Did You Know...
...that it was melting ice cream that inspired the invention of the outboard motor? It was a lovely August day and Ole Evinrude was rowing his boat to his favorite island picnic spot. As he rowed, he watched his ice cream melt and wished he had a faster way to get to the island. At that moment the idea for the outboard motor was born!
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| Number | Title | Issue Date |
| 7877722 | Systems and methods for creating inspection recipes Systems and methods for creating inspection recipes are provided. One computer-implemented method for creating an inspection recipe includes acquiring a first design and one or more characteristics of output of an inspection system for a wafer on which the first des... | 01/25/2011 |
| 7873937 | System and method for lithography simulation A system has been developed for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the sys... | 01/18/2011 |
| 7870532 | Lithography simulation method, method of manufacturing a semiconductor device and program A lithography simulation method of obtaining a resist image by a simulation using a first function and a second function, the lithography simulation method comprising: determining a mask transmission function from a mask layout, modulating the mask transmission func... | 01/11/2011 |
| 7865865 | Method, program product and apparatus for performing decomposition of a pattern for use in a DPT process A method of decomposing a target pattern containing features to be printed on a wafer into multiple patterns. The method includes the steps of: (a) defining a region of influence which indicates the minimum necessary space between features to be imaged; (b) selectin... | 01/04/2011 |
| 7861210 | Exposure data generator and method thereof An exposure data generator for generating exposure data representing graphical information of a pattern to be exposed and a computer-readable recording medium are provided. The generator includes a storage device for storing pre-correction exposure data which includ... | 12/28/2010 |
| 7856613 | Method for self-aligned doubled patterning lithography Various embodiments of the invention provide systems and methods for semiconductor device fabrication and generation of photomasks for patterning a target layout of line features and large features. Embodiments of the invention are directed towards systems and metho... | 12/21/2010 |
| 7856612 | Lithography mask design through mask functional optimization and spatial frequency analysis In an electronic design automation technique for optical proximity correction, a mask is represented by a function with an exact analytical form over a mask region. Using the physics of optical projection, a solution based on a spatial frequency analysis is determin... | 12/21/2010 |
| 7853920 | Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturing One embodiment of a method for detecting, sampling, analyzing, and correcting hot spots in an integrated circuit design allows the identification of the weakest patterns within each design layer, the accurate determination of the impact of process drifts upon the pa... | 12/14/2010 |
| 7844939 | Mask pattern correction program and system The present invention provides a mask pattern correction program for correcting a design pattern which serves as a source to form a mask pattern so that, by exposure of a mask with a pattern formed thereon onto a substrate, the mask pattern is transferred as designe... | 11/30/2010 |
| 7844940 | Mask set for microarray, method of fabricating mask set, and method of fabricating microarray using mask set A mask set with a light-transmitting region of a controlled size includes a plurality of masks for performing in-situ synthesis on probes of a microarray, wherein each mask includes a light-transmitting region and a light-blocking region, and the size of the light-t... | 11/30/2010 |
| 7844941 | Charged particle beam exposure method and charged particle beam exposure device When a space, sandwiched by large patterns having a predetermined size or more, is exposed using a charged particle beam, the space sandwiched by the large patterns is exposed using a common block mask having the space and edge portions of the large patterns on both... | 11/30/2010 |
| 7836423 | Sum of coherent systems (SOCS) approximation based on object information A method for determining kernels in a sum of coherent systems (SOCS) approximation is provided. Information for an object to be simulated in a manufacturing process is determined. For example, information based on geometries that are included in a layout or mask is ... | 11/16/2010 |
| 7831954 | Flash-based updating techniques for high-accuracy high efficiency mask synthesis An embodiment of the present invention provides a system that computes the effect of perturbations to a pattern layout during an OPC process. During operation, the system receives a pattern layout and a set of lithography model kernels. The system then obtains a set... | 11/09/2010 |
