Did You Know...
...that when IBM conducted a market study of Chester Carlson's invention in 1959, the company concluded that it would take only 5000 units of his new product to saturate the market? IBM therefore declined to be part of the new product introduction. Too bad for IBM. Carlson's invention was the xerography process, and his new product was the beginning of the Xerox Corporation. It is estimated that every day, worldwide, 3,000,000,000 copies are made!!
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| Number | Title | Issue Date |
| 8079376 | Multi-pass, inverting bottle cleaner A bottle cleaner that inverts the bottles to spray solutions into them. The bottles invert and receive, for example, a spray of a cleaning solution. The cleaner then returns the bottles to the upright orientation. Each pass of the bottles utilizes two sets of linked... | 12/20/2011 |
| 7597109 | Spin scrubber apparatus A spin scrubber apparatus has an index unit configured to support one or more cassettes, a processing unit having one or more cleaning stations facing the index unit across a transfer space, and a substrate transfer device disposed in the transfer space for transfer... | 10/06/2009 |
| 7445015 | Cluster tool process chamber having integrated high pressure and vacuum chambers A cluster tool includes a transfer chamber connected to a plurality of vacuum chambers. An additional process chamber connected to the transfer chamber includes a high pressure chamber assembly seated on a housing. The high pressure chamber assembly, which is adjust... | 11/04/2008 |
| 7422023 | Tissue valve cleansing apparatus The apparatus includes a housing having a centrally disposed longitudinal axis situated along a horizontal plane during operating conditions. The housing further has a monolithically formed flange portion extending orthogonally therefrom. The flange portion has a pl... | 09/09/2008 |
| 7337792 | Liquid processing apparatus and liquid processing method A cleaning apparatus 1 includes a foup loading/unloading part 2 for mounting foups F each accommodating a plurality of wafers W at intervals of a constant pitch (normal pitch), a rotor 34 capable of holding the wafers W at half the normal pitch ... | 03/04/2008 |
| 7325556 | Transparent combination package for cleaning, spin drying, displaying and storing a paint roller This invention has two components, a side delivery spray wand and a transparent plastic package with two compartments. One compartment serves for storage and display of the spray wand, and for guiding and limiting the wand's use in delivering the spray to the paint ... | 02/05/2008 |
| 7325557 | Roller and paintbrush cleaning kit A paint roller includes a spindle adapted to hold a rotatable cylindrical paint pad, and an arm connecting the spindle to a handle. A semi-cylindrical cover curves about the roller's spindle. A liquid manifold is integral with the cover to deliver a curtain of liqui... | 02/05/2008 |
| 7306002 | System and method for wet cleaning a semiconductor wafer A system and method for cleaning a substrate, such as a semiconductor wafer, utilizes a rotatable wafer supporting assembly with a cylindrical body to provide stability for the substrate being cleaned, even at high rotational speeds. The rotatable wafer supporting a... | 12/11/2007 |
| 7305998 | Mobile flushing unit and process In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a flexible hose of the mobile flushing unit to one end of the workpiece and... | 12/11/2007 |
| 7267129 | Device and process for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the outside to the peripheral-side edge of the wafer-shaped article and ... | 09/11/2007 |
| 7264008 | Apparatus for cleaning a wafer An apparatus for cleaning a wafer includes a plurality of holders for contacting and securing peripheral portions of a wafer, and for rotating the wafer, a first plate disposed to face a first surface of the wafer, the first plate having a plurality of first nozzles... | 09/04/2007 |
| 7254969 | Ribbed washing machine basket A basket for a washing machine includes a body comprising an outer wall and at least one rib extending radially inward from said wall, said rib comprising at least a first portion having a first cross section and a second portion having a second cross section, said ... | 08/14/2007 |
| 7252095 | Mobile flushing unit and process In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a flexible hose of the mobile flushing unit to one end of the workpiece and... | 08/07/2007 |
| 7243392 | Device for extracting liquid from a wiping covering The invention relates to a device for extracting liquid from a wiping covering of a surface wiping device which has a wiping head held on a handle and having two supporting arms, on which the wiping covering is held and which can be pivoted back and forth between a ... | 07/17/2007 |
| 7240680 | Substrate processing apparatus A substrate processing apparatus includes a rotor 45 for rotating a plurality of wafers W paralleled each other at appropriate intervals. While rotating the wafers W by the rotor 45, a chemical liquid is supplied to the wafers W for their processing. T... | 07/10/2007 |
| 7201176 | Wafer chucking apparatus for spin processor A wafer chuck is configured to hold a wafer efficiently for spin process cleaning of wafer edges and back sides. A first group of retractable tips extend to hold the wafer during a first portion of the cleaning period. A second group of retractable tips extend to ho... | 04/10/2007 |
| 7198052 | Mobile flushing unit and process In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a flexible hose of the mobile flushing unit to one end of the workpiece and... | 04/03/2007 |
| 7192494 | Method and apparatus for annealing copper films A method and apparatus for annealing copper. The method comprises forming a copper layer by electroplating on a substrate in an integrated processing system and annealing the copper layer in a chamber inside the integrated processing system. ... | 03/20/2007 |
| 7189313 | Substrate support with fluid retention band An apparatus and method for supporting a substrate is provided. In one embodiment, an apparatus for supporting a substrate includes a body having a band extending therefrom. The band is adapted to retain a fluid on the body thereby forming a shallow processing bath ... | 03/13/2007 |
