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| Number | Title | Issue Date |
| 7680556 | Method for data collection during manufacturing processes The present invention discloses a new data collection method employed by a middle layer between the host and the equipment, which improves the speed and consistency of data collection. The middle layer incorporated with the proposed data collection method functions ... | 03/16/2010 |
| 7680557 | System for processing semiconductor substrate by using laser and method of the same The present invention provides a system for processing a semiconductor substrate using a laser beam, the system including: a storing unit storing a process control data set for a slot for loading the semiconductor substrate therein; a process controlling unit detect... | 03/16/2010 |
| 7676296 | Substrate processing system, substrate processing method and computer-readable storage medium storing verification program Disclosed is a method of verifying a recipe execution program. When a computer executes a recipe execution program, the computer sends instructions, which are issued based on a process recipe data defining specific operations to be performed by a substrate processin... | 03/09/2010 |
| 7672750 | Method and apparatus for monitoring a microstructure etching process An etching monitoring apparatus and related method for use in the manufacture of microstructures (and in particular MEMS) located within an etching chamber is described. The apparatus and related method operates by setting the temperature of the chamber within which... | 03/02/2010 |
| 7672749 | Method and apparatus for hierarchical process control The present invention provides a method and apparatus for hierarchical process control. The method includes accessing at least one first metric indicative of processing performed on a wafer by a plurality of tool groups. The method also includes providing at least o... | 03/02/2010 |
| 7660645 | Production management method and production management system Processing apparatuses A, B, C, and D are included in a job-shop production line, and process 1 to process 6 are performed by the processing apparatuses A, B, C, B, D, and B, respectively. The processing apparatus B is repeatedly used in process 2 | 02/09/2010 |
| 7660644 | Atomic layer deposition apparatus A method and apparatus for atomic layer deposition (ALD) is described. The apparatus comprises a deposition chamber and a wafer support. The deposition chamber is divided into two or more deposition regions that are integrally connected one to another. The wafer sup... | 02/09/2010 |
| 7657339 | Product-related feedback for process control A method, apparatus, and a system for performing a product feedback for process control are provided. Metrology data relating to a first workpiece is received. An end of line parameter relating to the first workpiece is received. The end of line parameter is correla... | 02/02/2010 |
| 7650199 | End of line performance prediction A method, apparatus, and a system for performing post processing modeling is provided. A predicted end of line parameter relating to a workpiece is determined. The predicted end of line parameter is stored. An interface for accessing the end of line parameters provi... | 01/19/2010 |
| 7650200 | Method and apparatus for creating a site-dependent evaluation library The present invention includes a method of creating a Site-Dependent (S-D) evaluation library including receiving a plurality of S-D wafers by one or more S-D transfer subsystems in a processing system, establishing wafer state data for each S-D wafer, establishing ... | 01/19/2010 |
| 7640072 | Substrate processing apparatus, control method for the apparatus, and program for implementing the method A substrate processing apparatus, according to which inspection of various devices in the substrate processing apparatus can be carried out with improved reliability, while reducing the burden on a user. A processing chamber processes semiconductor wafers therein. A... | 12/29/2009 |
| 7636611 | Fuzzy logic system for process control in chemical mechanical polishing The present invention provides a versatile system for controlling chemical mechanical polishing in a semiconductor manufacturing process. The system of the present inventions utilizes an in-situ chemical mechanical polishing system, having some type of measurement o... | 12/22/2009 |
| 7634325 | Prediction of uniformity of a wafer A method of monitoring uniformity of a wafer is provided. A wafer parameter is selected. Manufacturing data is collected. The manufacturing data includes measurements of the selected wafer parameter. An average offset profile of the wafer parameter for a first and s... | 12/15/2009 |
| 7623937 | Semiconductor device manufacturing system and method for manufacturing semiconductor devices including calculating oxide film thickness using real time simulator The present invention provides a solution for interleaving data frames, in a semiconductor device manufacturing system in which the processing apparatus for conducting a process on any one of a semiconductor substrate and a thin film on a surface thereof; a self-dia... | 11/24/2009 |
| 7599757 | System and methods for automatic generation of component data A method of manufacturing an electronic circuit including employing a pick & place machine-specific component placement sequence, pick & place machine-specific component data for governing the operation of at least one specific pick & place machine in a manufacturin... | 10/06/2009 |
| 7596421 | Process control system, process control method, and method of manufacturing electronic apparatus A process control system includes a client computer which prepares a correlation between a reference monitored value of apparatus information and a feature quantity, a manufacturing execution system which prepares a processing recipe describing, as a first setting v... | 09/29/2009 |
| 7596420 | Device manufacturing method and computer program product A method is provided wherein a lithographic projection apparatus is used to print a series of test patterns on a test substrate to measure printed critical dimension as function of exposure dose setting and focus setting. A full-substrate analysis of measured critic... | 09/29/2009 |
| 7596423 | Method and apparatus for verifying a site-dependent procedure The present invention includes a method of verifying a Site-Dependent (S-D) processing procedure, the method including receiving a plurality of wafers by a S-D transfer system, determining S-D wafer state data for each wafer; establishing a first set of verification... | 09/29/2009 |
| 7596422 | Determining one or more profile parameters of a structure using optical metrology and a correlation between profile models and key profile shape variables One or more profile parameters of a structure fabricated on a wafer in a wafer application are determined by developing a correlation between a set of profile models and one or more key profile shape variables. The wafer application has one or more process steps and... | 09/29/2009 |
| 7571021 | Method and system for improving critical dimension uniformity A method for improving critical dimension of a substrate is provided. Manufacturing data of a plurality of critical dimension deviations corresponding to a plurality of areas on the substrate is collected. A plurality of sensitivity data corresponding to the plurali... | 08/04/2009 |
