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...that the Slinky toy was the result of a failed attempt by engineer Richard James to produce an antivibration device for ship instruments? His goal was to develop a spring that would instantaneously counterbalance the wave motion that rocks a ship at sea. Instead, he developed the Slinky.
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| Number | Title | Issue Date |
| 7888521 | Aluminum chelates Provided are aluminum chelates having the formula (I). Also provided are compositions having these chelates, methods of producing these chelates, and methods of modifying the viscosity of a liquid or a semisolid using these chelates. ... | 02/15/2011 |
| 7683195 | Silver β-ketocarboxylate, material comprising the same for forming silver metal, and use thereof It is an object to provide a novel material that can quickly form metal silver even at a low temperature of approximately 210° C. or less. This serves as a metal silver forming material that includes a silver β-ketocarboxylate. By heating this forming material, it... | 03/23/2010 |
| 7652158 | High purity metal acetylacetonate compound A process for producing a trivalent metal ion compound is provided. The process combines a trivalent metal organo-oxide M-(OR1)3 with a dione under reaction conditions to yield a reaction product ... | 01/26/2010 |
| 7595414 | Metal complex compound comprising β-diketonato ligand To provide a metal complex compound capable of being suitably used for manufacturing a metal-containing thin film by the CVD method and a method for preparing a metal-containing thin film. A metal complex compound comprising a β-diketonato ligand having an a... | 09/29/2009 |
| 7518008 | Processes for producing hafnium complexes Disclosed are first to sixth processes for respectively producing hafnium tetra-tertiary-butoxide, tetrakis(acetylacetonato)hafnium, tetrakis(1-methoxy-2-methyl-2-propanolato)hafnium, hafnium tetra-tertiary-amyloxide, tetrakis(3-methyl-3-pentoxy)hafnium, and tetraki... | 04/14/2009 |
| 7335783 | Thin film-forming material and method for producing thin film The thin film-forming material of the present invention comprises a bis(β-diketonato)zinc compound that is liquid at 25° C. and is suitable for forming a zinc-containing thin film. By using the thin film-forming material, a thin film can be produced with stable fi... | 02/26/2008 |
| 7323581 | Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition A metalorganic complex composition comprising a metalorganic complex selected from the group consisting of: metalorganic complexes comprising one or more metal central atoms coordinated to one or more monodentate or multidentate organic ligands, and complexed with o... | 01/29/2008 |
| 7316980 | Method for forming ferrocapacitors and FeRAM devices Ferrocapacitors having a vertical structure are formed by a process in which a ferroelectric layer is deposited over an insulator. In a first etching stage, the ferroelectric material is etched to form openings in it, leaving the insulating layer substantially intac... | 01/08/2008 |
| 7282573 | Process for making metal acetylacetonates The present invention provides an improved, economical and environmentally benign process for metal complexes of acetylacetone having the general formula, M(acac)n wherein M is a metal cation selected from the group consisting of Fe, Co, Ni, Cu, Zn, Al, C... | 10/16/2007 |
| 7270770 | Triboluminescent materials and devices This invention relates to various phosphine oxides and their use in applications which exploit the triboluminescent effect. ... | 09/18/2007 |
| 7244858 | Organometallic precursor compounds This invention relates to organometallic precursor compounds represented by the formula (L)M(L′)2(NO) wherein M is a Group 6 metal, L is a substituted or unsubstituted anionic ligand and L′ is the same or different and is a π acceptor ligand, a proce... | 07/17/2007 |
| 7238820 | Fluorine-free metallic complexes for gas-phase chemical metal deposition The invention concerns novel copper or silver complexes and their use for gas-phase chemical deposition of metal copper or silver almost free of impurities. ... | 07/03/2007 |
| 7232616 | Organic electroluminescent materials and devices made from such materials A class of organic metal complexes with mixed ligands for organic light emitting diodes are designed and characterized as the formula:(L2L3M)n. In this formula: L2 is a bidentate ligand which has at least one coordinate atom of oxyge... | 06/19/2007 |
| 7230127 | Photoluminescent compounds Triboluminescent materials comprising M wherein M is chosen from Tb, Eu, Sm, Dy and from 75% to 99.99% of M is replaced by Y, Gd, La or Lu. ... | 06/12/2007 |
