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| Number | Title | Issue Date |
| 8133324 | Methods for removal of polymeric coating layers from coated substrates The invention provides a method for the at least partial removal of one or more polymeric coating layers from a coated substrate having at least one coated surface. The method includes generating at least one reactive species in an ionized gas stream discharged at a... | 03/13/2012 |
| 8097087 | Method of cleaning support plate A method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at low cost. The method of cleaning the support plate includes the step of removing an organic substance a... | 01/17/2012 |
| 8097088 | Methods for processing substrates in a dual chamber processing system having shared resources Methods for processing substrates in dual chamber processing systems comprising first and second process chambers that share resources may include performing a first internal chamber clean in each of the first process chamber and the second process chamber; and subs... | 01/17/2012 |
| 8080108 | Method for cleaning a substrate A method for the continuous vacuum cleaning of a substrate, characterized in that: a species is chosen that has a low sputtering efficiency and is chemically active with regard to the soiling matter; using at least... | 12/20/2011 |
| 8080109 | Film formation apparatus and method for using the same A method for using a film formation apparatus for a semiconductor process includes setting an idling state where a reaction chamber of the film formation apparatus accommodates no product target substrate therein, and then, performing a purging process of removing a... | 12/20/2011 |
| 8057604 | Method and device for descaling metal strip A method and a device for descaling a metal strip, in which the metal strip is guided in a direction of conveyance through at least one plasma descaling unit in which it is subjected to a plasma descaling. The metal strip is subjected to an automatically controlled ... | 11/15/2011 |
| 8057603 | Method of cleaning substrate processing chamber, storage medium, and substrate processing chamber A method of cleaning a substrate processing chamber that enables formation of an oxide film on a surface of a processing chamber inside component to be prevented. A substrate processing chamber 11 has therein a processing space S into which a wafer W is trans... | 11/15/2011 |
| 8052798 | Particle removal apparatus and method and plasma processing apparatus A particle removal apparatus for removing particles from a chamber of a plasma processing apparatus, wherein the chamber is connected to a gas exhaust port and a plasma of a processing gas is generated in the chamber to plasma process a substrate to be processed, in... | 11/08/2011 |
| 8034183 | Cleaning method and plasma processing method In a RLSA microwave plasma processing apparatus that radiates microwave from a microwave generator into a chamber by using a planer antenna (Radial Line Slot Antenna) having many slots formed according to a certain pattern, the chamber contaminated with Na or the li... | 10/11/2011 |
| 8025736 | Semiconductor device fabrication equipment for performing PEOX process and method including cleaning the equipment with remotely produced plasma Semiconductor device fabrication equipment performs a PEOX (physical enhanced oxidation) process, and includes a remote plasma generator for cleaning a process chamber of the equipment. After a PEOX process has been preformed, a purging gas is supplied into the proc... | 09/27/2011 |
| 8021489 | Substrate treatment process A method of forming a plasma to physicochemically modify properties of a fluid spray in a substrate treatment processes includes providing an applicator in proximity to the substrate. The applicator comprises an electrically insulated main body portion containing a ... | 09/20/2011 |
| 8012264 | Method and apparatus for cleaning tire vulcanization mold A tire vulcanization mold cleaning method for cleaning a molding surface of a sector of the tire vulcanization mold for molding a tread portion of a pneumatic tire by using plasma created in an atmosphere of a reaction gas which chemically reacts with dirt attached ... | 09/06/2011 |
| 7993465 | Electrostatic chuck cleaning during semiconductor substrate processing Methods and apparatus for cleaning electrostatic chucks in processing chambers are provided. The process comprises flowing a backside gas comprising a reactive agent into a zone in a process chamber, the zone defined by a space between a surface of an electrostatic ... | 08/09/2011 |
| 7959737 | Film formation apparatus and method for using the same A method for using a film formation apparatus for a semiconductor process includes a first cleaning process of removing by a first cleaning gas a by-product film from an inner surface of a reaction chamber of the film formation apparatus, while supplying the first c... | 06/14/2011 |
| 7947129 | Ion source apparatus and cleaning optimized method thereof An ion source apparatus includes a rare gas supply source supplying rare gas instead of ion source gas to a plasma chamber, means to determine time and timing for cleaning electrodes in consideration of a collecting amount of insulation layers accreting to the elect... | 05/24/2011 |
| 7931752 | Method for cleaning semiconductor equipment A method for cleaning a semiconductor equipment is provided. First, a first cleaning step is performed to the process chamber. The first cleaning step includes conducting a cleaning gas into the process chamber via a short processing gas injector for generating a pl... | 04/26/2011 |
| 7909933 | Plasma processing method The invention provides a plasma processing method capable of reducing particle caused by flinging up of particles by airflow due to the pressure fluctuation in the processing chamber during the time the sample is carried into the processing chamber, subjected to pla... | 03/22/2011 |
| 7887637 | Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning In a substrate processing apparatus for performing a plasma process on a substrate including a tungsten-containing film, cleaning is performed for a process chamber. This cleaning includes, after the plasma process, supplying a gas containing O2 into the ... | 02/15/2011 |
| 7833358 | Method of recovering valuable material from exhaust gas stream of a reaction chamber A semiconductor processing chamber is cleaned by introducing a cleaning gas into a processing chamber, striking a plasma in a remote plasma source that is in communication with the processing chamber, measuring the impedance of the plasma, vaporizing a ruthenium con... | 11/16/2010 |
