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| Number | Title | Issue Date |
| 8393289 | Laser assisted nano deposition An apparatus and method is disclosed for forming a nano structure on a substrate with nano particles. The nano particles are deposited through a nano size pore onto the substrate. A laser beam is directed through a concentrator to focus a nano size laser beam onto t... | 03/12/2013 |
| 8028646 | Coating medical devices Methods and systems for coating at least a portion of a medical device (e.g., a stent structure) include providing a plurality of coating particles (e.g., monodisperse coating particles) in a defined volume. For example, the particles may be provided using one or mo... | 10/04/2011 |
| 7568445 | System and method for the holographic deposition of material An apparatus and method for hologram induced deposition of material for use in the formation of three-dimensional structures is described. An electromagnetic energy source may be directed in the form of a hologram to a process chamber with a medium. The medium may b... | 08/04/2009 |
| 7516714 | Immobilizing device A solution containing a sample is provided vibration by a vibrating element, the solution is atomized in a status retaining its activities as minute particulate substances, and the solution and/or the atomized minute particulate substances are electrically charged b... | 04/14/2009 |
| 7432475 | Vertical heat treatment device and method controlling the same A vertical heat processing apparatus includes a process chamber (5) defining a process field (A1) configured to accommodate a plurality of target substrates (W) supported at intervals in a vertical direction. The apparatus further includes a heating fu... | 10/07/2008 |
| 7429717 | Multizone heater for furnace The present invention relates to an apparatus and method for heating a semiconductor processing chamber. One embodiment of the present invention provides a furnace for heating a semiconductor processing chamber. The furnace comprises a heater surrounding side walls ... | 09/30/2008 |
| 7429718 | Heating and cooling of substrate support A substrate support assembly and method for controlling the temperature of a substrate within a process chamber are provided. A substrate support assembly includes an thermally conductive body comprising a stainless steel material, a substrate support surface on the... | 09/30/2008 |
| 7381928 | Thermal processing apparatus and thermal processing method A light source including a plurality of flash lamps emits flashes thereby flash-heating a semiconductor wafer held by a thermal diffuser and a hot plate. The current distance of irradiation between the thermal diffuser and the hot plate holding the semiconductor waf... | 06/03/2008 |
| 7381967 | Non-axisymmetric charged-particle beam system The charged-particle beam system includes a non-axisymmetric diode forms a non-axisymmetric beam having an elliptic cross-section. A focusing element utilizes a magnetic field for focusing and transporting the non-axisymmetric beam, wherein the non-axisymmetric beam... | 06/03/2008 |
| 7378618 | Rapid conductive cooling using a secondary process plane A method and apparatus for thermally processing a substrate is described. The apparatus includes a substrate support configured to move linearly and/or rotationally by a magnetic drive. The substrate support is also configured to receive a radiant heat source to pro... | 05/27/2008 |
| 7371997 | Thermal processing apparatus and thermal processing method In a thermal processing apparatus, using a lamp for heating a substrate, an opening is formed for a camera unit, which is used to image portions of an auxiliary ring supporting the substrate, to obtain the position of the center of the auxiliary ring. The camera fur... | 05/13/2008 |
| 7358462 | Apparatus and method for reducing stray light in substrate processing chambers A method and apparatus for heating semiconductor wafers in thermal processing chambers is disclosed. The apparatus includes a non-contact temperature measurement system that utilizes radiation sensing devices, such as pyrometers, to determine the temperature of the ... | 04/15/2008 |
| 7358284 | Particulate acellular tissue matrix A method of processing an acellular tissue matrix to give a particulate acellular tissue matrix includes: cutting sheets of dry acellular tissue matrix into strips; cryofracturing the dry acellular tissue matrix strips at cryogenic temperatures; separating the resul... | 04/15/2008 |
