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"I hate what they've done to my child...I would never let my own children watch it. "
Vladimir Zworykin, television pioneer ; Talking about an invention in which he played a critical role.
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| Number | Title | Issue Date |
| 8110044 | Substrate processing apparatus and temperature control device A first flow passage (16), which cools a temperature controlled object by a circulating first cooling water (15), and a second flow passage (19) separate from the first flow passage are provided so as to exchange heat between a second cooling wa... | 02/07/2012 |
| 8110045 | Processing equipment for object to be processed Processing equipment for an object to be processed is provided with a process container, the internal of which can be evacuated, a gas introducing means for introducing a prescribed gas into the process container, a supporting table provided in the process container... | 02/07/2012 |
| 8092603 | Substrate processing apparatus A substrate processing apparatus includes a processing chamber, a substrate holding part that holds substrates of required numbers in the processing chamber, a gas supply/exhaust part that supplies or exhausts required gas into the processing chamber, a rotation par... | 01/10/2012 |
| 8062426 | CVD reactor with RF-heated process chamber The invention concerns a deposition device in particular of crystalline coatings on at least one substrate in particular crystalline. Said device comprises a treatment chamber (5) consisting of a number of wall elements (1, 2, 3, 4), said wall elements... | 11/22/2011 |
| 8025732 | Apparatus for processing a substrate A method for a substrate processing apparatus having a substrate holding mechanism and a chemical solution dispensing/sucking mechanism including a chemical solution dispensing port for supplying a first chemical solution and a chemical solution suction port, includ... | 09/27/2011 |
| 8007591 | Substrate holder having a fluid gap and method of fabricating the substrate holder A substrate holder (20) for supporting a substrate (30). A heating component (50) is positioned adjacent to a supporting surface and between the supporting surface and a cooling component (60). A fluid gap is positioned between the coolin... | 08/30/2011 |
| 7985295 | RF heater arrangement for substrate heating apparatus An RF heating system for a substrate or substrates including a susceptor for supporting the substrate; one or more RF heating coils; and a platen disposed between the RF heating coil and the substrate. The platen is constructed of materials that become heated under ... | 07/26/2011 |
| 7981218 | Substrate supporting mechanism and substrate processing apparatus A substrate supporting mechanism includes a function for heating a substrate placed thereon in a process container of a substrate processing apparatus. The substrate supporting mechanism includes a worktable configured to place the substrate thereon and including a ... | 07/19/2011 |
| 7959734 | Substrate mounting structure and substrate processing apparatus A substrate mounting structure that can maintain the temperature uniformity of a substrate mounted on a mounting stage. The substrate mounting structure disposed in a pressure reduced space has a base portion, a pillar portion mounted in a standing manner on the bas... | 06/14/2011 |
| 7955437 | Apparatus for fabricating a III-V nitride film An apparatus for fabricating a III-V nitride film by a MOCVD method, including a reactor prepared horizontally, a susceptor to hold a substrate thereon installed in the reactor, a heater to heat the substrate to a predetermined temperature via the susceptor, and a c... | 06/07/2011 |
| RE42175 | Electrostatic chucking stage and substrate processing apparatus This application discloses the structure of an ESC stage where a chucking electrode is sandwiched by a moderation layer and a covering layer. The moderation layer and the covering layer have the thermal expansion coefficients between the dielectric plate and the chu... | 03/01/2011 |
| 7846254 | Heat transfer assembly A heat transfer assembly having a heat spreading member sandwiched between a heat source and a heat sink is disclosed. The heat sink, the heat spreading member, and the heat source are pressed against the bottom of a substrate support plate by a bias member. ... | 12/07/2010 |
| 7846255 | Processing equipment for object to be processed Processing equipment for an object to be processed is provided with a process container, the internal of which can be evacuated, a gas introducing means for introducing a prescribed gas into the process container, a supporting table provided in the process container... | 12/07/2010 |
