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| Number | Title | Issue Date |
| 7332039 | Plasma processing apparatus and method thereof A nozzle head NH of a plasma processing apparatus comprises an annular inner holder 3, an annular inner electrode 11 surrounding this holder 3, an annular outer electrode 21 surrounding this electrode 11, and an annular outer holde... | 02/19/2008 |
| 7327089 | Beam plasma source A plasma source which includes a discharge cavity having a first width, where that discharge cavity includes a top portion, a wall portion, and a nozzle disposed on the top portion and extending outwardly therefrom, where the nozzle is formed to include an aperture ... | 02/05/2008 |
| 7282244 | Replaceable plate expanded thermal plasma apparatus and method The present invention provides a deposition process for plasma enhanced chemical vapor deposition of a coating on a substrate. The process comprises detennining a target process condition within a chamber of an expanding thermal plasma generator; the generator compr... | 10/16/2007 |
| 7264849 | Roll-vortex plasma chemical vapor deposition method A chemical vapor deposition method includes a step of maintaining a hydrogen plasma at low pressure in a processing chamber. The processing chamber has a long, wide, thin geometry to favor deposition of thin-film silicon on sheet substrates over the chamber walls. T... | 09/04/2007 |
| 7264850 | Process for treating a substrate with a plasma A process for depositing a diamond-like carbon film, which comprises providing a means for generating a sheet-like beam-type plasma region inside a vacuum vessel for depositing the diamond-like carbon film, and depositing the film on a substrate being moved through ... | 09/04/2007 |
| 7165506 | Method and device for plasma-treating the surface of substrates by ion bombardment In an ion etching method for reducing a substrate thickness, an electric arc is generated in a vacuum chamber such that the electric arc is locally separated from the substrate and circulates about the substrate. A plasma of a supplied etching gas is produced by the... | 01/23/2007 |
| 7056806 | Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces The present disclosure provides methods and apparatus useful in depositing materials on batches of microfeature workpieces. One implementation provides a method in which a quantity of a first precursor gas is introduced to an enclosure at a first enclosure pressure.... | 06/06/2006 |
| 7044191 | Mold material processing device, method and apparatus for producing same The invention relates to a molten material processing device having an elongated thermal element like a heating element, a thermocouple, a sensor, a heatpipe and a cooling pipe which is characterised in that said elongated thermal element (2) is located in a ... | 05/16/2006 |
| 6948448 | Apparatus and method for depositing large area coatings on planar surfaces A method and apparatus for depositing a uniform coating on a large area, planar surface using an array of multiple plasma sources and a common reactant gas injector. The apparatus includes at least one array of a plurality of plasma sources, wherein each of the plur... | 09/27/2005 |
| 6935618 | Valve component with multiple surface layers A sliding component, particularly a disk valve plate. The sliding component includes a multi-layer surface structure comprising a strengthening layer harder than the substrate material, and an amorphous diamond top layer. ... | 08/30/2005 |
| 6918352 | Method for producing coated workpieces, uses and installation for the method A system and a method produce workpieces coated by PECVD with a quality sufficient for epitaxy. Included are a vacuum recipient, a plasma discharge source operationally connected to the vacuum recipient and a workpiece holder within the vacuum recipient, said plasma... | 07/19/2005 |
| 6916398 | Gas delivery apparatus and method for atomic layer deposition One embodiment of the gas delivery assembly comprises a covering member having an expanding channel at a central portion of the covering member and having a bottom surface extending from the expanding channel to a peripheral portion of the covering member. One or mo... | 07/12/2005 |
| 6806652 | High-density plasma source using excited atoms The plasma source includes a cathode assembly. An anode is positioned adjacent to the cathode assembly. An excited atom source generates an initial plasma and excited atoms from a volume of feed gas. The initial plasma and excited atoms are located proximate to the ... | 10/19/2004 |
