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| Number | Title | Issue Date |
| 7238240 | Method of applying hydrocarbon barrier to a plastic fuel tank The subject invention relates to a method of applying the hydrocarbon barrier inside plastic fuel tanks. The plastic fuel tanks are supported on a carrier in an upright position for movement in a loop through inverted positions. While upright, hot and dry air treats... | 07/03/2007 |
| 7208065 | Structure for measuring the etching speed The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor syste... | 04/24/2007 |
| 7144459 | Centrifugal swing arm spray processor A machine for processing a flat workpiece or wafer has a head, which spins the wafer between upper and lower weirs in a base. The head is spaced apart from the base by an air gap. A vacuum source attached to an exhaust opening in the base draw air through the air ga... | 12/05/2006 |
| 6899788 | Article holders that use gas vortices to hold an article in a desired position An article (e.g. a semiconductor wafer) is held in an article holder by means of a number of gas flows emitted from gas vortex chambers. Some of the gas flows act to cool an adjacent article portion more than the other gas flows. For example, some of the vortex cham... | 05/31/2005 |
| 6858088 | Method and apparatus for treating substrates To achieve a uniform coating of a substrate, with an apparatus and a method for coating substrates, according to which the substrate is supported on a substrate holder in such a way that a substrate surface that is to be coated is exposed, and the substrate is rotat... | 02/22/2005 |
| 6627039 | Plasma processing methods and apparatus To move an article in and out of plasma during plasma processing, the article is rotated by a first drive around a first axis, and the first drive is itself rotated by a second drive. As a result, the article enters the plasma at different angles for diff... | 09/30/2003 |
| 6451114 | Apparatus for application of chemical process to a workpiece An apparatus for application of a chemical process to a workpiece in which movement and precise location of the workpiece within the apparatus is accomplished by means of a single linear actuator and two locator components. A sequence of liquid solutions ... | 09/17/2002 |
| 6340405 | Etching apparatus for manufacturing semiconductor devices An etching apparatus for manufacturing semiconductor devices which reduces contamination of the processing surface of a wafer by transporting a plurality of wafers stacked in a cassette with their processing surfaces facing down from the cassette supply c... | 01/22/2002 |
| 6176968 | Method and apparatus for producing semiconductor laser device A method for producing a semiconductor laser device includes the steps of: forming a reflection protective film on a light-emitting facet of a semiconductor laser device; and removing an unwanted reflection protective film formed on a portion other than t... | 01/23/2001 |
| 6132562 | Method and device for transporting cylindrical substrates to be coated For coating substrates (17,18,20,21,22) in a vacuum-coating chamber (2) the substrates are introduced by an air lock into the coating chamber (2) and moved along a transport path in front of the coating sources (50a,b,c,d) producing a coating cloud. To th... | 10/17/2000 |
| 6082298 | Substrate carrier for a vacuum coating apparatus A vacuum coating apparatus includes a carrier accommodating substrates to be coated; and an evaporation source vertically spaced from the carrier and emitting a vapor stream onto the substrates mounted on the carrier. The carrier includes at least two rad... | 07/04/2000 |
| 5580384 | Method and apparatus for chemical coating on opposite surfaces of workpieces A PECVD coating apparatus includes a vacuum coating chamber for performing a PECVD process. At least one pair of spaced apart electrodes is positioned within the chamber and powered by an electric power supply generator to produce a plasma discharge gener... | 12/03/1996 |
| 5474641 | Processing method and apparatus thereof The present invention relates to a processing chamber that processes an object to be processed in an atmosphere of a processing gas. The processing chamber is provided with a mounting stand having a holder mechanism that holds the object to be processed w... | 12/12/1995 |
| 5421889 | Method and apparatus for inverting samples in a process The invention provides apparatus and methods for improving systems which expose samples to reactive plasmas, and more particularly for inverting the sample within these systems. The systems are of the type which have one or more process chambers, at least... | 06/06/1995 |
