Bizarre Patents
Neuroimaging as a Marketing Tool
Neuroimaging as a means for validating whether a stimulus such as advertisement, communication, or product evokes a certain mental response such as emotion, preference, or memory, or to predict the consequences of the stimulus on later behavior such as consumption or purchasing.
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| Number | Title | Issue Date |
| 7865864 | Electrically driven optical proximity correction An approach that provides electrically driven optical proximity correction is described. In one embodiment, there is a method for performing an electrically driven optical proximity correction. In this embodiment, an integrated circuit mask layout representative of ... | 01/04/2011 |
| 7805700 | Physical-resist model using fast sweeping A method for determining a surface in a material is described. During this method, arrival times of a wavefront at a first depth in the material are calculated using an Eikonal equation. Note that the first depth is proximate to an outer surface of the material. Nex... | 09/28/2010 |
| 7743358 | Apparatus and method for segmenting edges for optical proximity correction An apparatus and method for modifying a mask data set includes calculating a derivative of a figure-of-merit, indicative of a data set defined by a plurality of polygon edges and then segmenting polygon edges in response to said step of calculating. ... | 06/22/2010 |
| 7730444 | Structural analysis method employing finite element method A structural analysis method that saves analysis time without lowering the prediction accuracy is provided. The structural analysis method has dividing up the analysis target into a plurality of finite elements; defining a plurality of meshes that divide up the anal... | 06/01/2010 |
| 7669173 | Semiconductor mask and method of making same A method of making a semiconductor device is disclosed. A target mask pattern is provided which includes features to be exposed on the mask, and features to be non-exposed on the mask. The to be exposed features are fractured by searching for geometries on the targe... | 02/23/2010 |
| 7669174 | Pattern generation method and charged particle beam writing apparatus A pattern generation method includes changing a dimension of a pattern included in each mesh-like region of a plurality of mesh-like regions by using an area of the pattern and a total sum of lengths of circumferential sides of the pattern included in each mesh-like... | 02/23/2010 |
| 7650587 | Local coloring for hierarchical OPC A method for designing a mask for fabricating an integrated circuit is provided wherein a mask layout that requires coloring, such as for alternating phase shift, double-exposure and double-exposure-etch masks, is organized into uncolored hierarchical design units. ... | 01/19/2010 |
| 7631287 | Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method A method in which a desired pattern is compared with a finish pattern to be formed on a wafer, which is predicted from a design pattern, based on a calculation of a light beam intensity, and a deviation quantity of the finish pattern from the desired pattern at each... | 12/08/2009 |
| 7617476 | Method for performing pattern pitch-split decomposition utilizing anchoring features A method for decomposing a target pattern containing features to be printed on a wafer into multiple patterns. The method includes the steps of: (a) determining a minimum critical dimension and pitch associated with a process to be utilized to image the multiple pat... | 11/10/2009 |
| 7454739 | Method and apparatus for determining an accurate photolithography process model One embodiment of the present invention provides a system that determines an accurate process model. During operation, the system receives process data. Next, the system receives an optical model which models an optical system of a photolithography process. The syst... | 11/18/2008 |
| 7448017 | System and method of automatically generating kerf design data A method and system is provided to use the same design manipulation processes for both chip design and kerf design. Concurrent generation of kerf designs and chip designs provides a consistent, accurate, and repeatable process. Improved quality of wafer testing resu... | 11/04/2008 |
| 7444615 | Calibration on wafer sweet spots A method for generating an OPC model is provided which takes into consideration across-wafer variations which occur during the process of manufacturing semiconductor chips. More particularly, a method for generating an OPC model is provided which takes into consider... | 10/28/2008 |
| 7434196 | Renesting interaction map into design for efficient long range calculations Methods, and program storage devices, for performing model-based optical lithography corrections by partitioning a cell array layout, having a plurality of polygons thereon, into a plurality of cells covering the layout. This layout is representative of a desired de... | 10/07/2008 |