| 7842135 | Equipment innovations for nano-technology aquipment, especially for plasma growth chambers of carbon nanotube and nanowire Nano-technology is an emerging and intensely competitive field. There are a number of companies that work mainly in the development of various Nano-technology areas. One area that has not received too much emphasis is that of specialized equipment for Nano-technolog... | 11/30/2010 |
| 7833352 | Apparatus for fabrication of thin films The invention relates to an apparatus for growing thin-films onto a substrate by exposing the substrate to alternate surface reactions of vapor-phase reactants for forming a thin-film onto the, substrate by means of said surface reactions. The apparatus comprises a ... | 11/16/2010 |
| 7806984 | Semiconductor or liquid crystal producing device An apparatus for manufacturing a semiconductor or liquid crystal has, within a reaction chamber 1 to which a reactive gas is supplied, a ceramic holder 2 having a resistive heating element 7 embedded therein; and further comprises a ceramic cyli... | 10/05/2010 |
| 7785419 | Epitaxial apparatus An epitaxial apparatus, including a supporting member to support a substrate; an external wall provided to surround the supporting member from the sides; an inner lid member provided in a removable manner on the external wall and covering at least a part of a gap be... | 08/31/2010 |
| 7776156 | Side RF coil and side heater for plasma processing apparatus A RF plasma generation and temperature control system for an inductively coupled plasma process chamber. The plasma generation system includes a heater that includes an elongated upper heating element substantially parallel to an elongated lower heating element, whe... | 08/17/2010 |
| 7771537 | Methods and systems for controlling temperature during microfeature workpiece processing, E.G. CVD deposition The present disclosure provides methods and systems for controlling temperature. The method has particular utility in connection with controlling temperature in a deposition process, e.g., in depositing a heat-reflective material via CVD. One exemplary embodiment pr... | 08/10/2010 |
| 7771536 | Substrate processing apparatus The substrate processing apparatus according to the present invention is aimed to stably and efficiently perform a deposition process on a substrate W. The substrate processing apparatus supports the substrate W in a position facing a heater portion and thus rotates... | 08/10/2010 |
| 7731798 | Heated chuck for laser thermal processing A chuck for supporting a wafer and maintaining a constant background temperature across the wafer during laser thermal processing (LTP) is disclosed. The chuck includes a heat sink and a thermal mass in the form of a heater module. The heater module is in thermal co... | 06/08/2010 |
| 7691204 | Film formation apparatus and methods including temperature and emissivity/pattern compensation A film formation system 10 has a processing chamber 15 bounded by sidewalls 18 and a top cover 11. In one embodiment, the top cover 11 has a reflective surface 13 for reflecting radiant energy back onto a substrate 19... | 04/06/2010 |
| 7674338 | Heated substrate support and method of fabricating same A method and apparatus for forming a substrate support is provided herein. In one embodiment, the substrate support includes a body having a support surface and at least one groove. A heater element surrounded with a malleable heat sink is disposed in the groove. Th... | 03/09/2010 |
| 7670434 | Vapor phase growth apparatus It is to provide a vapor phase growth apparatus which can perform vapor phase growth of a thin film having a good uniformity throughout a surface of a wafer. The vapor phase growth apparatus includes at least a sealable reactor, a wafer containing member (wafer hold... | 03/02/2010 |
| 7658801 | Heat treatment apparatus A heating means is disclosed which comprises a reflector plate composed of an opaque quartz and a quartz tube welded to the surface of the reflector plate. A carbon wire which generates heat when a current is applied is inserted in the quartz tube. ... | 02/09/2010 |
| 7645342 | Restricted radiated heating assembly for high temperature processing A vapor deposition reactor and associated method are disclosed that increase the lifetime and productivity of a filament-based resistive-heated vapor deposition system. The reactor and method provide for heating the filament while permitting the filament to move as ... | 01/12/2010 |
| 7622007 | Substrate processing apparatus and semiconductor device producing method Disclosed is a substrate processing apparatus which comprises reaction tubes (3,4) for processing multiple substrates (27), a heater (5) for heating the substrates, and gas introducing nozzles (6,7,8,9,10) for supplying a gas into the rea... | 11/24/2009 |
