Bizarre Patents
Reward Candy Dispenser for Personal Computers
A personal computer peripheral, battery powered reward candy dispenser which immediately presents students with a single candy for each problem completed correctly.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7568490 | Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids An apparatus and method are disclosed in which a semiconductor substrate having a surface containing contaminants is cleaned or otherwise subjected to chemical treatment using a foam. The semiconductor wafer is supported either on a stiff support (or a layer of foam... | 08/04/2009 |
| 7422641 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 09/09/2008 |
| 7386944 | Method and apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer A method an apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer are provided. In the apparatus for cleaning and drying a wafer, the wafer is dipped into a cleaning solution in a cleaning tank. The wafer is then dried using a drying gas in ... | 06/17/2008 |
| 7373941 | Wet cleaning cavitation system and method to remove particulate wafer contamination A cavitation cleaning system and method for using the same to remove particulate contamination from a substrate including providing at least one substrate immersed in a cleaning solution said cleaning solution contained in a cleaning solution container. The containe... | 05/20/2008 |
| 7370644 | EGR control apparatus and method for operating the same An ECU calculates a foreign-matter accumulation index base on a total flow rate of EGR gas integrated since the previous execution of a last foreign-matter removal operation until the present execution of the foreign-matter removal operation. The ECU controls an act... | 05/13/2008 |
| 7367346 | Method for cleaning hollow tubing and fibers Hollow porous fibers containing adhered contaminants are cleaned to remove the contaminants by backflushing a liquid to fill the pores, and adding a flow of gas so as to form a two-phase mixture of gas and bubbles of liquid that can scrub the fibers, loosening the c... | 05/06/2008 |
| 7343922 | Wafer drying apparatus A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning ... | 03/18/2008 |
| 7328712 | Cleaning bench for removing contaminants from semiconductor process equipment Described are cleaning benches and methods for removing contaminant layers from semiconductor process components using small volumes of hazardous liquids and minimizing cross-contamination between components from different deposition chambers. Components to be clean... | 02/12/2008 |
| 7326305 | System and method for decapsulating an encapsulated object A system and method for the selective etching or removal of encapsulating material from an encapsulated object, such as a semiconductor, includes depositing an encapsulant-removal agent, such as a solvent or acid, onto the surface of the object. A flow of heated gas... | 02/05/2008 |
| 7316236 | Cleaning device for the shaving head of a dry shaving apparatus A shaving head cleaning device includes a housing, a receptacle configured to receive the dry shaving apparatus, a receiving region configured to receive the shaving head of the dry shaving apparatus, a reservoir for containing cleaning fluid, a supply conduit conne... | 01/08/2008 |
| 7314529 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 01/01/2008 |
| 7288156 | Methods for cleaning a substrate The invention provides a water supplying apparatus and method thereof which has a high capacity of peeling and removing a disused material such as a resist film and the like, and can efficiently use water vapor. A water supplying apparatus for executing a washing pr... | 10/30/2007 |
| 7275553 | Liquid processing apparatus and liquid processing method A cleaning processing apparatus comprises a spin chuck for holding a wafer W, an under plate being positioned to face the back surface of the wafer W with a prescribed gap provided therebetween, a support member for supporting the under plate, and a nozzle hole form... | 10/02/2007 |
| 7267130 | Substrate processing apparatus The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, interm... | 09/11/2007 |
| 7264009 | Cleaning system and method of use A cleaning apparatus is provided for cleaning an inner surface of a container. A spray head is arranged for operable fluid communication with a fluid pump and has a nozzle configured to disperse liquid in a mist. A mount carries the spray head and is removably suppo... | 09/04/2007 |
| 7258124 | Apparatus and method for treating surfaces of semiconductor wafers using ozone An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of processing fluid formed o... | 08/21/2007 |
| 7255115 | Apparatus for cleaning semiconductor wafers An apparatus for cleaning semiconductor wafers includes a chamber, a bubbler having a vapor generating part for generating alcohol vapor and a spray pipe for spraying the alcohol vapor into the chamber, a gas supply nozzle for spraying gas into the chamber to dry th... | 08/14/2007 |
| 7252095 | Mobile flushing unit and process In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a flexible hose of the mobile flushing unit to one end of the workpiece and... | 08/07/2007 |
| 7225817 | Cleaning device for the shaving head of a dry shaving apparatus A cleaning device for the shaving head of a dry shaving apparatus includes a receptacle having a reservoir adapted to receive the a shaving head and a pump to transfer a cleaning fluid from the reservoir and into the receptacle. A controllable drain disposed between... | 06/05/2007 |
| 7216813 | Pressure gauge A retrofittable pressure gauge for a spray gun includes a pressure sensor, located in a pressure chamber, a power source and a display unit, all enclosed within a case, a passageway providing fluid communication between the pressure chamber and a pressurised interio... | 05/15/2007 |
| 7198052 | Mobile flushing unit and process In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a flexible hose of the mobile flushing unit to one end of the workpiece and... | 04/03/2007 |
| 7179390 | Method of filtering a fluid and remote filtering station Filtering of an operating fluid of a mechanical device is performed utilizing a pumping device of the mechanical device which routinely circulated the operating fluid within the mechanical device. A remote filtering station of the present invention has a first condu... | 02/20/2007 |