| 7424699 | Modifying sub-resolution assist features according to rule-based and model-based techniques Modifying sub-resolution assist features includes receiving a mask pattern for a photolithographic mask. The mask pattern includes main features, and the photolithographic mask is operable to pattern a wafer pattern for a semiconductor wafer. Placement of sub-resolu... | 09/09/2008 |
| 7421678 | Assist feature placement using a process-sensitivity model One embodiment of the present invention provides a system that determines an assist feature placement. During operation, the system receives an initial assist feature placement for a layout. Next, the system determines assist feature perturbations using the initial ... | 09/02/2008 |
| 7418682 | Method and mechanism for performing DRC processing with reduced passes through an IC design A method and mechanism is disclosed for performing a spacing rule DRC check that does not require an excessive number of passes through the IC design. In one approach, a two-pass approach is employed to perform a spacing check. In an approach, a polygons are associa... | 08/26/2008 |
| 7412676 | Integrated OPC verification tool An integrated verification and manufacturability tool provides more efficient verification of integrated device designs than verification using several different verification components. The integrated verification and manufacturability includes a hierarchical datab... | 08/12/2008 |
| 7409327 | Simulation program for integrated optical/electronic circuit A method for forming a hybrid active electronic and optical circuit using a lithography mask. The hybrid active electronic and optical circuit comprising an active electronic device and at least one optical device on a Silicon-On-Insulator (SOI) wafer. The SOI wafer... | 08/05/2008 |
| 7406675 | Method and system for improving aerial image simulation speeds A method and system for improving aerial image simulation speeds. The method includes receiving a mask; generating a matrix of node values based on the mask, wherein each node value corresponds to a node of a plurality of nodes in a lattice; performing a one-dimensi... | 07/29/2008 |
| 7398509 | Network-based photomask data entry interface and instruction generator for manufacturing photomasks A computer network for generating instructions for photomask manufacturing equipment, based on photomask specification data input by a customer. A series of order entry screens are downloaded to a remote customer's computer, typically via an internet connection. The... | 07/08/2008 |
| 7392502 | Method for real time monitoring and verifying optical proximity correction model and method This invention relates to a method for real time monitoring and verifying optical proximity correction (OPC) models and methods in production. Prior to OPC is performed on the integrated circuit layout, a model describing the optical, physical and chemical processes... | 06/24/2008 |
| 7383530 | System and method for examining mask pattern fidelity A method and system is disclosed for examining mask pattern fidelity. A mask picture is generated from a first mask with a first OPC model applied to a mask design. The mask picture is converted into a mask based simulation file. A first simulation is conducted unde... | 06/03/2008 |
| 7382920 | Analyzing apparatus, model creating method, and computer product A mesh is placed over an image of an element thereby dividing the image (element) into a plurality of solids. Each of the solids is then divided equally into the even number of parts. Inclusion-ratio determination-points, which are points where the straight lines an... | 06/03/2008 |
| 7378202 | Grid-based resist simulation A grid-based resist simulator predicts how a wafer coated with one or more resist layers will develop when exposed with a mask pattern. Image intensity values are calculated at a grid of points on the wafer, and the image intensity points are analyzed with a resist ... | 05/27/2008 |
| 7372461 | Image processing apparatus and method of same An image processing apparatus able to decrease the number of minute unit graphics, able to achieve an improvement of performance of graphics drawing processing, and able to efficiently generate images, provided with a triangle generator for receiving vertex data fro... | 05/13/2008 |
| 7366648 | Electronic circuit analyzing apparatus, electronic circuit analyzing method, and electronic circuit analyzing program The present invention provides an electronic circuit analyzing apparatus for evaluating the reliability value of an analysis result, an electronic circuit analyzing method, and an electronic circuit analyzing program. The electronic circuit analyzing apparatus compr... | 04/29/2008 |