| 6806651 | High-density plasma source The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first power supply generates a first electric field across t... | 10/19/2004 |
| 6745717 | Method and apparatus for preparing nitride semiconductor surfaces Semiconductor nitride layers are produced using a corona discharge supersonic free-jet source producing an activated nitrogen molecule beam impacting a semiconductor substrate in the presence of a group III metal or impacting an oxide layer on a semiconductor substr... | 06/08/2004 |
| 6681716 | Apparatus and method for depositing large area coatings on non-planar surfaces A method and apparatus for depositing a uniform coating on a large area, non-planar surface using an array of multiple plasma sources. The apparatus comprises at least one array of a plurality of plasma sources for generating a plurality of plasmas, where... | 01/27/2004 |
| 6632323 | Method and apparatus having pin electrode for surface treatment using capillary discharge plasma A method and an apparatus for treating a workpiece using a plasma are disclosed in the present invention. In treating a workpiece using a plasma, the apparatus includes at least one pin electrode for receiving a power source, a dielectric body having firs... | 10/14/2003 |
| 6539890 | Multiple source deposition plasma apparatus An apparatus for forming a film on a substrate includes a gas inlet and an insert attached to the gas inlet, the insert including a deposition source material such as lithium. To form the film on the substrate, the substrate is mounted in a vacuum chamber... | 04/01/2003 |
| 6525481 | Method of making a physically and chemically active environment by means of a plasma jet and the related plasma jet The method consists in the fact that from at least one external source (3) electromagnetic energy is conducted to at least one hollow electrode (1) with elements (14) locally increasing the density of electromagnetic energy, by which, inside the cavities ... | 02/25/2003 |
| 6394025 | Vacuum film growth apparatus A correction mechanism including a magnetic body (51) is placed at a position between a vacuum chamber (21) and a steering coil (23) and where line of magnetic force generated from the steering coil is present, to correct torsion and/or bias of a plasma b... | 05/28/2002 |
| 6388381 | Constricted glow discharge plasma source A miniaturized construction and slit end orifice configurations of a constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ... | 05/14/2002 |
| 6365013 | Coating method and device The invention relates to a coating process, particularly for coating a gas turbine blade (1) having cooling passageways (4) opening out onto the surface (2). During the coating operation, a fluid (6) is directed out of the cooling passageways (4) to preve... | 04/02/2002 |
| 6325857 | CVD apparatus A CVD apparatus is provided, which is capable of cleaning the inside of a reaction chamber without affecting a catalyzer member after a CVD process is completed. This apparatus is comprised of a reaction chamber; a substrate stage located in the chamber, ... | 12/04/2001 |
| 6213049 | Nozzle-injector for arc plasma deposition apparatus A nozzle-injector was designed and fabricated for plasma deposition of thin-film coatings using a wall-stabilized arc torch as the plasma generator. The design of the nozzle-injector controls the injection, ionization, and reaction of the reagents, and th... | 04/10/2001 |
| 6077388 | System and method for plasma etch on a spherical shaped device A system and method for performing plasma etch on a spherical shaped device is disclosed. The system includes a processing tube for providing a reactive chamber for the spherical shaped substrate and a plasma jet is located adjacent to the processing tube... | 06/20/2000 |
| 5891312 | Enhanced vacuum arc vapor deposition electrode A process for forming a thin metal coating on a substrate wherein a gas stream heated by an electrical current impinges on a metallic target in a vacuum chamber to form a molten pool of the metal and then vaporize a portion of the pool, with the source of... | 04/06/1999 |
| 5846330 | Gas injection disc assembly for CVD applications A gas injection disc is provided which includes an outer ring and a tubular modular insert which slips into the outer ring. The outer ring is provided with an inner bore, a ring-shaped plenum located around the inner bore, an outer gas sealing surface aro... | 12/08/1998 |
