Did You Know...
...that in the early 1940s GE engineer James Wright was charged with a task of utmost importance to the war effort: develop a cheap substitute for rubber that could be used to produce tires, gas masks and a whole host of military gear. Wright tackled the task diligently -- and wound up inventing Silly Putty.
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| Number | Title | Issue Date |
| 8123863 | Evaporation apparatus An evaporation apparatus is capable of preventing a sag phenomenon in a substrate. The evaporation apparatus includes a substrate supporting unit. The substrate supporting unit includes a substrate supporter for supporting side walls of a substrate in a chamber towa... | 02/28/2012 |
| 8118941 | Semiconductor processing parts having apertures with deposited coatings and methods for forming the same Holes in semiconductor processing reactor parts are sized to facilitate deposition of protective coatings, such as by chemical vapor deposition at atmospheric pressure. In some embodiments, the holes each have a flow constriction that narrows the holes in one part a... | 02/21/2012 |
| 8118940 | Clamping mechanism for semiconductor device A clamping mechanism for a semiconductor substrate includes: a C-shaped pickup plate; a susceptor top plate having a periphery adapted to receive and support an inner periphery portion of the C-shaped pickup plate thereon; and a clamp comprising (i) a top ring porti... | 02/21/2012 |
| 8105438 | Film coating cover and film coating device using same An exemplary film coating device includes a film coating holder and a film coating cover. The film coating holder includes a plurality of through holes defined therein for receiving workpieces to be coated. The film coating cover includes a first cover body and a se... | 01/31/2012 |
| 8092606 | Deposition apparatus A deposition apparatus configured to form a thin film on a substrate includes: a reactor wall; a substrate support positioned under the reactor wall; and a showerhead plate positioned above the substrate support. The showerhead plate defines a reaction space togethe... | 01/10/2012 |
| 8092605 | Magnetic confinement of a plasma A method and apparatus for confining a plasma are provided herein. In one embodiment, an apparatus for confining a plasma includes a substrate support and a magnetic field forming device for forming a magnetic field proximate a boundary between a first region dispos... | 01/10/2012 |
| 8043433 | High efficiency electro-static chucks for semiconductor wafer processing The present invention generally provides a high efficiency electrostatic chuck for holding a substrate in a processing volume. The high efficiency electrostatic chuck includes an electrode embedded within a high-purity, thermoplastic member. In particular, the high-... | 10/25/2011 |
| 7993461 | Method and system for mask handling in high productivity chamber A structure for independently supporting a wafer and a mask in a processing chamber is provided. The structure includes a set of extensions for supporting the wafer and a set of extensions supporting the mask. The set of extensions for the wafer and the set of exten... | 08/09/2011 |
| 7993462 | Substrate-supporting device having continuous concavity A substrate-supporting device has a top surface for placing a substrate thereon composed of a plurality of surfaces separated from each other and defined by a continuous concavity being in gas communication with at least one through-hole passing through the substrat... | 08/09/2011 |
| 7993460 | Substrate support having dynamic temperature control A substrate support useful for a plasma processing apparatus includes a metallic heat transfer member and an overlying electrostatic chuck having a substrate support surface. The heat transfer member includes one or more passage through which a liquid is circulated ... | 08/09/2011 |
| 7988786 | Carbon film coated member The present invention provides a carbon film coated member comprising: a base material; and a coated film formed on at least part of a surface of the base material, the coated film comprising: a matrix composed of amorphous carbon; and at least one of metal and meta... | 08/02/2011 |
| 7972444 | Workpiece support with fluid zones for temperature control A workpiece support is disclosed defining a workpiece-receiving surface. The workpiece support includes a plurality of fluid zones. A fluid, such as a gas, is fed to the fluid zones for contact with a workpiece on the workpiece support. The fluid can have selected t... | 07/05/2011 |
| 7964038 | Apparatus for improved azimuthal thermal uniformity of a substrate Methods and apparatus for providing an improved azimuthal thermal uniformity of a substrate are provided herein. In some embodiments, a substrate support for use in a semiconductor process chamber includes a susceptor plate; and a supporting member to support a back... | 06/21/2011 |
