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Class 556/113 - Chalcogen bonded directly to the metal


Subclass of Class 556 - Organic compounds -- part of the class 532-570 series
Definition: Compounds wherein chalcogen (i.e., oxygen, sulfur, selenium
No. of patents: 153
Last issue date: 03/27/2012


1        
NumberTitleIssue Date
8143431Low temperature thermal conductive inks
Novel copper alkoxide compound based ink formulations and their chemical syntheses are disclosed. The method of using the ink formulations to print conducting copper metal lines with standard ink jet printing and curing at
03/27/2012
7402296Method for stabilizing copper hydroxide
Disclosed is a method of stabilizing copper(II) hydroxide, the method comprising the sequential steps of: (a) combining copper(II) hydroxide, a water-soluble phosphate and water to form a mixture; and (b) drying the mixture. Also disclosed is stabilized copper(II) h...
07/22/2008
7393555Dicopper(I) oxalate complexes as precursor for metallic copper deposition
The invention relates to dicopper(I) oxalate complexes stabilized by neutral Lewis bases, such as alkenes or alkynes, and to the use of dicopper(I) oxalate complexes as precursors for the deposition of metallic copper, in which the neutral Lewis bases used are alkyn...
07/01/2008
7390832Dinuclear copper-based compound and ligand for nucleic acid scission and anticancer treatment
The present invention is related to a novel method for oxidizing or splitting nucleic acids at specific points on a complementary nucleic acid segment using a dinuclear copper-based compound of Formula I. Additionally, the present invention is related to a novel tre...
06/24/2008
7273944Methods for producing copper ethanolamine solutions
Provided are preservation formulations and methods, e.g., formulations for the preservation of wood. In particular, provided are methods for the production of copper monoethanolamine aqueous solutions from metallic copper and monoethanolamine. ...
09/25/2007
7238820Fluorine-free metallic complexes for gas-phase chemical metal deposition
The invention concerns novel copper or silver complexes and their use for gas-phase chemical deposition of metal copper or silver almost free of impurities. ...
07/03/2007
7208197Method of depositing copper on a support
A process for the deposition of copper on a support. The process includes bringing a copper precursor, in the vapor phase, into contact with a heated support, optionally in the presence of hydrogen. The copper precursor is in the form of a CuCl or CuBr composition i...
04/24/2007
7196210Isoreticular metal-organic frameworks, process for forming the same, and systematic design of pore size and functionality therein, with application for gas storage
The ability to design and construct solid-state materials with pre-determined structures is a grand challenge in chemistry. An inventive strategy based on reticulating metal ions and organic carboxylate links into extended networks has been advanced to a point that ...
03/27/2007
7189867Trifluoromethylcarbinol terminated thiols
A compound having the formula CF3—CH(OH)—CH2—(L)n—CH2—SH or a disulfide thereof. Each L is substituted or unsubstituted methylene, substituted or unsubstituted oxyalkylene, and alkyl-substituted or unsubstituted ...
03/13/2007
7169947Dicopper(I) oxalate complexes for use as precursor substances in metallic copper deposition
The invention relates to dicopper(I) oxalate complexes stabilised by neutral Lewis base components and to the use thereof as precursors for the deposition of metallic copper. The neutral Lewis bases used are alkynes or alkenes containing at least one silyl or ester ...
01/30/2007
7141688Fluorinated dye stabilizers in fluorinated dielectric solvent
The present invention is directed to novel fluorinated dye stabilizers having both high quenching efficiency and solubility in halogenated solvents. These dye stabilizers have shown a significantly effect on improving the dye fastness in hostile photooxidation condi...
11/28/2006
7034169Volatile metal β-ketoiminate complexes
Metal complexes, containing copper, silver, gold, cobalt, ruthenium, rhodium, platinum, palladium, nickel, osmium, and/or indium, and methods for making and using same are described herein. In certain embodiments, the metal complexes described herein may be used as ...
04/25/2006
7022469Silver halide photographic light-sensitive material
A silver halide emulsion is disclosed, comprising at least one monovalent Au(I) complex coordinated with a compound represented by the following formula (1): R1—Ch—R2  (1) wherein R1 and R2 each...
