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| Number | Title | Issue Date |
| 7717060 | Controlled electroless plating An electroless metal deposition process to make a semiconductor device uses a plating bath solution having a reducing agent. A sample of the bath solution is taken and the pH of the sample is increased. The hydrogen evolved from the sample is measured. The hydrogen ... | 05/18/2010 |
| 7341634 | Apparatus for and method of processing substrate A workpiece is processed uniformly, e.g., a uniform plated film is formed on a workpiece, by a processing liquid, e.g., a plating solution, which is maintained in an optimum state while minimizing the amount of the processing liquid to be used. An apparatus for proc... | 03/11/2008 |
| 7323063 | Apparatus for changing concentration of treatment solution and treatment solution supply apparatus According to the present invention, in changing the concentration of a treatment solution supplied to a substrate, a volume of an existing treatment solution in a tank connected to a treatment solution supply section for supplying the treatment solution to the subst... | 01/29/2008 |
| 7108009 | Semiconductor manufacturing apparatus enabling inspection of mass flow controller maintaining connection thereto An opening/closing of a plurality of valves are controlled so that a plurality of gases flow into a chamber in an operation of a semiconductor manufacturing apparatus, and the opening/closing of the plurality of valves are controlled so that a gas A flows into mass ... | 09/19/2006 |
| 7087118 | Coating film forming apparatus and coating unit A coating film forming apparatus for forming a film by applying a coating solution to a substrate, which is provided with a cassette section, coating unit, developing unit, pre-treatment/post-treatment units and a main arm for transferring the substrate between the ... | 08/08/2006 |
| 7062348 | Dynamic mask for producing uniform or graded-thickness thin films A method for producing single layer or multilayer films with high thickness uniformity or thickness gradients. The method utilizes a moving mask which blocks some of the flux from a sputter target or evaporation source before it deposits on a substrate. The velocity... | 06/13/2006 |
| 7000454 | Particle measurement configuration and semiconductor wafer processing device with such a configuration A particle measurement configuration measures the particle concentration in a liquid or gaseous medium by way of a particle measuring instrument. In order to avoid erroneous measurements or damage to the particle measuring instrument, a measuring cell is provided wh... | 02/21/2006 |
| 6946157 | Method and apparatus for monitoring the coating on particle during manufacturing of a pharmaceutical product In a method of monitoring the formation of a coating on a single particle (P), an apparatus is used which comprises means (2,5,6,9) for arranging said particle (P) at a given spatial location, and a fluid supply unit (3) adapted to apply a coating flui... | 09/20/2005 |
| 6863730 | Coating die with laser position sensors An apparatus including: a movement device that moves an object to be coated; a slot die coater equipped with a position sensor mounted on at least one end of the slot die coater and which slot die coater controllably dispenses coating material onto the moving object... | 03/08/2005 |
| 6790281 | Finely-divided powder spray apparatus The present invention provides a finely-divided powder spray apparatus having a spray nozzle pipe for discharging finely-divided powders from the tip together with a gas stream, which is disposed at a prescribed distance from the member to be sprayed and inclined in... | 09/14/2004 |
| 6620248 | Coating apparatus and mixing apparatus In a coating apparatus for supplying a mixed solution of a resist solution and a thinner onto a wafer from a nozzle, the nozzle is connected to a mixed solution supply pipe, and the resist solution and the thinner are supplied to the mixed solution supply... | 09/16/2003 |
| 6576483 | Backside cannelure to provide for wafer shift detection A backside cannelure of an electrode to provide for detecting semiconductor wafer shift after the wafer has been positioned over the cannelure of the electrode is disclosed. The wafer has a backside and a proper position over the cannelure. The cannelure ... | 06/10/2003 |
| 6524659 | Method and apparatus for electrically controlling a flow of material The invention relates to a method for electrically controlling a flow of material, wherein a single- or multi-component, essentially polymer-based material (1), such as plastics, elastomer or the like, is charged electrically (I) and sprayed (II) in an el... | 02/25/2003 |