| 5753045 | Vacuum treatment system for homogeneous workpiece processing A process provides for the reactive treatment of workpieces in which a plasma beam is produced in an evacuated recipient. With respect to the area of the highest plasma density along the beam axis, workpieces are arranged in a radially offset manner. Fres... | 05/19/1998 |
| 5679167 | Plasma gun apparatus for forming dense, uniform coatings on large substrates A plasma system forms a dense, uniform coating of metallic oxide or other material on a relatively large substrate of metal foil or other composition located a substantial distance from the plasma gun so that the plasma stream covers the entire width of t... | 10/21/1997 |
| 5679159 | Spinning substrate holder for cutting tool inserts for improved arc-jet diamond deposition A mandrel for use in an arc-jet spinning diamond deposition process for coating cutting tool inserts is disclosed. The mandrel has a plurality of cutouts or wells for receiving cutting tool inserts. The receiving wells are machined or otherwise provided t... | 10/21/1997 |
| 5580386 | Coating a substrate surface with a permeation barrier A substrate surface is coated with a permeation barrier of inorganic material, which is vaporised from a crucible in a vacuum chamber evacuated to at least 10-3 mbar and precipitated on the substrate surface. An ionizing electron beam of low en... | 12/03/1996 |
| 5565249 | Method for producing diamond by a DC plasma jet A process for gas phase synthesis of diamond using a DC plasma jet where a plasma jet generated by DC arc discharge using a DC plasma torch is made to strike a substrate and grow diamond on the substrate, wherein use is made of a plurality of plasma torch... | 10/15/1996 |
| 5560779 | Apparatus for synthesizing diamond films utilizing an arc plasma There is provided a system for the manufacture of a diamond film. A plasma generator generates a hydrogen atom containing plasma stream into which a hydrocarbon containing gas is fed. The plasma dissociates the hydrocarbon to carbon radicals and carbon wh... | 10/01/1996 |
| 5529633 | Apparatus for depositing a substance on a rotating surface An apparatus for depositing a substance includes a rotating mandrel assembly with a mandrel having a deposition surface exposed to the vapor so that the substance is deposited on the deposition surface and having a base having a plurality of radiator fins... | 06/25/1996 |
| 5468295 | Apparatus and method for thermal spray coating interior surfaces A method of thermal spray coating a surface with a metal coating material includes the provision of a nozzle about a thermal spray coating apparatus, such as a two wire electric-arc apparatus. The nozzle includes a plurality of ports facing generally radi... | 11/21/1995 |
| 5435849 | Apparatus for plasma deposition The substrate in a plasma jet deposition system is provided with structural attributes, such as apertures and/or grooves, that facilitate efficient deposition. Groups of substrates are arranged with respect to the plasma beam in a manner which also facili... | 07/25/1995 |
| 5403399 | Method and apparatus for vapor deposition of diamond An apparatus for a vapor deposition of diamond by: effecting an arc discharge while feeding a discharge gas between an anode and a cathode of a thermal plasma chemical vapor deposition device; radicalizing a gaseous carbon compound by feeding the gaseous carbon ... | 04/04/1995 |
| 5382293 | Plasma jet CVD apparatus for forming diamond films An apparatus for depositing a diamond film on a substrate includes a first electrode formed as an enclosed body having a nozzle for jetting thermal plasma opening therefrom and a second electrode of opposite polarity positioned in the nozzle. The apparatu... | 01/17/1995 |
| 5328516 | Modular plasma gun assembly for coating the inner surfaces of hollow spaces and cavities The plasma gun assembly of the invention is particularly suitable for coating the inner surfaces of narrow cavities, bores, channels or the like. It essentially comprises a plasma gun head member, a plasma gun shaft member and a connector member. These th... | 07/12/1994 |
| 5314540 | Apparatus for forming diamond film Apparatus and process for synthesizing a diamond film of high purity at a high rate. Mixture gas of hydrocarbon gas and hydrogen gas is introduced into an arc discharge to produce a gas plasma. This gas plasma is blown against a substrate to deposit diamo... | 05/24/1994 |