04/04/2006
6982341Volatile copper aminoalkoxide complex and deposition of copper thin film using same
A volatile copper aminoalkoxide complex of formula (I) can form a copper thin film having an improved quality by metal organic chemical vapor deposition (MOCVD): wherein, R1, R2, R3 and ...
01/03/2006
6965045Organic metal precursor for use in forming metal containing patterned films
An organic metal precursors containing one or more organic ligands bonded to one or more metal atoms, wherein the organic ligand is rapidly dissociated from the metal atom upon exposure to light and degraded leaving a metal or a metal oxide. By using the organic met...
11/15/2005
6930193Isoreticular metal-organic frameworks, process for forming the same, and systematic design of pore size and functionality therein, with application for gas storage
An isoreticular metal-organic framework (IRMOF) and method for systematically forming the same. The method comprises the steps of dissolving at least one source of metal cations and at least one organic linking compound in a solvent to form a solution; and crystalli...
08/16/2005
6905532Process for the dissolution of copper metal
Process for producing a copper-containing aqueous solution, in which a copper mass is dissolved in the presence of an oxidant in an aqueous leach liquor containing monoethanolamine and (HMEA)2CO3. The leach liquor is produced by partially carbo...
06/14/2005
6905531Process for the dissolution of copper metal
Process for producing a copper-containing aqueous solution, in which a copper mass is dissolved in the presence of an oxidant in an aqueous leach liquor containing monoethanolamine and (HMEA)2CO3. The leach liquor is produced by partially carbo...
06/14/2005
6822107Chemical vapor deposition precursors for deposition of copper
Copper precursors of the formula (I): wherein: Cu is Cu(I) or Cu(II); x is an integer having a value of from 0 to 4; each of R, R′ and R″ ...
11/23/2004
6818783Volatile precursors for deposition of metals and metal-containing films
This invention is directed to a group of novel homologous eight membered ring compounds having a metal, such as copper, reversibly bound in the ring and containing carbon, nitrogen, silicon and/or other metals. A structural representation of the compounds of this in...
11/16/2004
6784319Synthesis of (±)-2-((dimethylamino)methyl)-1-(aryl)cyclohexanols
Compositions comprising (±)-2-((dimethylamino)methyl)cyclohexanone, a transition-metal salt, and an organic solvent and methods of preparing (±)-cis-2-((dimethylamino)methyl)-1-(aryl)cyclohexanols, in particular (±)-cis-2-((dimethylamino)methyl)-1-(3-methoxypheny...
08/31/2004
6696586Bis AU(I) sensitizers and their synthesis
This invention relates to an organothiosulfonato Au(I) complex having the formula wherein M is a cationic counter ion; A is a substituted or unsubstituted organic group; and n is 1 to 4; and wherein the compound is symmetrical. It further relates t...
02/24/2004
6677490Method for producing alcohol/ketone mixtures
The invention relates to a method for producing a mixture of alcohols/ketones by decomposing an alkyl hydroperoxide, particularly to a method for producing a cyclohexanol/cyclohexanone by decomposing cyclohexyl hydroperoxide in the presence of a heterogen...
01/13/2004
6660632Method for depositing metal and metal oxide films and patterned films
The invention is directed to a photoresist-free method for depositing films composed of metals, such as copper, or its oxides from metal complexes. More specifically, the method involves applying an amorphous film of a metal complex to a substrate. The me...
12/09/2003
6649783Synthesis of (+/-)-2-((dimethylamino)methyl)-1-(aryl)cyclohexanols
Compositions comprising (&#b1;)-2-((dimethylamino)methyl)cyclohexanone, a transition-metal salt, and an organic solvent and methods of preparing (&#b1;)-cis-2-((dimethylamino)methyl)-1-(aryl)cyclohexanols, in particular (&#b1;)-cis-2-((dimethylamino)methy...
11/18/2003
6646147Process for the dissolution of copper metal
Process for producing a copper-containing aqueous solution, in which a copper mass is dissolved in the presence of an oxidant in an aqueous leach liquor containing monoethanolamine and (HMEA)2 CO3. The leach liquor is produced by par...
