontal position, a drive motor for driving the spin chuck for rotation, and a processing vessel accommodating the spin chuck and the drive motor 50 therein... | 05/01/2007 |
| 7195679 | Versatile system for wafer edge remediation The present invention provides a system (200, 300) for remediating aberrations along the perimeter of a semiconductor wafer (202). The system includes a cleaning apparatus (204) within which the wafer is spun within a confined area. A chuck (... | 03/27/2007 |
| 7185661 | Reciprocating megasonic probe A method of cleaning a substrate comprises placing the substrate on a rotating fixture, placing a liquid on at least one side of the substrate, and creating a standing wave of megasonic energy oriented generally parallel to the substrate. The standing wave generates... | 03/06/2007 |
| 7172979 | Substrate processing apparatus and method A substrate processing apparatus has a substrate holder for detachably holding a substrate so that a surface, to be processed, of the substrate faces downward, and a sealing ring for sealing a peripheral portion of the surface, to be processed, of the substrate held... | 02/06/2007 |
| 7172674 | Device for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, in which a mask is kept at a defined short distance to the wafer-shaped article such that liquid can be retained between the mask and the defined area of the wafer-shap... | 02/06/2007 |