| 7169875 | Organometallic compositions A composition suitable for use as a catalyst for the reaction of an isocyanate compound or prepolymer thereof with an alcohol to form a polyurethane comprises a mixture of (a)an organometallic compound selected from: (i) a compound of formula M(RO)4, wher... | 01/30/2007 |
| 7112690 | Volatile noble metal organometallic complexes A series of noble metal organometallic complexes of the general formula (I): MLaXb(FBC)c, wherein M is a noble metal such as iridium, ruthenium or osmium, and L is a neutral ligand such as carbonyl, alkene or diene; X is an anionic l... | 09/26/2006 |
| 7109365 | Processes for solubilizing organometallic compounds in fluorinated solvents by addition of a partly fluorinated non-catalytic co-solubilizer A process for solubilizing an organometallic compound in a fluorinated solvent to form an organometallic solution by adding and reacting a co-solubilizer having a partly fluorinated polymer, an organometallic compound, and a fluorinated solvent, and the co-solubiliz... | 09/19/2006 |
| 7094284 | Source reagent compositions for CVD formation of high dielectric constant and ferroelectric metal oxide thin films and method of using same Chemical vapor deposition (CVD) precursor compositions for forming metal oxide high dielectric constant (κ) thin films. The precursor composition in one embodiment comprises a metal precursor having a general formula M(β-diketonate)2(OR)2, wh... | 08/22/2006 |
| 7022800 | Organosiloxane compositions A moisture curable composition capable of cure to an elastomeric body, comprising a polymeric material having not less than two hydroxyl or hydrolyzable groups an alkoxysilane curative and a catalyst comprising: a mixture and/or re... | 04/04/2006 |
| 7014885 | Direct-write laser transfer and processing A device and method for depositing a material of interest onto a receiving substrate includes a first laser and a second laser, a receiving substrate, and a target substrate. The target substrate comprises a laser transparent support having a back surface and a fron... | 03/21/2006 |
| 6992200 | Copper complexes and process for formation of copper-containing thin films by using the same Copper-containing thin films can be industrially advantageously formed by chemical vapor deposition using as the copper source a divalent copper complex bearing β-diketonato ligands having silyl ether linkage. A representative example of the divalent copper complex... | 01/31/2006 |
| 6987197 | Organozirconium composite and method of synthesizing the same, raw material solution containing the same, and method of forming lead zirconate titanate thin film The organozirconium composite of the present invention has a decomposition temperature which is near the respective decomposition temperatures of an organolead compound and an organotitanium compound. The raw material solution can precisely control the composition o... | 01/17/2006 |
| 6979739 | Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds The present invention is generally directed to electroluminescent Ir(III) compounds, the substituted 2-phenylpyridines, phenylpyrimidines, and phenylquinolines that are used to make the Ir(III) compounds, and devices that are made with the Ir(III) compounds. ... | 12/27/2005 |
| 6962961 | S,S′-BIS-(α, α′-DISUBSTITUTED-α-ACETIC ACID)-TRITHIOCARBONATES AND DERIVATIVES AS INITIATOR-CHAIN TRANSFER AGENT-TERMINATOR FOR CONTROLLED RADICAL POLYMERIZATIONS AND THE PROCESS FOR MAKING THE SAME A s,s′-bis-(α, α′-disubstituted-α″-acetic acid)-trithiocarbonate and derivatives thereof can be used as an initiator, chain transfer agent, or terminator for polymerization of monomers such as free radical polymerizable monomers. Homopolymers, copolymers, a... | 11/08/2005 |
| 6946688 | Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds The present invention is generally directed to electroluminescent Ir(III) compounds, the substituted 2-phenylpyridines, phenylpyrimidines, and phenylquinolines that are used to make the Ir(III) compounds, and devices that are made with the Ir(III) compounds. ... | 09/20/2005 |
| 6870054 | Synthesis for organometallic cyclometallated transition metal complexes Disclosed is a process for forming an organometallic cyclometallated iridium compound comprising reacting an iridium halide complex with a silver salt and excess organic cyclometallating ligand in a diol solvent. The process provides better yields and control of des... | 03/22/2005 |
| 6849752 | Process for synthesizing ionic metal complex The invention relates to a process for synthesizing an ionic metal complex represented by the general formula (1) or (5). This process includes reacting in an organic solvent a compound (corresponding to ligand of the complex) represented by the general formula (2) ... | 02/01/2005 |
