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| Number | Title | Issue Date |
| 8166985 | Substrate cleaning and processing apparatus with magnetically controlled spin chuck holding pins When a substrate is subjected to bevel cleaning processing, a first magnet plate is arranged at a lower position, and a second magnet plate is arranged at an upper position. In this case, each of chuck pins enters a closed state in a region outside the first magnet ... | 05/01/2012 |
| 8136539 | Wash ring assembly and method of use Devices, including a wash ring assembly, and methods are provided for the removal of excess fluid or solids from the exterior or interior of a probe used to transfer fluids, for instance, in an automated assay device. Typically, a probe is used to aspirate and dispe... | 03/20/2012 |
| 8042559 | Dishwasher having rack with shelf holder A dishwasher is disclosed which includes a rack arranged inside of a washing cabinet, a plurality of shelves arranged on the rack, and a shelf holder installed on the rack. The shelf holder may include a plurality of shelf fixing parts that fix the shelves together.... | 10/25/2011 |
| 8042560 | Substrate processing apparatus A substrate processing apparatus includes a rotary cup disposed outside a substrate holding member to surround a substrate held on the substrate holding member and to rotate along with the substrate holding member, and having a wall portion that receives a process l... | 10/25/2011 |
| 8025069 | Semiconductor wafer treating apparatus A semiconductor wafer treating apparatus comprising a housing, holding means rotatably disposed within the housing, rotating means for rotating the holding means, and cleaning means for cleaning a semiconductor wafer held on the holding means. Irradiation means for ... | 09/27/2011 |
| 8015986 | Apparatus for cleaning substrate and method for cleaning substrate Provided is an apparatus for cleaning a substrate. The apparatus includes a stage on which a substrate is loaded, a cleaning liquid supply unit supplying a cleaning liquid to the substrate, an oscillator transmitting sound waves to the substrate for cleaning the sub... | 09/13/2011 |
| 7997289 | Methods of and apparatus for cleaning and conveying a substrate Discs roll along an inclined track through a chamber to expose opposite disc sides for cleaning. Energized fluid directed against the opposite sides removes particles from the discs, the fluid and particles exiting the chamber. Stop pins control a time period for cl... | 08/16/2011 |
| 7946303 | Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus A carrier for supporting a substrate during processing by a meniscus formed by upper and lower proximity heads is described. The carrier includes a frame having an opening sized for receiving a substrate and a plurality of support pins for supporting the substrate w... | 05/24/2011 |
| 7938129 | Substrate processing apparatus A substrate processing apparatus of the present invention is to apply processing using a processing liquid to a substrate. The substrate processing apparatus includes a first-side plate disposed oppositely to a first surface of the substrate with a distance and prov... | 05/10/2011 |
| 7921858 | Self-cleaning adhesive structure and methods An apparatus for transporting an object from one workstation to another, where the object or workstations may be contaminated with unwanted dirt or dust particles. A movable transfer arm connected to a control unit has an end effector including an array of nano-scal... | 04/12/2011 |
| 7896012 | Shoe washer A shoe washing device including a motor for driving a rotor onto which the shoes are directly mounted as by aligning the soles of the shoes parallel to the axis of rotation of the rotor. The shoes are affixed onto the rotor by using a clip, strap, cage, or other att... | 03/01/2011 |
| 7891366 | Liquid processing apparatus A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; a rotary cup configured to surround the substrate held on the substrate holding member, to rotate along with the substra... | 02/22/2011 |
| 7849865 | System for processing a workpiece A wafer processing system has a moveable drain assembly having multiple drain rings. The drain rings may be spaced apart sufficiently to allow a process fluid applicator to move between them. Each drain ring provides a separate drain path, optionally in a separate r... | 12/14/2010 |
| 7793671 | Apparatus for and method of cleaning substrates An apparatus for cleaning substrates includes a substrate support that is configured to support a plurality of substrates horizontally as spaced regularly one above the other, a rotating device for rotating the substrate support and a liquid supply system for dispen... | 09/14/2010 |
| 7779848 | Apparatus and method for cleaning semiconductor wafer Method and apparatus for precisely removing dusts from a side edge of a wafer, improving a production yield of wafers, and reducing a manufacturing cost for semiconductor devices. The apparatus includes: a retaining table having a circular top plan view, capable of ... | 08/24/2010 |
| 7775222 | Single substrate cleaning apparatus and method for cleaning backside of substrate Provided are a single substrate cleaning apparatus, and a method for cleaning the backside of a substrate, where a substrate reversing device for cleaning the backside of a substrate is installed inside a processing chamber. ... | 08/17/2010 |
| 7753060 | Cellular aqueous tube cleaning system and method An aqueous tube cleaning system as described herein can be utilized to clean a plurality of tubes having different lengths. The system includes a tower assembly having a wash chamber that houses the tubes during the cleaning cycle. The tower assembly is held in a ho... | 07/13/2010 |
| 7730898 | Semiconductor wafer lifter A novel semiconductor wafer lifter is disclosed for handling wafers during wet bench processing. In particular, the lifter has a plurality of holes formed in its vertical support surface to allow cleaning or rinsing fluid to flow through the vertical support instead... | 06/08/2010 |
| 7424893 | Dishwasher A dishwasher is disclosed, by which an installation height of a rack is adjusted inside a washing chamber and in which the installation height is automatically adjusted by a button. The dishwasher includes a washing chamber having tableware washed therein, a rack mo... | 09/16/2008 |