| 7171973 | Substrate processing apparatus The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chem... | 02/06/2007 |
| 7172674 | Device for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, in which a mask is kept at a defined short distance to the wafer-shaped article such that liquid can be retained between the mask and the defined area of the wafer-shap... | 02/06/2007 |
| 7160416 | Substrate treating apparatus A substrate treating apparatus for treating substrates as immersed in a treating solution includes a treating tank for storing the treating solution and accommodating the substrates, a holding mechanism for holding a plurality of substrates in upstanding posture in ... | 01/09/2007 |
| 7153388 | Chamber for high-pressure wafer processing and method for making the same Broadly speaking, a wafer processing chamber for performing a high pressure wafer process is provided. More specifically, the wafer processing chamber incorporates a wafer processing volume and an outer chamber volume. The wafer processing volume is configured to co... | 12/26/2006 |
| 7144056 | Detection and handling of semiconductor wafers and wafers-like objects An end-effector includes multiple vortex chucks for supporting a wafer. Vortex chucks are located along the periphery of the end-effector to help prevent a flexible wafer from curling. The end-effector has limiters to restrict the lateral movement of a supported waf... | 12/05/2006 |
| 7138039 | Liquid isolation of contact rings Embodiments of the invention may further provide a contact ring for an electrochemical plating system. The contact generally includes a substrate receiving member having a substrate support surface formed thereon, a plurality of electrical contact pins extending fro... | 11/21/2006 |
| 7111630 | High pressure processing apparatus and method When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and a valve is opened, supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another val... | 09/26/2006 |
| 7090663 | High volume liquid waste collection and disposal system A system for collecting and disposing of liquid medical waste includes a fluid collection cart and a draining and cleaning station. The fluid collection cart includes a pair of containers, each of which includes a draining port and a cap. Liquid level detectors also... | 08/15/2006 |
| 7087144 | Contact ring with embedded flexible contacts A contact assembly for supporting a substrate in an electrochemical plating system, wherein that contact assembly includes a contact ring and a thrust plate assembly. The contact ring includes an annular ring member having an upper surface and a lower surface, an an... | 08/08/2006 |
| 7080651 | High pressure processing apparatus and method When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and one valve is opened, to supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, anothe... | 07/25/2006 |
| 7073522 | Apparatus for applying disparate etching solutions to interior and exterior surfaces Described are methods, systems, and chemistries for cleaning various components of semiconductor process equipment. A method in accordance with one embodiment cleans articles with differently contaminated interior and exterior surfaces by using those articles to sep... | 07/11/2006 |
| 7066787 | Substrate processing apparatus A substrate processing apparatus is used for removing surface irregularities occurring on a peripheral portion (a bevel portion, an edge portion, and a notch) of a substrate, such as a semiconductor wafer, and films deposited as a contaminant on the peripheral porti... | 06/27/2006 |
| 7065900 | Docking-type system and method for transferring and treating substrate A substrate transferring/treating system includes a substrate stacking base, a substrate transferring member for receiving/transferring the substrate from/to the base, a substrate cleaning/drying device for cleaning and drying the substrate transferred from the subs... | 06/27/2006 |
| 7056392 | Wafer chucking apparatus and method for spin processor A wafer chuck is configured to hold a wafer efficiently for spin process cleaning of wafer edges and back sides. A first group of retractable tips extend to hold the wafer during a first portion of the cleaning period. A second group of retractable tips extend to ho... | 06/06/2006 |
| 7047984 | Device and method for cleaning articles used in the production of semiconductor components A cleaning device for use in the production of semiconductor components comprises two feed devices with which a fluid medium is guided across a respective surface of an object to be cleaned so that different faces of the object are simultaneously cleaned. At least t... | 05/23/2006 |
| 7040209 | Tool fixtures for use in rotational processing A fixture for holding tools to be processed in a rotational processing apparatus. The fixture includes at least one mounting rod with a plurality of spacers slidably disposed on the mounting rod. A plurality of tools are disposed about the rod, each tool being space... | 05/09/2006 |
| 7025861 | Contact plating apparatus Embodiments of the invention generally provide a substrate processing system and method. The substrate processing system generally includes a fluid basin configured to contain a plating solution therein, an anode assembly positioned in a lower portion of the fluid b... | 04/11/2006 |
| 7024798 | Low-pressure dryer and low-pressure drying method A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate ... | 04/11/2006 |
| 7007702 | Device and process for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the outside to the peripheral-side edge of the wafer-shaped article and ... | 03/07/2006 |
| 6994776 | Method and apparatus for low temperature annealing of metallization micro-structure in the production of a microelectronic device A method for filling recessed microstructures at a surface of a microelectronic workpiece, such as a semiconductor wafer, with metallization is set forth. In accordance with the method, a metal layer is deposited into the microstructures with a process, such as an e... | 02/07/2006 |
| 6986214 | Low-pressure dryer and low-pressure drying method A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate ... | 01/17/2006 |