11/11/2003
6620956Nitrogen analogs of copper II ଲ-diketonates as source reagents for semiconductor processing
Nitrogen containing analogs of Copper II ଲ-diketonates which analogs are more stable source reagents for copper deposition when substantially free of solvents of excess ligands. The nitrogen containing analogs replace --O-- with --N(R")-- wherein R"...
09/16/2003
6613924Silver precursors for CVD processes
Organosilver complexes with ଲ-diketonates and neutral coordinating ligands are useful as silver precursors in chemical vapor deposition processes. The ଲ-diketonates include 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate (hfac), acetylacetonate (aca...
09/02/2003
6599587Organometallic precursor for forming metal pattern and method of forming metal pattern using the same
Disclosed is an organometallic precursor for forming a metal pattern, having a structure defined by the following Formula 1, and a method of forming the metal pattern using the same, in which the conductive metal pattern is readily formed through an expos...
07/29/2003
6538147Organocopper precursors for chemical vapor deposition
The present invention provides a copper precursor according to the formula (R3 COOCR2 COR1)Cu+1 {L}x, where x is 1, 2 or 3 and L is a neutral ligand. The precursors in the present invention, which are...
03/25/2003
6534665Single-carbon bridges bys cyclopentadienyl compounds and metallocene complexes thereof
The present invention relates to metallocenes, wherein the two cyclopentadienyl rings are connected to each other by a single carbon atom characterized by the following general formula III ##STR1## where each A, equal to or different from each other, is s...
03/18/2003
6486334Biomembrane mimetic surface coatings
Disclosed are thiol-functionalized phospholipids that have been covalently linked to a gold and/or silver substrate, methods for making them, and intermediates useful for such purposes. The resulting material creates a biomimetic surface that can be inclu...
11/26/2002
6372928Layer forming material and wiring forming method
A layer forming material is a compound which has a structure of six-membered ring coordinated to Cu and containing Si, and of which general formula is represented by the following chemical formula: ##STR1## wherein X1 and X2 are elem...
04/16/2002
6369256Self-reducible copper(II) source reagents for chemical vapor deposition of copper metal
Volatile low melting solid Cu(II) metal complexes are provided which are capable of depositing a copper film on various substrates under CVD conditions in the absence of reducing carrier gas H2. These CU(II) metal complexes are represented by t...
04/09/2002
6365746Stable and water soluble bis Au(I) complexes and their synthesis
This invention relates to an organomercapto Au(I) complex having the formula [(M--SOL)n --A--S--Au--S--A--(SOL--M)n ]M wherein M is a cationic counterion; SOL is a solubilizing group: A is a substituted or unsubstituted divalent organic linkin...
04/02/2002
6355821Preparation of metal alkoxides
Methods of forming metal alkoxides and methods of forming precursor solutions of metal alkoxides suitable for the coating of glass in the manufacture of electrochromic devices are disclosed. The method of forming metal alkoxides involves dissolving the me...
03/12/2002
6242625Process for extracting copper values from copper containing ores
In an acid leach copper extraction circuit for leaching copper values from copper ores using a water-immiscible organic solvent solution containing a copper extractant and an acid strip solution, the improvement wherein the stripped organic solvent soluti...
06/05/2001
6221285Production of organomagnesium compounds using catalysts
The preparation of organomagnesium compounds from organic halides, especially aromatic chloro compounds, and magnesium metal in the presence of a transition metal compound as a catalyst....
04/24/2001
6153779CuII and ZnII phenoxyl complexes and radical complexes thereof, methods for their preparation and use
Quadridentate CuII and ZnII phenoxyl complexes and phenoxyl radical complexes thereof, in which one ligand L is bonded to each metal atom and H2 L stands for the general formula ##STR1## in which the bridge-unit Q sta...
11/28/2000
6096913Production of metal-ligand complexes
In a process for the synthesis of a first metal-ligand complex, M+n (L-)n, where nࣙ1, from a metal compound precursor and a ligand precursor, where the metal of the metal compound precursor may during the synthesis chang...
08/01/2000
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