| 7827521 | Method for manufacturing semiconductor device When a design diagram of the semiconductor device by a conventional CAD tool is used, a pattern which can be formed with the ink-jet apparatus is limited; therefore, there is a possibility that some circuits of the desired semiconductor device cannot be formed as th... | 11/02/2010 |
| 7818709 | Circuit-pattern-data correction method and semiconductor-device manufacturing method Circuit-pattern-data correction method and semiconductor-device manufacturing method which prevent excessive correction from being made when model-based proximity-effect correction (OPC) is applied to a corrected circuit pattern, the excessive correction being cause... | 10/19/2010 |
| 7818710 | Method and system for lithographic simulation and verification Methods and systems for lithographic simulation and verification comprising a process in the frequency domain or in the spatial domain of calculating intensity at a location (x, y) for a number of defocus values. In addition, evaluating the intensity calculation res... | 10/19/2010 |
| 7818711 | System and method for making photomasks The present application is directed a method for determining the position of photomask patterns in a mask making process. The method comprises providing one or more mask rules defining the minimum spacing between photomask patterns. The method further comprises dete... | 10/19/2010 |
| 7810066 | Irradiation pattern data generation method, mask fabrication method, and plotting system An irradiation pattern data generation method includes: a process for providing a design pattern having diagonal side portions that extend diagonally with respect to an X-axis direction and a Y-axis direction on an XY plane; a rectangular approximation process for a... | 10/05/2010 |
| 7805701 | Universal two-input logic gate that is configurable and connectable in an integrated circuit by a single mask layer adjustment A spare logic circuit for implementing any one of a plurality of logic gates includes a multiplexer circuit whose select inputs are utilized as logic gate inputs, and whose output is utilized as a logic gate output. Each of a plurality of data inputs of the multiple... | 09/28/2010 |
| 7802226 | Data preparation for multiple mask printing A method for preparing data to create two or more masks required to print a desired feature pattern with a multiple mask technique. In one embodiment of the invention, a target feature pattern is separated into two or more groups or data layers with a coloring algor... | 09/21/2010 |
| 7797668 | Method for optimally converting a circuit design into a semiconductor device A method for converting a circuit design into a semiconductor device includes the following steps. A first set of deign information is provided for representing the circuit design. Priority design information, which represents a priority portion of the circuit desig... | 09/14/2010 |
| 7788630 | Method and apparatus for determining an optical model that models the effect of optical proximity correction One embodiment provides a system that can enable a designer to determine the effects of subsequent processes at design time. During operation, the system may receive a test layout and an optical model that models an optical system, but which does not model the effec... | 08/31/2010 |
| 7788629 | Systems configured to perform a non-contact method for determining a property of a specimen Systems configured to perform a non-contact method for determining a property of a specimen are provided. One system configured to perform a non-contact method for determining a property of a specimen includes a focused biasing device configured to provide a stimulu... | 08/31/2010 |
| 7784020 | Semiconductor circuit pattern design method for manufacturing semiconductor device or liquid crystal display device A semiconductor circuit pattern design method includes the following operations. A design pattern is created by placing a plurality of cells in each functional block as a unit of the semiconductor circuit and executing routing among the plurality of placed cells. Ma... | 08/24/2010 |
| 7774739 | Methods for adjusting shifter width of an alternating phase shifter having variable width In accordance with an embodiment of the invention, there is a method of designing a lithography mask. The method can comprise determining a maximum width of a shifter, wherein the maximum width corresponds to a width of a shifter for a first set of features and dete... | 08/10/2010 |
| 7770144 | Modular array defined by standard cell logic Disclosed herein is an ASIC having a base array of function blocks. Each function block includes a plurality of primitive cells. Each primitive cell is defined by a component from a standard cell library. The base array is prefabricated for use later with a custom c... | 08/03/2010 |
