Quotables
"Transmission of documents via telephone wires is possible in principle, but the apparatus required is so expensive that it will never become a practical proposition."
Dennis Gabor, British physicist
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8021488 | Sealing structure of vacuum device A sealing structure for sealing a gap between a vacuum container 2 and a lid 3 contacted to an opening of the vacuum container 2 to close it. A cavity 66 is formed in an elastomer O-ring 64 interposed between the vacuum container | 09/20/2011 |
| 8012261 | ALD apparatus and method An apparatus and method for atomic layer deposition with improved efficiency of both chemical dose and purge is presented. The apparatus includes an integrated equipment and procedure for chamber maintenance. ... | 09/06/2011 |
| 7794546 | Sealing device and method for a processing system A method, computer readable medium, and system for treating a substrate in a process space of a processing system that is vacuum isolated from a transfer space of the processing system is described. A sealing device is disposed between a first chamber assembly confi... | 09/14/2010 |
| 7622008 | Gate valve and vacuum container for semiconductor processing system A gate valve (20) for a semiconductor processing system includes a housing (21) forming a plurality of passages (22A to 22D) arrayed in a first direction. The passages respectively have ports (23A to 23D) facing a first pred... | 11/24/2009 |
| 7604701 | Method and apparatus for removing external components from a process chamber without compromising process vacuum An access assembly for a process chamber, including a wall segment constructed and arranged to access the process chamber, a mounting assembly constructed and arranged to couple the wall segment to the process chamber, and a sealing plate mounted to the process cham... | 10/20/2009 |
| 7431813 | Multi-chambered substrate processing equipment having sealing structure between chambers thereof, and method of assembling such equipment Sealing structure provided between a transfer chamber and a chamber, such as a process chamber, connected to the transfer chamber includes an insert member, a docking member, and annular seals. The insert member is fixed to the exterior of the transfer chamber and t... | 10/07/2008 |
| 7422653 | Single-sided inflatable vertical slit valve A vacuum chamber having a gate valve including a chamber housing defining an internal vacuum region and first and second openings through the chamber housing and a gate valve secured to the chamber housing. The gate valve includes a sealing door located in the proce... | 09/09/2008 |
| 7416633 | Plasma processing apparatus Described is a vacuum processing apparatus that includes a vacuum container which has a processing chamber inside thereof, wherein a plasma used for processing a sample is formed inside the processing chamber. The processing chamber has an upper side wall which surr... | 08/26/2008 |
| 7410542 | Variable environment, scale-able, roll to roll system and method for manufacturing thin film electronics on flexible substrates A roll to roll, film forming system overcoming the shortcomings of current roll to roll processing is presented; The roll to roll enabled cartridge is loaded with a bolt of fresh flexible substrate. A skate couples with a cartridge, forms a seal with the cartridge's... | 08/12/2008 |
| 7374620 | Substrate processing apparatus A substrate processing apparatus (10A) using a microwave plasma is disclosed wherein an inner partition wall (15) is provided within a process chamber (11) so that the inside of the process chamber (11) is divided into a space (11A... | 05/20/2008 |
| 7371285 | Motorized chamber lid A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom defining an interior volume. A lid assembly is coupled to the chamber body ... | 05/13/2008 |
| 7332038 | Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates A device for depositing crystalline layers onto one or more substrates in a process chamber, including: a reverse-heatable support plate which forms a wall of the process chamber and which is heated with a high frequency and is formed of inertly coated graphite; a g... | 02/19/2008 |
| 7313888 | Device for and method of preventing rattling of door window glass for vehicles A device for preventing rattling of a door window glass for vehicles. In an activated condition, i.e. upon the upward and downward movement of the window glass, smoother upward and downward movement of the window glass is enabled, thereby eliminating noise due to fr... | 01/01/2008 |
| 7311779 | Heating apparatus to heat wafers using water and plate with turbolators Embodiments of the invention provide a fluid processing method and apparatus. The apparatus includes a substrate support assembly positioned in a processing volume, a disk shaped member positioned in the processing volume in parallel orientation with a substrate sup... | 12/25/2007 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7292909 | Substrate processing apparatus and management method A variety of maintenance work is performed for each of operation units in a substrate processing apparatus. Doors are provided at given positions on sides of an apparatus space, each of which is provided with an interlock switch. An interlock release unit is provide... | 11/06/2007 |
| 7282111 | System and method for monitoring particles contamination in semiconductor manufacturing facilities Provided is a particle monitoring system capable of detecting a level of polymer particle contamination on inner walls of a process chamber. Also disclosed is a method of monitoring the level of polymer particle contamination on inner walls of a process chamber.... | 10/16/2007 |
| 7282097 | Slit valve door seal Embodiments of the invention generally provide a slit valve door seal. In one embodiment, a slit valve door seal includes a ring-shaped base having a center axis and at least one finger extending from the base. The finger is oriented substantially parallel to the ce... | 10/16/2007 |
| 7282460 | Transfer chamber for cluster system A transfer chamber for a cluster system includes a first body, a second body attached at one side of the first body, and a cover combined with an upper portion of the first body. The transfer chamber further includes a third body at another side of the first body, w... | 10/16/2007 |
