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...that the first rickshaw was invented in 1869 by an American Baptist minister, the Rev. E. Jonathan Scobie, to transport his invalid wife around the streets of Yokohama?
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| Number | Title | Issue Date |
| 7404410 | Dish-washing machine with versatility of position Described herein is a dish-washing machine, in which there is provided: at least one supporting structure; a washing station, defined by one or more washing arms; a rinsing station, defined by one or more rinsing arms and by at least two attachment assemblies for at... | 07/29/2008 |
| 7364626 | Substrate processing apparatus and substrate processing method Substrate cleaning apparatus and method capable of preventing adhesion of particles to a substrate irrespective of being hydrophilic or hydrophobic are provided. Although a cleaning liquid ejected from a two-fluid nozzle 36 rebounds from a cup CP and scatters... | 04/29/2008 |
| 7331482 | Dispense pump with heated pump housing and heated material reservoir A heated dispense pump overcomes the limitations of conventional systems providing for reliable and efficient heating of the dispensed material in a system that is compact, lightweight, and accurate. A pump housing and cartridge body are formed of a thermally conduc... | 02/19/2008 |
| 7297286 | Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants A method for manufacturing an article having polymeric residue that is to be removed during the manufacture of the article is disclosed. The article is introduced into a controlled environment of a processing tool having one or more processing chambers. Free radical... | 11/20/2007 |
| 7270132 | Washer A washer includes a plurality of washing devices for spraying washing water to an object to be washed from various directions of a washing tub, and a washing water feeding device for feeding the washing water. The washing water is sequentially sprayed from respectiv... | 09/18/2007 |
| 7258124 | Apparatus and method for treating surfaces of semiconductor wafers using ozone An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of processing fluid formed o... | 08/21/2007 |
| 7225818 | Water spraying device and system for dishwashers Water spraying systems for a dishwasher including water spraying devices for mounting on the ceiling, dish rack and a rotating spray arm of a dishwasher for effectively spraying water throughout the dishwasher cabinet. The device includes a housing on which a spinne... | 06/05/2007 |
| 7178745 | Dispense tip with vented outlets In a fluid pump and cartridge assembly, a cartridge includes a material inlet port, a material outlet port, and a feed screw. The feed screw delivers fluid to be dispensed from the fluid inlet to the outlet port. The fluid inlet is preferably elongated in a directio... | 02/20/2007 |
| 7165564 | Device for cleaning installations and related methods A device having at least one cleaning unit for cleaning installations, especially for the production and/or processing of food stuffs or pharmaceuticals is provided. The device may include a cleaning unit that is configured to move within the installation to be clea... | 01/23/2007 |
| 7160808 | Chuck for supporting wafers with a fluid A method of relieving surface stress on a thin wafer by removing a small portion of the wafer substrate, the substrate being removed by applying a warm solution of KOH to the backside of the wafer while the wafer spins. The wafer may be supported on a rotatable plat... | 01/09/2007 |
| 7143793 | Cleaning system for a filling machine An automatic cleaning apparatus and/or method for periodically cleaning a filling machine during a filling cycle without the need for human interaction to initiate the cleaning process. In some embodiments, a controller automatically initiates a cleaning sequence at... | 12/05/2006 |
| 7134946 | Apparatus to treat and inspect a substrate An apparatus for treating a substrate with a cryogenic impingement fluid includes a protective enclosure defining an internal cavity, a cryogenic fluid applicator positioned within the internal cavity and a snow generation system connected to the cryogenic fluid app... | 11/14/2006 |
| 7134941 | Methods for residue removal and corrosion prevention in a post-metal etch process A method of plasma assisted CO2 cleaning for dry removal of residual photoresist and sidewall polymer with an etch gas mixture comprising fluorine containing gas, oxygen and hydrogen in N2 or H2O. The process removes polymer residues... | 11/14/2006 |