| 7770145 | Semiconductor device pattern creation method, pattern data processing program, and semiconductor device manufacturing method A correction target pattern having a size not more than a threshold value is extracted from first design data containing a pattern of a semiconductor integrated circuit. The first characteristic of the semiconductor integrated circuit is calculated on the basis of t... | 08/03/2010 |
| 7761840 | Mask data generation including a main pattern and an auxiliary pattern A computer-readable recording medium recording a mask data generation program which causes a computer to generate data of a mask illuminated by illumination light and used to form a latent image on a photoresist via a projection optical system. The program causes th... | 07/20/2010 |
| 7752595 | Method for verifying and correcting post-OPC pattern layout A pattern producing method includes specifying a first pattern and a second pattern obtained by modifying the first pattern, specifying a correction area based on the second pattern, in a part of an area including the first pattern and the second pattern, producing ... | 07/06/2010 |
| 7747977 | Method and system for stencil design for particle beam writing Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell lib... | 06/29/2010 |
| 7747978 | System and method for creating a focus-exposure model of a lithography process A system and a method for creating a focus-exposure model of a lithography process are disclosed. The system and the method utilize calibration data along multiple dimensions of parameter variations, in particular within an exposure-defocus process window space. The... | 06/29/2010 |
| 7743359 | Apparatus and method for photomask design An apparatus and method of synthesizing a photolithographic data set includes using a first computational model to calculate a first figure-of-merit for the photolithographic data set; changing a first part of the photolithographic data set to increase the first fig... | 06/22/2010 |
| 7739650 | Pre-bias optical proximity correction A pre-bias optical proximity correction (OPC) method allows faster convergence during OPC iterations, providing an initial set of conditions to edge fragments of a layout based on density conditions near the edge fragments. ... | 06/15/2010 |
| 7739651 | Method and apparatus to determine if a pattern is robustly manufacturable One embodiment provides a method to determine if a pattern is robustly manufacturable. During operation, the system may receive a first pattern and a design intent, wherein the first pattern is intended to generate the design intent. Next, the system may determine a... | 06/15/2010 |
| 7735055 | Method of creating photo mask data, method of photo mask manufacturing, and method of manufacturing semiconductor device A method of creating photo mask data includes preparing design data of a photo mask, generating drawing data of the photo mask by using the design data, generating inspection control information configured to control inspection of defect on the photo mask by using t... | 06/08/2010 |
| 7735056 | Automated circuit design dimension change responsive to low contrast condition determination in photomask phase pattern The present application is directed to methods of forming a phase pattern for an integrated circuit feature described in a design database as having a first target dimension. In one embodiment, the method comprises determining whether forming a phase pattern for the... | 06/08/2010 |
| 7730445 | Pattern data verification method for semiconductor device, computer-readable recording medium having pattern data verification program for semiconductor device recorded, and semiconductor device manufacturing method A pattern data verification method for a semiconductor device, including extracting, from design data, design data corresponding to an edge portion of a mask pattern to obtain an edge portion of a pattern on a substrate to be processed, when the pattern is obtained ... | 06/01/2010 |
| 7721248 | Circuit element function matching despite auto-generated dummy shapes Methods, systems, program products are disclosed that control placement of dummy shapes about sensitive circuit elements such that the dummy shapes are at least substantially similar for each circuit element even though the dummy shapes are auto-generated. In one em... | 05/18/2010 |
| 7721247 | Side lobe image searching method in lithography A method for detecting the presence of side lobes in a full chip layout having a main pattern designed on a mask includes surrounding the main pattern with a pattern of polygons or circles. A lithography rule check is performed and uses the pattern of polygons or ci... | 05/18/2010 |
| 7716628 | System, method and program for generating mask data, exposure mask and semiconductor device in consideration of optical proximity effects A system for generating mask data includes an extracting module extracting a block necessary to correct process proximity effects as a wide correction area from a plurality of blocks by comparing parameter, a wide correction data generator generating wide correction... | 05/11/2010 |