| 7279049 | Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support In one embodiment, the invention is a guard ring for reducing particle entrapment along a moveable shaft of a substrate support. In one embodiment, the guard ring comprises a substantially annular guard ring positioned within a step formed in a sleeve that circumscr... | 10/09/2007 |
| 7279067 | Port structure in semiconductor processing system In a port structure 16A in a semiconductor processing system 2, a door 20A is disposed in a port 12A defined by upright wall 52 and 54. A table 48 opposed to the port is disposed outside the system. Defined on the tab... | 10/09/2007 |
| 7276123 | Semiconductor-processing apparatus provided with susceptor and placing block A semiconductor-processing apparatus comprises a susceptor and removable placing blocks detachably placed at a periphery of the susceptor for transferring a substrate. Retractable supporting members are provided for detaching/attaching the placing blocks from/to the... | 10/02/2007 |
| 7269982 | Steam seal for textile production The invention is a sealing mechanism for a steam chest (14) used in the manufacture of textile materials. This invention is a device for heating continuous textile material comprising: a steam chest (14) having a steam inlet, a material inlet (18 | 09/18/2007 |
| 7270715 | Chemical vapor deposition apparatus A chemical vapor deposition apparatus includes a subatmospheric substrate transfer chamber. A subatmospheric deposition chamber is defined at least in part by a chamber sidewall. A passageway in the chamber sidewall extends from the transfer chamber to the depositio... | 09/18/2007 |
| 7267725 | Thin-film deposition apparatus A thin-film deposition apparatus includes a reaction chamber, a substrate transfer chamber, a susceptor having a radially-extending step portion, a ring-shaped separation wall for separating the reaction chamber and the substrate transfer chamber at a processing pos... | 09/11/2007 |
| 7258347 | Discrete active seal assemblies Active seal assemblies employing active materials that can be controlled and remotely changed to alter the seal effectiveness, wherein the active seal assemblies actively change modulus properties such as stiffness, shape orientation, and the like. In this manner, i... | 08/21/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7247207 | Vacuum processing apparatus A vacuum processing apparatus includes a vacuum processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas. The vacuum processing chamber has an axisymmetric structure, including a double wall struct... | 07/24/2007 |
| 7241346 | Apparatus for vapor deposition A stage has a plate, a first seal surface, a stem, a second seal surface, a cover, a conductor and a flow path. A heater is embedded in the plate. A terminal for supplying power to the heater is exposed at one surface of the plate. The first seal surface is provided... | 07/10/2007 |
| 7232286 | Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber The present invention provides a seal device comprising a sealing passage which allows communication between a first space and a second space, and evacuation lines individually connected to the first space and the sealing passage. A gas feed line for feeding dry gas... | 06/19/2007 |
| 7225820 | High-pressure processing chamber for a semiconductor wafer A processing chamber having an improved sealing means is disclosed. The processing chamber comprises a lower element, an upper element, and a seal energizer. The seal energizer is configured to maintain the upper element against the lower element to maintain a proce... | 06/05/2007 |
| 7214274 | Method and apparatus for thermally insulating adjacent temperature controlled processing chambers A dual chamber apparatus including a first chamber and a second chamber which is configured to be coupled to the first chamber at an interface. Each of the first chamber and the second chamber has a transfer opening located at the interface. An insulating plate is l... | 05/08/2007 |
| 7208065 | Structure for measuring the etching speed The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor syste... | 04/24/2007 |
| 7198678 | Apparatus for performing at least one process on a substrate Apparatus for performing at least one processing operation on a substrate, the apparatus being provided with at least one process chamber and a vacuum lock for the purposes of placing the substrate from the surroundings into a process chamber without the reduced pre... | 04/03/2007 |
| 7196507 | Apparatus for testing substrates An apparatus for testing substrates reduces the area required and the costs which arise with the testing of substrates, in particular semiconductor wafers, during the production process. The apparatus includes testing arrangements comprising a chuck, a chuck drive, ... | 03/27/2007 |
| 7192487 | Semiconductor substrate processing chamber and accessory attachment interfacial structure A semiconductor substrate processor includes a substrate transfer chamber and a plurality of substrate processing chambers connected therewith. An interfacial structure is received between at least one of the processing chambers and the transfer chamber. The interfa... | 03/20/2007 |
| 7189313 | Substrate support with fluid retention band An apparatus and method for supporting a substrate is provided. In one embodiment, an apparatus for supporting a substrate includes a body having a band extending therefrom. The band is adapted to retain a fluid on the body thereby forming a shallow processing bath ... | 03/13/2007 |
| 7189437 | Mobile plating system and method An exemplary method for using a mobile plating system is provided that includes locating the mobile plating system at a desired location for plating, positioning an external vacuum pump from an interior position of a mobile storage volume of the mobile plasma platin... | 03/13/2007 |
| 7189290 | Method and device for cleaning raw material gas introduction tube used in CVD film forming apparatus A method and apparatus for cleaning a source gas introduction pipe, which can prevent strong adhesion of contaminant mainly containing carbon powder on an outer surface of the source gas introduction pipe to easily remove the contaminant in a short period of time. W... | 03/13/2007 |