| 7128279 | Method and apparatus for fluid delivery to a backside of a substrate A fluid delivery device for delivering fluid to the backside of a substrate while minimizing waste is provided. The device includes an inner cylindrical tube having a top opening and a bottom opening. An upper cap overlying a top portion of the inner cylindrical tub... | 10/31/2006 |
| 7112260 | Process and device for cleaning a circulating belt Device and process for cleaning a circulating belt, the device using a cleaning device having at least one nozzle. The process includes feeding a pressurized fluid to the at least one nozzle, and subjecting the circulating belt to the pressurized fluid via the at le... | 09/26/2006 |
| 7101260 | Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants A method for manufacturing an article where the article has polymeric residue that is to be removed during the manufacture of the article. The article is introduced into a controlled environment of a processing tool that has at least first and second processing cham... | 09/05/2006 |
| 7077916 | Substrate cleaning method and cleaning apparatus A substrate is cleaned by supplying an ultrasonically-agitated cleaning liquid onto the substrate from a nozzle provided above the substrate while spinning the substrate. The substrate being cleaned is spun at a rotational speed of 2600 rpm or more and 3500 rpm or l... | 07/18/2006 |
| 7051743 | Apparatus and method for cleaning surfaces of semiconductor wafers using ozone An apparatus and method for cleaning surfaces of semiconductor wafers utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of cleaning fluid formed on a semiconductor wafer surface to inc... | 05/30/2006 |
| 7040961 | Methods for resist stripping and cleaning surfaces substantially free of contaminants A plasma assisted cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants has a resiliently mounted nozzle for spraying a cryogenic cleaning medium on the surface. The cleaning is conducted by applying t... | 05/09/2006 |
| 7013953 | Heat exchanger for wasted heat with its cleaning apparatus A waste heat recovery system includes: a tank; heat exchange pipes connected with one another in the form of a ‘S’ shape in multiple steps inside the tank and having city water flow pipes bound up into a bundle; circulation leading plates mounted between the hea... | 03/21/2006 |
| 7017028 | Apparatus and method for updating pointers for indirect and parallel register access An apparatus and method are provided for updating one or more pluralities of pointers (i.e. one or more vector pointers) which are used for accessing one or more pluralities of data elements (i.e. one or more vector data elements) in a multi-ported memory. A first r... | 03/21/2006 |
| 7008306 | Nozzle for injecting sublimable solid particles entrained in gas for cleaning a surface Disclosed is a nozzle for injecting sublimable solid particles, which is capable of minimizing consumption of the carrier gas and also maximizing cleaning efficiency. The nozzle comprises a base block having a space in which carrier gas is supplied through a gas sup... | 03/07/2006 |
| 7000853 | System and method for control of fluid dispense pump In a fluid pump and cartridge assembly, a cartridge includes a material inlet port, a material outlet port, and a feed screw. The feed screw delivers fluid to be dispensed from the fluid inlet to the outlet port. The fluid inlet is preferably elongated in a directio... | 02/21/2006 |
| 7000623 | Apparatus and method for substrate preparation implementing a surface tension reducing process Methods and systems for preparing a substrate implementing a surface tension reducing process are provided. In one example, a substrate preparation system includes a chuck which fingers for edge gripping the substrate. The chuck is hollow to provide simultaneous acc... | 02/21/2006 |
| 6983756 | Substrate treatment process and apparatus A substrate treatment apparatus comprises a treatment vessel, a substrate holder for rotating the substrate in a horizontal plane in the treatment vessel, a nozzle unit arranged in an upper part of the treatment vessel such that a liquid is downwardly fed, a feed li... | 01/10/2006 |
| 6983755 | Cleaning method and cleaning apparatus for performing the same A cleaning apparatus includes upper and lower nozzle assemblies supplying a cleaning liquid to edge and bottom sections of a semiconductor substrate. The upper nozzle assembly has a first nozzle supplying the cleaning liquid onto the edge section, and second and thi... | 01/10/2006 |