| 5403401 | Substrate carrier A flat substrate carrier comprising a machined main surface for supporting substrates to be treated, a surface opposite to the main surface and coating on all sides. The main surface may have been machined with a view to the removal of the treated substra... | 04/04/1995 |
| 5188669 | Circuit board coating apparatus with inverting pallet shuttle A coating apparatus has one coating station with a downwardly directed device to coat both opposite surfaces of two sided circuit boards. One upwardly facing surface of a first board is coated at the coating station and moved to a handling station while a... | 02/23/1993 |
| 5178681 | Suspension system for semiconductor reactors A suspension system for hanging a susceptor inside a reactor for processing semiconductor wafers. A hanger is provided with a flange at its lower end for supporting the susceptor. A collar has an internal flange which engages with another flange at the up... | 01/12/1993 |
| 5138974 | Vacuum apparatus for coating an optical substrate In a vacuum vapor deposition apparatus for coating one side of an optical substrate in an evacuable container, above at least one vapor source, a rotatable support structure is provided. The support structure includes a plurality of at least approximately... | 08/18/1992 |
| 5135635 | Sputtering apparatus The sputtering apparatus for the present invention is used for manufacturing optical discs. On loading and unloading of disc substrates to and from a vacuum chamber, a disc entrance and exit opening provided on the vacuum chamber is closed by a tray havin... | 08/04/1992 |
| 5124019 | Lens holder for use in a high-vacuum vapor deposition or sputtering system A lens holder, particularly for eyeglass lenses to be coated in a high-vacuum vapor deposition or sputtering system, is formed as a ring pair. The ring pair is connectable to a substrate holder that is mounted in the process chamber of the high-vacuum sys... | 06/23/1992 |
| 5122392 | Method and apparatus for manufacturing magnetic recording medium A method and apparatus for manufacturing a magnetic recording medium at high efficiency. A flexible web is passed around first and second cooling cans. The web is reversed between the two cans so that the same surface of the web is directed to the outside... | 06/16/1992 |
| 5026469 | Apparatus for holding and turning eyeglass lenses in a high-vacuum vapor deposition or sputtering system An apparatus for holding and turning lenses, particularly for eyeglass lenses to be coated in a high-vacuum vapor deposition or sputtering system. A ring pair carrying the lens to be held is seated on a substrate holder in the process chamber of the high-... | 06/25/1991 |
| 4871584 | Process of coating and drying both sides of printed circuit boards A very economical process for coating both sides of boards, in particular printed circuit boards, with a liquid coating material, includes the insertion of the boards in a turnover device, wherein first one side is coated, then the board is turned over an... | 10/03/1989 |
| 4817559 | Vacuum vapor-deposition apparatus for coating an optical substrate The cup like support of a vacuum vapor deposition apparatus for substrates to be coated comprises a plurality of pivotable support plates each with a plurality of openings for substrate holders. The substrate holders can have a frame partially embracing t... | 04/04/1989 |
| 4661033 | Apparatus for unloading wafers from a hot boat Wafers are unloaded from a hot wafer processing boat of the type having a plurality of elongated parallel electrodes defining elongated processing gaps therebetween with the wafers being serially spaced apart lengthwise of the gap. A wafer carrier, into w... | 04/28/1987 |
| 4551192 | Electrostatic or vacuum pinchuck formed with microcircuit lithography A pinchuck is formed in accordance with this invention by using lithographic techniques to define and to etch a pattern of pins from an extremely flat etchable surface. Since the pins are formed from a surface which is already flat, it is not necessary to... | 11/05/1985 |
| 4313783 | Computer controlled system for processing semiconductor wafers Automated reactor system and process for etching or otherwise processing semiconductor wafers in a plasma environment. The wafers are carried into and out of a reaction chamber by a conveyor and processed on an individual basis. Within the chamber, an ele... | 02/02/1982 |