| 6522009 | Apparatus to electroless plate a metal layer while eliminating the photo electric effect A new method of electroless plating a metal layer onto a semiconductor substrate in the manufacture of an integrated circuit device has been achieved. A semiconductor substrate is provided. A metal layer is electroless plated onto the semiconductor substr... | 02/18/2003 |
| 6521112 | Paced chemical replenishment system A method of controlling the content of a chemical bath includes the steps of: determining a replenishment condition for the chemical bath; defining a unit of the replenishment condition; establishing a pacing factor corresponding to a replenishment volume... | 02/18/2003 |
| 6485782 | Coating film forming method and coating apparatus A spreading state of an outline of the outer periphery of a coating solution is detected by a detecting sensor, and the rotation speed or the like of a wafer as a substrate is controlled so that a spreading speed of the outline becomes not more than a pre... | 11/26/2002 |
| 6482468 | Method and device for powdering printed sheets The invention relates to a method and a device for powdering printed paper sheets. According to the invention, the performance of the air-pressure generator which generates the air stream for the powder-air mixture can be adjusted in line with the machine... | 11/19/2002 |
| 6470940 | Apparatus for distributing a release agent for use in the manufacture of ligno-cellulosic composite materials An apparatus for distributing a soap based release agent upon a surface comprising; a means for metering a controlled quantity of a liquid metallic soap into a pressurized water stream to form a pressurized aqueous solution having a controlled dilution ra... | 10/29/2002 |
| 6387801 | Method and an apparatus to electroless plate a metal layer while eliminating the photoelectric effect A new method of electroless plating a metal layer onto a semiconductor substrate in the manufacture of an integrated circuit device has been achieved. A semiconductor substrate is provided. A metal layer is electroless plated onto the semiconductor substr... | 05/14/2002 |
| 6383297 | Method and device for joint oxydation and heat treatment of workpieces Disclosed is a method for joint oxydation and heat treatment of workpieces at temperatures ࣘ1300° in the treatment chamber of an oven containing a neutral or reactive gas in a temperature range above 570°. In order for the process to be reproducible a... | 05/07/2002 |
| 6374160 | Method and device for monitoring fluid consumption A method and device are disclosed for monitoring lacquer consumption per can in a lacquer application unit. The device includes a counter providing can number data on the number of cans being applied with lacquer in the application unit; a tank for interm... | 04/16/2002 |
| 6364953 | Method and apparatus for making aerogel film A method for making an aerogel film includes the steps of performing a gelation reaction of a metal alkoxide on a substrate to prepare a substrate with a wet-gel film, and converting the wet-gel film into an aerogel film by a supercritical or sub-critical... | 04/02/2002 |
| 6328801 | Method and system for recovering and recirculating a deuterium-containing gas Provided is a novel method of and system for recovering and recirculating a deuterium-containing gas. According to the inventive method, a deuterium-containing feed gas is introduced into a chamber. An exhaust gas containing deuterium is removed from the ... | 12/11/2001 |
| 6319317 | Coating film forming method and coating apparatus A spreading state of an outline of the outer periphery of a coating solution is detected by a detecting sensor, and the rotation speed or the like of a wafer as a substrate is controlled so that a spreading speed of the outline becomes not more than a pre... | 11/20/2001 |
| 6258168 | Apparatus for applying adhesive to a web-shaped carrier A paster for the application of a film of water-containing adhesive to a running substrate of cigarette paper or the like automatically replaces the evaporated percentage of water when the substrate-processing machine is idle but the paster continues to c... | 07/10/2001 |
| 6251185 | System for delivering chopped fiberglass strands to a preform screen A system for placing chopped fiberglass strands onto a preform screen where desired includes a relatively light-weight chopper/feeder unit mounted on the outer end of a robot arm in closely spaced relation to the preform screen for robotically directing t... | 06/26/2001 |
| 6229971 | Toner concentration detecting method and system A method for detecting a toner concentration of a developer including toner particles provides that when developing a latent image having a predetermined area formed on a photoconductor using a developing member, a developing current flowing through the d... | 05/08/2001 |