| 6838573 | Copper CVD precursors with enhanced adhesion properties This invention relates to copper(+1)(β-diketonate)(L) and related copper complexes such as copper (+1)(β-ketoiminate)(L) represented by the formula: wherein X represents O or NR9, R1 and R3... | 01/04/2005 |
| 6790381 | Drying agent An organic EL device is disclosed in which is placed a transparent water-capturing film comprising an easy-to-use organometallic compound illustrated by the chemical formula (1): wherein, R1, R2 and... | 09/14/2004 |
| 6762314 | Organometallic compositions An organometallic composition is described which comprises a complex of at least one orthoester of a metal having a formula M(ROAcAc)x(OR′)y in which M is selected from the group consisting of titanium, zirconium and hafnium; ROAcAc denotes a... | 07/13/2004 |
| 6753437 | CVD material compound and method for manufacturing the same, and CVD method of iridium or iridium compound thin film The present invention relates to a raw material for CVD comprising an organic iridium compound as a main component, said organic iridium compound being tris(2,4-octanedionato)iridium represented by Formula 1. Particularly preferably, the raw material for CVD consist... | 06/22/2004 |
| 6743933 | Process of forming thin film and precursor for chemical vapor deposition A process of producing a strontium titanate, barium titanate or barium strontium titanate thin film by chemical vapor deposition which comprises using a titanium compound represented by formula (I): wherein R1 | 06/01/2004 |
| 6743934 | Raw material compounds for use in CVD, and chemical vapor deposition of ruthenium compound thin films This invention provides raw material compounds for use in CVD which contain organic ruthenium compounds as a main ingredient, the organic ruthenium compounds having two β-diketones plus one diene, one diamine or two organic ligands which are coordinated with ruthen... | 06/01/2004 |
| 6682602 | Chemical vapor deposition systems including metal complexes with chelating O- and/or N-donor ligands A method of forming a film on a substrate using one or more complexes containing one or more chelating O- and/or N-donor ligands. The complexes and methods are particularly suitable for the preparation of semiconductor structures using chemical vapor depo... | 01/27/2004 |
| 6663706 | Raw material compounds for use in CVD, and chemical vapor deposition for producing iridium or iridium compound thin films This invention provides raw material compounds for use in CVD which contain an organic iridium compound as a main ingredient, the organic iridium compound consisting of tris(5-methyl-2,4-hexanedionato)iridium. According to the CVD which uses the above raw... | 12/16/2003 |
| 6603033 | Organotitanium precursors for chemical vapor deposition and manufacturing method thereof The invention comprises an organotitanium precursor formed from a ଲ-ketoester and a titanium glycolate, and dimer precursors formed from a reaction of the above organotitanium precursor with alcohol, which are used as sources of titanium dioxide for... | 08/05/2003 |
| 6562990 | Titanium chelates and processes therefor A composition and processes for producing the composition are provided. The composition comprises titanium chelates having the formulae of TiXm (OR)4-m, TiXm (OR).sub.(4-m)/2 (OR1).sub.(4-m)/2, and TiXm | 05/13/2003 |
| 6559328 | Indium source reagent compositions, and use thereof for deposition of indium-containing films on substrates and ion implantation of indium-doped shallow junction microelectronic structures An indium precursor composition having utility for incorporation of indium in a microelectronic device structure, e.g., as an indium-containing film on a device substrate by bubbler or liquid delivery MOCVD techniques, or as a dopant species incorporated ... | 05/06/2003 |
| 6555701 | CVD material compound and method for manufacturing the same and CVD method of ruthenium or ruthenium compound thin film The present invention provides a CVD material compound based on an organic ruthenium compound, the organic ruthenium compound consisting of one of cis and trans isomers of tris (2,4-octa-dionato) ruthenium (III). The organic ruthenium compound which consi... | 04/29/2003 |
| 6547863 | Metal compound solution and thin film formation using the same A metal compound solution of a metal compound represented by formula (I): ##STR1## wherein R1, R2, and R3 are each a halogen-substituted or unsubstituted alkyl group having 1 to 8 carbon atoms which may contain an oxygen a... | 04/15/2003 |