| 7332691 | Cooling plate, bake unit, and substrate treating apparatus A bake unit includes a cooling plate for cooling a substrate and a lift pin assembly for loading a substrate on the cooling plate. When a wafer is cooled on the cooling plate, a guide groove is formed at the cooling plate to allow a space between the wafer and the c... | 02/19/2008 |
| 7312422 | Semiconductor batch heating assembly A heat treatment apparatus for use in batch heating/wafer processing is provided, which comprises a process chamber for receiving a wafer boat, at least a heating element comprising a substrate body configured to form an electrical heating circuit for at least one h... | 12/25/2007 |
| 7308865 | Installation for the electrostatic oiling of metal strips An installation for the electrostatic oiling of metal strips, with an integral system for heating the fluid circuits which allows the application of products which are solid at room temperature with melting point of 30-50° C., wherein the main heated components of ... | 12/18/2007 |
| 7309395 | System for forming composite polymer dielectric film A system for depositing a composite polymer dielectric film on a substrate is disclosed, wherein the composite polymer dielectric film includes a low dielectric constant polymer layer disposed between a first silane-containing layer and a second silane-containing la... | 12/18/2007 |
| 7288294 | Method of crystallizing amorphous silicon using nanoparticles A method of crystallizing amorphous silicon, wherein the method includes supplying nanoparticles over a surface of an amorphous silicon layer; intermittently melting nanoparticles that reach the surface of the amorphous silicon layer while supplying the nanoparticle... | 10/30/2007 |
| 7274867 | System and method for determining the temperature of a semiconductor wafer A system and method for determining the temperature of a semiconductor wafer at the time of thermal contact of the semiconductor wafer with a temperature sensing element. According to the invention, a temperature profile of the temperature sensing element is recorde... | 09/25/2007 |
| 7274006 | Heater A heater includes a heating member formed in a plate shape that includes a substrate-heating surface on which a substrate is mounted and a heating member rear surface which is on the opposite side of the substrate-heating surfaces. The heater also has a resistance h... | 09/25/2007 |
| 7270724 | Scanning plasma reactor A scanning plasma reactor for exciting reactant gases at a substrate surface including a beam forming module, a gas injection module, a reaction chamber with a window and a vacuum chuck, a gas exhaust module. Radiation from the beam forming module and the reactant g... | 09/18/2007 |
| 7258901 | Directed growth of nanotubes on a catalyst A nanostructure is fabricated using charged particle deposition to deposit a catalyst on a substrate. A charged particle beam is directed to location on the substrate where the catalyst is to be deposited, with a beam-activated precursor gas also being directed to t... | 08/21/2007 |
| 7256370 | Vacuum thermal annealer A vacuum thermal annealing device is provided having a temperature control for use with various materials, such as semiconductor substrates. A vacuum is used to remove air and outgas residual materials. Heated gas is injected planar to a substrate as pressure is qui... | 08/14/2007 |
| 7253109 | Method of depositing a tantalum nitride/tantalum diffusion barrier layer system We have discovered a method of providing a thin, approximately from about 2 Å to about 100 Å thick TaN seed layer, which can be used to induce the formation of alpha tantalum when tantalum is deposited over the TaN seed layer. Further, the ... | 08/07/2007 |
| 7251893 | Tribological applications of polyelectrolyte multilayers One aspect of the present invention relates to an implantable medical device comprising a surface coated with a polyelectrolyte multilayer, wherein said surface is glass, metal, plastic, polymer, or fiberglass. Another aspect of the present invention involves a meth... | 08/07/2007 |
| 7233013 | Radiation source for the generation of short-wavelength radiation In a radiation source for the generation of short-wavelength radiation, it is the object of the invention to effectively increase the protection of the collimator optics by a buffer gas without substantially reducing the radiation transmission. A vacuum chamber whic... | 06/19/2007 |
| 7217337 | Plasma process chamber and system The present invention relates to a plasma process chamber, which includes: an upper housing having a gas inlet connected to a gas source, and a gas shower head placed in the upper housing; and a lower housing having a gas outlet connected to a vacuum pump, and a sub... | 05/15/2007 |