| 7172383 | Wafer transfer equipment and semiconductor device manufacturing apparatus using wafer transfer equipment A semiconductor wafer transfer equipment transfers a plurality of semiconductor wafers, held in grooves of carriers in an erected state, to a boat using first and second wafer elevators equipped with a comb-teeth portion and a wafer grip and transfer unit. The first... | 02/06/2007 |
| 7156112 | Method and apparatus for cleaning paint supply systems A solvent flush cleaning system for a paint supply system. The cleaning system includes an air injection system that injects air directly into the pumping chambers of the solvent pump to entrain air within the solvent. The cleaning system preferably includes a dedic... | 01/02/2007 |
| 7152613 | Cleaning apparatus having fluid mixing nozzle for manufacturing flat-panel display Provided is a cleaning apparatus having a fluid mixing nozzle, the cleaning apparatus having a fluid mixing nozzle, the cleaning apparatus for cleaning a glass plate used in the manufacture of a flat-panel display and which mixes a cleaning fluid with a gas and spra... | 12/26/2006 |
| 7128539 | Method for improved cleaning of a pumping system Improved method for cleaning a pump, fluid hose, and spray gun is provided by, for example, repeatedly changing the flow rate of the cleaning fluid pumped through the system to generate turbulence or increased turbulence and increased frictional resistance for enhan... | 10/31/2006 |
| 7124466 | Particle capture system A particle capture system includes a container sized to receive a structural disc drive component. A fixture is able to maintain the disc drive component within a spray zone in the container, and a first nozzle in the container is connected to a fluid source and is ... | 10/24/2006 |
| 7125438 | Method and an apparatus for continuously deaerating a liquid The invention relates to a method for continuously deaerating a liquid. The method comprises the step that the liquid is led into a closed container (1) so that a liquid surface (7) is formed within the container (1). The space above the liquid ... | 10/24/2006 |
| 7124766 | Apparatus and use thereof in cleaning a respiratory device A cleaning apparatus includes a tank housing and a partition disposed in the tank housing so as to divide the interior thereof into pumping and cleaning chambers as the only chambers within the tank housing adapted to contain cleaning liquid. A submersible pump moun... | 10/24/2006 |
| 7118533 | Disinfecting and storage apparatus for a trans-esophageal probe An apparatus adapted for use with a trans-esophageal probe. The apparatus comprises a disinfecting unit and a storage unit, each of which includes a tubular housing having an interior, upper and lower ends, and an opening at the upper end for access to the interior.... | 10/10/2006 |
| 7104268 | Megasonic cleaning system with buffered cavitation method A wafer cleaning method and system including a combined high frequency signal, a low frequency signal, and in one embodiment a biased voltage signal, allows cleaning particles and impurities off of fine-structured wafers, through application of an acoustic field to ... | 09/12/2006 |
| 7097717 | Method and device for collecting particulate contaminants during COblasting decontamination Disclosed is a method and device for collecting particulate contaminants removed using a CO2 decontamination medium from an early step of a decontamination process. The device removes particulate contaminants from a contaminated subject by a decontaminati... | 08/29/2006 |
| 7097713 | Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substrates A method for removing a metallic layer from the surface of a ceramic substrate, the method including the steps of immersing the metallic coated ceramic substrate in a solution of up to 31% hydrochloric acid for a sufficient time to at least substantially dissolve or... | 08/29/2006 |
| 7077486 | Enclosure for handling hazardous material An enclosure for handling hazardous material includes a sealable housing which is configured with a first air inlet connected to a bubble gauge and a second air inlet disposed inside the housing for air evacuation from the housing is connected to a pump for maintain... | 07/18/2006 |
| 7067018 | Automated system for handling and processing wafers within a carrier A workpiece handling and processing system has a interface section for loading wafers from cassettes into carriers. The wafers are lifted out of cassettes by a buffer elevator and moved into a position over an open carrier by a buffer robot. A comb elevator lifts co... | 06/27/2006 |
| 7059336 | Cleaning device for a shaving head of a dry shaving apparatus A cleaning device for a shaving head of a dry shaving apparatus includes a reservoir to store a cleaning fluid, a receptacle adapted to receive the shaving head and the cleaning fluid, the receptacle being configured to direct the cleaning fluid toward the shaving h... | 06/13/2006 |
| 7056442 | Method and apparatus for flushing contaminants from a container of fluids A contaminant-flushing machine for removing contaminants from a container, such as an engine transmission, air-conditioner coil, or transmission cooler, which includes hoses for coupling to the transmission cooler and a pump for circulating fluid through the hoses a... | 06/06/2006 |
| 7051743 | Apparatus and method for cleaning surfaces of semiconductor wafers using ozone An apparatus and method for cleaning surfaces of semiconductor wafers utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of cleaning fluid formed on a semiconductor wafer surface to inc... | 05/30/2006 |
| 7047988 | Automatic cleaning mechanism for a paint sprayer A cleaning device which washes each of the components of a paint sprayer from the correct angle to ensure that all residue is properly removed. The invention provides a mechanism for aligning cleaning nozzles with the components of the paint sprayer. Holding devices... | 05/23/2006 |
| 7017593 | Pipe washing method and pipe washing apparatus A micro device in which a functional element can be moved between an operating position and a waiting position by the displacement of support means coupled to a substrate. The micro device has a cantilever structure in which one end of support means is made a fixed ... | 03/28/2006 |