| 7959735 | Susceptor with insulative inserts A method and apparatus for reducing arcing in a plasma processing system when processing large area substrates which contain one or more holes. In one embodiment of the invention, a substrate support member includes an electrically insulating insert located beneath ... | 06/14/2011 |
| 7942971 | Method of manufacturing plasma display panels A method of manufacturing plasma display panels using a substrate holder for deposition on a substrate of the plasma display panel. The substrate holder is configured with plural frames, and the substrate of the plasma display panel is held by its periphery with at ... | 05/17/2011 |
| 7927424 | Padded clamp ring with edge exclusion for deposition of thick AlCu/AlSiCu/Cu metal alloy layers A substrate clamp ring has an edge exclusion lip with a variable bottom surface. At least a portion of that bottom surface has a height above the substrate contact level selected to minimize accumulation over time of deposited aluminum-copper alloy across lower port... | 04/19/2011 |
| 7871470 | Substrate support lift mechanism An apparatus for positioning a substrate support within a processing chamber is provided. In one embodiment, an apparatus for positioning a substrate support includes a yoke comprising a curved surface with a first slot formed therethrough, a base comprising a first... | 01/18/2011 |
| 7862659 | Semiconductor manufacturing device The present invention relates to a semiconductor manufacturing device that a maintenance or a repairing is easy so that an efficiency of manufacturing can be enhanced because a high temperature of a susceptor can be rapidly down. The present invention relates to a s... | 01/04/2011 |
| 7837798 | Semiconductor processing apparatus with a heat resistant hermetically sealed substrate support An apparatus for manufacturing a semiconductor or liquid crystal is provided with a reaction chamber housing a ceramic holder with an embedded resistive heating element, and a cylindrical support member one end of which supports the ceramic holder and the other end ... | 11/23/2010 |
| 7824498 | Coating for reducing contamination of substrates during processing A substrate support has a support structure and a coating on the support structure having a carbon-hydrogen network. The coating has a contact surface having a coefficient of friction of less than about 0.3 and a hardness of at least about 8 GPa. The contact surface... | 11/02/2010 |
| 7789962 | Device and method for controlling temperature of a mounting table, a program therefor, and a processing apparatus including same A device for controlling a temperature of a mounting table for mounting thereon a target object includes a first and a second coolant passageway provided at the mounting table, a coolant circulator for circulating a coolant in the first and the second coolant passag... | 09/07/2010 |
| 7771539 | Holder for fabricating organic light emitting display A holder for fabricating an organic light emitting display comprises: a holder main body; and a plurality of supporters provided on opposite sides of the holder main body; wherein each supporter has a ‘┐’-shape and comprises a side wall having a predetermined ... | 08/10/2010 |
| 7771538 | Substrate supporting means having wire and apparatus using the same An apparatus includes: a process chamber for treating a substrate; a susceptor in the process chamber; a supporting frame over the susceptor; and at least one wire connected to the supporting frame. ... | 08/10/2010 |
| 7754016 | Multiple axis tumbler coating apparatus The present invention relates to an apparatus for coating one or more workpieces such as components to be used in jet engines or industrial turbines. The apparatus comprises a device for simultaneously manipulating a workpiece about multiple axes while holding a cen... | 07/13/2010 |
| 7718007 | Substrate supporting member and substrate processing apparatus A substrate supporting member, and a substrate processing apparatus including the substrate supporting member are provided. The substrate supporting member for mounting and supporting a substrate on a substrate supporting surface thereof, and controlling a temperatu... | 05/18/2010 |
| 7713355 | Silicon shelf towers A silicon shelf tower for hatch thermal processing of silicon wafers in a vertical furnace. The tower includes at least three silicon legs joined to bases and having a vertical arrangement of slots. Silicon shelves are detachably loaded by sliding them through the s... | 05/11/2010 |
