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| Number | Title | Issue Date |
| 8117987 | Hot wire chemical vapor deposition (CVD) inline coating tool Methods and apparatus for hot wire chemical vapor deposition (HWCVD) are provided herein. In some embodiments, an inline HWCVD tool may include a linear conveyor for moving a substrate through the linear process tool; and a multiplicity of HWCVD sources, the multipl... | 02/21/2012 |
| 8006639 | Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure The present invention provides a catalytic enhanced chemical vapor deposition (CVD) apparatus capable of maximizing efficiency of gas use to 80% or more, and obtaining a uniform thin film by efficiently arranging filaments mounted on a shower head of the catalytic e... | 08/30/2011 |
| 7866278 | Thin-film deposition system A thin-film deposition system has a vacuum chamber and a plasma generator. The plasma generator includes a case, a cathode disposed in the case, an anode assembly disposed at an end of the case, a discharge power supply for applying a discharge voltage between the c... | 01/11/2011 |
| 7712436 | Plasma processing apparatus with filter circuit A plasma processing apparatus includes a first high frequency power for outputting a first high frequency, electrically connected to a first electrode disposed inside a depressurizable processing chamber; a heater power supply electrically connected to a heating ele... | 05/11/2010 |
| 7338581 | Sputtering apparatus A sputtering apparatus includes paired targets 31 disposed in a vacuum chamber 30, substrate holder 33 disposed at a position nearly perpendicular to the paired target 31 and apart from a space formed by the paired targets 31, a pl... | 03/04/2008 |
| 7211152 | Heating element CVD system and connection structure between heating element and electric power supply mechanism in the heating element CVD system A heating element CVD system wherein one or a plurality of connection terminal holders is placed in the processing container, and each of the connection terminal holders holds a plurality of connection terminals. Each of the connection terminals connects the heating... | 05/01/2007 |
| 7185602 | Ion implantation ion source, system and method An ion implantation device for vaporizing decaborane and other heat-sensitive materials via a novel vaporizer and vapor delivery system and delivering a controlled, low-pressure drop flow of vapors, e.g. decaborane, into the ion source. The ion implantation device i... | 03/06/2007 |
| 7165506 | Method and device for plasma-treating the surface of substrates by ion bombardment In an ion etching method for reducing a substrate thickness, an electric arc is generated in a vacuum chamber such that the electric arc is locally separated from the substrate and circulates about the substrate. A plasma of a supplied etching gas is produced by the... | 01/23/2007 |
| 7122736 | Method and apparatus for fabricating a thin-film solar cell utilizing a hot wire chemical vapor deposition technique A thin-film solar cell is provided. The thin-film solar cell comprises an a-SiGe:H (1.6 eV) n-i-p solar cell having a deposition rate of at least ten (10) Å/second for the a-SiGe:H intrinsic layer by hot wire chemical vapor deposition. A method for fabricating a t... | 10/17/2006 |
| 7087271 | Method for preparing low dielectric films A low dielectric constant hydrogenated silicon-oxycarbide (SiCO:H) film is prepared by bringing an organosilicon or organosilicate compound having at least one vinyl or ethynyl group, or a mixture of a saturated organosilicon or organosilicate compound and an unsatu... | 08/08/2006 |
| 7042145 | Electron beam projector provided with a linear thermionic emitting cathode for electron beam heating An electron beam gun comprises a beam waveguide and an accelerating anode fixed thereto. The accelerating anode is connected with the aid of high-voltage insulators and through a cathode plate to a cathode assembly. The cathode assembly comprises a linear hot cathod... | 05/09/2006 |
| 7033462 | Vacuum arc vapor deposition process and apparatus To prevent the film forming characteristic deterioration by a magnetic field of a magnetic filter to thereby make vacuum arc vapor deposition uniform, in the invention, plurality of magnets includes a terminal magnet closest to a plasma injection hole located at the... | 04/25/2006 |
| 7005047 | Film deposition apparatus and film deposition method A particle film deposition apparatus and method are provided, with which ultra fine particles are generated by arc heating. The generated ultra fine particles can be efficiently sucked up into a transfer tube regardless of an arc voltage, and the resulting film can ... | 02/28/2006 |