| 7367010 | Designing method and device for phase shift mask The work load spent on designing a trench-type, Levenson-type phase shift mask is lightened and the working time for the designing process is shortened. A pattern 11, having a plurality of apertures, is designed by means of a designing tool 10. In a da... | 04/29/2008 |
| 7363199 | Method and apparatus for simulating soft object movement Movement of a soft body is simulated by defining its surface as an arbitrary mesh of points connected by edges. Each point is represented as a point mass, subject to conventional laws of motion. The simulator represents forces acting on the point masses, namely skin... | 04/22/2008 |
| 7363198 | Long elements method for simulation of deformable objects Long Elements Method (LEM) for real time physically based dynamic simulation of deformable objects. The LEM is based on a new meshing strategy using long elements whose forms can be straight or arbitrary. The LEM implements a static solution for elastic global defor... | 04/22/2008 |
| 7354684 | Test pattern and method of evaluating the transfer properties of a test pattern A test pattern or set of patterns, a method of evaluating the transfer properties of the pattern, and a method of determining a parameter of a transfer process (e.g., imaging process) making use of the test pattern is provided. With the test pattern, the impact of l... | 04/08/2008 |
| 7353473 | Modeling small mosfets using ensemble devices A method of modeling statistical variation of field effect transistors having fingers physically measures characteristics of existing transistors and extracts a scaled simulation based on the characteristics of the existing transistors using a first model. The metho... | 04/01/2008 |
| 7350183 | Method for improving optical proximity correction A method for performing model based optical proximity correction (MBOPC) and a system for performing MBOPC is described, wherein the process model is decomposed into a constant process model term and a pattern dependent portion. The desired wafer target is modified ... | 03/25/2008 |
| 7349878 | Simulation method and system for the valuation of derivative financial instruments A Monte Carlo system and method are presented for the pricing of financial instruments such as derivative securities and for assisting a user in making an investment decision using the output of the system and method. A path-integral approach is described that relie... | 03/25/2008 |
| 7346887 | Method for fabricating integrated circuit features The present invention is directed to a method for conversion of an integrated circuit design into a set of masks for fabrication of an integrated circuit that optimizes use of an edge based image transfer mask process. ... | 03/18/2008 |
| 7346883 | System and method for integrated data transfer, archiving and purging of semiconductor wafer data A system for the integrated archiving, restoring, purging, importing and exporting of semiconductor wafer data, the system including a data acquisition system for acquiring scan data from differing types of semiconductor wafer scanning tools such as wafer dimensiona... | 03/18/2008 |
| 7343271 | Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare A first method to compute a phase map within an optical proximity correction simulation kernel utilizes simulated wavefront information from randomly generated data. A second method uses measured data from optical tools. A phase map is created by analytically embedd... | 03/11/2008 |
| 7343583 | System and method for searching for patterns of semiconductor wafer features in semiconductor wafer data A system for the integrated archiving, restoring, purging, importing and exporting of semiconductor wafer data, the system including a data acquisition system for acquiring scan data from differing types of semiconductor wafer scanning tools such as wafer dimensiona... | 03/11/2008 |
| 7340371 | System, method, and computer program product for performing transformation of rotations to translations during finite element stiffness formulation A system, method, and computer program product for transformation of rotations to translation degrees of freedom in structural analysis during finite element formulation. ... | 03/04/2008 |
| 7340713 | Method and apparatus for determining a proximity correction using a visible area model One embodiment of the present invention provides a system that determines a proximity correction for an integrated circuit layout. During operation, the system receives a layout. Next, the system receives an evaluation point within the layout. The system then determ... | 03/04/2008 |
| 7339584 | Method of generating a surface mesh A method and machine-readable medium provide a technique to generate and modify a quadrilateral finite element surface mesh using dual creation and modification. After generating a dual of a surface (mesh), a predetermined algorithm may be followed to generate and m... | 03/04/2008 |