| 7699934 | Epitaxial wafer production apparatus and susceptor structure A susceptor structure capable of discharging the atmosphere containing dopant species and filling a wafer pocket, without causing a large quantity of a raw material gas to flow from the front surface side of a susceptor to under the susceptor. The susceptor having a... | 04/20/2010 |
| 7691205 | Substrate-supporting device A substrate-supporting device for CVD having a substrate-supporting region includes: a substrate-supporting surface which is a continuous surface defining a reference plane on which a substrate is placed; and multiple dimples having bottom surfaces lower than the re... | 04/06/2010 |
| 7682455 | Device for storing and/or transporting plate-shaped substrates in the manufacture of electronic components To make possible a tightly packed, essentially horizontal storage of wafers (40), in which a simplified access to each of these wafers (40) is possible, a device is provided having a plurality of superimposed storage elements (10). The storage e... | 03/23/2010 |
| 7670436 | Support ring assembly A substrate ring assembly is provided for a substrate support having a peripheral edge. The assembly has an annular band having an inner perimeter that surrounds and at least partially covers the peripheral edge of the substrate support. The assembly also has a clam... | 03/02/2010 |
| 7655093 | Wafer support system A wafer support system comprising a susceptor having top and bottom sections and gas flow passages therethrough. One or more spacers projecting from a recess formed in the top section of the susceptor support a wafer in spaced relationship with respect to the recess... | 02/02/2010 |
| 7651571 | Susceptor The present invention provides a susceptor including a plate member having an upper surface on which a substrate is placed and a lower surface, a base member bonded to the lower surface of the plate member with a bonding layer, and an annular protective member dispo... | 01/26/2010 |
| 7638003 | Semiconductor processing apparatus with lift pin structure A semiconductor processing apparatus includes: a reaction chamber; a susceptor disposed in the reaction chamber for placing a substrate thereon and having through-holes in an axial direction of the susceptor; lift pins slidably disposed in the respective through-hol... | 12/29/2009 |
| 7632356 | Gas providing member and processing device A gas providing member includes a body portion which forms a gas providing passage between the body portion and a processing member which holds the processing target, and the gas providing passage provides gas onto a processing target. In the body portion, a gas res... | 12/15/2009 |
| 7615121 | Susceptor system The present invention relates to a susceptor system for an apparatus of the type adapted to treat substrates and/or wafers; the susceptor system is provided with a cavity (1) which acts as a chamber for the treatment of the substrates and/or wafers and which ... | 11/10/2009 |
| 7591908 | Vapor deposition apparatus and vapor deposition method In a vapor phase growth apparatus for performing a vapor phase growth of a silicon epitaxial layer on a main surface of a silicon single crystal substrate while heating the silicon single crystal substrate placed on a pocket formed on a susceptor, from both sides, t... | 09/22/2009 |
| 7582167 | Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support In one embodiment, the invention is a guard ring for reducing particle entrapment along a moveable shaft of a substrate support. In one embodiment, the guard ring comprises a substantially annular guard ring positioned within a step formed in a sleeve that circumscr... | 09/01/2009 |
| 7582166 | Holder for supporting wafers during semiconductor manufacture An improved wafer holder design is described which has manufacturing and performance advantages over present state-of-the-art holders used in various wafer processing applications. The new wafer holder design incorporates a series of short radial grooves. The groove... | 09/01/2009 |
| 7534301 | RF grounding of cathode in process chamber An apparatus for providing a short return current path for RF current between a process chamber wall and a substrate support is provided. The RF grounding apparatus, which is RF grounded and is place above the substrate transfer port, establishes electrical contact ... | 05/19/2009 |
| 7513954 | Plasma processing apparatus and substrate mounting table employed therein A plasma processing apparatus includes a processing container for receiving a substrate to be processed and processing the substrate by a plasma of a processing gas, a substrate mounting table, installed in the processing container, for mounting the substrate thereo... | 04/07/2009 |