| 7214618 | Technique for high efficiency metalorganic chemical vapor deposition A technique for more efficiently forming conductive elements, such as conductive layers and electrodes, using chemical vapor deposition. A conductive precursor gas, such as a platinum precursor gas, having organic compounds to improve step coverage is introduced int... | 05/08/2007 |
| 7211152 | Heating element CVD system and connection structure between heating element and electric power supply mechanism in the heating element CVD system A heating element CVD system wherein one or a plurality of connection terminal holders is placed in the processing container, and each of the connection terminal holders holds a plurality of connection terminals. Each of the connection terminals connects the heating... | 05/01/2007 |
| 7211769 | Heating chamber and method of heating a wafer A heating chamber which can be used during a reflow process to form a metal wiring having a multi-layered writing structure and a method of heating a wafer using the same, are provided. The heating chamber is movable upward and downward between the upper process pos... | 05/01/2007 |
| 7189437 | Mobile plating system and method An exemplary method for using a mobile plating system is provided that includes locating the mobile plating system at a desired location for plating, positioning an external vacuum pump from an interior position of a mobile storage volume of the mobile plasma platin... | 03/13/2007 |
| 7179504 | Substrate processing method and substrate processing system The present invention relates to a processing method for processing a substrate, and comprises a step of coating a coating solution on a surface of the substrate while relatively moving a coating solution discharge nozzle and the substrate and discharging the coatin... | 02/20/2007 |
| 7169690 | Method of producing crystalline semiconductor material and method of fabricating semiconductor device Disclosed are a method of producing a crystalline semiconductor material capable of improving the crystallinity and a method of fabricating a semiconductor device using the crystalline semiconductor material. An amorphous film is uniformly irradiated with a pulse la... | 01/30/2007 |
| 7163608 | Apparatus for synthesis of layers, coatings or films Systems and methods are described for the synthesis of films, coatings or layers. An apparatus includes a first holder; a second holder coupled to the first holder; a linkage coupled to the first holder and the second holder to move the first holder relative to the ... | 01/16/2007 |
| 7159535 | Apparatus for heating and curing powder coatings on porous wood products An improved apparatus is provided for curing powdered coatings on the face of porous wood products, such as medium density fiberboard (MDF), wherein a pair of inclined infrared catalytic heaters are used to apply heat directly onto the side edges of the board. In ad... | 01/09/2007 |
| 7156045 | Coating machine A coating machine having a coating material discharging mechanism for discharging a previously filled coating material under pressure to an atomizing mechanism wherein a coating material bag for filling a coating material is housed in a coating material discharging ... | 01/02/2007 |
| 7151060 | Device and method for thermally treating semiconductor wafers A device for thermally treating semiconductor wafers having at least one silicon layer to be oxidized and a metal layer, preferably a tungsten layer, which is not to be oxidized. The inventive device comprises the following: at least one radiation source; a treatmen... | 12/19/2006 |
| 7141763 | Method and apparatus for rapid temperature change and control An apparatus and a method for controlling the temperature of a substrate during substrate processing. The apparatus comprises a substrate table having a thermal surface supporting the substrate. The apparatus also comprises a first thermal assembly arranged in the s... | 11/28/2006 |
| 7138187 | Polyvinyl alcohol-based film exhibiting improved adhesion Modifications to the surface of polyvinyl alcohol-based films are disclosed that result in improved adhesion to optical materials. Specifically, the surface chemistry of the polyvinyl alcohol-based film is altered to include fluorine bonds, which surprisingly improv... | 11/21/2006 |
| 7138014 | Electroless deposition apparatus An apparatus and a method of depositing a catalytic layer comprising at least one metal selected from the group consisting of noble metals, semi-noble metals, alloys thereof, and combinations thereof in sub-micron features formed on a substrate. Examples of noble me... | 11/21/2006 |
