Class 118/732 - Porous

Subclass of Class 118 - Coating apparatus
Definition: Apparatus wherein the base holding means is foraminously
No. of patents: 36
Last issue date: 10/23/2007

Number	Title	Issue Date
7285483	Coated semiconductor wafer, and process and apparatus for producing the semiconductor wafer A susceptor configured to receive a semiconductor wafer for deposition of a layer on a front surface of the semiconductor wafer by chemical vapor deposition (CVD) has a gas-permeable structure with a porosity of at least 15%, a density of from 0.5 to 1.5 g/cm3	10/23/2007
7208065	Structure for measuring the etching speed The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor syste...	04/24/2007
7101794	Coated semiconductor wafer, and process and device for producing the semiconductor wafer A susceptor for a semiconductor wafer to be placed on during deposition of a layer on a front surface of the semiconductor wafer by chemical vapor deposition (CVD), has a gas-permeable structure with a porosity of at least 15% and a density of from 0.5 to 1.5 g/cm	09/05/2006
7056806	Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces The present disclosure provides methods and apparatus useful in depositing materials on batches of microfeature workpieces. One implementation provides a method in which a quantity of a first precursor gas is introduced to an enclosure at a first enclosure pressure....	06/06/2006
7030335	Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression A plasma reactor for processing a semiconductor workpiece, includes a reactor chamber having a chamber wall and containing a workpiece support for holding the semiconductor workpiece, an overhead electrode overlying said workpiece support, the electrode comprising a...	04/18/2006
7024105	Substrate heater assembly A substrate heater assembly for supporting a substrate of a predetermined standardized diameter during processing is provided. In one embodiment, the substrate heater assembly includes a body having an upper surface, a lower surface and an embedded heating element. ...	04/04/2006
6957956	Vertical heat treating equipment A vertical heat-processing apparatus (1) includes a vertical heat-processing furnace (2) having a furnace port (3), a lid (5) movable up and down to open and close the furnace port, and a rotation mechanism (15) disposed on the lid...	10/25/2005
6841049	OPTICAL DEVICE SUBSTRATE FILM-FORMATION APPARATUS, OPTICAL DISK SUBSTRATE FILM-FORMATION METHOD, SUBSTRATE HOLDER MANUFACTURE METHOD, SUBSTRATE HOLDER, OPTICAL DISK AND A PHASE-CHANGE RECORDING TYPE OF OPTICAL DISK In an optical disk substrate film-formation apparatus which prepared an optical disk by forming a thin film on a substrate, the optical disk substrate is held by a holder section. A contact support surface is provided to the holder section which closely contacts at ...	01/11/2005
6682627	Process chamber having a corrosion-resistant wall and method A substrate processing chamber has a substrate support, a gas supply, a gas exhaust, a gas energizer, and a wall about the substrate support, the wall having a porous ceramic material at least partially infiltrated with a fluorinated polymer, whereby a su...	01/27/2004
6365013	Coating method and device The invention relates to a coating process, particularly for coating a gas turbine blade (1) having cooling passageways (4) opening out onto the surface (2). During the coating operation, a fluid (6) is directed out of the cooling passageways (4) to preve...	04/02/2002
6148763	Deposited film forming apparatus In a deposited film forming apparatus, at least part of the inner wall surfaces of a reactor or surfaces of structural component parts on which films are deposited is constituted of a porous ceramic material. This can prevent film come-off of deposited fi...	11/21/2000
6018616	Thermal cycling module and process using radiant heat In general, the present invention provides a single thermal cycling module for baking and chilling a substrate, such as a wafer, that is in thermal contact with a foil heater, a heat exchanger, and a radiation heater. The radiation heater thermally heats ...	01/25/2000
5890269	Semiconductor wafer, handling apparatus, and method A semiconductor wafer comprising a single crystalline lattice suitable for use in the manufacture of integrated circuits, namely computer chips and dies, wherein a diameter of the wafer is greater than approximately 150 millimeters and wherein the wafer i...	04/06/1999
5620525	Apparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrate A platen supports a substrate on an interior platen region during the deposition of materials such as tungsten, metal nitrides, other metals, and silicides in a chemical vapor deposition ("CCVD") reactor. A deposition control gas composed of a suitable in...	04/15/1997
5534073	Semiconductor producing apparatus comprising wafer vacuum chucking device It is an object of the present invention to obtain a vacuum chucking which can vacuum suck a wafer even if dusts attach thereon. The main body of vacuum chuck (101) has a plurality of block grooves (125) on the surface on which the wafer (1) is sucked and...	07/09/1996
5516367	Chemical vapor deposition chamber with a purge guide Vacuum CVD chambers are disclosed which provide a more uniformly deposited thin film on a substrate. The chamber susceptor mount for the substrate is heated resistively with a single coil firmly contacting the metal of the susceptor on all sides, providin...	05/14/1996
5389152	Apparatus for densification of porous billets A porous preform is densified by heating while emersed in a precursor liquid. Heating is achieved by passing a current through the preform or by an induction coil immersed in the liquid. Ways to control the densification process are also described....	02/14/1995
5238499	Gas-based substrate protection during processing A suitable inert gas such as argon or a mixture of inert and reactive gases such as argon and hydrogen is introduced onto the backside of wafers being processed in a CVD reactor during the deposition of tungsten or other metals, metal nitrides and silicid...	08/24/1993
