Did You Know...
...that in 1800 ether was first used by partyers as a fun diversion? Sniffing the gas led to hilarious and raucous laughter as people watched each other become more and more intoxicated and silly. Several doctors independently realized the value ether would have to anesthetize surgery patients. Of those who claimed rights to the "discovery," none had a happy ending. One had a seizure and died defending his rights. Another spent his life in an asylum because he had been denied acclaim. A third became addicted to chloroform and, in a New York City jail, he soaked a cloth in the drug, severed an artery and bled to death.
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| Number | Title | Issue Date |
| 7281869 | Coating and developing system and coating and developing method A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist fil... | 10/16/2007 |
| 6858088 | Method and apparatus for treating substrates To achieve a uniform coating of a substrate, with an apparatus and a method for coating substrates, according to which the substrate is supported on a substrate holder in such a way that a substrate surface that is to be coated is exposed, and the substrate is rotat... | 02/22/2005 |
| 6527861 | Developing apparatus with a porous film nozzle In a solution treatment apparatus, a nozzle for discharging a treatment solution toward a substrate held by a spin chuck includes a discharge opening for discharging the treatment solution on a surface of the substrate. A collision body against which the ... | 03/04/2003 |
| 6376014 | Dispenser for use with a polyurethane mixing head A spinning cone is positioned directly below a mixing head outlet to dispense and distribute a sticky mixture of polyurethane foam liquid chemical components. The mixing head and cone are reciprocated together across a longitudinally advancing metal strip... | 04/23/2002 |
| 5798140 | Oscillatory chuck method and apparatus for coating flat substrates An apparatus and method are provided for efficiently and effectively coating a substantially flat surface, i.e., a substrate, with a high-viscosity liquid chemical, such as photoresist. The flat surface is oscillated by rotating the surface in one directi... | 08/25/1998 |
| 5772764 | Coating apparatus A coating apparatus comprises a spin chuck for holding and rotating a substrate, a header unit movable along a linear line connecting a position just above a center-of-rotation of the substrate, to a home position of the unit, a plurality of nozzles inclu... | 06/30/1998 |
| 5656082 | Liquid applying apparatus utilizing centrifugal force A liquid applying apparatus includes a rotary member having a disk table in which a substrate to be applied with liquid is placed; a cover member movable above the disk table and operable to define a closed space in combination with the disk table; an ele... | 08/12/1997 |
| 5205867 | Spin coating apparatus having a horizontally linearly movable wafer holder A semiconductor wafer 11 is mounted on an elongated member 18, one end of which is rotatable about a transverse axis (14), thereby to distribute a liquid on the upper surface of the wafer more evenly. In order to stabilize the rotation of the elongated me... | 04/27/1993 |
| 5095848 | Spin coating apparatus using a tilting chuck A spin coating method includes the steps of applying a coating material on the surface of a substrate, rotating the substrate about a first axis, and revolving the substrate about a second axis while tilting the substrate towards the second axis. The rota... | 03/17/1992 |
| 4903717 | Support for slice-shaped articles and device for etching silicon wafers with such a support A device is disclosed for etching silicon wafers, with a support (1) for the silicon wafers, an annular nozzle (8) being provided in the surface (9, 10) of this support that faces the silicon wafer (11), the nozzle being chargeable with compressed gas for... | 02/27/1990 |
| 4899686 | Coating device A coating device includes a ring-shaped outer circumferential groove formed along and adjacent to the outer circumferential rim of a cup means and communicated with a processing vessel, and a processing liquid supply source connected to the outer circumfe... | 02/13/1990 |
| 4821675 | Color filter dyeing apparatus A color filter dyeing apparatus for dyeing a color filter formed on a substrate comprises a chuck for holding the substrate on which the color filter is mounted, a dyeing solution receptacle in intimate engagement, by means of a sealing member, with the c... | 04/18/1989 |
| 4788994 | Wafer holding mechanism A wafer holding mechanism horizontally holds, one at a time, wafers which are sequentially transported thereto. Wafers are treated with liquids such as an etchant, rinsing liquid, and the like, at the same time that the wafer is rotated at a high speed. T... | 12/06/1988 |
| 4674521 | Rinsing apparatus and method Rinsing methods and apparatus employ a rotatable work support to spray rinsing liquid against a surrounding wall of a processing station. The rinsing liquid washes residual processing liquid from the surrounding wall of the processing station, whereby the... | 06/23/1987 |