| 6981465 | Chemical vapor deposition process and apparatus thereof The present invention is related to an apparatus for forming diamond via a chemical vapor deposition process using hot metal filament based on hydrogen and methane gas, and a method thereof. In particular, the present invention provides an apparatus for using the ho... | 01/03/2006 |
| 6958112 | Methods and systems for high-aspect-ratio gapfill using atomic-oxygen generation Methods and systems are provided for depositing silicon oxide in a gap on a substrate. The silicon oxide is formed by flowing a process gas into a process chamber and forming a plasma having an overall ion density of at least 1011 ions/cm3. The... | 10/25/2005 |
| 6942892 | Hot element CVD apparatus and a method for removing a deposited film The present invention provides a method for efficiently and completely removing a film deposited inside a film forming chamber. In addition, the invention provides a CVD apparatus using heating element which an in-situ cleaning method can be applied and its in-situ ... | 09/13/2005 |
| 6918352 | Method for producing coated workpieces, uses and installation for the method A system and a method produce workpieces coated by PECVD with a quality sufficient for epitaxy. Included are a vacuum recipient, a plasma discharge source operationally connected to the vacuum recipient and a workpiece holder within the vacuum recipient, said plasma... | 07/19/2005 |
| 6875326 | Plasma processing apparatus with real-time particle filter A plasma processing device include a plasma generation unit for generating plasma by using a cathodic arc discharge, first and second magnetic field ducts arranged in a row for transporting the plasma with one end of the row being connected to the plasma generation ... | 04/05/2005 |
| 6772710 | Plasma enhanced chemical vapor deposition apparatus In a PECVD (plasma enhanced chemical vapor deposition) apparatus including a reaction chamber; plural susceptors installed inside the reaction chamber and horizontally mounted with a wafer respectively; a heating means for heating the susceptors; a power supply unit... | 08/10/2004 |
| 6708645 | Arc resistant high voltage feedthru fitting for a vacuum deposition chamber In an apparatus for initial ion cleaning, vapor metal deposition and protective coating of objects by vacuum deposition, an improved high voltage high current feedthru fitting with improved anti-fouling arc-resistant characteristics. The apparatus includes a vacuum ... | 03/23/2004 |
| 6699525 | Method of forming carbon nanotubes and apparatus therefor Carbon nanotubes are formed on a substrate by providing a coiled filament in a chemical vapor deposition chamber, supporting a substrate having a catalytic coating provided thereon inside the coiled filament, evacuating air, if present, from the chamber, ... | 03/02/2004 |
| 6692574 | Gas dispersion apparatus for use in a hot filament chemical vapor deposition chamber A carbon deposition chamber is provided with several advantages. The gas mixture used within the deposition process is expressed from tubing through three zones, which are each individually determined with needle valves. The substrate is permitted to rota... | 02/17/2004 |
| 6673392 | Method of vertically aligning carbon nanotubes on substrates at low pressure using thermal chemical vapor deposition with DC bias A method of vertically aligning pure carbon nanotubes on a large glass or silicon substrate at a low temperature using a low pressure DC thermal chemical vapor deposition method is provided. In this method, catalytic decomposition with respect to hydro-ca... | 01/06/2004 |
| 6638403 | Plasma processing apparatus with real-time particle filter In the plasma processing device which utilizes a low pressure arc discharge, a method for efficiently capturing and removing electrically charged particles and neutral particles having no charge which are at most 5 μm in particle diameter is demanded. Th... | 10/28/2003 |
| 6633133 | Ion source An ion source is furnished with a gas introducing mechanism for introducing an inert gas and an organometallic gas being a raw gas into a plasma production container.... | 10/14/2003 |
| 6548946 | Electron beam generator An electron beam generator having circuit interconnections between individual components that are less prone to the adverse effects of thermal cycling. The generator includes a conductor rod within a guide tube, a center conductor secured to one end of th... | 04/15/2003 |