5133284	Gas-based backside protection during substrate processing A suitable inert thermal gas such as argon is introduced onto the backside of wafers being processed in a CVD reactor during the deposition of tungsten or other metals and silicides, to avoid deposition of material on the backside of the wafers being proc...	07/28/1992
5076203	Coating apparatus for thin plastics webs Coating apparatus for a thin plastics web comprises a coating deposition station for applying a coating to the web by vapor deposition and a support for supporting the web at the coating deposition station. The apparatus includes a device for urging gas i...	12/31/1991
5037262	Holding device for a disk and application therefor A holding device for semiconductor disks or wafers orients and secures the disk during transport to a working position. Shortly before the disk reaches a working position the device releases the surface to be worked or secures the disk position with the a...	08/06/1991
4719873	Film forming apparatus A film forming apparatus utilizing discharge to accomplish film formation is provided with a cover electrode movable back and forth and a gas supply pipe. By moving the cover electrode, the cover electrode and a substrate containing cassette in which a su...	01/19/1988
4694778	Chemical vapor deposition wafer boat A chemical vapor deposition wafer boat for supporting a plurality of wafers in an evenly spaced, upright orientation perpendicular to the axis of the boat comprises a cylinder having closed ends and comprised of mutually engaging upper and lower hemicylin...	09/22/1987
4668479	Plasma processing apparatus The present invention relates to a plasma processing apparatus comprising a housing chamber which accommodates substances to be painted made of synthetic resin, a rotating support base which is provided in the housing chamber and rotates the substance to ...	05/26/1987
4641604	Chemical vapor deposition wafer boat A chemical vapor deposition wafer boat for supporting a plurality of wafers in an evenly spaced, upright orientation perpendicular to the axis of the boat comprises a cylinder having closed ends and comprised of mutually engaging upper and lower hemicylin...	02/10/1987
4609562	Apparatus and method for depositing coating onto porous substrate Disclosed is an apparatus for forming a chemically vapor deposited coating on a porous substrate where oxygen from a first gaseous reactant containing a source of oxygen permeates through the pores of the substrate to react with a second gaseous reactant ...	09/02/1986
4584965	Plasma treating apparatus Herein disclosed is a plasma treating apparatus for treating articles such as bumpers of synthetic resins with a plasma gas to activate the surfaces of said articles before the same are painted. The plasma treating apparatus comprises: a body defining a c...	04/29/1986
4582020	Chemical vapor deposition wafer boat A chemical vapor deposition wafer boat for supporting a plurality of wafers in an evenly spaced, upright orientation perpendicular to the axis of the boat comprises a cylinder having closed ends and comprised of mutually engaging upper and lower hemicylin...	04/15/1986
4580524	Process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition A chemical vapor deposition (CVD) process for preparing fiber-reinforced ceramic composites. A specially designed apparatus provides a steep thermal gradient across the thickness of a fibrous preform. A flow of gaseous ceramic matrix material is directed ...	04/08/1986
4548159	Chemical vapor deposition wafer boat A chemical vapor deposition wafer boat for polysilicon deposition in a vertical CVD apparatus comprises upper and lower, mutually engaging, open ended hemicylinders. Gas flow passageways are present in a diffusion zone of the lower hemicylinder wall, but ...	10/22/1985
4514240	Method for adhesively bonding parts made of refractory materials A method for the adhesive bonding of refractory parts wherein the refractory parts used are porous or capable of becoming porous by thermal treatment; a layer of thickness between 0.1. and 1 mm is interposed between the refractory parts, which layer is es...	04/30/1985
4403567	Workpiece holder A workpiece holder for semiconductor workpieces during treatment with a substantially cylindrical casing shaped like a hockey puck having an upper surface for receiving a workpiece, a lower surface, at least one bore between the surfaces for applying a va...	09/13/1983
4365588	Fixture for VPE reactor A fixture for use within an epitaxial deposition reactor includes a box adapted to receive a semiconductor substrate. The box is movable to a position of reactant gas flow within the reactor and it includes a porous cover. A stagnant mixture of reactant g...	12/28/1982
3989004	Apparatus for applying durable lubricous coatings to newly formed vitreous surfaces This invention pertains to apparatus for coating vitreous surfaces, advantageously precoated with a metal oxide, including a continuous treating chamber exposing the vitreous surfaces to the chemically unchanged vapor of a coating composition, particularl...	11/02/1976
3958530	Apparatus for coating an article The present invention relates to a method and apparatus for treating vitreous surfaces such as glass with a coating material introduced upwardly into a coating area or chamber from below a conveyor means which transports the article through such coating a...	05/25/1976
3952118	Method for hot-end coating of glass containers The present invention relates to a method and apparatus for treating vitreous surfaces such as glass with a coating material introduced upwardly into a coating area or chamber from below a conveyor means which transports the article through such coating a...	04/20/1976

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Class 118/732 - Porous