| 7412982 | Cleaning probe and megasonic cleaning apparatus having the same A cleaning probe capable of providing uniform cleaning to an entire wafer while not damaging the edge portion of the wafer, and a megasonic cleaning apparatus having the cleaning probe are provided. The cleaning probe comprises a front portion located near the cente... | 08/19/2008 |
| 7413628 | Substrate treatment method and substrate treatment apparatus A substrate treatment method for treating a substrate by supplying a treatment liquid to the substrate while rotating the substrate. The method comprises the steps of: performing a first substrate rotation process for rotating the substrate while clamping the substr... | 08/19/2008 |
| 7412980 | Machine for cleaning glasses or similar articles A washing machine for glass lenses (11) or other similar items of the type including a conveyor (1) has a bearing surface (10) for moving the lenses through a washing chamber (12) made of a succession of washing means (21). The tra... | 08/19/2008 |
| 7409960 | Cleaning fluid container The invention aims at improving a cleaning fluid container (3) for a cleaning device (RV) for personal needs, in particular for cleaning a shaving head (SK) of a dry shaving apparatus (R), with a housing (20), with an inlet port (15) provided on... | 08/12/2008 |
| 7404410 | Dish-washing machine with versatility of position Described herein is a dish-washing machine, in which there is provided: at least one supporting structure; a washing station, defined by one or more washing arms; a rinsing station, defined by one or more rinsing arms and by at least two attachment assemblies for at... | 07/29/2008 |
| 7383846 | Dishwasher basket A dishwasher rack basket assembly that includes a water impervious basket of open mesh construction, the basket is selectively positionable between a first size and a second size, the first size securing small items while permitting flow of liquid therethrough, the ... | 06/10/2008 |
| 7364625 | Rinsing processes and equipment Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates the use of a surface tension ... | 04/29/2008 |
| 7346956 | Automatic cart wash apparatus An automatic cart wash apparatus. The automatic cart wash apparatus provides improved cleaning of stock carts on a regular basis over manual cleaning by store employees. The automatic cart wash apparatus includes three main stages: a debris removal (vacuum) stage, a... | 03/25/2008 |
| 7338102 | Manipulator This invention provides a manipulator having an arrangement which easily makes it possible to execute fine work such as attitude control while properly grasping even a minute target object. The manipulator of this invention has, at, e.g., the contact portion to a ma... | 03/04/2008 |
| 7325557 | Roller and paintbrush cleaning kit A paint roller includes a spindle adapted to hold a rotatable cylindrical paint pad, and an arm connecting the spindle to a handle. A semi-cylindrical cover curves about the roller's spindle. A liquid manifold is integral with the cover to deliver a curtain of liqui... | 02/05/2008 |
| 7306002 | System and method for wet cleaning a semiconductor wafer A system and method for cleaning a substrate, such as a semiconductor wafer, utilizes a rotatable wafer supporting assembly with a cylindrical body to provide stability for the substrate being cleaned, even at high rotational speeds. The rotatable wafer supporting a... | 12/11/2007 |
| 7299810 | Substrate treating apparatus with circulating and heating mechanism for removal liquid A substrate treating apparatus includes a spin chuck for supporting a substrate to be rotatable in a plane including a principal surface of the substrate, a motor for rotating the spin chuck, a circulating pump for circulating a removal liquid and transmitting the r... | 11/27/2007 |
| 7267132 | Methods for removing silicon and silicon-nitride contamination layers from deposition tubes Described are methods, systems, and chemistries for removing layers of stubborn silicon and silicon-nitride contamination layers from the inside surfaces of such articles as deposition tubes. In such embodiments, a tube to be cleaned is gently rolled on it side whil... | 09/11/2007 |
| 7267131 | Rack assembly in dishwasher Rack assembly in a dishwasher including a hollow main rack drawable from a washing chamber for placing tableware thereon, and a supplementary rack detachably, and shiftably mounted on an inside of the main rack, for placing the tableware therein, thereby permitting ... | 09/11/2007 |
| 7264008 | Apparatus for cleaning a wafer An apparatus for cleaning a wafer includes a plurality of holders for contacting and securing peripheral portions of a wafer, and for rotating the wafer, a first plate disposed to face a first surface of the wafer, the first plate having a plurality of first nozzles... | 09/04/2007 |
| 7266196 | Telephone mouthpiece and earpiece cover system A telephone mouthpiece and earpiece cover system for helping protect a user from contact from germs on a telephone. The system includes an earpiece cover attachment and a mouthpiece cover attachment. The earpiece cover attachment comprises a base having a plurality ... | 09/04/2007 |
| 7261110 | Shaving apparatus cleaning device A shaving apparatus cleaning device includes a reservoir for holding a supply of a cleaning fluid and a cleaning receptacle for receiving the shaving apparatus. The reservoir has a discharge orifice through which the cleaning fluid is allowed to flow from the reserv... | 08/28/2007 |
| 7258124 | Apparatus and method for treating surfaces of semiconductor wafers using ozone An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of processing fluid formed o... | 08/21/2007 |
| 7255114 | Ion sampling system for wafer An ion sampling method for wafer provides a wafer in a sampling chamber, wherein the wafer surface that is going to be sampled faces upward; spraying an extraction liquid continuously on the wafer surface to form a liquid film thereon; keeping the thickness of the f... | 08/14/2007 |
| 7243911 | Substrate treating apparatus A substrate treating apparatus for performing a predetermined treatment of substrates includes a treating tank for storing a treating solution, a holder for holding a plurality of substrates arranged in one direction inside the treating tank, and a bubble generating... | 07/17/2007 |
| 7237564 | Distribution of energy in a high frequency resonating wafer processing system A transducer for use in an acoustic energy cleaner is provided. The transducer includes a resonator and a plurality of crystals bonded to a surface of the resonator. The plurality of crystals is configured to be bonded to the surface of the resonator in a staggered ... | 07/03/2007 |