| 7565220 | Targeted data collection architecture A targeted data collection system configured to collect processing data in a plasma processing system is provided. The system includes a data collection host and a plurality of plasma processing components having a plurality of sensors such that each of the pluralit... | 07/21/2009 |
| 7565219 | Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object has a plurality of alignment marks of which desired positions are known. The method inc... | 07/21/2009 |
| 7561938 | Method for using data regarding manufacturing procedures integrated circuits (ICS) have undergone, such as repairs, to select procedures the ICs will undergo, such as additional repairs An inventive method in an integrated circuit (IC) manufacturing process for using data regarding repair procedures conducted on ICs at probe to determine whether any further repairs will be conducted later in the manufacturing process includes storing the data in as... | 07/14/2009 |
| 7558643 | Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object may include a plurality of alignment marks of which desired positions are known. The me... | 07/07/2009 |
| 7555358 | Process and method for continuous, non lot-based integrated circuit manufacturing A method for continuous, non lot-based manufacturing of integrated circuit (IC) devices of the type to each have a unique fuse identification (ID) includes: reading the fuse ID of each of the IC devices; advancing multiple lots of the IC devices through, for example... | 06/30/2009 |
| 7546178 | Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device An aligner evaluation system includes (a) an error calculation module configured to calculate error information on mutual optical system errors among a plurality of aligners; (b) a simulation module configured to simulate device patterns to be delineated by each of ... | 06/09/2009 |
| 7546177 | Automated state estimation system for cluster tools and a method of operating the same By using weighted entity states for representing a state of a cluster tool, a highly efficient technique for the measurement and monitoring of cluster tool characteristics, such as reliability, availability and maintainability, is provided. For example, individual e... | 06/09/2009 |
| 7539553 | System and method for automated dispatch and transportation of work-in-process A system and method for transporting wafer lots to desired destinations. The system includes a wafer lot status database unit, status storage, a filtering rule base, and a dispatch control unit. First, status records are input from the wafer lot status database by t... | 05/26/2009 |
| 7539554 | Tape out template system and method A tape out template system is provided. The tape out template system comprises a template database, a query database, and a processor. The template database stores a plurality of templates for mask tooling for different manufacturing technologies. Each of the templa... | 05/26/2009 |
| 7536236 | Component mounting apparatus, service providing device and servicing method A service receiving method for receiving a component library including component size necessary for mount production, by inputting, via a service receiver, to a service provider, mounted component data having the results of fabrication of non-defective products, thr... | 05/19/2009 |
| 7529595 | Method of controlling substrate processing apparatus and substrate processing apparatus It is an object of the present invention to realize, in a coating and developing apparatus including an inspection section, reduction in the startup time, cost reduction, and an improved operating rate of the inspection section. In the present invention, a co... | 05/05/2009 |
| 7509186 | Method and system for reducing the variation in film thickness on a plurality of semiconductor wafers having multiple deposition paths in a semiconductor manufacturing process A method and system for reducing the variation in film thickness on a plurality of semiconductor wafers having multiple deposition paths in a semiconductor manufacturing process is disclosed. A film of a varying input thickness is applied to semiconductor wafers mov... | 03/24/2009 |
| 7502659 | Sorting a group of integrated circuit devices for those devices requiring special testing A method for sorting integrated circuit (IC) devices of the type having a fuse identification (ID) into those devices requiring enhanced reliability testing and those requiring standard testing includes storing fabrication deviation data, probe data, and test data i... | 03/10/2009 |
| 7502660 | Feature dimension deviation correction system, method and program product A system, method and program product for correcting a deviation of a dimension of a feature from a target in a semiconductor process, are disclosed. The invention determines an origin of a deviation in a feature dimension from a target dimension regardless of whethe... | 03/10/2009 |
| 7496425 | Micrologistics tracking system for an automated manufacturing facility A computing system for monitoring activity in an automated fabrication facility includes a computer operably coupled to an MES (Manufacturing Execution Systems) database having data relating to manufacturing operation events; and the computer also being operably co... | 02/24/2009 |
| 7493186 | Method and algorithm for the control of critical dimensions in a thermal flow process A method of controlling one or more critical dimension (CD) features, dependent upon at least a first and a second processing parameter, with a single metrology step, while still enabling decoupled feedback to the first and the second processing parameter, includes ... | 02/17/2009 |
| 7489982 | Method and software for conducting efficient lithography WPH / lost time analysis in semiconductor manufacturing A method and a computer readable medium includes instructions for obtaining time data as programmed into processing recipes or as recorded when a wafer is processed and transferred during lithography operations. The data is parsed and saved into an MES database. A r... | 02/10/2009 |
| 7483764 | Exposure apparatus and device manufacturing method An exposure apparatus for exposing a substrate to a pattern. The apparatus includes an update system to update a parameter necessary for processing in the exposure apparatus through measurement, a setting system to set a validity period of the parameter updated by t... | 01/27/2009 |
| 7480539 | Automated manufacturing system and method for processing photomasks The present invention relates generally to an automated manufacturing system and method for manufacturing photomasks wherein information provided by a customer at a remote location is interfaced, via a network, to a photomask manufacturer's computer system and autom... | 01/20/2009 |
| 7477960 | Fault detection and classification (FDC) using a run-to-run controller A method for implementing FDC in an APC system including receiving an FDC model from memory; providing the FDC model to a process model calculation engine; computing a vector of predicted dependent process parameters using the process model calculation engine; recei... | 01/13/2009 |