| 4655162 | Semiconductor device manufacturing apparatus The present invention provides a semiconductor device manufacturing apparatus which, in processing wafers with processing liquid, prevents dust contamination of a wafer surface to be processed, enables fine control of processing liquid temperature, enable... | 04/07/1987 |
| 4640846 | Semiconductor spin coating method An improved method for coating a semiconductor wafer with a uniform layer of photoresist or other liquid film is provided. The liquid is first semi-uniformly deposited on the wafer by spraying or otherwise. Thereafter, the wafer is rotated about an axis p... | 02/03/1987 |
| 4590094 | Inverted apply using bubble dispense The invention described avoids all the problems of the above described prior art techniques and is characterized by holding the workpiece in an inverted position, contacting the inverted face of the workpiece with a precisely metered amount of a flowable ... | 05/20/1986 |
| 4526127 | Apparatus for coating steel objects with an alloy of zinc and aluminium An apparatus for coating steel objects with an alloy of zinc and aluminium. The steel objects are preheated in a furnace to within 400°-950° C. within a protective reducing gas, and then introduced into a zinc bath containing about 5% aluminium in a cag... | 07/02/1985 |
| 4418639 | Apparatus for treating semiconductor wafers Apparatus for treating semiconductor wafers including a reciprocating wafer tray placed between a wafer loading station and a wafer unloading station. A station for applying photoresist and a station for heating the wafer in a vacuum chamber are placed be... | 12/06/1983 |
| 4386122 | Method and apparatus for galvanizing articles An improved galvanizing system is provided having a centrifuge assembly wherein an elongate member positively couples a motor means to a container holding articles to be spun. This positive engagement results in more rapid rotational acceleration and dece... | 05/31/1983 |
| 4315705 | Apparatus for handling and treating wafers A wafer processing system for spin processing photoresist liquid on a silicon wafer and automatically sequencing them through the processor includes a shuttle having upper and lower air bearing slides. The upper slide receives the wafer from a supply maga... | 02/16/1982 |
| 4314524 | Apparatus for transfer and treatment of apertured articles Apparatus comprising a vertically movable arm member pivoted at one end about a vertical axis and a chucking head mounted at the other distal end thereof, for engagement with and holding an apertured article, said chucking head being arranged to rotate th... | 02/09/1982 |
| 4237154 | Improved galvanizing method [and apparatus] Articles of almost any imaginable configuration are given a uniform, complete coating over all surfaces by placing them in a spinnable perforate container or basket that is suspended from a reversible spinning assembly which is adapted to spin the perfora... | 12/02/1980 |
| 4196231 | Impregnating equipment and method of vacuum impregnation Impregnating equipment includes a centrifuge, a tank which can be exhausted and into which an impregnating compound can be introduced, and means for attaching at an upper part of the tank a mounting for a centrifugal basket, said mounting comprising a sin... | 04/01/1980 |
| 4148942 | Removal of excess molten aluminum or its alloys from articles coated by the hot-dip method A process for removing excess molten aluminum or its alloys from articles following the aluminizing of same in such melt by high speed revolution of said articles while withdrawing from said melt.... | 04/10/1979 |
| 4096295 | Method for multiple coatings A plurality of articles such as sheets or lenses are simultaneously and uniformly coated by first placing them in vertical spaced relationship with respect to each other within a tank having a quantity of fluid coating material therein. The coating materi... | 06/20/1978 |
| 4064635 | Apparatus for drying plastic trays Equipment for use in washing articles such as egg trays and the like wherein the articles after being washed are moved by a conveyor to a drying zone for being picked up by a rotatable carriage by which they are lifted into a hood and rotated at high spee... | 12/27/1977 |
| 3974797 | Apparatus for applying a film of material to substrates or slices In a method and apparatus for applying light sensitive materials to semiconductor slices, a plurality of semiconductor slices are supported in a spaced apart array extending along an axis. The slices are supported on knife edges positioned at circumferent... | 08/17/1976 |
| 3950184 | Multichannel drainage system Disclosed is a multichannel drainage system for separately draining the centrifugally broadcast residue of different liquids sequentially dispensed on the top surface of a semiconductor wafer spun on a spindle at a work station. The multichannel drainage ... | 04/13/1976 |