| 7824499 | Photon induced cleaning of a reaction chamber The present invention provides a method for in-situ cleaning of walls of a reaction chamber, e.g. reactive ion etching chamber, to remove contamination, e.g. copper comprising contamination from the walls. The method comprises converting the contamination, e.g. copp... | 11/02/2010 |
| 7819979 | Method and system for cleaning magnetic artifacts using a carbonyl reactive ion etch A method and system for providing a magnetic structure that includes at least one magnetic material is disclosed. The method and system include defining the magnetic structure. The magnetic structure also includes a top layer that is insensitive to an istroropic car... | 10/26/2010 |
| 7819980 | System and method for removing particles in semiconductor manufacturing A system for semiconductor wafer manufacturing, comprises a chamber process path for processing the wafer, and a device operable to remove particles from the wafer by electrostatic and electromagnetic methodologies wherein the device is installed in the chamber proc... | 10/26/2010 |
| 7799138 | In-situ method to reduce particle contamination in a vacuum plasma processing tool The method and apparatus of the embodiments of the present invention employ an in-situ particle decontamination technique that allows for such decontamination while a wafer is a vacuum tool or deposition chamber, thereby eliminating the need for another device for p... | 09/21/2010 |
| 7718008 | Method for cleaning photo mask The present invention provides a method for cleaning a photo mask without the need for removal of the pellicle mounted on the photo mask, without the large scale equipment for washing with a solution, with a small number of steps for cleaning and inspection, and wit... | 05/18/2010 |
| 7699935 | Method and system for supplying a cleaning gas into a process chamber A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate suppor... | 04/20/2010 |
| 7662237 | Method of cleaning the surface of a material coated with an organic substrate and a generator and device for carrying out said method A method for the continuous cleaning of the surface of a material (2) which is coated with an organic substance. Steps of the method are: introducing the material (2) into a treatment area which is supplied with a gas stream containing oxygen; earthing... | 02/16/2010 |
| 7658802 | Apparatus and a method for cleaning a dielectric film An apparatus and a method of cleaning a dielectric film are provided in the present invention. In one embodiment, an apparatus of cleaning a dielectric film the apparatus includes a chamber body adapted to support a substrate therein, a remote plasma source adapted ... | 02/09/2010 |
| 7637268 | Film formation method and apparatus for semiconductor process In a film formation method for a semiconductor process, a target substrate having a target surface with a natural oxide film is loaded into a reaction chamber, while setting the reaction chamber at a load temperature lower than a threshold temperature at which the n... | 12/29/2009 |
| 7604010 | Film formation apparatus and method of using the same A film formation apparatus for a semiconductor process includes a cleaning gas supply circuit, a concentration measuring section, and an information processor. The cleaning gas supply circuit is configured to supply a cleaning gas into a reaction chamber to perform ... | 10/20/2009 |
| 7588036 | Chamber clean method using remote and in situ plasma cleaning systems A process for removing unwanted deposition build-up from one or more interior surfaces of a substrate processing chamber. According to one embodiment the process comprises performing a substrate processing operation on the substrate within the substrate processing c... | 09/15/2009 |
| 7578301 | Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system A method of determining an endpoint of a process by measuring a thickness of a layer, the layer being deposited on the surface by a prior process is disclosed. The method includes providing a sensor that is coplanar with the surface, wherein the sensor is configured... | 08/25/2009 |
| 7575007 | Chamber recovery after opening barrier over copper A chamber dry cleaning process particularly useful after a dielectric plasma etch process which exposes an underlying copper metallization. After the dielectric etch process, the production wafer is removed from the chamber and a cleaning gas is excited into a plasm... | 08/18/2009 |
| 7552736 | Process for wafer backside polymer removal with a ring of plasma under the wafer A process is provided for removing polymer from a backside of a workpiece. The process includes supporting the workpiece on the backside in a vacuum chamber while leaving at least a peripheral annular portion of the backside exposed. The process further includes con... | 06/30/2009 |
| 7530359 | Plasma treatment system and cleaning method of the same A plasma treatment apparatus has a reaction vessel (11) provided with a top electrode (13) and a bottom electrode (14), and the first electrode is supplied with a VHF band high frequency power from a VHF band high frequency power source (32 | 05/12/2009 |
| 7509962 | Method and control system for treating a hafnium-based dielectric processing system A method and control system for treating a hafnium-based dielectric processing system in which a system component of the processing system is exposed to a chlorine-containing gas. A residual hafnium by-product remaining in the processing system after a hafnium remov... | 03/31/2009 |
| 7506654 | Accelerated plasma clean A method and apparatus that reduces the time required to clean a processing chamber employing a reactive plasma cleaning process. A plasma is formed in an Astron fluorine source generator from a flow of substantially pure inert-source gas. After formation of the pla... | 03/24/2009 |
| 7484513 | Method of forming titanium film by CVD A Ti film is formed by CVD in holes formed in an insulating film formed on a Si substrate or on a Si film formed on a Si substrate by a method according to the present invenitioin. The method includes the steps of loading a Si substrate into a film forming chamber; ... | 02/03/2009 |
| 7481230 | Plasma processing method and apparatus A plasma processing method allows to suppress the drop of the etching rate of the depoless-process without performing an additional seasoning process right after the dry cleaning process. The method includes a first and a second plasma processing step carried out in... | 01/27/2009 |
| 7464717 | Method for cleaning a CVD chamber The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF ... | 12/16/2008 |
| 7435687 | Plasma processing method and plasma processing device The invention provides a plasma processing method and plasma processing device for manufacturing semiconductor devices in which the number of foreign particles being adhered to the wafer is reduced greatly and the yield is improved. In a plasma processing device hav... | 10/14/2008 |