| 6974040 | Container in the form of a compartment for domestic appliance A container for a domestic appliance, comprising: guides for lateral movement of the container with respect to a domestic appliance; a device for one or more of vertically adjusting and inclining of the container, including supporting members associated with the con... | 12/13/2005 |
| 6959881 | Nozzle assembly of dishwasher A nozzle of a dishwasher reduces a space for installing a supplementary nozzle on a main nozzle by having first and second connectors coupled to be caught on each other between main and auxiliary nozzles. The nozzle assembly includes a main nozzle having a first cou... | 11/01/2005 |
| 6957783 | Dispense tip with vented outlets In a fluid pump and cartridge assembly, a cartridge includes a material inlet port, a material outlet port, and a feed screw. The feed screw delivers fluid to be dispensed from the fluid inlet to the outlet port. The fluid inlet is preferably elongated in a directio... | 10/25/2005 |
| 6807974 | Single wafer type substrate cleaning method and apparatus In the drying step of the single wafer type substrate cleaning system for cleaning wafers not stored in a cassette, in a sealed cleaning housing, a spin drying treatment is applied to the wafer when the wafer is supported and rotated at high speed while an inert gas... | 10/26/2004 |
| 6702202 | Method and apparatus for fluid delivery to a backside of a substrate A fluid delivery device for delivering fluid to the backside of a substrate while minimizing waste. The device includes an inner cylindrical tube having a top opening and a bottom opening. An upper cap overlying a top portion of the inner cylindrical tube... | 03/09/2004 |
| 6638366 | Automated spray cleaning apparatus for semiconductor wafers Semiconductor wafer (11) are uniformly and thoroughly cleaned of particulate and organic contaminants by sweeping the wafer with a hydraulic broom that sprays cleaning solution onto the wafer. The broom contains an aspirating nozzle (3) for connection to ... | 10/28/2003 |
| 6612009 | Dishwasher spray arm feed system A dishwasher having a wash chamber or tub including a sump and a side wall. A pump is fluidly connected with the sump and a supply tube is supported adjacent the tub side wall and receives wash liquid from the pump, the supply tube has a manifold portion ... | 09/02/2003 |
| 6568408 | Method and apparatus for removing a liquid from a surface of a rotating substrate A method and an apparatus for removing a liquid, i.e a wet processing liquid, from a surface of at least one substrate is disclosed. A liquid is supplied on a surface of substrate. Simultaneously or thereafter besides the liquid also a gaseous substance c... | 05/27/2003 |
| 6561204 | Apparatus and method for cleaning wafers with contact holes or via holes An apparatus and a method for cleaning wafers with contact holes or via holes are provided. The apparatus for cleaning wafers comprises a first arm, a second arm, a fixing device, a rotating device and a spraying device. The fixing device, disposed on the... | 05/13/2003 |
| 6543462 | Apparatus for cleaning surfaces substantially free of contaminants A cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants has a resiliently mounted nozzle for spraying a cryogenic cleaning medium on the surface. The nozzle is driven in an oscillatory manne... | 04/08/2003 |
| 6539952 | Megasonic treatment apparatus The invention provides an apparatus and method for cleaning or etching wafers. The invention further provides a megasonic transducer designed to apply mechanical vibrations to a layer of fluid in contact with a wafer. The electromechanical transducer is h... | 04/01/2003 |
| 6526999 | Random high pressure water jetting nozzle for cleaning castings An apparatus for cleaning castings includes a cleaning cabinet having a rotary clamping device which clamps a casting to be cleaned upon a freely rotatable plate in the cabinet. An elongate lance having a high pressure nozzle at its inner end projects int... | 03/04/2003 |
| 6517641 | Apparatus and process for collecting trace metals from wafers An improved process for cleaning a semiconductor wafer surface during manufacture to remove metallic contaminants without the use of robotics and without risk of scanning droplets falling from the wafer, in a faster time than with a manual process using a... | 02/11/2003 |
| 6505635 | Lifting and rinsing a wafer A nozzle that extends telescopically upward is used to elevate a wafer without contacting the wafer. The nozzle includes a stationary hollow cylinder, closed at its lower end and open at its upper end, within which a spool is disposed to slide vertically.... | 01/14/2003 |