| 6051284 | Chamber monitoring and adjustment by plasma RF metrology A method and apparatus for monitoring a parameter of the RF power applied to a plasma-enhanced chemical vapor deposition (PECVD) chamber. The parameter is used to monitor an aspect of the chamber or a process in the chamber. In particular, the parameter c... | 04/18/2000 |
| 6010740 | Fluid dispensing system An apparatus and method for controlling the opening of a solenoid actuated valve in a sealant dispensing gun are disclosed. A proximity sensor is provided adjacent a portion of the needle valve stem in order to sense when the needle valve has reached its ... | 01/04/2000 |
| 6008143 | Metal organic chemical vapor deposition apparatus and deposition method A metal organic chemical vapor deposition apparatus comprising a source ampule, a liquid micro-pump, a vaporizer equipped with a solvent supply means, and a reactor. A reactant dissolved in a solvent in the source ampule is transferred to the vaporizer by... | 12/28/1999 |
| 5985030 | Wet end starch application A method of applying a starch sizing to a forming web on a paper machine, such as in the form of a curtain on a fourdrinier machine, employs a suspension of uncooked particulate starch and water which is applied, as a suspension, to the inlet of a downwar... | 11/16/1999 |
| 5820678 | Solid source MOCVD system A system for MOCVD fabrication of superconducting and non-superconducting oxide films provides a delivery system for the feeding of metalorganic precursors for multi-component chemical vapor deposition. The delivery system can include multiple cartridges ... | 10/13/1998 |
| 5810928 | Method of measuring gas component concentrations of special material gases for semiconductor, a semiconductor equipment, and an apparatus for supplying special material gases for semiconductor A method of measuring gas component Concentrations of special material gases for semiconductor, and a semiconductor equipment are provided. The method and apparatus can be incorporated in a gas pipe line system in an inline manner, and measure the compone... | 09/22/1998 |
| 5724629 | Liquid developer monitoring device, liquid developer controlling system, and image forming apparatus using same This invention relates to a liquid developer monitoring device comprising a first electrode which contacts with a liquid developer comprising a liquid medium and electrically charged toner particles dispersed therein, a second electrode being either a dev... | 03/03/1998 |
| 5667701 | Method of measuring the amount of capacitive coupling of RF power in an inductively coupled plasma The amount of capacitive coupling of RF power to a semiconductor substrate or wafer in an inductively coupled RF plasma reactor is quantitatively measured by separating the RF current from the plasma through the wafer pedestal into the Fourier components ... | 09/16/1997 |
| 5665214 | Automatic film deposition control method and system A film deposition control system and method in which a deposition rate monitor and an ellipsometer are used to control the thickness of a thin film being deposited on a wafer. The ellipsometer is also used to detect the refractive index of the thin film b... | 09/09/1997 |
| 5601649 | Oxide superconducting film manufacturing apparatus Disclosed herein is an apparatus for manufacturing an oxide superconducting film employing laser ablation method. This apparatus has a thin film forming chamber having a laser-transparent laser entrance window, a target being provided in the thin film for... | 02/11/1997 |
| 5585137 | Apparatus and method of manufacturing fiber An apparatus includes a first waveguide having a first surface having a first hole through which a fiber passes, and a second surface having a second hole through which an object passes and opposing the first surface, a magic tee connected to the first wa... | 12/17/1996 |
| 5534066 | Fluid delivery apparatus having an infrared feedline sensor An apparatus for processing a layer on a workpiece includes a source of reactant fluid, a reaction chamber having a support for the workpiece and a fluid delivery apparatus for feeding an input fluid into the reaction chamber with the input fluid being ut... | 07/09/1996 |
| 5519316 | Method and apparatus for measuring a toner concentration of a two-component developer In an electrophotographic or electrostatic image forming device, the toner concentration of a two-component developer, i.e., a mixture of toner and carrier is measured on the basis of an output of a magnetic bridge type concentration sensor responsive to ... | 05/21/1996 |