| 7618494 | Substrate holding structure and substrate processing device The object of the present invention is to prevent damage due to thermal stress induced into a substrate holding table in a substrate holding structure for holding a substrate to be processed. In the substrate holding structure having the substrate holding table arra... | 11/17/2009 |
| 7601224 | Method of supporting a substrate in a gas cushion susceptor system An apparatus and method to position a wafer onto a wafer holder and to maintain a uniform wafer temperature is disclosed. The wafer holder or susceptor comprises a recess or pocket whose surface includes a grid containing a plurality of grid grooves that separate pr... | 10/13/2009 |
| 7585371 | Substrate susceptors for receiving semiconductor substrates to be deposited upon In one implementation, a substrate susceptor for receiving a semiconductor substrate for selective epitaxial silicon-comprising depositing thereon, where the depositing comprises measuring emissivity of the susceptor from at least one susceptor location in a non-con... | 09/08/2009 |
| 7485190 | Apparatus for heating a substrate in a variable temperature process using a fixed temperature chuck A method is provided for heating a substrate in a process chamber using a heated chuck. In accordance with the method, the substrate is lowered onto the chuck and heated to a first temperature less than a temperature of the chuck. The substrate is then raised away f... | 02/03/2009 |
| 7481888 | Heat treatment jig and heat treatment method for silicon wafer In this heat treatment jig and method for silicon wafers, a silicon wafer is heat-treated while being mounted on support projections provided on three support arms, having an intervening spacing, protruding from a support frame towards the center. At that time, all ... | 01/27/2009 |
| 7449071 | Wafer holder with peripheral lift ring A wafer holder for supporting a wafer within a CVD processing chamber includes a vertically moveable lift ring configured to support the bottom peripheral surface of the wafer, and an inner plug having a top flat surface configured to support the wafer during wafer ... | 11/11/2008 |
| 7442275 | Lateral temperature equalizing system for large area surfaces during processing In many processes used in fabricating semiconductors the wafer is seated on the top surface of a pedestal and heated in a high energy process step, such as plasma etching. The pedestal, chuck or platen may be cooling but the wafer gradually heats until the process c... | 10/28/2008 |
| 7442900 | Chamber for uniform heating of large area substrates Embodiments of the present invention generally provide an apparatus for providing a uniform thermal profile to a plurality of large area substrates during thermal processing. In one embodiment, an apparatus for thermal processing large area substrates includes a cha... | 10/28/2008 |
| 7432475 | Vertical heat treatment device and method controlling the same A vertical heat processing apparatus includes a process chamber (5) defining a process field (A1) configured to accommodate a plurality of target substrates (W) supported at intervals in a vertical direction. The apparatus further includes a heating fu... | 10/07/2008 |
| 7432476 | Substrate heat treatment apparatus A substrate heat treatment apparatus for heat-treating a substrate includes a bake plate having projections on an upper surface thereof, a seal unit disposed peripherally of the upper surface of the bake plate for closing a lateral area of a minute space formed betw... | 10/07/2008 |
| 7432474 | Heating device A heating device includes a substantially cylindrical shaft joined to a joint surface of a plate-shaped ceramic substrate opposite to a heating surface, the ceramic substrate including a resistance heating element embedded in the ceramic substrate. The shaft include... | 10/07/2008 |
| 7431585 | Apparatus and method for heating substrates An apparatus for processing substrates is disclosed. In one embodiment, the apparatus includes a housing and a plurality of stacked cell structures in the housing. An actuator is adapted to move the plurality of stacked cell structures inside of the housing while su... | 10/07/2008 |
| 7429717 | Multizone heater for furnace The present invention relates to an apparatus and method for heating a semiconductor processing chamber. One embodiment of the present invention provides a furnace for heating a semiconductor processing chamber. The furnace comprises a heater surrounding side walls ... | 09/30/2008 |