| 6539890 | Multiple source deposition plasma apparatus An apparatus for forming a film on a substrate includes a gas inlet and an insert attached to the gas inlet, the insert including a deposition source material such as lithium. To form the film on the substrate, the substrate is mounted in a vacuum chamber... | 04/01/2003 |
| 6432206 | Heating element for use in a hot filament chemical vapor deposition chamber A carbon deposition chamber is provided with several advantages. The heating filaments are permitted to expand and contract without breakage by permitting the electrode attached to one end of the filaments to move freely as the filaments change in length.... | 08/13/2002 |
| 6427622 | Hot wire chemical vapor deposition method and apparatus using graphite hot rods A hot wire chemical vapor deposition method and apparatus for fabricating high quality amorphous, micro-crystalline, and poly-crystalline thin film silicon, or related materials, devices and large area modules is described. A silane gas impinges upon a ho... | 08/06/2002 |
| 6368678 | Plasma processing system and method A substrate processing system includes a processing chamber, an electrically floating substrate holder positioned in the chamber, a gas source for supplying a process gas to the chamber, at least one ion source located in the chamber, and a power source f... | 04/09/2002 |
| 6349669 | Method and apparatus for depositing a thin film, and semiconductor device having a semiconductor-insulator junction This invention discloses a method and apparatus where a pre-treatment which reduce interfacial level density is carried out before thin film deposition on a substrate utilizing a catalytic gas phase reaction. The catalytic gas phase reaction is generated ... | 02/26/2002 |
| 6325857 | CVD apparatus A CVD apparatus is provided, which is capable of cleaning the inside of a reaction chamber without affecting a catalyzer member after a CVD process is completed. This apparatus is comprised of a reaction chamber; a substrate stage located in the chamber, ... | 12/04/2001 |
| 6211622 | Plasma processing equipment A plurality of extracting orifices 42 for extracting the electron beam from a discharge portion 2 into a plasma process chamber 3 via a compartment 4 are provided radially. A plurality of accelerating electrodes 36, 37 are arranged in the process chamber ... | 04/03/2001 |
| 6203862 | Processing systems with dual ion sources A substrate processing system includes a processing chamber, a substrate holder positioned in the chamber, a gas source for supplying a process gas to the chamber, first and second ion sources located in the chamber, and a power source for energizing the ... | 03/20/2001 |
| 6146462 | Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same Methods and apparatus for plasma modifying a substrate are disclosed along with associated techniques for applying coatings to the substrate. Particular utility has been found using a hollow cathode to generate the plasma along with magnetic focusing mean... | 11/14/2000 |
| 6110540 | Plasma apparatus and method A gas purged counter-electrode prevents the counter-electrode from being covered with dielectric material by flowing gas past a surface of a metal element. The gas purged counter-electrode produces a relatively high-density plasma which effectively acts a... | 08/29/2000 |
| 6101972 | Plasma processing system and method A substrate processing system includes a processing chamber, a substrate holder positioned in the chamber, a gas source for supplying a process gas to the chamber, at least one ion source located in the chamber, and a power source for energizing the ion s... | 08/15/2000 |
| 6026763 | Thin-film deposition apparatus using cathodic arc discharge A thin-film deposition apparatus includes an arc vaporization portion from which charged particles of a deposition material are generated by a cathodic arc discharge, a plasma duct having a bend and guiding the charged particles from the arc vaporization ... | 02/22/2000 |
| 6021738 | Carriage electrode contact system used in coating objects by vacuum deposit An improved electrode contact system for metal vaporization electrodes or rods which are electrically and supportively connected to a movable carriage which also receives and supports objects such as parts and components in a vacuum chamber during metal v... | 02/08/2000 |
| 5968276 | Heat exchange passage connection The present invention provides a method and apparatus for improving thermal management of gas being delivered to a chemical vapor deposition chamber. Thermal management is accomplished using a heat transfer fluid in thermal communication with the depositi... | 10/19/1999 |
